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    • 7. 发明公开
    • FIELD-EFFECT TRANSISTOR WITH SPIN-DEPENDENT TRANSMISSION CHARACTERISTIC AND NONVOLATILE MEMORY USING SAME
    • FELDEFFEKTTRANSISTOR MITSPINABHÄNGIGERÜBERTRAGUNGSEIGENSINGSUNDNICHTFLÜCHTIGERSPEICHER DAMIT
    • EP1603168A4
    • 2008-02-27
    • EP04704734
    • 2004-01-23
    • JAPAN SCIENCE & TECH AGENCY
    • SUGAHARA SATOSHITANAKA MASAAKI
    • H01L29/82G11C11/16H01L21/8246H01L27/105H01L27/22H01L29/66H01L43/08
    • H01L29/47B82Y10/00G11C11/161H01L27/228H01L29/66984
    • When a gate voltage VGS is applied, the Schottky barrier width due to the metallic spin band in the ferromagnetic source is decreased, and up-spin electrons from the metallic spin band are tunnel-injected into the channel region. However, down-spin electrons from the nonmagnetic contact (3b) are not injected because of the energy barrier due to semiconductive spin band of the ferromagnetic source (3a). That is, only up-spin electrons are injected into the channel layer from the ferromagnetic source (3a). If the ferromagnetic source (3a) and the ferromagnetic drain (5a) are parallel magnetized, up-spin electrons are conducted through the metallic spin band of the ferromagnetic drain to become the drain current. Contrarily, if the ferromagnetic source (3a) and the ferromagnetic drain (5a) are antiparallel magnetized, up-spin electrons cannot be conducted through the ferromagnetic drain (5a) because of the energy barrier Ec due to the semiconductive spin band in the ferromagnetic drain (5a). Thus, a high-performance high-degree of integration nonvolatile memory composed of MISFETs operating on the above operating principle can be fabricated.
    • 当施加栅极电压VGS时,由铁磁源中的金属自旋带引起的肖特基势垒宽度减小,并且来自金属自旋带的向上自旋电子被隧道注入到沟道区域中。 然而,由于由于铁磁源(3a)的半导电自旋带而导致的能量势垒,因此来自非磁性接触(3b)的下旋电子不会被注入。 也就是说,只有上自旋电子从铁磁源(3a)注入沟道层。 如果铁磁源(3a)和铁磁性漏极(5a)被平行磁化,则上行电子通过铁磁性漏极的金属自旋带传导成漏极电流。 相反,如果铁磁源(3a)和铁磁性漏极(5a)是反平行磁化的,则由于铁磁性漏极中的半导体自旋带导致的能量势垒Ec,上升自旋电子不能通过铁磁性漏极(5a)传导 (5A)。 因此,可以制造以上述工作原理工作的由MISFET组成的高性能高集成度非易失性存储器。