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32. 发明专利

JP5380460B2 Standard member and a manufacturing method for calibration, as well as scanning electron microscope using it 有权
公开(公告)号：JP5380460B2
公开(公告)日：2014-01-08
申请号：JP2010536648
申请日：2009-10-22
申请人：株式会社日立ハイテクノロジーズ
发明人：義則中山 , 隆田勢 , 治朗山本
IPC分类号： G01B15/04 , G01N1/00 , G01N23/225 , H01J37/20
CPC分类号： H01J37/28 , B82Y35/00 , G01B3/004 , G01B3/30 , G01B15/00 , H01J37/263 , H01J37/265 , H01J2237/2826

33. 发明专利

JP5380443B2 Semiconductor inspection equipment 有权
公开(公告)号：JP5380443B2
公开(公告)日：2014-01-08
申请号：JP2010517757
申请日：2009-06-23
申请人：株式会社日立ハイテクノロジーズ
发明人：豪宮 , 誠一郎菅野 , 浩之橘内 , 勝松島 , 亨首藤
IPC分类号： H01J37/20 , H01L21/66 , H01L21/683
CPC分类号： H01L22/10 , H01J37/20 , H01J37/265 , H01J37/28 , H01J2237/0044 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00

34. 发明专利

JP5357889B2 Charged particle beam device 有权
公开(公告)号：JP5357889B2
公开(公告)日：2013-12-04
申请号：JP2010530707
申请日：2009-09-10
申请人：株式会社日立ハイテクノロジーズ
发明人：宗行福田 , 弘将山梨 , 康成早田
IPC分类号： H01J37/153 , H01J37/22 , H01J37/28
CPC分类号： H01J37/153 , H01J37/265 , H01J37/28 , H01J2237/004 , H01J2237/1532 , H01J2237/216 , H01J2237/221
摘要： The astigmatism control processing time is decreased to 1 second or less by improving the astigmatic difference measurement accuracy. A charged particle beam device includes: a stage on which a sample is loaded; a transport mechanism which carries the sample onto the stage; a charged particle beam optical system which irradiates the sample on the stage with a charged particle beam and detects secondary charged particles generated from the sample; and a controller which determines setup parameters for the charged particle beam optical system and controls the charged particle beam optical system. The controller registers and holds electro-optical system setup parameters for irradiation with a beam tilted from a normal line on the sample as the charged particle beam, compares observation images obtained by the tilted beam, measures the amount and direction of movement and calculates the amount of astigmatism correction from the amount of movement and the direction.

35. 发明专利

JP2013217898A Sample preparation device and sample preparation method 有权
标题翻译：样品制备装置和样品制备方法
公开(公告)号：JP2013217898A
公开(公告)日：2013-10-24
申请号：JP2012252639
申请日：2012-11-16
申请人： Hitachi High-Tech Science Corp , 株式会社日立ハイテクサイエンス
发明人： MITSU KIN
IPC分类号： G01N1/28
CPC分类号： H01J37/261 , H01J37/265 , H01J37/2955 , H01J2237/31745
摘要： PROBLEM TO BE SOLVED: To exactly acquire an EBSP image of a desired observation object inside a sample.SOLUTION: There is provided a sample preparation device which has: a sample support 6 which supports a sample 7; a FIB lens barrel 2 for irradiating the sample 7 with a focused ion beam 9 to be processed; and an irradiation area setting part 16 for setting a focused ion beam irradiation area consisting of a first irradiation area for forming an observation surface for irradiating an electronic beam 8, and a second irradiation area for forming an inclination surface inclined to a normal direction of the observation surface at 67.5 degrees or more and less than 90 degrees in order to detect back scattered electrons.
摘要翻译：要解决的问题：准确地获取样品内的所需观察对象的EBSP图像。解决方案：提供了一种样品制备装置，其具有：样品支架6，其支撑样品7; FIB透镜镜筒2，用于用待处理的聚焦离子束9照射样品7; 以及照射区域设定部16，其设定由用于形成用于照射电子束8的观察面的第一照射区域的第一照射区域和用于形成倾斜面的倾斜面的第二照射区域观察表面为67.5度以上且小于90度，以便检测背散射电子。

36. 发明专利

JP2013213781A Positional deviation measuring device, positional deviation measuring method, and scanning electron microscope using positional deviation measuring device 有权
标题翻译：位置偏差测量装置，位置偏差测量方法和使用位置偏差测量装置扫描电子显微镜
公开(公告)号：JP2013213781A
公开(公告)日：2013-10-17
申请号：JP2012085122
申请日：2012-04-04
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： YAMAGUCHI ATSUKO , HAYATA YASUNARI , MAEDA TATSUYA , NASU OSAMU , KAWADA HIROKI
IPC分类号： G01B15/00 , G01N23/225 , H01J37/22 , H01L21/027
CPC分类号： H01J37/265 , H01J2237/221 , H01J2237/24578 , H01J2237/2817
摘要： PROBLEM TO BE SOLVED: To measure a positional deviation between patterns differing in height, formed by a plurality of different pattern formation processes, with high accuracy while keeping throughput.SOLUTION: A correspondence between a lens of an electronic optical system and a parameter of a beam deflector, and an angle of a beam incident upon a sample is recorded as data. On the basis of the data and information on the height of patterns, a positional deviation amount or an edge position correction amount is calculated, and on the basis of the correction amount and edge position information from an observation image, a true positional deviation amount is calculated.
摘要翻译：要解决的问题：为了测量由多个不同的图案形成处理形成的高度不同的图案之间的位置偏差，同时保持产量，同时高精度。解决方案：电子光学系统的透镜与光束偏转器和入射到样品上的光束的角度被记录为数据。根据数据和图案的高度信息，计算位置偏差量或边缘位置校正量，根据来自观察图像的修正量和边缘位置信息，真正的位置偏差量为计算。

