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    • 6. 发明公开
    • 두 웨이퍼의 교번 접촉을 위한 방법 및 장치
    • 用于替换两个波形的接触的方法和装置
    • KR1020060132599A
    • 2006-12-21
    • KR1020067010721
    • 2004-12-02
    • 파크 테크-파카징 테크놀로지이스 게엠베하
    • 자켈,엘케아즈다쉬트,가셈
    • H01L23/10H01L21/60H01L21/027
    • H01L23/10B23K26/0063B23K35/262B23K35/3013B23K2201/40H01L21/50H01L25/0657H01L25/50H01L2224/16H01L2924/01079H01L25/18
    • A method and device for the alternating contacting of two wafer-type component composite arrangements (12,14) from a plurality of connected similar components, particularly a semiconductor wafer with a functional component wafer, for the production of electronic modules on a wafer plane, wherein the two component composite arrangements provided with contact metallizations respectively on the opposite-lying contact surfaces (38,39) thereof are pressed against each other in order to form contact pairs with the contact metallizations thereof and the contacting of the contact metallizations occurs by backward impingement of one compound composite arrangement (12) with laser radiation, wherein the wavelength of the laser radiation is selected according to the absorption degree of the backwardly impinged upon component-composite arrangement such that transmission of the laser radiation by the backwardly impinged upon component-composite arrangement is substantially prohibited or absorption of the laser radiation occurs essentially in the contact metallizations of one or both component-composite arrangements..
    • 一种用于在多个连接的类似部件(特别是具有功能部件晶片的半导体晶片)上交替接触两个晶片型部件复合布置(12,14)以用于在晶片平面上生产电子模块的方法和装置, 其中分别在其相对的接触表面(38,39)处设置有接触金属化的双组分复合布置被压靠在一起,以便与其接触金属化形成接触对,并且接触金属化的接触通过向后 用激光辐射冲击一个复合复合布置(12),其中激光辐射的波长根据向后冲击在组分 - 复合布置上的吸收程度来选择,使得激光辐射通过向后冲击成分 - 复合布置基本禁止或吸收o f激光辐射基本上在一个或两个组件 - 复合布置的接触金属化中发生。
    • 7. 发明公开
    • 회로 기판 건조를 위한 방법 및 디바이스
    • 用于干燥电路基板的方法和装置
    • KR1020060127867A
    • 2006-12-13
    • KR1020067012414
    • 2004-12-22
    • 파크 테크-파카징 테크놀로지이스 게엠베하
    • 자켈,엘케아즈다쉬트,가셈
    • H01L21/304
    • H01L21/67034F26B3/30
    • The invention relates to a method and to a device for drying circuit substrates (13), in particular semi-conductor substrates. According to the invention, a circuit surface (30) is rinsed by means of a rinsing liquid (10) during a rinsing phase and is dried in a subsequent drying phase. In the rinsing phase, the circuit substrate is displaced in a direction of the flat extension thereof, transversally and in relation to a liquid level (28) of the rinsing liquid mirror, in such a manner that a liquid meniscus is formed in a transition area which varies according to the relative movement thereof, between the circuit surface and the liquid level, and the transition area moistened by the liquid meniscus is impinged upon by thermal radiation (36) in the drying phase.
    • 本发明涉及一种用于干燥电路基板(13),特别是半导体基板的方法和装置。 根据本发明,在冲洗阶段通过冲洗液体(10)冲洗电路表面(30),并在随后的干燥阶段中干燥。 在漂洗阶段,电路基板沿其平坦的延伸方向相对于冲洗液体反射镜的液面(28)相对于液态液面(28)的方向移动,使得在过渡区域中形成液体弯液面 其根据其相对运动而在电路表面和液面之间变化,并且由液体弯月面润湿的过渡区域在干燥阶段被热辐射(36)撞击。
    • 9. 发明公开
    • 본딩 재료 부착물 개별적으로 인가하는 장치
    • 用于单独应用粘合材料沉积物的装置
    • KR1020170026363A
    • 2017-03-08
    • KR1020167035197
    • 2015-07-15
    • 파크 테크-파카징 테크놀로지이스 게엠베하
    • 아즈다쉬트,가셈크라우스,토르스텐
    • B23K3/06B23K1/00B23K1/005B23K3/04B23K101/42
    • B23K3/0623B23K1/0016B23K1/0056B23K3/04B23K2201/42
    • 본발명은솔더재료부착물(11) 특히, 솔더볼을개별적으로인가하는장치(10)에관한것인데, 상기장치는, 상기장치의상부하우징부분(14)에배치된솔더재료리저버(reservoir, 12)로부터상기장치의하부하우징부분(20)에배치된인가장치(33)를향하여상기솔더재료부착물을개별적으로운반하기위한운반장치를포함하고, 상기운반장치는운반디스크(19)로서형성되고, 회전축(28)을중심으로운반되고, 상기하부하우징부분및 상기상부하우징부분사이의수용공간(21)에배치되고, 수송홀더들(18)을구비하며, 상기수송홀더들(18)은통로홀들로형성되고상기솔더재료부착물이솔더재료리저버로부터수용되는수용위치(P1)로부터상기솔더재료부착물이상기상부하우징부분내에형성되는압력구멍(42)을통하여압력가스에노출되는전달위치(P2)로각각이동될수 있고상기솔더재료부착물은상기전달위치(P2)로부터상기인가장치의인가노즐(36)의인가위치(P3)로전달되고, 상기인가장치는상기하부하우징부분에서형성되되상기인가노즐에배치된솔더재료부착물로의레이저광선의전송을위하여이용되는전송덕트(64)의하부섹션(63)을동시에형성하는인가덕트(35)를구비하며, 상기전송덕트는상부섹션(65)이상기상부하우징부분을관통하면서연장되고, 상기인가덕트는상기회전축에대하여인가각도α 로경사진다.
    • 本发明涉及一种用于单独应用焊料材料贮存库(11)的设备(10),特别是焊球,所述设备包括一个传送装置,用于将焊料材料储存器单独地从布置在焊料材料贮存器(12) 在所述设备的上部壳体部分(14)上的布置在所述设备的下部壳体部分(20)上的施加装置(33)上,其中所述传送装置被设计为传送盘(19),所述传送盘布置在 在下壳体部分和上壳体部分之间的接收区域(21),并且围绕旋转轴线(28)传送,该传送器盘具有设计为通孔的传送容器(18),每个传送容器 可以从其中将焊料材料贮存器从焊料储存器接收的接收位置P1移动到转印位置P2,在该转印位置P2,通过压力孔(42)向压焊气体施加压缩气体, 形成在上部壳体部分中,并且焊料材料贮存器从该转移位置被转移到施加装置的施加喷嘴(36)到施加位置P3,其中施加装置具有形成在施加位置P3中的施加导管(35) 下壳体部分,其同时形成传输导管(64)的下部(63),传输导管(64)将激光辐射传输到位于施加喷嘴中的焊料材料仓库,其中传输管道的上部部分(65)延伸穿过上部 壳体部分,并且施加导管以施加角度α相对于旋转轴线倾斜。