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1. 发明授权

EP1378036B1 INJECTION SEEDED LASER WITH PRECISE TIMING CONTROL 有权
标题翻译：注射激光精密时序同步
公开(公告)号：EP1378036B1
公开(公告)日：2009-04-01
申请号：EP02731237.0
申请日：2002-04-02
申请人： Cymer, Inc.
发明人： NESS, Richard, M. , SANDSTROM, Richard, L. , PARTLO, William, N. , ERSHOV, Alexander, I.
IPC分类号： H01S3/225 , H01S3/134 , H01S3/105
CPC分类号： H01S3/2366 , G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/0057 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/10092 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2258 , H01S3/2325 , H01S3/2333
摘要： A narrow band laser system having two laser subsystems. The first laser subsystem is configured to provide a very narrow band pulsed output beam which is used to injection seed the second laser subsystem where the narrow band pulsed seed beam is amplified to produce a narrow band pulsed output beam. A pulse power supply is provided which is specially configured to precisely time the discharges in the two laser subsystem so that the discharges are properly synchronized. Preferred embodiments include a pulse power system with a pulse transformer unit having two sets of transformer cores. A single upstream pulse compression circuit provides high voltage pulses in parallel to the primary windings of all of the cores in both sets. Separate secondary conductors (one passing through one set of cores and the other passing through the other set of cores) provide very high voltage pulses respectively to separate downstream circuits supplying discharge pulses to the electrodes in each of two separate laser chambers. Preferred embodiments include KrF, ArF and F2 systems. In these preferred embodiments, line narrowing may be accomplished within the resonant cavity of the seed laser or the output of the seed laser could be line narrowed using a pre-gain filter.

2. 发明公开

EP1855311A1 TWO-LIGHT FLUX INTERFERENCE EXPOSURE DEVICE, TWO-LIGHT FLUX INTERFERENCE EXPOSURE METHOD, SEMICONDUCTOR LIGHT EMITTING ELEMENT MANUFACTURING METHOD, AND SEMICONDUCTOR LIGHT EMITTING ELEMENT 有权
标题翻译： DEVICE AND METHOD FOR TWO-LIGHT FLOW干涉曝光，方法用于制造半导体发光元件及半导体发光元件
公开(公告)号：EP1855311A1
公开(公告)日：2007-11-14
申请号：EP06714428.7
申请日：2006-02-23
申请人： Meijo University
发明人： KAMIYAMA, Satoshi , IWAYA, Motoaki , AMANO, Hiroshi , AKASAKI, Isamu
IPC分类号： H01L21/027 , G02F1/37 , G03F7/20 , H01L33/00 , H01S3/00
CPC分类号： G03F7/70408 , G03F7/70025 , H01L33/22 , H01S3/082 , H01S3/109 , H01S3/2207
摘要： It is possible to realize a 2-light flux interference device capable of generating a significantly uniform laser beam having a high coherence by using a double higher harmonic of Ar laser or a quadruple higher harmonic of Nd dope YAG laser as a light source, an etalon, and a half-wavelength plate. Moreover, by the 2-light flux interference exposure, a photo resist mask is subjected to exposure of cyclic pattern. The photo resist mask is developed. By using the resist pattern as a mask, a semiconductor layer etching mask pattern is formed. After the resist is removed, the light extraction surface is etched. Thus, it is possible to manufacture a semiconductor light emitting element having a high energy conversion efficiency at a significantly low cost.
摘要翻译：这是可以实现能够生成具有由使用Ar激光的双高次谐波或四倍的Nd掺杂YAG激光的高次谐波作为光源具有高相干性的显着均匀的激光束的2光束干涉装置，到标准具和半波长板。更完了，通过双光束干涉曝光，光致抗蚀剂掩模进行循环模式的曝光。光刻胶掩模发达。通过使用抗蚀剂图案作为掩模，在半导体层的蚀刻掩模图案形成。去除抗蚀剂之后，光提取表面被蚀刻。因此，能够制造在相当低的成本具有能量转换效率高的半导体发光元件。

