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    • 2. 发明公开
    • 납땜 증착물 구조를 전달하기 위한 방법 및 디바이스
    • 用于传送焊接深度安排的方法和装置
    • KR1020070085432A
    • 2007-08-27
    • KR1020077011738
    • 2005-09-26
    • 파크 테크-파카징 테크놀로지이스 게엠베하스마트 팩 게엠베하 테크놀로지 서비시즈
    • 자켈,엘케아즈다쉬트,가셈
    • H01L21/48
    • B23K3/0623H05K3/3478H05K2201/10734H05K2203/0338H05K2203/041H05K2203/082
    • Disclosed area a method and an apparatus for transferring a solder depot arrangement comprising a plurality of solder depots to a connecting area arrangement of a contact surface of a substrate (36). According to the invention, a plurality of solder depots are removed from a solder depot reservoir (25) that is accommodated in a solder depot receiving device (11) by means of a singulating mechanism (12) which is embodied like a stencil and is placed above the solder depot reservoir in order to form the solder depot arrangement that is configured in accordance with the connecting area arrangement. The solder depot arrangement is then transferred to the connecting area arrangement of the substrate, the solder depot reservoir being impinged upon by negative pressure through stencil openings (15) of the singulating mechanism in order to transfer the solder depot from the solder depot reservoir to the singulating mechanism. The solder depot reservoir (25) is ventilated via a bottom wall (20) that is located opposite the singulating mechanism during impingement with negative pressure (27) through the singulating mechanism (12).
    • 公开的领域一种用于将包括多个焊料储存库的焊料库装置转移到基板(36)的接触表面的连接区域布置的方法和装置。 根据本发明,多个焊料贮存器通过借助于模制机构(12)而被容纳在焊料贮存器接收装置(11)中的焊料储存器(25)上,该单独机构(12)被实施为模板并被放置 在焊料储存器上方,以形成根据连接区域布置配置的焊料堆放装置。 然后将焊料储存库布置转移到基板的连接区域布置,焊料储存器通过负压通过分离机构的模板开口(15)撞击,以将焊料储存库从焊料储存库转移到 单机制。 焊料储存器(25)通过底壁(20)通风,底壁(20)通过分离机构(12)在与负压(27)碰撞时位于与分离机构相对的位置。
    • 8. 发明公开
    • 두 웨이퍼의 교번 접촉을 위한 방법 및 장치
    • 用于替换两个波形的接触的方法和装置
    • KR1020060132599A
    • 2006-12-21
    • KR1020067010721
    • 2004-12-02
    • 파크 테크-파카징 테크놀로지이스 게엠베하
    • 자켈,엘케아즈다쉬트,가셈
    • H01L23/10H01L21/60H01L21/027
    • H01L23/10B23K26/0063B23K35/262B23K35/3013B23K2201/40H01L21/50H01L25/0657H01L25/50H01L2224/16H01L2924/01079H01L25/18
    • A method and device for the alternating contacting of two wafer-type component composite arrangements (12,14) from a plurality of connected similar components, particularly a semiconductor wafer with a functional component wafer, for the production of electronic modules on a wafer plane, wherein the two component composite arrangements provided with contact metallizations respectively on the opposite-lying contact surfaces (38,39) thereof are pressed against each other in order to form contact pairs with the contact metallizations thereof and the contacting of the contact metallizations occurs by backward impingement of one compound composite arrangement (12) with laser radiation, wherein the wavelength of the laser radiation is selected according to the absorption degree of the backwardly impinged upon component-composite arrangement such that transmission of the laser radiation by the backwardly impinged upon component-composite arrangement is substantially prohibited or absorption of the laser radiation occurs essentially in the contact metallizations of one or both component-composite arrangements..
    • 一种用于在多个连接的类似部件(特别是具有功能部件晶片的半导体晶片)上交替接触两个晶片型部件复合布置(12,14)以用于在晶片平面上生产电子模块的方法和装置, 其中分别在其相对的接触表面(38,39)处设置有接触金属化的双组分复合布置被压靠在一起,以便与其接触金属化形成接触对,并且接触金属化的接触通过向后 用激光辐射冲击一个复合复合布置(12),其中激光辐射的波长根据向后冲击在组分 - 复合布置上的吸收程度来选择,使得激光辐射通过向后冲击成分 - 复合布置基本禁止或吸收o f激光辐射基本上在一个或两个组件 - 复合布置的接触金属化中发生。
    • 9. 发明公开
    • 회로 기판 건조를 위한 방법 및 디바이스
    • 用于干燥电路基板的方法和装置
    • KR1020060127867A
    • 2006-12-13
    • KR1020067012414
    • 2004-12-22
    • 파크 테크-파카징 테크놀로지이스 게엠베하
    • 자켈,엘케아즈다쉬트,가셈
    • H01L21/304
    • H01L21/67034F26B3/30
    • The invention relates to a method and to a device for drying circuit substrates (13), in particular semi-conductor substrates. According to the invention, a circuit surface (30) is rinsed by means of a rinsing liquid (10) during a rinsing phase and is dried in a subsequent drying phase. In the rinsing phase, the circuit substrate is displaced in a direction of the flat extension thereof, transversally and in relation to a liquid level (28) of the rinsing liquid mirror, in such a manner that a liquid meniscus is formed in a transition area which varies according to the relative movement thereof, between the circuit surface and the liquid level, and the transition area moistened by the liquid meniscus is impinged upon by thermal radiation (36) in the drying phase.
    • 本发明涉及一种用于干燥电路基板(13),特别是半导体基板的方法和装置。 根据本发明,在冲洗阶段通过冲洗液体(10)冲洗电路表面(30),并在随后的干燥阶段中干燥。 在漂洗阶段,电路基板沿其平坦的延伸方向相对于冲洗液体反射镜的液面(28)相对于液态液面(28)的方向移动,使得在过渡区域中形成液体弯液面 其根据其相对运动而在电路表面和液面之间变化,并且由液体弯月面润湿的过渡区域在干燥阶段被热辐射(36)撞击。