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    • 2. 发明授权
    • Molecular fluorine (F.sub.2) laser with narrow spectral linewidth
    • 具有窄光谱线宽的分子氟(F2)激光
    • US6154470A
    • 2000-11-28
    • US317527
    • 1999-05-24
    • Dirk BastingSergei V. GovorkovUwe Stamm
    • Dirk BastingSergei V. GovorkovUwe Stamm
    • H01S3/223H01S3/03H01S3/08H01S3/098H01S3/106H01S3/137H01S3/225
    • H01S3/225H01S3/08004H01S3/08036H01S3/1062H01S3/2258
    • A molecular fluorine (F.sub.2) laser is provided wherein the gas mixture comprises molecular fluorine for generating a spectral emission including two or three closely spaced lines around 157 nm. An etalon provides line selection such that the output beam only includes one of these lines. The etalon may also serve to outcouple the beam and/or narrow the selected line. Alternatively, a prism provides the line selection and the etalon narrows the selected line. The etalon may be a resonator reflector which also selects a line, while another element outcouples the beam. The etalon plates, preferably uncoated, comprise a material that is transparent at 157 nm, such as CaF.sub.2, MgF.sub.2, LiF.sub.2, BaF.sub.2, SrF.sub.2, quartz and fluorine doped quartz. The etalon plates are separated by spacers comprising a material having a low thermal expansion constant, such as invar, zerodur.RTM., ultra low expansion glass, and quartz. A gas such as helium or a solid such as CaF.sub.2 that does not absorb radiation 157 nm fills the gap between the etalon plates, or the gap is evacuated. The gas mixture preferably further includes neon as a buffer gas. Another etalon may be used for line narrowing. One or more of a highly reflective mirror, a high finesse etalon or a prism with a highly reflective back surface may serve as a highly reflective resonator reflector. Any of one or more etalons, a prism, a brewster plate and a highly or partially reflective mirror may seal the laser discharge chamber.
    • 提供分子氟(F2)激光器,其中气体混合物包含用于产生包括在157nm附近的两个或三个紧密间隔的线的光谱发射的分子氟。 标准具提供线选择,使得输出光束仅包括这些线之一。 标准具还可用于将光束外耦合和/或使所选择的线变窄。 或者,棱镜提供线选择并且标准具缩小所选行。 标准具可以是也选择一条线的谐振器反射器,而另一个元件将光束耦合。 优选未涂覆的标准具板包括在157nm下透明的材料,例如CaF 2,MgF 2,LiF 2,BaF 2,SrF 2,石英和氟掺杂的石英。 标准具板由包括具有低热膨胀常数的材料的间隔物分离,例如invar,zerodur TM,超低膨胀玻璃和石英。 诸如氦气或诸如CaF 2的不吸收辐射的固体的气体157nm填充了标准具板之间的间隙,或间隙被排空。 气体混合物优选还包括作为缓冲气体的氖。 另一种标准具可用于线窄。 高反射镜,高精度标准具或具有高反射背面的棱镜中的一个或多个可以用作高反射谐振器反射器。 一个或多个标准具,棱镜,布鲁斯特板和高度或部分反射镜中的任何一个可以密封激光放电室。
    • 4. 发明授权
    • Excimer or molecular fluorine laser system with precision timing
    • 准分子或分子氟激光系统具有精确时序
    • US07308013B2
    • 2007-12-11
    • US10699763
    • 2003-11-03
    • Dirk BastingSergei GovorkovRainer PaetzelIgor BraginAndreas Targsdorf
    • Dirk BastingSergei GovorkovRainer PaetzelIgor BraginAndreas Targsdorf
    • H01S3/22
    • H01S3/225H01S3/073H01S3/09702H01S3/09713H01S3/2258
    • A Master Oscillator (MO)—Power Amplifier (PA) configuration (MOPA) can be used advantageously in an excimer laser system for micro-lithography applications, where semiconductor manufacturers demand powers of 40 W or more in order to support the throughput requirements of advanced lithography scanner systems. The timing of discharges in discharge chambers of the MO and PA can be precisely controlled using a common pulser to drive the respective chambers. The timing of the discharges further can be controlled through the timing of the pre-ionization in the chambers, or through control of the reset current in the final compression stages of the pulser. A common pulser, or separate pulser circuits, also can be actively controlled in time using a feedback loop, with precision timing being achieved through control of the pre-ionization in each individual discharge chamber. Yet another system provides for real-time compensation of time delay jitter of discharge pulses in the chambers.
    • 主振荡器(MO) - 功率放大器(PA)配置(MOPA)可以有利地用于微光刻应用的准分子激光系统,其中半导体制造商需要40W或更高的功率,以支持先进的吞吐量要求 光刻扫描仪系统。 可以使用公共脉冲发生器来精确地控制MO和PA的放电室中的放电定时以驱动各个室。 放电的时间进一步可以通过室内预电离的定时或通过控制脉冲发生器的最终压缩级中的复位电流来控制。 公共脉冲发生器或单独的脉冲发生器电路也可以使用反馈回路在时间上有效地控制,通过在每个单独的放电室中控制预电离来实现精确定时。 另一个系统提供对腔室中的放电脉冲的时间延迟抖动的实时补偿。
    • 8. 发明授权
    • Preionization arrangement for gas laser
    • 气体激光器的预处理装置
    • US06650679B1
    • 2003-11-18
    • US09247887
    • 1999-02-10
    • Igor BraginUlrich RebhanUwe StammDirk Basting
    • Igor BraginUlrich RebhanUwe StammDirk Basting
    • H01S3097
    • G03F7/70025H01S3/0384H01S3/0385
    • A preionization device for a gas laser comprises an internal preionization electrode having a dielectric housing around it and an external preionization electrode displaced from the dielectric housing by a small gap. The dielectric housing includes two cylindrical regions of differing outer radii of curvature. An open end of the housing has a larger radius of curvature than the other end which is closed. The internal electrode connects to circuitry external to the discharge chamber via a conductive feedthrough which penetrates through the housing. The external circuitry prevents voltage oscillations caused by residual energy stored as capacitance in the dielectric housing. The external preionization electrode, which is connected electrically to one of the main discharge electrodes, is formed to shield the internal preionization electrode from the other main discharge electrode to prevent arcing therebetween. The external electrode is also formed to shield the outer gas volume and walls of the discharge chamber from the preionization unit. A semi-transparent external electrode prevents charged particles emanating from the main discharge area from settling on the housing and causing field distortion and discharge instabilities.
    • 用于气体激光器的预电离装置包括其周围具有介电壳体的内部预电离电极和通过小间隙从绝缘壳体移位的外部预电离电极。 介电壳体包括具有不同外部曲率半径的两个圆柱形区域。 外壳的开口端具有比封闭的另一端更大的曲率半径。 内部电极通过穿透壳体的导电馈通连接到放电室外部的电路。 外部电路防止由绝缘外壳中的电容存储的剩余能量引起的电压振荡。 与主放电电极之间电连接的外部预电离电极被形成为将内部预电离电极与另一个主放电电极屏蔽,以防止它们之间的电弧。 外部电极也形成为将外部气体体积和排出室的壁与预电离单元进行屏蔽。 半透明外部电极防止从主放电区域发出的带电粒子沉降在壳体上并导致场失真和放电不稳定。