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1. 发明公开

EP3368703A2 APPLICATION OF MULTIPLE PLASMA COATING LAYERS IN A CONTINUOUS VACUUM 审中-公开
公开(公告)号：EP3368703A2
公开(公告)日：2018-09-05
申请号：EP16822767.6
申请日：2016-11-28
申请人： SABIC Global Technologies B.V.
发明人： THAKORE, Ashir , YAO, Huazhen , LAI, Hengjie , LIU, Chao , NIU, Yaming , JIANG, Siguang
IPC分类号： C23C14/34 , C23C14/56 , C23C14/02 , C23C14/46 , G02B1/00 , H01J37/317 , H01J37/34
CPC分类号： C23C14/3464 , C23C14/022 , C23C14/34 , C23C14/3414 , C23C14/46 , C23C14/56 , G02B1/14 , H01J37/32403 , H01J37/3408 , H01J37/3417 , H01J37/3429
摘要： A device and a process for applying multiple plasma coating layers in a vacuum, and a product created from that process. The process includes disposing a substrate in a vacuum chamber and applying multiple plasma coating layers to the substrate without breaking vacuum.

2. 发明公开

EP3208363A4 METHOD FOR FORMING FILM ON FLEXIBLE SUBSTRATE USING VAPOR PHASE DEPOSITION METHOD 审中-公开
公开(公告)号：EP3208363A4
公开(公告)日：2018-05-16
申请号：EP15850658
申请日：2015-10-13
申请人： TOPPAN PRINTING CO LTD
发明人： KON MASATO
IPC分类号： C23C14/34 , C23C14/00 , C23C14/02 , C23C14/14 , C23C14/22 , C23C14/56 , C23C16/455 , C23C16/54 , H01J37/32 , H01J37/34 , H01L21/316
CPC分类号： C23C14/3464 , C23C14/0078 , C23C14/024 , C23C14/14 , C23C14/22 , C23C14/56 , C23C14/562 , C23C16/455 , C23C16/54 , H01J37/32513 , H01J37/3277 , H01J37/3417 , H01J37/3426
摘要： A method for forming a film on a flexible substrate by vapor deposition is provided, wherein the method is capable of reducing in size of the entire apparatus and improving an efficiency to thereby enhance productivity. A film formation method includes the steps of: transporting the flexible substrate through a first zone in a vacuum chamber, into which a raw material gas containing metal or silicon is introduced, so that components included in the raw material gas are adsorbed onto the flexible substrate, and performing sputter deposition by transporting the flexible substrate through a second zone in the vacuum chamber, the second zone being separated from the first zone and including a target material containing metal or silicon.

3. 发明授权

EP2655686B1 VERDAMPFERQUELLE UND BESCHICHTUNGSVERFAHREN 有权转让
标题翻译：蒸发器源和涂层过程
公开(公告)号：EP2655686B1
公开(公告)日：2017-11-22
申请号：EP11802863.8
申请日：2011-12-16
申请人： OC3 AG
发明人： ULMER, Frank , GÖBERT, Christof , ZACHMANN, Hendrik , RÖSSLER, Jens , SCHULER, Heiko , HUBER, Frank , LEIFELD, Oliver
IPC分类号： C23C14/24 , C23C14/56 , B05B1/00 , H01L31/0392
CPC分类号： B05B1/005 , C23C14/24 , C23C14/243 , C23C14/56 , H01L31/03923

4. 发明公开

EP3220212A1 PROCÉDÉ DE DÉCORATION D'UN COMPOSANT HORLOGER 有权转让
标题翻译：装饰观看部件的方法
公开(公告)号：EP3220212A1
公开(公告)日：2017-09-20
申请号：EP16160659.5
申请日：2016-03-16
申请人： The Swatch Group Research and Development Ltd.
发明人： Manasterski, Christian , Faure, Cédric , Springer, Simon , Rossier, Gérard
IPC分类号： G04B37/22 , G04B19/04 , G04B19/06
CPC分类号： C23C28/021 , C23C14/14 , C23C14/165 , C23C14/34 , C23C14/56 , C25D7/005 , G04B5/16 , G04B13/026 , G04B19/042 , G04B19/06 , G04B29/027 , G04B37/223 , G04B47/04 , G04D3/0092 , G04D3/0097
摘要： L'invention se rapporte à un procédé de décoration d'un composant horloger (1) comprenant :
a) une étape de préparation du composant horloger (1) comprenant optionnellement une première étape de dépôt d'un premier matériau sur le composant horloger (1) pour former une première sous-couche (2),
b) une deuxième étape de dépôt d'un deuxième matériau sur le composant horloger (1) obtenu à l'étape a) pour former une deuxième sous-couche (4),
c) une étape de mise en couleur comprenant le dépôt d'un troisième matériau de couleur sur le composant horloger (1) obtenu à l'étape b) pour former une couche de décoration externe de couleur (5).
Selon l'invention, au moins l'étape b) et l'étape c) sont réalisées par un procédé de dépôt physique en phase vapeur (Physical Vapor Deposition, PVD).
摘要翻译：本发明涉及装饰钟表部件的方法（1），包括：a）一种钟表部件准备步骤（1）任选地包括所述钟表部件上沉积第一材料的第一步骤（1 ），以形成第一子层（2）中，b）在步骤a获得的（1））的钟表部件上沉积的第二材料的第二步骤，以形成第二子层（4）中，c ）着色步骤，包括在步骤b）中获得的钟表部件（1）上沉积第三色材以形成彩色外装饰层（5）。根据本发明，至少步骤b）和步骤c）通过物理气相沉积（PVD）方法进行。