3. 发明公开

EP1323216A4 VERY NARROW BAND, TWO CHAMBER, HIGH REP RATE GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：具有两室和高重复率非常狭窄的气体喷出激光系统
公开(公告)号：EP1323216A4
公开(公告)日：2006-03-22
申请号：EP01977198
申请日：2001-09-25
申请人： CYMER INC
发明人： MYERS DAVID W , BESAUCELE HERVE A , ERSHOV ALEXANDER I , PARTLO WILLIAM N , SANDSTROM RICHARD L , DAS PALASH P , ANDERSON STUART L , FOMENKOV IGOR V , UJAZDOWSKI RICHARD C , PAN XIAOJIANG J , ONKELS ECKEHARD D , NESS RICHARD M , BROWN DANIEL J W
IPC分类号： H01S3/225 , G01J9/00 , G03F7/20 , H01S3/00 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/23
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers (10A, 12A) are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam which is amplified in the second discharge chamber (12). The chambers (10A, 12A) can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator (10) and optimization of pulse energy parameters in the amplifying chamber (12A). A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber (10A, 12A) comprises a single tangential fan (10A, 10) providing sufficient gas flow (11) to permit operation at pulse rates of 4,000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator (10) is equipped with a line narrowing package (16, 16A) having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4,000 Hz or greater to a precision of less than 0.2 pm.

4. 发明公开

EP1438774A4 VERY NARROW BAND, TWO CHAMBER, HIGH REP RATE GAS DISCHARGE LASER SYSTEM 有权
标题翻译： SEHR SCHMALBANDIGES GASENTLADUNGSLASERSYSTEM MIT ZWEI KAMMERN UND HOHER WIEDERHOLUNGSRATE
公开(公告)号：EP1438774A4
公开(公告)日：2006-03-08
申请号：EP02797839
申请日：2002-08-28
申请人： CYMER INC
发明人： KNOWLES DAVID S , BROWN DANIEL J W , BESAUCELE HERVE A , MYERS DAVID W , ERSHOV ALEXANDER I , PARTLO WILLIAM N , SANDSTROM RICHARD L , DAS PLASH P , ANDERSON STUART L , FOMENKOV IGOR V , UJAZDOWSKI RICHARD C , ONKELS ECKEHARD D , NESS RICHARD M , SMITH SCOTT T , HULBURD WILLIAM G , OICLES JEFFREY
IPC分类号： H01S1/00 , H01S3/225 , G01J1/42 , G01J9/00 , G03F7/20 , H01S3/00 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/23
CPC分类号： G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： An injection seeded modular gas discharge laser system (2) capable of producing high quality pulsed beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam, which is amplified (12) in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in the ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan (10A) providing sufficient gas flow to permit operation at pulse rates of 4,000 Hz or greater by cleaning debris from the discharge region in less time that the approximately 0.25 milliseconds between pulses. The masters oscillation is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.
摘要翻译：一种注入模块化气体放电激光系统（2），能够以大约4,000Hz或更高的脉冲速率和大约5mJ或更大的脉冲能量产生高质量脉冲束。提供两个独立的放电室，其中一个是主振荡器（10）的一部分，产生非常窄带的种子束，其在第二放电室中放大（12）。这些室可以分开控制，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。 ArF准分子激光器系统中的一个优选实施例被配置为MOPA，并被专门设计用作集成电路光刻的光源。在优选的MOPA实施例中，每个腔室包括单个切向风扇（10A），其提供足够的气流以允许在脉冲之间大约0.25毫秒的更短时间内通过清洁来自放电区域的碎片以4,000Hz或更高的脉冲速率进行操作。主振荡装备有线变窄组件，其具有非常快速的调谐镜，其能够以重复率4000Hz或更大的脉冲到脉冲的基础上控制中心线波长，精度小于0.2μm。

