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    • 9. 发明专利
    • Window structure semiconductor laser device and its manufacturing method
    • 窗口结构半导体激光器件及其制造方法
    • JP2006269759A
    • 2006-10-05
    • JP2005085903
    • 2005-03-24
    • Sharp Corpシャープ株式会社
    • WATANABE MASANORI
    • H01S5/16H01S5/343
    • H01S5/162B82Y20/00H01S5/028H01S5/168H01S5/2214H01S5/2231H01S5/305H01S5/3063H01S5/34326H01S5/3436H01S2301/185
    • PROBLEM TO BE SOLVED: To provide a window structure semiconductor layer for which the radiation angle θv of vertical radiation light is reduced while suppressing the increase of a threshold current, the axial deviation ϕv of the vertical radiation light is reduced further, and the vertical radiation light is close to a Gaussian distribution shape in order to improve the utilization efficiency of radiation light.
      SOLUTION: In an AlGaInP-based window structure semiconductor laser device, a window length is turned to be ≥48 μm and ≤80 μm, a waveguide light shape is converted at a window, and a vertical radiation angle is reduced. Thus, while suppressing the increase of an oscillation threshold current, θv is reduced to be ≥9° and ≤14° compared to a conventional case, and the axial deviation of the vertical radiation light is turned to be within -1° to 1°. Also, preferably, a quantum well layer thickness is turned to be ≤6.5 nm. Thus, since a vertical radiation angle conversion amount at the window can be increased, θv is lowered. Also, preferably, a second annealing process is performed after forming the window in order to suppress light loss increase at the window.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:为了提供在抑制阈值电流增加的同时降低垂直辐射光的辐射角度θv的窗口结构半导体层,垂直辐射光的轴向偏差φv进一步降低,并且 垂直辐射光接近高斯分布形状,以提高辐射光的利用效率。 解决方案:在基于AlGaInP的窗口结构半导体激光器件中,窗口长度被变为≥48μm且≤80μm,在窗口处转换波导形状,并降低垂直辐射角。 因此,与常规情况相比,在抑制振荡阈值电流的增加的同时,θv相对于≥9°,≤14°,垂直放射线的轴向偏差为-1°〜1° 。 此外,优选地,量子阱层厚度变为≤6.5nm。 因此,由于可以增加窗口处的垂直辐射角转换量,所以θv降低。 此外,优选地,在形成窗口之后执行第二退火处理,以便抑制窗口处的光损失增加。 版权所有(C)2007,JPO&INPIT
    • 10. 发明专利
    • Semiconductor laser apparatus
    • 半导体激光设备
    • JP2005033077A
    • 2005-02-03
    • JP2003272287
    • 2003-07-09
    • Matsushita Electric Ind Co Ltd松下電器産業株式会社
    • UEDA TETSUOKUME MASAHIROKAWADA TOSHIYAKIDOGUCHI ISAO
    • H01S5/227H01S5/16H01S5/22H01S5/223H01S5/30H01S5/323H01S5/343H01S5/40
    • B82Y20/00H01S5/162H01S5/168H01S5/221H01S5/2231H01S5/305H01S5/3054H01S5/32341H01S5/34326H01S5/3436H01S5/4031H01S5/4087H01S2301/185
    • PROBLEM TO BE SOLVED: To provide a semiconductor laser apparatus capable of expanding a horizontal spread angle of laser light independently of other characteristics.
      SOLUTION: In the semiconductor laser apparatus 1, a current blocking layer 19 covers a p type second cladding layer 17 and a p type capping layer 18 extending in the direction of the length of an optical resonator largely on the side of a light exit end surface but over a small area thereof on the opposite side to form a current non-injection region in an optical waveguide. By providing the current blocking layer 19 on the side of the light exit end surface largely to the degree where carriers flowing in from a current injection region do not reach the light exit end surface, a light intensity distribution of a near field image at the light exit end surface is concentrated, and hereby the horizontal spread angle of emitted laser light is expanded. The structure can optimize the thickness of the cladding layer and the size of the current injection region, and independently therefrom can expand the horizontal spread angle.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 解决的问题:提供一种能够独立于其他特性而扩大激光的水平扩展角的半导体激光装置。 解决方案:在半导体激光装置1中,电流阻挡层19覆盖在光学谐振器的长度方向上延伸的ap型第二包层17和ap型覆盖层18, 表面,但是在相对侧的小面积上形成光波导中的电流非注入区域。 通过在光出射端面的侧面设置电流阻挡层19,使得从电流注入区域流入的载流子未到达光出射端面的程度大,在光的近场图像的光强度分布 出口端面集中,因此发射激光的水平扩展角度扩大。 该结构可以优化包层的厚度和电流注入区域的尺寸,并且独立于此可以扩大水平扩展角。 版权所有(C)2005,JPO&NCIPI