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    • 6. 发明授权
    • 방전램프
    • KR100426580B1
    • 2004-07-05
    • KR1019960062368
    • 1996-12-06
    • 우시오덴키 가부시키가이샤
    • 이가라시다츠시미즈노오사무나카무라가즈오미야마쇼이치
    • H01J61/00
    • G03F7/70016H01J61/40
    • A discharge lamp in which ultraviolet radiation of short wavelengths can be advantageously cut and in which the amount of emitted light (i-line) of 365 nm wavelength can be increased is achieved according to the invention by providing a quartz glass arc tube that is coated with a plurality of coating layers which include a layer which has Ta2O5 as the main component, and at least one additional coating layer which has a refraction coefficient which differs from the refraction coefficient of the coating layer having the Ta2O5 main component. These layers act to prevent the reflection of light with a wavelength of 365 nm which is incident on the coatings on the arc tube and to cut at least 50% of the ultraviolet radiation having wavelengths of 230 nm or less. According to the invention, the coating layers can be provided on the outer side of the arc tube, on the inner side of the arc tube, or on both on the inner and outer sides of the arc tube.
    • 一种放电灯,其中可以有利地切割短波长的紫外线并且其中可以增加365nm波长的发射光量(i线)根据本发明通过提供一种石英玻璃电弧管来实现,该石英玻璃电弧管被涂覆 具有多个涂层,所述涂层包括具有Ta 2 O 5作为主要成分的层和至少一个具有不同于具有Ta 2 O 5主要成分的涂层的折射系数的折射系数的附加涂层。 这些层用于防止入射在电弧管上的涂层上的波长为365nm的光的反射,并且切割波长为230nm或更小的紫外线辐射的至少50%。 根据本发明,涂层可以设置在电弧管的外侧上,电弧管的内侧上,或者电弧管的内侧和外侧上。 <图像>
    • 8. 发明公开
    • 노광장치
    • 曝光装置
    • KR1020030058744A
    • 2003-07-07
    • KR1020010089278
    • 2001-12-31
    • 아이티에스테크놀러지 주식회사
    • 김응원
    • G03F7/20
    • G03F7/70191G03F7/2004G03F7/70016G03F7/70075G03F7/702
    • PURPOSE: An exposure apparatus is provided, to allow the upper and under faces of the substrate for preparation of a semiconductor and a printed circuit board to be exposed uniformly. CONSTITUTION: The exposure apparatus comprises a light source(100) comprising a lamp(101) and an elliptical mirror(102) for collecting the light emitted at the lamp; a cold mirror(110) for extracting the UV light from the collected light and reflecting it; a plano convex lens(130) for converting the light reflected at the cold mirror into a parallel light; a light divider(140) for dividing the light from the plano convex lens into upper and lower parts; upper and lower mirrors(150) for changing the path of the light divided at the light divider; upper and lower fly eye lens assemblies(160) which comprise a plurality of fly eye lenses arranged vertically and horizontally and increase the illumination uniformity of the light reflected by the upper and lower mirrors; and upper and lower spherical mirrors which are installed at the upper and under parts of a substrate and irradiates the light projected at the upper and lower fly eye lens assemblies to the upper and under faces of the substrate to expose it.
    • 目的:提供曝光装置,以允许基板的上表面和下表面准备半导体和印刷电路板以均匀地曝光。 构成:曝光装置包括:光源(100),包括灯(101)和椭圆镜(102),用于收集在灯处发射的光; 用于从收集的光中提取UV光并反射的冷镜(110); 用于将在冷镜处反射的光转换成平行光的平凸透镜(130); 用于将来自平凸透镜的光分成上部和下部的光分离器(140); 上和下反射镜(150),用于改变在分光器处划分的光的路径; 上和下眼睛透镜组件(160),其包括垂直和水平布置的多个飞眼镜片,并且增加由上镜和下镜反射的光的照明均匀性; 以及上下球面镜,其安装在基板的上部和下部,并将投射在上下眼睛透镜组件上的光照射到基板的上下表面以使其曝光。