37. 发明专利

JP5223208B2 Transmission electron microscope 有权
公开(公告)号：JP5223208B2
公开(公告)日：2013-06-26
申请号：JP2007050921
申请日：2007-03-01
申请人：株式会社日立製作所
发明人：照生孝橋 , 卓大嶋 , 隆夫松元 , 洋一西田
IPC分类号： H01J37/26
CPC分类号： H01J37/266 , H01J37/265 , H01J2237/06383 , H01J2237/1514 , H01J2237/24557 , H01J2237/2588 , H01J2237/2614

38. 发明专利

JP2013089599A Adjustment method of stem including aberration corrector 有权
标题翻译：干涉校正方法包括异常校正
公开(公告)号：JP2013089599A
公开(公告)日：2013-05-13
申请号：JP2012229984
申请日：2012-10-17
申请人： Fei Co , エフイーアイカンパニFei Company
发明人： MAARTEN BISCHOFF , BURND REHEL
IPC分类号： H01J37/153
CPC分类号： H01J37/22 , G01N23/20 , H01J37/153 , H01J37/20 , H01J37/265 , H01J37/28 , H01J2237/1532 , H01J2237/1534 , H01J2237/216 , H01J2237/221 , H01J2237/2802
摘要： PROBLEM TO BE SOLVED: To provide a method of always adjusting the STEM, preferable automatically, to a level sufficient for setting to obtain an HR image.SOLUTION: The method of adjusting the Cs corrector of STEM by using crystal samples comprises steps for recording a series by a through focus method, for converting an image thus obtained to the Fourier space, and for forming a set of images such as diffraction images. Symmetry can be improved by determining the symmetry of a Fourier image and tuning the corrector. The transmission limit can be determined by determining the maximum distance of a spot from the center. The corrector can be tuned to the optimum performance by carrying out these steps repeatedly.
摘要翻译：要解决的问题：提供一种始终将STEM调整的方法，优选地自动地调整到足以设置以获得HR图像的水平。解决方案：通过使用晶体样品调整STEM的Cs校正器的方法包括通过聚焦方法记录一系列的步骤，用于将所获得的图像转换成傅立叶空间，并形成一组图像，例如衍射图像。可以通过确定傅里叶图像的对称性并调整校正器来改善对称性。可以通过确定点与中心的最大距离来确定传输限制。可以通过重复执行这些步骤来调整校正器的最佳性能。版权所有（C）2013，JPO＆INPIT

39. 发明专利

JP2013084629A Charged particle beam apparatus, and method of controlling the same 审中-公开
标题翻译：充电颗粒光束装置及其控制方法
公开(公告)号：JP2013084629A
公开(公告)日：2013-05-09
申请号：JP2013025053
申请日：2013-02-13
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： KASUYA KEIGO , OSHIMA TAKU , KATAGIRI SOUICHI , KOKUBO SHIGERU , TODOKORO HIDEO
IPC分类号： H01J37/06
CPC分类号： H01J1/304 , H01J37/073 , H01J37/265 , H01J2237/022 , H01J2237/06325 , H01J2237/0653 , H01J2237/0656
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam apparatus which can emit a stable electron beam, having high brightness and a narrow energy width.SOLUTION: A charged particle beam apparatus comprises a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vacuum exhaust unit for keeping the pressure around the field emission electron source at 1×10Pa or less. The apparatus is so constituted as to use electron beams having an electron-beam-center radiation angle of 1×10str or less among the emitted electron beams, and to use the electric current thereof, the second order derivative of which with respect to the time of the electric current of the electron beam is negative or zero and which decreases at a rate of 10% or less per hour. The charged particle beam apparatus further comprises a heating unit for the field emission electron source, and a detection unit for the electric current of the electron beam. The field emission electron source is repeatedly heated to keep the electric current of the electron beam to be emitted, at a predetermined value or higher.
摘要翻译：要解决的问题：提供一种能够发射稳定电子束的带电粒子束装置，其具有高亮度和窄的能量宽度。解决方案：带电粒子束装置包括场致发射电子源，用于向场致发射电子源施加电场的电极和用于将场致发射电子源周围的压力保持在1×10 5的真空排气单元， SP POS =“POST”> - 8 Pa以下。该装置构成为使用发射电子束中电子束中心辐射角为1×10 2 以下的电子束，并使用其电流相对于电子束的电流的二次导数为负或为零，以每小时10％以下的速度降低。带电粒子束装置还包括用于场发射电子源的加热单元和用于电子束电流的检测单元。重复加热场致发射电子源以使电子束的电流保持在规定值以上。版权所有（C）2013，JPO＆INPIT

40. 发明专利

JP5171071B2 Imaging magnification adjustment method and a charged particle beam apparatus 有权
公开(公告)号：JP5171071B2
公开(公告)日：2013-03-27
申请号：JP2007059357
申请日：2007-03-09
申请人：株式会社日立ハイテクノロジーズ
发明人：茂樹助川 , 俊介腰原 , 敬模梁
IPC分类号： H01J37/22 , H01L21/66
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/221 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00

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