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1. 发明公开

EP2630704A1 OSCILLATOR-AMPLIFIER DRIVE LASER WITH SEED PROTECTION FOR AN EUV LIGHT SOURCE 审中-公开
标题翻译：与激光种子保护研究EUV光源OSC-AMP DRIVE
公开(公告)号：EP2630704A1
公开(公告)日：2013-08-28
申请号：EP11834795.4
申请日：2011-09-06
申请人： Cymer, Inc.
发明人： HOU, Kai-chung , SANDSTROM, Richard, L. , PARTLO, William, N. , BROWN, Daniel, J.w. , FOMENKOV, Ifor, V.
IPC分类号： H01S3/00
CPC分类号： H01S3/117 , H01S3/005 , H01S3/0057 , H01S3/0064 , H01S3/076 , H01S3/0812 , H01S3/2232 , H01S3/2383 , H05G2/005 , H05G2/008
摘要： As disclosed herein, in a first aspect, a device may comprise: an oscillator producing a light output on a beam path; a target material for interaction with light on the beam path at an irradiation site; a beam delay on the beam path the beam delay having a beam folding optical arrangement; and a switch positioned along the beam path and interposed between the oscillator and the beam delay; the switch closable to divert at least a portion of light on the beam path from the beam path, the switch having close time, t1 and the beam path having a length, L1, along the path from the switch to the irradiation site; with t1

2. 发明公开

EP2586107A1 MASTER OSCILLATOR-POWER AMPLIFIER DRIVE LASER WITH PRE-PULSE FOR EUV LIGHT SOURCE 审中-公开
标题翻译： - 激光预脉冲的EUV光的主振荡功率放大器
公开(公告)号：EP2586107A1
公开(公告)日：2013-05-01
申请号：EP11798565.5
申请日：2011-05-24
申请人： Cymer, Inc.
发明人： HOU, Kai-chung , SANDSTROM, Richard, L , PARTLO, William, N. , BROWN, Daniel, J.W. , FOMENKOV, Igor, V.
IPC分类号： H01S3/00
CPC分类号： H01S3/0078 , G03F7/70033 , G03F7/70175 , G03F7/70908 , G03F7/70933 , H01S3/076 , H01S3/1055 , H01S3/117 , H01S3/2232 , H05G2/008
摘要： A device is described herein which may comprise an optical amplifier having a gain band including wavelengths λ
1 and λ
2 , with λ
1 ≠ λ
2 ; a pre-pulse seed laser having a tuning module for tuning a pre-pulse output to wavelength λ
1 ; a main pulse seed laser generating a laser output having wavelength, λ
2 ; and a beam combiner for directing the pre-pulse output and the main pulse output on a common path through the optical amplifier.

3. 发明授权

EP1807866B1 EUV COLLECTOR DEBRIS MANAGEMENT 有权
标题翻译： AN EUV集热器的存款处理
公开(公告)号：EP1807866B1
公开(公告)日：2013-03-06
申请号：EP05851232.8
申请日：2005-10-20
申请人： Cymer, Inc.
发明人： PARTLO, William, N. , FOMENKOV, Igor, V. , ERSHOV, Alexander, I. , OLDHAM, William , HEMBERG, Oscar , MARX, William, F.
IPC分类号： B08B7/00
CPC分类号： B08B7/00

4. 发明公开

EP1867014A2 GAS DISCHARGE LASER OUTPUT LIGHT BEAM PARAMETER CONTROL 有权
标题翻译：控制在所述主梁的气体放电激光器的参数
公开(公告)号：EP1867014A2
公开(公告)日：2007-12-19
申请号：EP06748813.0
申请日：2006-03-27
申请人： Cymer, Inc.
发明人： BESAUCELE, Herve, A. , FOMENKOV, Igor, V. , PARTLO, William, N. , TRINTICHOUK, Fedor , TON-THAT, Hao
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , H01S3/038 , H01S3/097 , H01S3/09702 , H01S3/134
摘要： A line narrowed gas discharge laser system and method of operation are disclosed which may comprise: an oscillator cavity; a laser chamber comprising a chamber housing containing a lasing medium gas; at least one peaking capacitor electrically connected to the chamber housing and to a first one of a pair of electrodes; a second one of the pair of electrodes connected to an opposite terminal of the at least one peaking capacitor; a current return path connected to the chamber housing; the one terminal, the first one of the electrodes, the lasing medium gas, the second one of the electrodes, the current return path and the second terminal forming a head current inductive loop having an inductance unique to the particular head current inductive loop; a spectral quality tuning mechanism comprising a mechanism for changing the particular head current inductive loop inductance value for the particular head current inductance loop.

