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1. 发明公开

EP3070732A1 APPARATUS AND METHOD OF PERFORMING SPECTROSCOPY IN A TRANSMISSION CHARGED-PARTICLE MICROSCOPE 审中-公开
标题翻译：装置和方法对于与带电粒子透射显微镜光谱实现
公开(公告)号：EP3070732A1
公开(公告)日：2016-09-21
申请号：EP15159576.6
申请日：2015-03-18
申请人： FEI COMPANY
发明人： Mele, Luigi , Sluijterman, Albertus , Veen, van, Gerard
IPC分类号： H01J37/28 , H01J37/05 , H01J37/244 , H01L27/146 , H01L31/107 , H04N5/3745
CPC分类号： G01T1/2006 , H01J37/244 , H01J37/28 , H01J2237/057 , H01J2237/24485 , H01J2237/2802 , H01J2237/2804 , H01L27/14643 , H01L27/148 , H01L31/107 , H04N5/32
摘要： A Transmission Charged-Particle Microscope, comprising:
- A specimen holder, for holding a specimen;
- A source, for producing a beam of charged particles;
- An illuminator, for directing said beam so as to irradiate the specimen;
- An imaging system, for receiving a flux of charged particles transmitted through the specimen and directing it onto a spectroscopic apparatus comprising:
▪ A dispersing device, for dispersing said flux into an energy-resolved array of spectral sub-beams distributed along a dispersion direction;
▪ A detector,
said detector comprising an assembly of sub-detectors arranged along said dispersion direction, whereby different sub-detectors are adjustable to have different detection sensitivities.
摘要翻译：一种变速器，带电粒子显微镜，包括： - 样品支架，用于保持样本; - 源极，其制造带电粒子的束; - 一种照明器，用于引导所述光束，以照射样品; - 一种成像系统，用于接收带电粒子的磁通反式通过试样mitted并引导它到分光装置，包括：-ª的分散装置，用于所说的磁通分散到沿分散的分布式频谱子束的能量分辨的阵列方向; -ª的检测器，所述检测器沿所述分散方向，排列的子检测器的组件的包括由此不同的子检测器是可调整的，以具有不同的检测灵敏度。

2. 发明公开

EP2831908A1 METHOD AND APPARATUS FOR DETECTING BURIED DEFECTS 审中-公开
标题翻译： VERFAHREN UND VORRICHTUNG ZUR ERKENNUNG VERBORGENER DEFEKTE
公开(公告)号：EP2831908A1
公开(公告)日：2015-02-04
申请号：EP13769920.3
申请日：2013-03-26
申请人： Kla-Tencor Corporation
发明人： XIAO, Hong , JIANG, Ximan
IPC分类号： H01L21/66 , H01L21/304
CPC分类号： G01N23/2251 , H01J37/26 , H01J37/28 , H01J2237/24475 , H01J2237/2804 , H01J2237/2817
摘要： One embodiment relates to a method of detecting a buried defect in a target microscopic metal feature. An imaging apparatus is configured to impinge charged particles with a landing energy such that the charged particles, on average, reach a depth within the target microscopic metal feature. In addition, the imaging apparatus is configured to filter out secondary electrons and detect backscattered electrons. The imaging apparatus is then operated to collect the backscattered electrons emitted from the target microscopic metal feature due to impingement of the charged particles. A backscattered electron (BSE) image of the target microscopic metal feature is compared with the BSE image of a reference microscopic metal feature to detect and classify the buried defect. Other embodiments, aspects and features are also disclosed.
摘要翻译：一个实施例涉及一种检测目标微观金属特征中的掩埋缺陷的方法。成像装置被配置为以带电粒子撞击着陆能量，使得带电粒子平均达到目标微观金属特征内的深度。此外，成像装置被配置为滤除二次电子并检测反向散射电子。然后操作成像装置以收集由于带电粒子的撞击而从目标微观金属特征发射的背散射电子。将目标微观金属特征的背散射电子（BSE）图像与参考微观金属特征的BSE图像进行比较，以检测和分类埋藏缺陷。还公开了其它实施例，方面和特征。

3. 发明公开

EP2590205A3 Transmission electron microscope and method of observing TEM images 审中-公开
标题翻译：用于观看TEM图像透射电子显微镜和方法
公开(公告)号：EP2590205A3
公开(公告)日：2014-11-05
申请号：EP12190836.2
申请日：2012-10-31
申请人： Jeol Ltd.
发明人： Yamazaki, Kazuya
IPC分类号： H01J37/26
CPC分类号： H01J37/22 , H01J37/26 , H01J2237/2802 , H01J2237/2804
摘要： A transmission electron microscope (TEM) is offered which can reduce the effects of a magnetic field on a sample during observation of a TEM image. The transmission electron microscope (100) includes an electron beam source (2), an illumination lens (4), a first objective lens (6), a second objective lens (8), a selected area aperture (16), a projector lens (10), a detector (12), and a control portion (22). This control portion controls at least the illumination lens (4), second objective lens (8), and projector lens (10). A first plane (17) is located between the second objective lens (8) and the projector lens (10). The control portion (22) performs first sets of processing for controlling the illumination lens (4) such that an electron beam (L) hits the sample (S), controlling the second objective lens (8) such that a diffraction pattern of the sample (S) is imaged onto the first plane (17), and controlling the projector lens (10) such that a TEM image of the sample (S) formed by the second objective lens (8) is focused onto a second plane where the light-sensitive portion (13) of the detector (12) is disposed.

