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1. 发明公开

EP3371639A1 STITCHLESS DIRECT IMAGING FOR HIGH RESOLUTION ELECTRONIC PATTERNING 有权
公开(公告)号：EP3371639A1
公开(公告)日：2018-09-12
申请号：EP16861723.1
申请日：2016-11-02
申请人： Orbotech Ltd. , Laser Imaging Systems GmbH
发明人： RUECKER, Steffen , HEINEMANN, Stefan , ESCHKE, Werner , GROSS, Abraham
IPC分类号： G02B26/10
CPC分类号： G03F7/70383 , G03F7/70025 , G03F7/70275 , G03F7/70291 , G03F7/704 , G03F7/70466 , G03F7/70475
摘要： A method of manufacture of objects including receiving a CAD file containing electrical circuit design data for direct writing on a surface, the CAD file including CAD data for a multiplicity of objects to be produced on the surface, automatically configuring a direct write machine to direct write direct writing data based on the CAD data on the surface in plural scans, each having a scan width less than a width of the surface, including arranging the direct writing data for the multiplicity of objects to be written in a side by side manner in each of the plural scans so as to be within the scan width, whereby stitching of direct writing data between adjacent scans is obviated and operating the direct write machine to create the multiplicity of objects on the surface.

2. 发明公开

EP3295470A1 ELECTRODELESS SINGLE CW LASER DRIVEN XENON LAMP 审中-实审
公开(公告)号：EP3295470A1
公开(公告)日：2018-03-21
申请号：EP16724576
申请日：2016-05-12
申请人： EXCELITAS TECH CORP
发明人： BLONDIA RUDI
IPC分类号： H01J61/02 , H01J61/16 , H01J61/30 , H01J61/54 , H01J65/04
CPC分类号： H01J61/54 , G03F7/70008 , G03F7/70016 , G03F7/70025 , G03F7/70033 , G03F7/7005 , H01J61/025 , H01J61/16 , H01J61/30 , H01J65/04
摘要： An ignition facilitated electrodeless sealed high intensity illumination device is disclosed. The device is configured to receive a laser beam from a continuous wave (CW) laser light source. A sealed chamber is configured to contain an ionizable medium. The chamber has an ingress window disposed within a wall of a chamber interior surface configured to admit the laser beam into the chamber, a plasma sustaining region, and a high intensity light egress window configured to emit high intensity light from the chamber. A path of the CW laser beam from the laser light source through the ingress window to a focal region within the chamber is direct. The ingress window is configured to focus the laser beam to within a predetermined volume, and the plasma is configured to be ignited by the CW laser beam, optionally by heating of a non-electrode ignition agent located entirely within the chamber.

3. 发明公开

EP2856260A1 AN ASSEMBLY FOR MODIFYING PROPERTIES OF A PLURALITY OF RADIATION BEAMS, A LITHOGRAPHY APPARATUS, A METHOD OF MODIFYING PROPERTIES OF A PLURALITY OF RADIATION BEAMS AND A DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：安排进行修改特点辐射BUNCH光刻设备的品种，进行修改的方法具有辐射的一群，装置的制造方法的各种
公开(公告)号：EP2856260A1
公开(公告)日：2015-04-08
申请号：EP13720415.2
申请日：2013-05-06
申请人： ASML Netherlands BV
发明人： MULDER, Heine , DE JAGER, Pieter
IPC分类号： G03F7/20 , G02B6/00 , H01S5/14
CPC分类号： G03F7/70025 , G03F7/70391 , G03F7/704 , H01S3/109 , H01S5/141 , H01S5/183 , H01S5/423
摘要： An assembly to modify a property of a plurality of radiation beams, the assembly including a plurality of waveguides configured to guide the plurality of radiation beams closer together, and a frequency multiplying device configured to receive the plurality of radiation beams guided by the plurality of waveguides and generate a corresponding plurality of radiation beams having frequencies that are an integer multiple higher. Also described are a corresponding lithography apparatus, method of modifying a property of a plurality of radiation beams and device manufacturing method.

4. 发明公开

EP2759027A1 SOLID-STATE LASER AND INSPECTION SYSTEM USING 193NM LASER 审中-公开
标题翻译：固态激光器和核查制度与激光的193nm
公开(公告)号：EP2759027A1
公开(公告)日：2014-07-30
申请号：EP12834106.2
申请日：2012-09-20
申请人： Kla-Tencor Corporation
发明人： CHUANG, Yung-Ho, Alex , DRIBINKSI, Vladimir , ARMSTRONG, Joseph, J.
IPC分类号： H01S3/109 , G01B11/30 , G01N21/88
CPC分类号： G01N21/9501 , G01J3/10 , G01J3/1256 , G01N2021/8825 , G01N2021/95676 , G02F1/3501 , G02F1/3532 , G02F2001/3507 , G02F2001/354 , G03F1/84 , G03F7/70025 , G03F7/7065 , H01S3/0092 , H01S3/06754 , H01S3/1618 , H01S3/302
摘要： An improved solid-state laser for generating 193 nm light is described. This laser uses the 6
th harmonic of a fundamental wavelength near 1160 nm to generate the 193 nm light. The laser mixes the 1160 nm fundamental wavelength with the 5
th harmonic, which is at a wavelength of approximately 232 nm. By proper selection of non-linear media, such mixing can be achieved by nearly non-critical phase matching. This mixing results in high conversion efficiency, good stability, and high reliability.

