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标题翻译： F2-Zweikammerlasersystem mit Linienauswahl

公开(公告)号：EP1458066A2

公开(公告)日：2004-09-15

申请号：EP04011567.7

申请日：2002-08-19

申请人： Cymer, Inc.

发明人： Knowles, David S. , Brown, Daniel J.,W. , Sandstrom, Richard, L. , Rylov, German E. , Onkels, Eckehard, D. , Besaucele, Herve A. , Myers, David, W. , Ershov, Alexander, I. , Partlo, William N. , Fomenkov, Igor, V. , Ujazdowski, Richard, C. , Ness, Richard, M. , Smith, Scot, T. , Hulburd, William, G.

IPC分类号： H01S3/223 , H01S3/23 , H01S3/036 , H01S3/038

CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333

摘要： A very narrow band two chamber high repetition rate F 2 gas discharge laser system comprising. A) a first laser unit comprising: 1) a first discharge chamber containing; a) a first laser gas b) a first pair of elongated spaced apart electrodes defining a first discharge region, 2) a first fan producing sufficient gas movement of said first laser gas in said first discharge region to clear from said first discharge region, following each gas discharge, substantially all discharge produced ions prior to a next gas discharge when operating at a repetition rate in the range of 4,000 gas discharges per second or greater, 3) a first heat exchanger system removing heat energy from said first laser gas, B) a line selection unit minimizing energy outside of a single selected line spectrum, C) a second laser unit comprising: 1) a second discharge chamber containing: a) a second laser gas, b) a second pair of elongated spaced apart electrodes defining a second discharge region 2) a second fan for producing sufficient gas movement of said second laser gas in said second discharge region to clear from said second discharge region, following each gas discharge, substantially all discharge produced ions prior to a next gas discharge when operating at a repetition rate in the range of 4,000 gas discharges per second or greater, 3) a second heat exchanger system removing heat energy from said second laser gas, D) a pulse power system configured to provide electrical pulses to said first pair of electrodes and to said second pair of electrodes sufficient to produce laser output pulses at rates of about 4,000 laser output pulses per second with precisely controlled laser output pulse energies in excess of about 5 mJ, E) a laser beam measurement and control system for measuring the laser output pulse energy of laser output pulses produced by said two chamber laser system and controlling said laser output pulses in a feedback control arrangement, and wherein output laser beams from said first laser unit are utilized as a seed beam for seeding said second laser unit.

摘要翻译：一种非常窄的两室高重复率F 2气体放电激光系统。 A）第一激光单元，包括：1）第一放电室， a）第一激光气体b）限定第一放电区域的第一对细长间隔开的电极，2）第一风扇，其在所述第一放电区域中产生所述第一激光气体充分的气体运动，以从所述第一放电区域清除，每次气体放电时，在以4,000次气体放电/秒或更大的范围内的重复率运行时，在下一次气体放电之前基本上全部放电产生离子，3）从第一激光气体B去除热能的第一热交换器系统）线选择单元，使单个所选线谱外的能量最小化; C）第二激光单元，包括：1）第二放电室，包含：a）第二激光气体，b）第二对细长间隔开的电极，第二排出区域2）第二风扇，用于在所述第二排放区域产生所述第二激光气体的足够的气体运动，以便在每个气体排放之后从所述第二排放区域清除在以每秒或更多的4,000次气体放电的范围内的重复频率操作时，在下一个气体放电之前，所有放电产生离子，3）从第二激光气体去除热能的第二热交换器系统，D）脉冲功率系统，被配置为向所述第一对电极和所述第二对电极提供电脉冲，足以以每秒约4,000个激光输出脉冲的速率产生激光输出脉冲，其精确控制的激光输出脉冲能量超过约5mJ，E ）激光束测量和控制系统，用于测量由所述两腔激光器系统产生的激光输出脉冲的激光输出脉冲能量，并且在反馈控制装置中控制所述激光输出脉冲，并且其中利用来自所述第一激光单元的输出激光束作为用于播种所述第二激光单元的种子束。

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