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1. 发明公开

EP1047288A3 Plasma focus high energy photon source 有权
标题翻译：高能光子的等离子体源
公开(公告)号：EP1047288A3
公开(公告)日：2004-01-02
申请号：EP00105276.0
申请日：2000-03-14
申请人： Cymer, Inc.
发明人： Partlo, William N. , Fomenkov, Igor V. , Birx, Daniel L.
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005 , H05H1/06
摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. A working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharge between the electrodes to produce very high temperature, high density plasma pinch in the working gas providing radiation at the spectral line of the active gas. An external reflection radiation collector-director collects radiation produced in the plasma pinches and directs the radiation in a desired direction. In a preferred embodiment the active gas is lithium and the buffer gas is helium and the radiation collector-director is coated with the material used for the electrodes. A good choice for the material is tungsten. In a second preferred embodiment the buffer gas is argon and lithium gas is produced by vaporization of solid or liquid lithium located in a hole along the axis of the central electrode of a coaxial electrode configuration. Other preferred embodiments utilize a conical nested debris collector upstream of the radiation collector-director.

2. 发明公开

EP1458066A3 Line selected F2 two chamber laser system 有权
标题翻译：用线选择F2双室激光系统
公开(公告)号：EP1458066A3
公开(公告)日：2006-04-19
申请号：EP04011567.7
申请日：2002-08-19
申请人： Cymer, Inc.
发明人： Knowles, David S. , Brown, Daniel J.,W. , Sandstrom, Richard, L. , Rylov, German E. , Onkels, Eckehard, D. , Besaucele, Herve A. , Myers, David, W. , Ershov, Alexander, I. , Partlo, William N. , Fomenkov, Igor, V. , Ujazdowski, Richard, C. , Ness, Richard, M. , Smith, Scot, T. , Hulburd, William, G.
IPC分类号： H01S3/225 , H01S3/23
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： A very narrow band two chamber high repetition rate F 2 gas discharge laser system comprising. A) a first laser unit comprising: 1) a first discharge chamber containing; a) a first laser gas b) a first pair of elongated spaced apart electrodes defining a first discharge region, 2) a first fan producing sufficient gas movement of said first laser gas in said first discharge region to clear from said first discharge region, following each gas discharge, substantially all discharge produced ions prior to a next gas discharge when operating at a repetition rate in the range of 4,000 gas discharges per second or greater, 3) a first heat exchanger system removing heat energy from said first laser gas, B) a line selection unit minimizing energy outside of a single selected line spectrum, C) a second laser unit comprising: 1) a second discharge chamber containing: a) a second laser gas, b) a second pair of elongated spaced apart electrodes defining a second discharge region 2) a second fan for producing sufficient gas movement of said second laser gas in said second discharge region to clear from said second discharge region, following each gas discharge, substantially all discharge produced ions prior to a next gas discharge when operating at a repetition rate in the range of 4,000 gas discharges per second or greater, 3) a second heat exchanger system removing heat energy from said second laser gas, D) a pulse power system configured to provide electrical pulses to said first pair of electrodes and to said second pair of electrodes sufficient to produce laser output pulses at rates of about 4,000 laser output pulses per second with precisely controlled laser output pulse energies in excess of about 5 mJ, E) a laser beam measurement and control system for measuring the laser output pulse energy of laser output pulses produced by said two chamber laser system and controlling said laser output pulses in a feedback control arrangement, and wherein output laser beams from said first laser unit are utilized as a seed beam for seeding said second laser unit.

3. 发明公开

EP1037510A3 Plasma focus high energy photon source with blast shield 审中-公开
标题翻译：具有阻隔高能光子的等离子体源
公开(公告)号：EP1037510A3
公开(公告)日：2004-01-02
申请号：EP00105278.6
申请日：2000-03-14
申请人： Cymer, Inc.
发明人： Partlo, William N. , Fomenkov, Igor V. , Birx, Daniel L.
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005
摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the active gas. A blast shield positioned just beyond the location of the high density pinch provides a physical barrier which confines the pinch limiting its axial elongation. A small port is provided in the blast shield that permits the radiation but not the plasma to pass through the shield. In a preferred embodiment a surface of the shield facing the plasma is dome-shaped.

4. 发明授权

EP0783193B2 Laser having improved beam quality and reduced operating cost 失效
标题翻译：激光具有改善的光束质量和降低的操作成本
公开(公告)号：EP0783193B2
公开(公告)日：2002-08-14
申请号：EP97300007.8
申请日：1997-01-02
申请人： Cymer, Inc.
发明人： Watson, Tom A. , Fomenkov, Igor V. , Partlo, William N. , deRuyter, Anthony J. , Larson, Donald G. , Das, Palash P.
IPC分类号： H01S3/036 , H01S3/04
CPC分类号： H01S3/036 , F28D2021/0077 , H01S3/04 , H01S3/041 , H01S3/225

