专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP5354657B2 Polarized electron gun, how the generation of polarized electron beam, an evaluation method of the electron gun, and inverse photoemission spectroscopy method 有权
公开(公告)号：JP5354657B2
公开(公告)日：2013-11-27
申请号：JP2009063992
申请日：2009-03-17
申请人：独立行政法人理化学研究所
发明人：宏光冨澤 , 智博西谷
IPC分类号： H01J37/073 , G01N21/62
CPC分类号： H01J37/06 , H01J37/252 , H01J37/26 , H01J2237/06383 , H01J2237/2538
摘要： Provided are a polarized electron gun and a method for generating polarized electron beams, wherein polarized electron beams can be easily generated. The polarized electron gun is comprised of a laser light source (11); a light dividing means (12) which divides light emitted from the laser light source; a polarization conversion element (36) which applies a phase difference to one of the laser lights divided by the light dividing means (12) in accordance with the position of incidence; a lens (18) which collects the incident light through the polarization conversion element (36); and a photo cathode (21) of a semiconductor wherein one laser light collected by the lens (18) enters in synchronization with the other laser light.

2. 发明专利

JP4262158B2 Low vacuum scanning electron microscope 有权
公开(公告)号：JP4262158B2
公开(公告)日：2009-05-13
申请号：JP2004206108
申请日：2004-07-13
申请人：株式会社日立ハイテクサイエンスシステムズ
发明人：満彦山田 , 雅子西村
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J2237/04756 , H01J2237/188 , H01J2237/2538 , H01J2237/2608

3. 发明专利

JP2006278329A Charged particle beam device for high spatial resolution and multi-viewpoint image formation 有权
标题翻译：用于高空间分辨率和多视点图像形成的充电颗粒光束装置
公开(公告)号：JP2006278329A
公开(公告)日：2006-10-12
申请号：JP2006075452
申请日：2006-03-17
申请人： Ict Integrated Circuit Testing Ges Fuer Halbleiterprueftechnik Mbh , アイシーティーインテグレーテッドサーキットテスティングゲゼルシャフトフィーアハルプライタープリーフテヒニックエムベーハー
发明人： FROSIEN JUERGEN
IPC分类号： H01J37/244 , G01N23/225 , H01J37/28 , H01L21/66
CPC分类号： H01J37/05 , H01J37/244 , H01J2237/047 , H01J2237/24465 , H01J2237/24475 , H01J2237/2448 , H01J2237/2538 , H01J2237/28
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam device with a detecting method improved.
SOLUTION: The charged particle beam device is equipped with a charged particle source (1) providing a primary charged particle beam, a first unit (5) providing a potential, a second unit (7) providing a potential, and a central unit (6) positioned between the first unit (5) and the second unit (7). The central unit slows down primary charged particles to first low energy, and can provide a different potential from the first and the second unit potentials to accelerate the primary charged particles to second high energy. The first unit (5) and/or the second unit (7) are detectors to detect secondary electrons emitted from a sample (4).
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种改进的检测方法的带电粒子束装置。带电粒子束装置配备有提供初级带电粒子束的带电粒子源（1），提供电势的第一单元（5）和提供电位的第二单元（7），以及中心单元（6）位于第一单元（5）和第二单元（7）之间。中央单元将初级带电粒子减慢到第一低能量，并且可以提供与第一和第二单位电位不同的电位，以将初级带电粒子加速到第二高能量。第一单元（5）和/或第二单元（7）是检测从样品（4）发射的二次电子的检测器。版权所有（C）2007，JPO＆INPIT