4. 发明授权

EP1916696B1 Charged particle detector assembly, charged particle beam apparatus and method for generating an image 有权
标题翻译：带电粒子检测器，粒子束装置和方法，用于形成图像的
公开(公告)号：EP1916696B1
公开(公告)日：2017-04-19
申请号：EP06022328.6
申请日：2006-10-25
申请人： ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
发明人： Almogy, Gilad , Shemesh, Dror , Adamec, Pavel
IPC分类号： H01J37/244
CPC分类号： H01J37/244 , H01J2237/2443 , H01J2237/24455 , H01J2237/2446 , H01J2237/24465 , H01J2237/2802 , H01J2237/2804

5. 发明公开

EP2660846A1 CHARGED PARTICLE BEAM DEVICE AND METHOD OF MANUFACTURE OF SAMPLE 审中-公开
标题翻译： VERFAHREN ZUR HERSTELLUNG EINER PROBELADUNGSTRÄGERSTRAHLVORRICHTUNG
公开(公告)号：EP2660846A1
公开(公告)日：2013-11-06
申请号：EP11853766.1
申请日：2011-12-08
申请人： Hitachi High-Technologies Corporation
发明人： NANRI Terutaka , TOMIMATSU Satoshi , AGEMURA Toshihide
IPC分类号： H01J37/317 , H01J37/22 , H01J37/244 , H01J37/28
CPC分类号： H01J37/304 , H01J37/3056 , H01J2237/2804 , H01J2237/30466 , H01J2237/31749
摘要： A precision of removal of a damaged layer (202) of a sample (101) created by machining with an FIB machining device depends on a skill of an operator. During removal machining of the damaged layer (202) generated by an ion beam (105), transmitted electrons which are generated by irradiating an electron beam (111) formed in an electron beam optics system (112) onto a sample (101) are detected by a two-dimensional detector (117), and a moment for finishing the removal machining of the damaged layer (202) is determined based on the amount of blur of a diffraction pattern (208, 301) acquired with the two-dimensional detector (117).
摘要翻译：通过用FIB加工装置加工产生的样品（101）的损坏层（202）的去除精度取决于操作者的技能。在由离子束（105）产生的损伤层（202）的去除加工期间，检测通过将形成在电子束光学系统（112）中的电子束（111）照射到样品（101）上而产生的透射电子通过二维检测器（117），并且基于用二维检测器（202）获取的衍射图案（208,301）的模糊量来确定用于完成损坏层（202）的去除加工的力矩 117）。

6. 发明公开

EP2590205A2 Transmission electron microscope and method of observing TEM images 审中-公开
标题翻译：传输电子邮件和Verfahren zum Betrachten von TEM-Bildern
公开(公告)号：EP2590205A2
公开(公告)日：2013-05-08
申请号：EP12190836.2
申请日：2012-10-31
申请人： Jeol Ltd.
发明人： Yamazaki, Kazuya
IPC分类号： H01J37/26
CPC分类号： H01J37/22 , H01J37/26 , H01J2237/2802 , H01J2237/2804
摘要： A transmission electron microscope (TEM) is offered which can reduce the effects of a magnetic field on a sample during observation of a TEM image. The transmission electron microscope (100) includes an electron beam source (2), an illumination lens (4), a first objective lens (6), a second objective lens (8), a selected area aperture (16), a projector lens (10), a detector (12), and a control portion (22). This control portion controls at least the illumination lens (4), second objective lens (8), and projector lens (10). A first plane (17) is located between the second objective lens (8) and the projector lens (10). The control portion (22) performs first sets of processing for controlling the illumination lens (4) such that an electron beam (L) hits the sample (S), controlling the second objective lens (8) such that a diffraction pattern of the sample (S) is imaged onto the first plane (17), and controlling the projector lens (10) such that a TEM image of the sample (S) formed by the second objective lens (8) is focused onto a second plane where the light-sensitive portion (13) of the detector (12) is disposed.
摘要翻译：提供透射电子显微镜（TEM），其可以在TEM图像的观察期间减少对样品的磁场的影响。透射电子显微镜（100）包括电子束源（2），照明透镜（4），第一物镜（6），第二物镜（8），选择区域孔（16），投影透镜（10），检测器（12）和控制部分（22）。该控制部至少控制照明透镜（4），第二物镜（8）和投影透镜（10）。第一平面（17）位于第二物镜（8）和投影透镜（10）之间。控制部分（22）执行用于控制照明透镜（4）的第一组处理，使得电子束（L）撞击样品（S），控制第二物镜（8）使得样品的衍射图案（S）被成像到第一平面（17）上，并且控制投影透镜（10），使得由第二物镜（8）形成的样本（S）的TEM图像聚焦到第二平面上，其中光设置检测器（12）的敏感部分（13）。