5. 发明公开

EP3108030A1 SYSTEM AND METHOD FOR BI-FACIAL PROCESSING OF SUBSTRATES 有权
标题翻译：系统和方法用于双面处理基板
公开(公告)号：EP3108030A1
公开(公告)日：2016-12-28
申请号：EP15751417.5
申请日：2015-02-20
申请人： Intevac, Inc. , Bluck, Terry , Shah, Vinay , Latchford, Ian , Riposan, Alex
发明人： BLUCK, Terry , SHAH, Vinay , LATCHFORD, Ian , RIPOSAN, Alexandru
IPC分类号： C23C14/50 , H01L21/677
CPC分类号： C23C14/50 , C23C14/56 , C23C14/568 , H01L21/67 , H01L21/67173 , H01L21/67271 , H01L21/677 , H01L21/67709 , H01L21/67718 , H01L21/67748 , H01L21/6776
摘要： A system for processing substrates in plasma chambers, such that all substrates transport and loading/unloading operations are performed in atmospheric environment, but processing is performed in vacuum environment. The substrates are transported throughout the system on carriers. The system's chambers are arranged linearly, such that carriers move from one chamber directly to the next. A conveyor, placed above or below the system's chambers, returns the carriers to the system's entry area after processing is completed. The carriers are configured for supporting substrates of different sizes. The carriers are also configured for flipping the substrates such that both surfaces of the substrates may be processed.

6. 发明公开

EP3108027A1 SPUTTERING SYSTEM AND METHOD FOR HIGHLY MAGNETIC MATERIALS 审中-公开
标题翻译：溅射和法求解强磁性材料
公开(公告)号：EP3108027A1
公开(公告)日：2016-12-28
申请号：EP15752108.9
申请日：2015-02-19
申请人： Intevac, Inc.
发明人： BROWN, David, Ward , BLUCK, Terry
IPC分类号： C23C14/00 , C23C14/34 , C23C14/35
CPC分类号： H01J37/3455 , C23C14/35 , C23C14/56 , G11B5/851 , H01F41/183 , H01J37/3405 , H01J37/3408 , H01J37/3417 , H01J37/3426 , H01J37/3435 , H01J37/3452 , H01J37/347
摘要： A system for depositing material from a target onto substrates, comprising a processing chamber; a sputtering target having length L and having highly magnetic sputtering material provided on front surface thereof; a magnet assembly operable to reciprocally scan across the length L in close proximity to rear surface of the target; and the magnet assembly comprises: a back plate made of magnetic material; a first group of magnets arranged in a single line central to the back plate and having a first pole positioned to face the rear surface of the target; and, a second group of magnets provided around periphery of the back plate so as to surround the first group of magnets, the second group of magnets having a second pole, opposite the first pole, positioned to face the rear surface of the target.