5. 发明公开

EP1458066A2 Line selected F2 two chamber laser system 有权
标题翻译： F2-Zweikammerlasersystem mit Linienauswahl
公开(公告)号：EP1458066A2
公开(公告)日：2004-09-15
申请号：EP04011567.7
申请日：2002-08-19
申请人： Cymer, Inc.
发明人： Knowles, David S. , Brown, Daniel J.,W. , Sandstrom, Richard, L. , Rylov, German E. , Onkels, Eckehard, D. , Besaucele, Herve A. , Myers, David, W. , Ershov, Alexander, I. , Partlo, William N. , Fomenkov, Igor, V. , Ujazdowski, Richard, C. , Ness, Richard, M. , Smith, Scot, T. , Hulburd, William, G.
IPC分类号： H01S3/223 , H01S3/23 , H01S3/036 , H01S3/038
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： A very narrow band two chamber high repetition rate F 2 gas discharge laser system comprising. A) a first laser unit comprising: 1) a first discharge chamber containing; a) a first laser gas b) a first pair of elongated spaced apart electrodes defining a first discharge region, 2) a first fan producing sufficient gas movement of said first laser gas in said first discharge region to clear from said first discharge region, following each gas discharge, substantially all discharge produced ions prior to a next gas discharge when operating at a repetition rate in the range of 4,000 gas discharges per second or greater, 3) a first heat exchanger system removing heat energy from said first laser gas, B) a line selection unit minimizing energy outside of a single selected line spectrum, C) a second laser unit comprising: 1) a second discharge chamber containing: a) a second laser gas, b) a second pair of elongated spaced apart electrodes defining a second discharge region 2) a second fan for producing sufficient gas movement of said second laser gas in said second discharge region to clear from said second discharge region, following each gas discharge, substantially all discharge produced ions prior to a next gas discharge when operating at a repetition rate in the range of 4,000 gas discharges per second or greater, 3) a second heat exchanger system removing heat energy from said second laser gas, D) a pulse power system configured to provide electrical pulses to said first pair of electrodes and to said second pair of electrodes sufficient to produce laser output pulses at rates of about 4,000 laser output pulses per second with precisely controlled laser output pulse energies in excess of about 5 mJ, E) a laser beam measurement and control system for measuring the laser output pulse energy of laser output pulses produced by said two chamber laser system and controlling said laser output pulses in a feedback control arrangement, and wherein output laser beams from said first laser unit are utilized as a seed beam for seeding said second laser unit.
摘要翻译：一种非常窄的两室高重复率F 2气体放电激光系统。 A）第一激光单元，包括：1）第一放电室， a）第一激光气体b）限定第一放电区域的第一对细长间隔开的电极，2）第一风扇，其在所述第一放电区域中产生所述第一激光气体充分的气体运动，以从所述第一放电区域清除，每次气体放电时，在以4,000次气体放电/秒或更大的范围内的重复率运行时，在下一次气体放电之前基本上全部放电产生离子，3）从第一激光气体B去除热能的第一热交换器系统）线选择单元，使单个所选线谱外的能量最小化; C）第二激光单元，包括：1）第二放电室，包含：a）第二激光气体，b）第二对细长间隔开的电极，第二排出区域2）第二风扇，用于在所述第二排放区域产生所述第二激光气体的足够的气体运动，以便在每个气体排放之后从所述第二排放区域清除在以每秒或更多的4,000次气体放电的范围内的重复频率操作时，在下一个气体放电之前，所有放电产生离子，3）从第二激光气体去除热能的第二热交换器系统，D）脉冲功率系统，被配置为向所述第一对电极和所述第二对电极提供电脉冲，足以以每秒约4,000个激光输出脉冲的速率产生激光输出脉冲，其精确控制的激光输出脉冲能量超过约5mJ，E ）激光束测量和控制系统，用于测量由所述两腔激光器系统产生的激光输出脉冲的激光输出脉冲能量，并且在反馈控制装置中控制所述激光输出脉冲，并且其中利用来自所述第一激光单元的输出激光束作为用于播种所述第二激光单元的种子束。

6. 发明公开

EP1430573A1 SIX TO TEN KHz, OR GREATER GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：六到十千赫或多个气体放电激光器系统
公开(公告)号：EP1430573A1
公开(公告)日：2004-06-23
申请号：EP02757140.5
申请日：2002-08-16
申请人： Cymer, Inc.
发明人： WATSON, Tom, A. , UJAZDOWSKI, Richard, C. , IVASCHENKO, Alex, P. , SHANNON, Robert, A. , SANDSTROM, Richard, L. , WEBB, Robert, Kyle , PALENSCHAT, Frederick, A. , HOFMANN, Thomas , RETTIG, Curtis, L. , NESS, Richard, L. , MELCHER, Paul, C. , ERSHOV, Alexander, I.
IPC分类号： H01S3/22
CPC分类号： H01S3/0385 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： The present invention provides gas discharge laser systems capable of reliable long-term operation in a production line capacity at repetition rates in the range of 6,000 to 10,000 pulses per second. Preferred embodiments are configured as KrF, ArF and F2 lasers used in photolithography. Improvements include a suction fan (555) in the immediate vicinity of the anode (542) to increase gas flow. The intake of the fan (555) is between the anode (542) and the insulating spacer (544B).