5. 发明授权

EP0894349B1 METHOD AND APPARATUS FOR ELIMINATING REFLECTED ENERGY DUE TO STAGE MISMATCH IN NONLINEAR MAGNETIC COMPRESSION MODULE 失效
标题翻译：减少的方法和装置的反射功率DUE TO水平不匹配非线性磁压缩模块
公开(公告)号：EP0894349B1
公开(公告)日：2002-01-23
申请号：EP98906461.3
申请日：1998-02-17
申请人： Cymer, Inc.
发明人： Partlo, William N. , Sandstrom, Richard L. , Birx, Daniel L. , Ness, Richard Mons
IPC分类号： H01S3/0971 , H03K3/57 , H03K17/80
CPC分类号： H03K17/80 , H01S3/0971 , H01S5/0428 , H03K3/57

6. 发明授权

EP1047288B1 Plasma focus high energy photon source 有权
标题翻译：高能光子的等离子体源
公开(公告)号：EP1047288B1
公开(公告)日：2009-06-10
申请号：EP00105276.0
申请日：2000-03-14
申请人： Cymer, Inc.
发明人： Partlo, William N. , Fomenkov, Igor V. , Birx, Daniel L.
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005 , H05H1/06

7. 发明公开

EP1458066A2 Line selected F2 two chamber laser system 有权
标题翻译： F2-Zweikammerlasersystem mit Linienauswahl
公开(公告)号：EP1458066A2
公开(公告)日：2004-09-15
申请号：EP04011567.7
申请日：2002-08-19
申请人： Cymer, Inc.
发明人： Knowles, David S. , Brown, Daniel J.,W. , Sandstrom, Richard, L. , Rylov, German E. , Onkels, Eckehard, D. , Besaucele, Herve A. , Myers, David, W. , Ershov, Alexander, I. , Partlo, William N. , Fomenkov, Igor, V. , Ujazdowski, Richard, C. , Ness, Richard, M. , Smith, Scot, T. , Hulburd, William, G.
IPC分类号： H01S3/223 , H01S3/23 , H01S3/036 , H01S3/038
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： A very narrow band two chamber high repetition rate F 2 gas discharge laser system comprising. A) a first laser unit comprising: 1) a first discharge chamber containing; a) a first laser gas b) a first pair of elongated spaced apart electrodes defining a first discharge region, 2) a first fan producing sufficient gas movement of said first laser gas in said first discharge region to clear from said first discharge region, following each gas discharge, substantially all discharge produced ions prior to a next gas discharge when operating at a repetition rate in the range of 4,000 gas discharges per second or greater, 3) a first heat exchanger system removing heat energy from said first laser gas, B) a line selection unit minimizing energy outside of a single selected line spectrum, C) a second laser unit comprising: 1) a second discharge chamber containing: a) a second laser gas, b) a second pair of elongated spaced apart electrodes defining a second discharge region 2) a second fan for producing sufficient gas movement of said second laser gas in said second discharge region to clear from said second discharge region, following each gas discharge, substantially all discharge produced ions prior to a next gas discharge when operating at a repetition rate in the range of 4,000 gas discharges per second or greater, 3) a second heat exchanger system removing heat energy from said second laser gas, D) a pulse power system configured to provide electrical pulses to said first pair of electrodes and to said second pair of electrodes sufficient to produce laser output pulses at rates of about 4,000 laser output pulses per second with precisely controlled laser output pulse energies in excess of about 5 mJ, E) a laser beam measurement and control system for measuring the laser output pulse energy of laser output pulses produced by said two chamber laser system and controlling said laser output pulses in a feedback control arrangement, and wherein output laser beams from said first laser unit are utilized as a seed beam for seeding said second laser unit.
摘要翻译：一种非常窄的两室高重复率F 2气体放电激光系统。 A）第一激光单元，包括：1）第一放电室， a）第一激光气体b）限定第一放电区域的第一对细长间隔开的电极，2）第一风扇，其在所述第一放电区域中产生所述第一激光气体充分的气体运动，以从所述第一放电区域清除，每次气体放电时，在以4,000次气体放电/秒或更大的范围内的重复率运行时，在下一次气体放电之前基本上全部放电产生离子，3）从第一激光气体B去除热能的第一热交换器系统）线选择单元，使单个所选线谱外的能量最小化; C）第二激光单元，包括：1）第二放电室，包含：a）第二激光气体，b）第二对细长间隔开的电极，第二排出区域2）第二风扇，用于在所述第二排放区域产生所述第二激光气体的足够的气体运动，以便在每个气体排放之后从所述第二排放区域清除在以每秒或更多的4,000次气体放电的范围内的重复频率操作时，在下一个气体放电之前，所有放电产生离子，3）从第二激光气体去除热能的第二热交换器系统，D）脉冲功率系统，被配置为向所述第一对电极和所述第二对电极提供电脉冲，足以以每秒约4,000个激光输出脉冲的速率产生激光输出脉冲，其精确控制的激光输出脉冲能量超过约5mJ，E ）激光束测量和控制系统，用于测量由所述两腔激光器系统产生的激光输出脉冲的激光输出脉冲能量，并且在反馈控制装置中控制所述激光输出脉冲，并且其中利用来自所述第一激光单元的输出激光束作为用于播种所述第二激光单元的种子束。