7. 发明公开

EP3080327A1 EVAPORATION SOURCE FOR ORGANIC MATERIAL, APPARATUS HAVING AN EVAPORATION SOURCE FOR ORGANIC MATERIAL, SYSTEM HAVING AN EVAPORATION DEPOSITION APPARATUS WITH AN EVAPORATION SOURCE FOR ORGANIC MATERIALS, AND METHOD FOR OPERATING AN EVAPORATION SOURCE FOR ORGANIC MATERIAL 审中-公开
标题翻译：有机材料的蒸发源，用一个膨胀源用于操作有机材料的蒸发源有机材料和方法通过扩展分离装置有机材料系统的扩展源设备
公开(公告)号：EP3080327A1
公开(公告)日：2016-10-19
申请号：EP13802641.4
申请日：2013-12-10
申请人： Applied Materials, Inc.
发明人： BANGERT, Stefan , SCHÜßLER, Uwe , DIEGUEZ-CAMPO, Jose Manuel , HAAS, Dieter
IPC分类号： C23C14/04 , C23C14/12 , C23C14/56 , C23C14/24 , B05D3/04 , B05D1/02 , B05D1/00 , H01L51/00 , H01L51/56 , C23C16/44
CPC分类号： C23C14/243 , C23C14/042 , C23C14/12 , C23C14/246 , C23C14/50 , C23C14/56 , C23C14/562 , C23C14/564 , C23C14/566 , H01L51/001 , H01L51/0011 , H01L51/56
摘要： An evaporation source for organic material is described. The evaporation source includes an evaporation crucible, wherein the evaporation crucible is configured to evaporate the organic material; a distribution pipe with one or more outlets, wherein the distribution pipe is in fluid communication with the evaporation crucible and wherein the distribution pipe is rotatable around an axis during evaporation; and a support for the distribution pipe, wherein the support is connectable to a first drive or includes the first drive, wherein the first drive is configured for a translational movement of the support and the distribution pipe.
摘要翻译：对于有机材料的蒸发源进行说明。蒸发源包括在蒸发坩锅，worin所述蒸发坩锅是被配置为蒸发有机材料; 与一个或多个出口的分配管，worin分配管与所述蒸发坩锅流体连通，并且worin分配管是蒸发期间围绕可旋转的基座上轴; 和用于分配管的支撑件，worin支承可连接到第一驱动器或包括所述第一驱动器，worin第一驱动器被配置为支撑的平移运动和分配管。

8. 发明授权

EP2402478B1 Method of forming a conductive transparent oxide film. 有权
标题翻译：制备导电透明Oxidfolienschicht的方法。
公开(公告)号：EP2402478B1
公开(公告)日：2016-05-11
申请号：EP11172017.3
申请日：2011-06-29
申请人： First Solar Malaysia SDN.BHD
发明人： Feldman-Peabody, Scott Daniel , Black, Russell Weldon
IPC分类号： C23C14/08 , C23C14/58 , C23C14/56 , H01L31/18
CPC分类号： C23C14/086 , C23C14/56 , C23C14/5806 , C23C14/5846 , H01L31/1884 , Y02E10/50

9. 发明公开

EP3013995A1 BELLOWS-FREE RETRACTABLE VACUUM DEPOSITION SOURCES 有权
标题翻译： EINZIEHBARE FALTENBALGFREIE BEDAMPFUNGSQUELLEN
公开(公告)号：EP3013995A1
公开(公告)日：2016-05-04
申请号：EP14816784.4
申请日：2014-06-25
申请人： Veeco Instruments Inc.
发明人： LABERE, Rikki Scott , BRESNAHAN, Richard Charles , PRIDDY, Scott Wayne , READINGER, Eric, Daniel
IPC分类号： C23C14/22
CPC分类号： C23C14/56 , C23C14/246 , H01L51/001
摘要： Systems are provided that include one or more retractable deposition source assemblies that eliminate the need for a bellows, but do not require breaking the ultra-high vacuum of a growth module for source replacement or recharging with deposition material. Systems of the present invention may include source heads that allow for a differential pumping option that provides marked improvement in base pressure around the source head (and material) that provides longer lifetimes for sources in corrosive, reactive or oxidizing environments. In addition, systems of the invention do not require an entire growth module to be vented to refill or repair an effusion source. Instead, for maintenance events that are tied to a specific source, a retractable source assembly of the present invention allows the sources to be withdrawn from the system, isolated from the growth environment, and removed without venting the entire chamber of the growth module.
摘要翻译：提供了包括一个或多个可缩回的沉积源组件的系统，其消除对波纹管的需要，但不需要破坏生长模块的超高真空以用于用沉积材料进行源替换或再充电。本发明的系统可以包括源头，其允许差分泵送选项，其提供围绕源头（和材料）的基础压力的显着改进，其为腐蚀性，反应性或氧化环境中的源提供更长的寿命。此外，本发明的系统不需要将整个生长模块排放以再填充或修复渗出源。相反，对于与特定来源相关的维护事件，本发明的可伸缩源组件允许源从生长环境中分离出来，并且在没有排放增长模块的整个室的情况下被移除。

10. 发明授权

EP1713110B1 Anlage zum Beschichten eines Substrats und Modul 有权
标题翻译：系统用于涂布基材和模块
公开(公告)号：EP1713110B1
公开(公告)日：2016-03-09
申请号：EP05007805.4
申请日：2005-04-08
申请人： Applied Materials GmbH & Co. KG
发明人： Buchberger, Hans , Geiss, Andreas , Krempel-Hesse, Jörg Dr. , Haas, Dieter
IPC分类号： C23C14/56 , H01J37/32
CPC分类号： C23C14/56 , H01J37/32431 , H01J37/32458

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