4. 发明专利

JP2006210367A Electron beam device 审中-公开
标题翻译：电子束装置
公开(公告)号：JP2006210367A
公开(公告)日：2006-08-10
申请号：JP2006132181
申请日：2006-05-11
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , SATAKE TORU , NOMICHI SHINJI , YOSHIKAWA SEIJI
IPC分类号： H01J37/26
CPC分类号： H01J2237/2441 , H01J2237/2446 , H01J2237/2538
摘要： PROBLEM TO BE SOLVED: To provide a means of inspecting fine defects with high throughput and high reliability, and provide a device manufacturing method with an improved yield of device manufacturing by processing a mask inspection with such a device. SOLUTION: With the electron beam device, electron beams emitted from an electron gun 710 is irradiated on a stencil mask 800, the electron beams transmitting the stencil mask 800 are enlarged by an electron lens, and are detected by a detector having a plurality of pixels to form sample images. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供以高产量和高可靠性检查精细缺陷的方法，并且通过用这种装置处理掩模检查来提供具有提高的装置制造成品率的装置制造方法。解决方案：利用电子束装置，从电子枪710发射的电子束照射在模板掩模800上，透过模板掩模800的电子束被电子透镜放大，并由具有多个像素以形成样本图像。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JPWO2011070890A1 検査装置および検査方法有权
公开(公告)号：JPWO2011070890A1
公开(公告)日：2013-04-22
申请号：JP2011545156
申请日：2010-11-11
申请人：株式会社日立製作所
发明人：長谷川　正樹 , 正樹長谷川 , 智一島倉 , 智一島倉
IPC分类号： H01J37/20 , H01J37/29
CPC分类号： H01J37/026 , H01J37/226 , H01J37/252 , H01J37/29 , H01J2237/0047 , H01J2237/2538 , H01J2237/2817
摘要：試料表面に平行な等電位面を形成し、かつ裏面側から紫外線を試料に照射することのできる検査装置を提供するために、ホルダに保持された試料に電子線を照射し、試料からの反射電子を検出して試料表面を検査する検査装置において、試料1を保持するホルダ2を挟んで平行となるように配置される上部電極6と下部電極7とを備え、上部電極6は電子線5が通過する孔を有すると共に、電子線5を加速して試料1に照射する電圧が印加され、下部電極7は電子線5が照射される試料1領域に紫外線8を試料1の裏面側から照射するための孔を有すると共に、加速された電子線5を減速し、試料表面で反射させる電圧が印加される。

6. 发明专利

JP2006032107A Reflection image forming electron microscope and pattern defect inspection device using it 审中-公开
标题翻译：使用它的反射图像形成电子显微镜和图案缺陷检查装置
公开(公告)号：JP2006032107A
公开(公告)日：2006-02-02
申请号：JP2004208871
申请日：2004-07-15
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： MURAKOSHI HISAYA , HASEGAWA MASAKI , TODOKORO HIDEO
IPC分类号： H01J37/29 , H01J37/147 , H01L21/66
CPC分类号： H01J37/29 , H01J37/147 , H01J2237/1508 , H01J2237/2538 , H01J2237/28
摘要： PROBLEM TO BE SOLVED: To provide a reflection image forming electron microscope capable of serving to both mirror electron microscope observation and low energy electron microscope observation in the same field of view; and to provide a defect inspection device capable of detecting a pattern defect part formed on a specimen with high resolution and at high speed using the reflection image forming electron microscope.
SOLUTION: This reflection image forming electron microscope comprises an irradiation lens system irradiating an electron beam outgoing from an electron source 1 into the specimen 7 as a sheet irradiation electron beam 301, an image forming lens system forming the image of the specimen by projecting and enlarging the reflection electron beam 302 outgoing from the specimen 7, and a beam separator 4 separating the irradiation electron beam 301 and the reflection electron beam 302. The beam separator 4 consists of an ExB deflector, wherein an electric field and a magnetic field are orthogonal and superimposed. A control means 28 is provided for controlling the deflector to put the reflection electron beam 302 in the Wien condition, wherein deflection effects by an electric field and a magnetic field are canceled by each other, with keeping the deflection angle approximately constant for the irradiation electron beam 301.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种能够在相同视野中用于镜像电子显微镜观察和低能量电子显微镜观察的反射成像电子显微镜; 并且提供一种能够使用反射成像电子显微镜以高分辨率和高速度检测形成在样本上的图案缺陷部分的缺陷检查装置。解决方案：该反射成像电子显微镜包括：照射透镜系统，其将从电子源1射出的电子束照射到作为片材照射电子束301的样本7中;成像透镜系统，通过投射和放大从样品7出射的反射电子束302以及分离照射电子束301和反射电子束302的光束分离器4.光束分离器4由ExB偏转器构成，其中电场和磁场正交和叠加。设置控制装置28，用于控制偏转器将反射电子束302置于维恩状态，其中由电场和磁场引起的偏转效应彼此消除，同时保持照射电子的偏转角近似恒定光束301.版权所有（C）2006，JPO＆NCIPI

