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1. 发明公开

KR1020020059046A 스캔형 노광장치 无效
标题翻译：扫描曝光装置
公开(公告)号：KR1020020059046A
公开(公告)日：2002-07-12
申请号：KR1020000087327
申请日：2000-12-30
申请人： 아이티에스테크놀러지 주식회사
发明人： 김응원
IPC分类号： G03F7/00
CPC分类号： G03F7/2059 , G03F7/7015 , G03F7/70225 , G03F7/70316 , G03F7/70358 , G03F7/704
摘要： PURPOSE: Provided is a scan exposure device, in which top surface/bottom surface of substrate can be completely and uniformly exposed to optical system continuously and repeatedly by scanning. CONSTITUTION: The scan exposure device comprises loading part(11) and unloading part(12) at both sides; and exposure part(15) at midsection. The exposure part(15) has frame assembly(20) having up/down frames so as to support the substrate, and to enable a mask to contact to top/bottom part, and frame transferring unit for establishing a moving area in the exposure(15) and relatively transferring the frame assembly with respect to exposed light in moving area. The exposure part(15) has optical system for irradiating to the top/bottom surface of the substrate.
摘要翻译：目的：提供一种扫描曝光装置，其中基板的顶表面/底表面可以通过扫描连续且重复地完全均匀地暴露于光学系统。构成：扫描曝光装置包括两侧装载部分（11）和卸载部分（12）; 和暴露部分（15）。曝光部分（15）具有框架组件（20），其具有上/下框架以支撑衬底，并且使掩模能够接触顶部/底部;以及框架传送单元，用于在曝光中建立移动区域并且相对于移动区域中的暴露的光相对地转移框架组件。曝光部分（15）具有用于照射到基板的顶/底表面的光学系统。

2. 发明公开

KR1020020059045A 스캔형 노광장치 无效
标题翻译：扫描型曝光装置
公开(公告)号：KR1020020059045A
公开(公告)日：2002-07-12
申请号：KR1020000087324
申请日：2000-12-30
申请人： 아이티에스테크놀러지 주식회사
发明人： 김응원
IPC分类号： H01L21/027
摘要： PURPOSE: A scan-type exposure device is provided to enable the upper and lower faces of s substrate loaded sequentially to be exposed continuously and repeatedly by moving optical devices linearly and reciprocally, thereby improving the velocity and quality of exposure. CONSTITUTION: The scan-type exposure device comprises a support frame(100) combined in the middle exposing part of the base body(10) to be moved linearly; a light source fixed to the support frame; a spectrometer which is set in the rear support part(101) of the support frame(100) and divides the light from the light source up and down; a pair of upper and lower rotating polygonal mirror which is fixed to the upper and lower parts of the rear support part and scans the light reflected at the spectrometer; an upper and lower cylindrical reflection mirror which is combined in the upper and lower slide plates fixed to the support frame and irradiates the scanned light onto the upper and lower faces of the substrate(S) equipped with an upper and lower frames(13,14); and a frame drive means which moves the support frame.
摘要翻译：目的：提供一种扫描型曝光装置，使得顺序加载的基片的上下面能够通过线性地和往复移动光学装置连续地和反复地暴露，从而提高曝光的速度和质量。构成：扫描型曝光装置包括：组合在基体（10）的中间露出部分中的线性移动的支撑框架（100）固定在支撑框架上的光源; 设置在支撑框架（100）的后支撑部（101）中的光谱仪，并且上下分离来自光源的光; 一对上下旋转多面镜，其固定在后支撑部分的上部和下部，并扫描在光谱仪反射的光; 上下圆柱反射镜，其组合在固定到支撑框架上的上滑动板和下滑板中，并将扫描的光照射到装备有上框架和下框架的基板（S）的上表面和下表面上）; 以及移动支撑框架的框架驱动装置。

3. 发明公开

KR1020030058744A 노광장치 无效
标题翻译：曝光装置
公开(公告)号：KR1020030058744A
公开(公告)日：2003-07-07
申请号：KR1020010089278
申请日：2001-12-31
申请人： 아이티에스테크놀러지 주식회사
发明人： 김응원
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/2004 , G03F7/70016 , G03F7/70075 , G03F7/702
摘要： PURPOSE: An exposure apparatus is provided, to allow the upper and under faces of the substrate for preparation of a semiconductor and a printed circuit board to be exposed uniformly. CONSTITUTION: The exposure apparatus comprises a light source(100) comprising a lamp(101) and an elliptical mirror(102) for collecting the light emitted at the lamp; a cold mirror(110) for extracting the UV light from the collected light and reflecting it; a plano convex lens(130) for converting the light reflected at the cold mirror into a parallel light; a light divider(140) for dividing the light from the plano convex lens into upper and lower parts; upper and lower mirrors(150) for changing the path of the light divided at the light divider; upper and lower fly eye lens assemblies(160) which comprise a plurality of fly eye lenses arranged vertically and horizontally and increase the illumination uniformity of the light reflected by the upper and lower mirrors; and upper and lower spherical mirrors which are installed at the upper and under parts of a substrate and irradiates the light projected at the upper and lower fly eye lens assemblies to the upper and under faces of the substrate to expose it.
摘要翻译：目的：提供曝光装置，以允许基板的上表面和下表面准备半导体和印刷电路板以均匀地曝光。构成：曝光装置包括：光源（100），包括灯（101）和椭圆镜（102），用于收集在灯处发射的光; 用于从收集的光中提取UV光并反射的冷镜（110）; 用于将在冷镜处反射的光转换成平行光的平凸透镜（130）; 用于将来自平凸透镜的光分成上部和下部的光分离器（140）; 上和下反射镜（150），用于改变在分光器处划分的光的路径; 上和下眼睛透镜组件（160），其包括垂直和水平布置的多个飞眼镜片，并且增加由上镜和下镜反射的光的照明均匀性; 以及上下球面镜，其安装在基板的上部和下部，并将投射在上下眼睛透镜组件上的光照射到基板的上下表面以使其曝光。

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