5. 发明公开

EP2673856A2 LASER APPARATUS, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, METHOD FOR CONTROLLING THE LASER APPARATUS, AND METHOD FOR GENERATING THE EXTREME ULTRAVIOLET LIGHT 审中-公开
标题翻译：激光器件，系统用于产生极紫外光，方法，用于控制激光器件及其制造方法极紫外光
公开(公告)号：EP2673856A2
公开(公告)日：2013-12-18
申请号：EP12714359.2
申请日：2012-01-25
申请人： GIGAPHOTON INC.
发明人： NOWAK, Krzysztof , WAKABAYASHI, Osamu
IPC分类号： H01S5/062 , H01S3/23 , H05G2/00 , H01S3/13 , H01S3/223 , H01S5/06 , H01S5/14 , H01S5/34 , H01S5/40 , H01S5/065 , G03F7/20
CPC分类号： H01S5/06 , B82Y20/00 , G03F7/70025 , G03F7/70033 , H01S3/1305 , H01S3/2232 , H01S3/2316 , H01S3/235 , H01S3/2375 , H01S5/0612 , H01S5/06216 , H01S5/0622 , H01S5/0653 , H01S5/0654 , H01S5/141 , H01S5/3402 , H01S5/4025 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A laser apparatus may include: a master oscillator configured to output a pulsed laser beam at a repetition rate, the master oscillator including at least one semiconductor laser apparatus; at least one amplifier configured to amplify the pulsed laser beam from the master oscillator, the at least one amplifier being configured to include at least one gain bandwidth; and a controller for controlling a parameter affecting an output wavelength of the pulsed laser beam from the master oscillator such that a wavelength chirping range of the pulsed laser beam from the master oscillator overlaps at least a part of the at least one gain bandwidth.

6. 发明公开

EP2470939A1 METROLOGY MODULE FOR LASER SYSTEM 审中-公开
标题翻译： MESSMODULFÜRLASERSYSTEM
公开(公告)号：EP2470939A1
公开(公告)日：2012-07-04
申请号：EP10745271.6
申请日：2010-08-26
申请人： Carl Zeiss Laser Optics GmbH
发明人： MÜNZ, Holger , KRAUS, Johannes , WEIGL, Bernhard
IPC分类号： G02B27/12 , G02B27/14 , H01S3/097 , G01J4/04 , G03F7/20 , G02B27/28 , G01J1/42
CPC分类号： G01J4/04 , G01J1/4257 , G02B27/10 , G02B27/1073 , G02B27/108 , G03F7/70025 , G03F7/70566 , G03F7/7085 , H01S3/02
摘要： A laser system (100) includes a laser (110), a housing (101) including the laser and a first chamber (120) arranged to receive laser radiation from the laser during operation of the laser system. The system also includes a first optical element (220) separating the first chamber from an adjacent chamber, the first optical element (220) being arranged in a path of the laser radiation (201) and forming a window between the first chamber (225) and the adjacent chamber; a beamsplitter (210) arranged in the path of the radiation (201) either upstream or downstream from the first optical element (220); and a radiation detection device (240). During operation of the system, the beamsplitter (210) receives the laser radiation (201), transmits a first portion of the laser radiation as a main beam (201) and directs a second portion (202, 203) of the laser radiation as a first sub-beam towards the radiation detection device.
摘要翻译：激光系统（100）包括激光器（110），包括激光器的壳体（101）和布置成在激光系统的操作期间接收来自激光器的激光辐射的第一腔室（120）。该系统还包括将第一腔室与相邻腔室分开的第一光学元件（220），第一光学元件（220）布置在激光辐射（201）的路径中，并在第一腔室（225）和相邻的室; 在所述第一光学元件（220）的上游或下游布置在所述辐射路径（201）中的分束器（210）; 和放射线检测装置（240）。在系统操作期间，分束器（210）接收激光辐射（201），将激光辐射的第一部分作为主光束（201）传输，并将激光辐射的第二部分（202,203）引导为朝向辐射检测装置的第一子光束。