7. 发明专利

JP2006032011A Low vacuum scanning electron microscope 有权
标题翻译：低真空扫描电子显微镜
公开(公告)号：JP2006032011A
公开(公告)日：2006-02-02
申请号：JP2004206108
申请日：2004-07-13
申请人： Hitachi Sci Syst Ltd , 株式会社日立サイエンスシステムズ
发明人： NISHIMURA MASAKO , YAMADA MITSUHIKO
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J2237/04756 , H01J2237/188 , H01J2237/2538 , H01J2237/2608
摘要： PROBLEM TO BE SOLVED: To realize a high resolution observation by a low acceleration voltage of 5 kV or less while the pressure of the testpiece chamber is kept high.
SOLUTION: The testpiece chamber 1 is made as a dual structure and an inner testpiece chamber 10a for maintaining low vacuum is provided inside the outer testpiece chamber 10b of high vacuum. A comparatively high negative voltage, for example, -1 to -9 kV for slowing down electrons immediately before the test piece is applied between the outer testpiece chamber 10b and the inner testpiece chamber 10a, and when the incident electron beams 7 pass an objective lens 9, thin electron beams maintaining high energy with small aberration are formed, and those electron beams are decelerated immediately before the test piece 11, thereby obtaining high resolution at low acceleration voltage.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：在试验室的压力保持较高的情况下，通过5kV以下的低加速电压实现高分辨率观察。解决方案：将试件室1制成双重结构，并且在高真空的外部试验室10b内部设置用于维持低真空的内部试验室10a。比较高的负电压，例如在试验片施加在外部试验室10b和内部试验室10a之前将电子减速的-1至-9kV，当入射的电子束7通过物镜如图9所示，形成了具有小像差的保持高能量的薄电子束，并且这些电子束在测试片11之前被减速，从而在低加速电压下获得高分辨率。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2005197121A Electron beam device 有权
标题翻译：电子束装置
公开(公告)号：JP2005197121A
公开(公告)日：2005-07-21
申请号：JP2004003202
申请日：2004-01-08
申请人： Ebara Corp , 株式会社荏原製作所
发明人： WATANABE KENJI , SATAKE TORU , NAKASUJI MAMORU , MURAKAMI TAKESHI , KARIMATA TSUTOMU , NOMICHI SHINJI , TOYAMA KEIICHI , HATAKEYAMA MASAKI
IPC分类号： H01L21/66 , H01J37/073 , H01J37/12 , H01J37/147 , H01J37/26 , H01J37/29
CPC分类号： H01J37/261 , H01J37/28 , H01J2237/06341 , H01J2237/2446 , H01J2237/24592 , H01J2237/2538
摘要： PROBLEM TO BE SOLVED: To enable to carry out evaluation of a sample with a high throughput and a high S/N ratio. SOLUTION: When electron beam irradiated from an electron gun is irradiated on a sample W placed on an X-Y-θ stage 9-1 through an electrostatic lens 4-1 and an objective lens 11-1 or the like, secondary electron or reflective electron is emitted from the sample W. An incident angle of the primary electron beam is set at 35° or more through adjustment of a deflector 8-1. Emitted electron from the sample is guided toward the vertical direction to be imaged at a detector. The detector is composed of an MCP 14-1, a phosphor plate 15-1, a relay lens 16-1 and a TDI (or a CCD) 17-1, and electric signals from the TDI 7-1 is supplied to a personal computer 18-1 for image processing to obtain a two-dimensional image of the sample. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了能够以高吞吐量和高S / N比进行样品的评价。解决方案：当从电子枪照射的电子束通过静电透镜4-1和物镜11-1等照射在放置在XY-θ平台9-1上的样品W上时，二次电子或反射电子从样品W发射。通过调节偏转器8-1将一次电子束的入射角设定在35°以上。来自样品的发射电子被引导到垂直方向以在检测器成像。检测器由MCP14-1，荧光板15-1，中继透镜16-1和TDI（或CCD）17-1组成，并且来自TDI 7-1的电信号被提供给个人计算机18-1，用于图像处理以获得样本的二维图像。版权所有（C）2005，JPO＆NCIPI

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式