7. 发明公开

EP1421653A1 LASER LITHOGRAPHY LIGHT SOURCE WITH BEAM DELIVERY 审中-公开
标题翻译：与光束传输激光光刻光源
公开(公告)号：EP1421653A1
公开(公告)日：2004-05-26
申请号：EP02759404.3
申请日：2002-08-19
申请人： Cymer, Inc.
发明人： KLENE, Brian, C. , DAS, Palash, P. , GROVE, Steven, L. , ERSHOV, Alexander, I. , SMITH, Scott, T. , PAN, Xiaojiang, J. , SANDSTROM, Richard, L.
IPC分类号： H01S3/22
CPC分类号： G03F7/70933 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser (4) light source for a production line machine. The system includes an enclosed and purged beam path for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine (2) and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band send beam which is amplified in the second discharge chamber. The MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable throughout the operating life of the lithography system, despite substantially degradation of optical components.

8. 发明公开

EP1297594A1 GAS DISCHARGE LASER LONG LIFE ELECTRODES 有权
标题翻译：耐用电极气体放LASER
公开(公告)号：EP1297594A1
公开(公告)日：2003-04-02
申请号：EP01937186.3
申请日：2001-04-24
申请人： Cymer, Inc.
发明人： FLEUROV Vladimir, B. , CATES, Michael, C. , DU'LYEA, Michael , FOMENKOV, Igor, V. , GAIDARENKO, Dmitri V. , HUEBER, Jean-Marc , MORTON, Richard, G. , ONKELS, Eckehard, D. , SHANNON, Robert, A. , WINNICK, Ross, H.
IPC分类号： H01S3/22 , H01S3/223
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0381 , H01S3/0385 , H01S3/0387 , H01S3/041 , H01S3/0979 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225
摘要： A gas discharge laser having a laser chamber with two elongated erodable electrode elements (83 and 84), each having an erodable section and an electrode support configured to minimize discharge region laser gas turbulence and with the electrode elements being configured to permit gradual erosion over more than 8 billion pulses without causing substantial changes in the shape of electrical discharges between the electrode elements. A pulse power system provides electrical pulses of at least 2J at rates of at least 2 KHz. A blower (4A) circulates laser gas between the electrodes at speeds of at least 2 m/s and a heat exchanger (6A) is provided to remove heat produced by the blower and the discharges.

9. 发明授权

EP1521942B1 WAVEMETER WITH ENHANCED ILLUMINATION FOR AN ULTRAVIOLET GAS DISCHARGE LASER 有权转让
标题翻译：具有改进的照明紫外线波长计气体放电激光器
公开(公告)号：EP1521942B1
公开(公告)日：2013-03-06
申请号：EP03736659.8
申请日：2003-05-23
申请人： Cymer, Inc.
发明人： SANDSTROM, Richard, L. , MELCHIOR, John, T. , RAO, Rahasekhar
IPC分类号： G01B9/02 , G01J9/02 , G01J1/42 , G01J3/26 , G01J3/02 , H01S3/225
CPC分类号： G01J3/26 , G01J1/4257 , G01J1/429 , G01J3/02 , G01J3/0205 , G01J3/0208 , G01J3/024 , G01J3/027 , G01J9/02 , G01J9/0246 , G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366

10. 发明授权

EP1297594B1 GAS DISCHARGE LASER LONG LIFE ELECTRODES 有权
标题翻译：耐用电极气体放LASER
公开(公告)号：EP1297594B1
公开(公告)日：2012-08-15
申请号：EP01937186.3
申请日：2001-04-24
申请人： Cymer, Inc.
发明人： FLEUROV Vladimir, B. , CATES, Michael, C. , DU'LYEA, Michael , FOMENKOV, Igor, V. , GAIDARENKO, Dmitri V. , HUEBER, Jean-Marc , MORTON, Richard, G. , ONKELS, Eckehard, D. , SHANNON, Robert, A. , WINNICK, Ross, H.
IPC分类号： G03F7/20 , H01S3/036 , H01S3/223 , H01S3/038 , H01S3/225
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0381 , H01S3/0385 , H01S3/0387 , H01S3/041 , H01S3/0979 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225
摘要： A gas discharge laser having a laser chamber with two elongated erodable electrode elements (83 and 84), each having an erodable section and an electrode support configured to minimize discharge region laser gas turbulence and with the electrode elements being configured to permit gradual erosion over more than 8 billion pulses without causing substantial changes in the shape of electrical discharges between the electrode elements. A pulse power system provides electrical pulses of at least 2J at rates of at least 2 KHz. A blower (4A) circulates laser gas between the electrodes at speeds of at least 2 m/s and a heat exchanger (6A) is provided to remove heat produced by the blower and the discharges.

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