8. 发明公开

EP1831974A4 LINE NARROWING MODULE 有权转让
标题翻译： LINIENVERSCHMÄLERUNGSMODUL
公开(公告)号：EP1831974A4
公开(公告)日：2010-11-24
申请号：EP05826233
申请日：2005-11-28
申请人： CYMER INC
发明人： ALGOTS MARTIN J , BERGSTEDT ROBERT A , GILLESPIE WALTER D , KULGEYKO VLADIMIR A , PARTLO WILLIAM N , RYLOV GERMAN E , SANDSTROM RICHARD L , STRATE BRIAN D , DYER TIMOTHY S
IPC分类号： H01S3/22
CPC分类号： H01S3/1055 , G03F7/70025 , G03F7/70041 , H01S3/005 , H01S3/036 , H01S3/08 , H01S3/08004 , H01S3/08059 , H01S3/097 , H01S3/106 , H01S3/2251

9. 发明公开

EP1724633A4 LASER LIGHT SOURCE DEVICE, EXPOSURE APPARATUS USING THIS LASER LIGHT SOURCE DEVICE, AND MASK EXAMINING DEVICE 有权
标题翻译：激光光源装置，在该激光光源装置和掩模检查设备曝光装置
公开(公告)号：EP1724633A4
公开(公告)日：2010-08-25
申请号：EP05720652
申请日：2005-03-07
申请人： NIPPON KOGAKU KK
发明人： KAWAI HITOSHI
IPC分类号： G02F1/37 , G03F1/00 , G03F7/20 , H01L21/027 , H01S3/00 , H01S3/23 , H04J14/00 , H04J14/08
CPC分类号： G03F1/84 , G03F7/70025 , G03F7/7005 , H01S3/2383 , H01S3/2391 , H04J14/02 , H04J14/08
摘要： A laser light source device 1, comprising M number of laser light sources, of which frequency is shifted from a fundamental frequency by (m -1) · a · ”É, a first laser light source section 2 and a first fiber amplifier section 4 for amplifying these laser lights, a first optical multiplexer 6 for approximately coaxially superimposing the laser lights emitted from the first fiber amplifier section 4 and emitting the laser lights, a first wavelength conversion device 9 for multiplying the frequency of the laser lights emitted from the first optical multiplexer 6 by A, M number of laser light sources, of which frequency is shifted from the fundamental frequency by (m - 1) · b · ”É, a second laser light source section 3 and a second fiber amplifier section 5 for amplifying these laser lights, a second optical multiplexer 7 for approximately coaxially superimposing the laser lights emitted from the second fiber amplifier section 5 and emitting the laser lights, a second wavelength conversion device 10 for multiplying the frequency of the laser lights emitted from the second optical multiplexer 7 by B, and a third wavelength conversion device 11 for simultaneously receiving the laser lights emitted from the first and second wavelength conversion devices 9 and 10 and converting the laser lights into laser lights, of which frequency is (A + B) times the fundamental frequency, the laser light source device 1 being characterized in that the expression A · a + B · b = 0 is satisfied.

10. 发明授权

EP1218986B1 NARROW BAND LASER WITH FINE WAVELENGTH CONTROL 有权
标题翻译：用细调谐波长SCHMALLBANDIGER LASER
公开(公告)号：EP1218986B1
公开(公告)日：2008-10-08
申请号：EP00963314.0
申请日：2000-08-31
申请人： Cymer, Inc.
发明人： ALGOTS, John, M. , MARCHI, Christopher, A. , ERIE, Fredrick, G. , BUCK, Jesse, D. , ERSHOV, Alexander, I. , DAS, Palash, P. , FOMENKOV, Igor, V.
IPC分类号： H01S3/22
CPC分类号： G03F7/70025 , G02B5/1828 , G03F7/70483 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/08009 , H01S3/08059 , H01S3/08081 , H01S3/0812 , H01S3/086 , H01S3/10 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/134 , H01S3/1392 , H01S3/225 , H01S3/2256
摘要： A smart laser having automatic computer control (24A) of pulse energy, wavelength, and bandwidth using feedback signals from a wavemeter (22). Pulse energy is controlled by controlling discharge voltage. Wavelength is controlled by very fine and rapid positioning of an Rmax mirror in a line narrowing module. Bandwidth is controller by adjusting the curvature of a grating in the line narrowing module. Preferred embodiments include automatic adjustment of a prism plate on which beam expander prisms are located and automatic adjustment of the Rmax tilt. Other preferred embodiments include automatic adjustment of the horizontal position of the laser chamber (3) within the resonance cavity. In preferred embodiments, feedback signals from a wavelength monitor are used to position the Rmax mirror. In other embodiments a separate laser beam reflected off the Rmax mirror on to a photodiode array is used to position the mirror.

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