8. 发明公开

EP1037510A2 Plasma focus high energy photon source with blast shield 审中-公开
标题翻译： Plasmaquelle von Hochenergie-Photonen mit Schutzwand
公开(公告)号：EP1037510A2
公开(公告)日：2000-09-20
申请号：EP00105278.6
申请日：2000-03-14
申请人： Cymer, Inc.
发明人： Partlo, William N. , Fomenkov, Igor V. , Birx, Daniel L.
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005
摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the active gas. A blast shield positioned just beyond the location of the high density pinch provides a physical barrier which confines the pinch limiting its axial elongation. A small port is provided in the blast shield that permits the radiation but not the plasma to pass through the shield. In a preferred embodiment a surface of the shield facing the plasma is dome-shaped.
摘要翻译：高能光子源。一对等离子体夹管电极位于真空室中。该室包含工作气体，其包括贵重缓冲气体和选择用于提供所需光谱线的活性气体。脉冲电源以足够高的电压提供电脉冲，以在电极之间产生放电，以在工作气体中产生非常高温，高密度的等离子体夹心，从而在活性气体的谱线处提供辐射。位于刚刚超出高密度夹点位置的防爆罩提供了限制其限制其轴向伸长的夹紧的物理屏障。防爆罩中设有一个允许辐射而不是等离子体通过防护罩的小型端口。在优选实施例中，面向等离子体的屏蔽的表面是圆顶形的。

9. 发明公开

EP0894349A1 METHOD AND APPARATUS FOR ELIMINATING REFLECTED ENERGY DUE TO STAGE MISMATCH IN NONLINEAR MAGNETIC COMPRESSION MODULE 失效
标题翻译：方法和装置消除反射功率BY STUFENFEHLPASSUNG而在非线性磁挤压模块
公开(公告)号：EP0894349A1
公开(公告)日：1999-02-03
申请号：EP98906461.0
申请日：1998-02-17
申请人： Cymer, Inc.
发明人： Partlo, William N. , Sandstrom, Richard L. , Birx, Daniel L. , Ness, Richard Mons
IPC分类号： H01S3 , H02M9 , H03K3 , H03K17 , H01S5
CPC分类号： H03K17/80 , H01S3/0971 , H01S5/0428 , H03K3/57
摘要： A high voltage pulse power generating circuit capable of eliminating secondary pulses due to stage mismatch in the stages of its magnetic pulse compressor circuit is disclosed. The pulse generating circuit source comprises a high voltage charge storing element (CO) which is periodically discharged into a nonlinear magnetic compressor circuit (16). A mismatch correction circuit (CRn) coupled to each stage of the compressor circuit discharges the reflected energy due to stage mismatch and thus eliminates the reflected energy from being launched back into the load. In a preferred embodiment, the pulse power generating circuit of the present invention utilizes a diode and a resistor that is coupled to each stage of the magnetic pulse compressor circuit (16).

10. 发明公开

EP0783193A1 Laser having improved beam quality and reduced operating cost 失效
标题翻译：激光mit mit。ter。。。。。。。。。。。。
公开(公告)号：EP0783193A1
公开(公告)日：1997-07-09
申请号：EP97300007.8
申请日：1997-01-02
申请人： Cymer, Inc.
发明人： Watson, Tom A. , Fomenkov, Igor V. , Partlo, William N. , deRuyter, Anthony J. , Larson, Donald G. , Das, Palash P.
IPC分类号： H01S3/036 , H01S3/04
CPC分类号： H01S3/036 , F28D2021/0077 , H01S3/04 , H01S3/041 , H01S3/225
摘要： Disclosed is a laser useful in, e.g., photolithography or medical surgery. In one embodiment, the laser comprises a discharge chamber (120) and heat-generating electronics (240) that are enclosed in a baffled enclosure (210) that requires less cooling air to reliably cool the components in the enclosure than previous unbaffled enclosures. A method of reducing the amount of conditioned air is also provided. In a further embodiment, the laser has a heat-exchange system (250) that acts quickly in response to changes in laser gas temperature by adjusting a flow-proportioning valve regulating water flow through a heat exchanger (250), thereby providing a continuously variable rate of heat exchange through the heat exchanger (250) to maintain the lasing gas temperature constant. Methods of providing a laser beam and of improving the uniformity of a laser beam are disclosed, as are photolithography methods utilizing a laser and method of this invention.
摘要翻译：公开了一种可用于例如光刻或医疗手术中的激光。在一个实施例中，激光器包括放电室（120）和发热电子器件（240），其被封闭在有障碍的外壳（210）中，其需要较少的冷却空气来可靠地冷却外壳中的部件比先前的未封闭的外壳。还提供了减少调节空气量的方法。在另一实施例中，激光器具有热交换系统（250），该热交换系统（250）响应于激光气体温度的变化而迅速作用，通过调节调节通过热交换器（250）的水流的流量比例阀，由此提供连续可变的通过热交换器（250）的热交换速率以保持激光气体温度恒定。公开了提供激光束并提高激光束的均匀性的方法，以及利用激光的光刻方法和本发明的方法。

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