5. 发明公开

EP1754291A2 GAS DISCHARGE LASER CHAMBER IMPROVEMENTS 有权转让
标题翻译：气体放电激光器室的改进
公开(公告)号：EP1754291A2
公开(公告)日：2007-02-21
申请号：EP05733083.9
申请日：2005-03-03
申请人： Cymer, Inc.
发明人： PARTLO, William, N. , AMADA, Yoshiho , CARMICHAEL, James, A. , DYER, Timothy, S. , GILLESPIE, Walter, D. , MOOSMAN, Bryan, G. , RETTIG, Curtis, L. , STRATE, Brian, D. , STEIGER, Thomas, D. , TRINTCHOUK, Fedor, B. , UJAZDOWSKI, Richard, C.
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , H01S3/0384 , H01S3/041 , H01S3/0971 , H01S3/225
摘要： A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall. The chamber may comprise a plurality of dust collecting recesses in at least one of the vertical interior wall and the bottom wall of the chamber which may be selected from a group comprising a one-part recess and a multi-part recess, which may comprise two sections angled with respect to each other. The dust trap may comprise a pressure trap positioned between a portion of a main insulator and an interior wall of the chamber. The chamber may comprise a gas circulating fan comprising a cross-flow fan with a fan cutoff that may comprise a vortex control pocket. The chamber may comprise a preionization mechanism comprising a preionization tub containing a ground rod within an elongated opening in the preionization tube that may comprise a compliant member, an automatic preionization shut-off mechanism, a preionization onset control mechanism and/or a focusing element. The chamber may comprise an elongated baffle plate that may comprise a plurality of pyramidal structures including varying numbers of generally pyramidal elements and oriented in groups of varying numbers of generally pyramidal elements and oriented along and transverse to the longitudinal axis. Acoustic resonances within the chamber may also be reduced by introducing an artificial fitter into the timing of the laser discharges varying the inter-pulse period randomly or in a repeating pattern from pulse to pulse within a burst.

6. 发明公开

EP1726028A2 A HIGH REPETITION RATE LASER PRODUCED PLASMA EUV LIGHT SOURCE 有权
标题翻译：用高重复率产生的等离子体EUV光源的激光
公开(公告)号：EP1726028A2
公开(公告)日：2006-11-29
申请号：EP05724572.2
申请日：2005-03-03
申请人： Cymer, Inc.
发明人： AKINS, Robert, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , FOMENKOV, Igor, V. , STEIGER, Thomas, D. , ALGOTS, Martin, J. , BOWERING, Norbert, R. , JACQUES, Robert, N. , PALENSCHAT, Frederick, A. , SONG, Jun
IPC分类号： H01J35/20
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap.

7. 发明公开

EP1602116A2 DISCHARGE PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：放电产生血浆EUV光源
公开(公告)号：EP1602116A2
公开(公告)日：2005-12-07
申请号：EP04716949.5
申请日：2004-03-03
申请人： Cymer, Inc.
发明人： PARTLO, William, N. , BLUMENSTOCK, Gerry, M. , BOWERING, Norbert , BRUZZONE, Kent, A. , COBB, Dennis W. , DYER, Timothy, S. , DUNLOP, John , FOMENKOV, Igor, V. , HYSHAM, James, Christopher , OLIVER, Roger, I. , PALENSCHAT, Frederick, A. , PAN, Xiaojiang, J. , RETTIG, Curtis, L. , SIMMONS, Rodney, S. , WALKER, John , WEBB, Kyle, R. , HOFMANN, Thomas , KHODYKIN, Oleh
IPC分类号： H01J1/52
CPC分类号： H01S3/005 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70908 , G03F7/70916 , H01S3/225 , H05G2/003 , H05G2/005 , H05H1/06
摘要： An EUV source (20) includes a debris mitigation apparatus (60) employing a metal halogen gas producing a metal halide from debris exiting the plasma, a debris shield (36) having a plurality of curvilinear shield members (102) having inner and outer surface connected by light passages (104) and electrodes (28,88) for providing a discharged plasma (32) in a chamber (22).