7. 发明公开

EP2387062A1 Simultaneous electron detection 有权
标题翻译：同步电子邮件
公开(公告)号：EP2387062A1
公开(公告)日：2011-11-16
申请号：EP11165383.8
申请日：2011-05-10
申请人： FEI Company
发明人： Tiemeijer, Peter , Freitag, Bert , Lazar, Sorin
IPC分类号： H01J37/28 , H01J37/05
CPC分类号： H01J37/05 , H01J37/28 , H01J2237/057 , H01J2237/2802 , H01J2237/2804
摘要： The invention provides multiple detectors that detect electrons that have passed through a sample. The detectors preferably detect electrons after the electrons have been passed through a prism that separates electrons according to their energies. Electrons in different energy ranges are then detected by different detectors, with preferably at least one of the detectors measuring the energy lost by the electrons as they pass through the sample. One embodiment of the invention provides EELS on core-loss electrons while simultaneously providing a bright-field STEM signal from low-loss electrons.
摘要翻译：本发明提供了多个检测器，其检测已经通过样品的电子。检测器优选在电子通过根据其能量分离电子的棱镜之后检测电子。不同能量范围的电子然后由不同的检测器检测，优选地，至少一个检测器测量当电子通过样品时由电子损失的能量。本发明的一个实施例在核心损耗电子上提供EELS，同时从低损耗电子提供亮场STEM信号。

8. 发明授权

EP2824448B1 Sample holder for transmission Kikuchi diffraction in SEM 有权转让
$Sample holder for transmission Kikuchi diffraction in SEM$
标题翻译：对于电子背散射衍射样品架
公开(公告)号：EP2824448B1
公开(公告)日：2016-12-14
申请号：EP13180033.6
申请日：2013-08-12
申请人： Bruker Nano GmbH
发明人： Goran, Daniel Radu , Hahn, Waldemar
IPC分类号： G01N23/20 , H01J37/20
CPC分类号： G01N23/20025 , H01J37/20 , H01J2237/2007 , H01J2237/20207 , H01J2237/2804

9. 发明公开

EP2660846A4 CHARGED PARTICLE BEAM DEVICE AND METHOD OF MANUFACTURE OF SAMPLE 审中-公开
标题翻译：货运航空公司束装置及其制造方法样本
公开(公告)号：EP2660846A4
公开(公告)日：2015-01-21
申请号：EP11853766
申请日：2011-12-08
申请人： HITACHI HIGH TECH CORP
发明人： NANRI TERUTAKA , TOMIMATSU SATOSHI , AGEMURA TOSHIHIDE
IPC分类号： H01J37/317 , H01J37/22 , H01J37/244 , H01J37/28 , H01J37/304 , H01J37/305
CPC分类号： H01J37/304 , H01J37/3056 , H01J2237/2804 , H01J2237/30466 , H01J2237/31749

10. 发明公开

EP2755021A1 Method of analyzing a sample and charged particle beam device for analyzing a sample 有权
标题翻译： Verfahren zur分析einer Probe和geladene Partikelstrahlvorrichtung zur分析einer Probe
公开(公告)号：EP2755021A1
公开(公告)日：2014-07-16
申请号：EP13151344.2
申请日：2013-01-15
申请人： Carl Zeiss Microscopy Ltd.
发明人： Hill, Edward , Bean, Stewart
IPC分类号： G01N23/225
CPC分类号： H01J37/26 , G01N23/2254 , H01J2237/2804 , H01J2237/2806 , H01J2237/2808 , H01J2237/2809
摘要： The invention refers to a method and a charged particle beam device (1) for analyzing an object (24) using a charged particle beam interacting with the object (24). The object (24) comprises a sample (15A) embedded in a resin (15B). Interaction radiation in the form of cathodoluminescence light is detected for identifying areas in which the resin (15B) is arranged and in which the sample (15A) is arranged. Interaction particles are detected to identify particles within the resin (15B) and the sample (15A) for further analysis by using EDX analysis.
摘要翻译：本发明涉及一种用于使用与物体（24）相互作用的带电粒子束来分析物体（24）的方法和带电粒子束装置（1）。物体（24）包括嵌入在树脂（15B）中的样品（15A）。检测呈阴极发光的形式的相互作用的放射线用于识别布置树脂（15B）的区域，并且其中布置有样品（15A）。检测相互作用颗粒以鉴定树脂（15B）和样品（15A）中的颗粒，以便通过使用EDX分析进一步分析。

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