8. 发明授权

EP1224717B1 HIGH PULSE RATE PULSE POWER SYSTEM WITH FAST RISE TIME AND LOW LEAKAGE CURRENT 有权
标题翻译：具有高脉冲速率，时间短，增加了低泄漏功率脉冲布置
公开(公告)号：EP1224717B1
公开(公告)日：2005-05-04
申请号：EP00953674.9
申请日：2000-07-25
申请人： Cymer, Inc.
发明人： BIRX, Daniel, L. DI , PARTLO, William, N. , NESS, Richard, M. , ROTHWEIL, Daniel, A. , MELCHER, Paul, C. , SMITH, Brett, D.
IPC分类号： H01S3/00 , H03K3/57 , H03K17/80 , H01S3/097
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/097 , H01S3/225 , H03K3/57 , H03K17/80
摘要： A high pulse rate pulse power source (20) for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source (20) includes a pulse generating circuit (50) including a charging capacitor (42), a solid state switch (46) and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer (56) increases peak voltage to at least 12,000 volts. A very fast regulated power supply (20) is provided for charging the charging capacitor (42) in less than 400 microseconds and a pulse control system including a programmed processor (102) controls the charging of the charging capacitor (42) to an accuracy of less than about one percent at a rate of at least 2000 charges per second.

9. 发明公开

EP1493039A2 EXTREME ULTRAVIOLET LIGHT SOURCE 审中-公开
标题翻译：极端紫外光源
公开(公告)号：EP1493039A2
公开(公告)日：2005-01-05
申请号：EP03723976.1
申请日：2003-04-09
申请人： Cymer, Inc.
发明人： MELNYCHUK, Stephen, T. , PARTLO, William, N. , FOMENKOV, Igor, V. , OLIVER, I., Roger , NESS, Richard, M. , BOWERING, Norbert , KHODYKIN, Oleh , RETTIG, Curtis, L. , BLUMENSTOCK, Gerry, M. , DYER, Timothy, S. , SIMMONS, Rodney, D. , HOFFMAN, Jerzy, R. , JOHNSON, R., Mark
IPC分类号： G01S1/00
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要： A reliable, high-repetition rate, production line compatible high energy photon source wherein hot plasma containing an atomic element having an emission line within a desired extreme ultraviolet (EUV) wavelength range is produced in a vacuum chamber. The EUV light source unit is integrated directly into a lithography unit such as a stepper machine. The integrated parts may include a commentator, and a compression head of a solid-state pulse power unit and a vacuum vessel all as shown at (120). Support equipment is located in a support equipment cabinet (122), and rough vacuum pumps and high-pressure water pumps are located in a third cabinet (124). The pulse power unit provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts on a continuous basis and in excess of 20 Watts on a burst basis.

10. 发明授权

EP1203427B1 HIGH PULSE RATE PULSE POWER SYSTEM WITH LIQUID COOLING 有权
标题翻译： LEISTUNSPULSANORDNUNG高脉冲速度和通液冷却
公开(公告)号：EP1203427B1
公开(公告)日：2004-10-06
申请号：EP00975177.7
申请日：2000-07-25
申请人： Cymer, Inc.
发明人： BIRX, Daniel, L. , PARTLO, William, N. , NESS, Richard, M. , ROTHWEIL, Daniel, A. , MELCHER, Paul, C. , SMITH, Brett, D.
IPC分类号： H01S3/00 , H01S3/225 , H03K3/57 , H03K17/80
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/097 , H01S3/225 , H03K3/57 , H03K17/80
摘要： A high pulse rate pulse power source (20) for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source (20) includes a pulse generating circuit (50) including a charging capacitor (42), a solid state switch (44-46) and a current limiting inductor (48). Pulses generated in the pulse generating circuit (50) are compressed in at least two pulse compression circuits and a step-up pulse transformer increases peak voltage to at least 12,000 volts. A very fast regulated power supply is provided for charging the charging capacitor (42) in less than 400 microseconds and a pulse control system including a programmed processor (102) controls the charging of the charging capacitor (42) an accuracy of less than about one percent at a rate of at least 4000 charges per second. In a preferred embodiment capable of operating at pulse rates of 2000 to 4000 Hz or greater, water cooling of the saturable inductors (48, 54, 64) is provided.

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