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    • 1. 发明公开
    • Cooler and display device having the same
    • 冷却器和显示设备具有相同的功能
    • EP2343959A2
    • 2011-07-13
    • EP10177476.8
    • 2010-09-17
    • SAMSUNG ELECTRONICS CO., LTD.
    • Lee, Moon-chulKim, Min-sooLee, Yong-sooKim, Sru
    • H05K7/20
    • H05K7/20972F04D25/166F04D29/441F04D29/444F05D2250/52H05K7/20172
    • A cooler and a display device including the cooler. The cooler includes: a housing; an air blowing unit disposed inside the housing and sucking external air and blowing the external air in the housing, wherein the air blowing unit includes a plurality of groups each including two air blowers; a guide vane disposed above the air blowing unit and to guide air flowed out from the air blowing unit to flow in different directions; and a plurality of auxiliary guide vanes disposed between the air blowing unit and the guide vane, and each disposed in each of the groups each including two air blowers, so as to guide air flowing below the air blowing unit to flow toward the guide vane.
    • 冷却器和包括该冷却器的显示装置。 该冷却器包括:壳体; 设置在所述壳体内并且吸入外部空气并将所述外部空气吹入所述壳体内的鼓风单元,其中所述鼓风单元包括多个组,每个组包括两个鼓风机; 引导叶片,所述引导叶片设置在所述鼓风单元上方并且引导从所述鼓风单元流出的空气沿不同的方向流动; 以及多个辅助导向叶片,设置在所述鼓风单元和所述导向叶片之间,并且每个辅助导向叶片设置在每个包括两个鼓风机的组中,以引导在所述鼓风单元下方流动的空气流向所述导向叶片。
    • 7. 发明公开
    • Mems gyroscope and fabrication method thereof
    • Mems-Kreisel und sein Herstellungsverfahren
    • EP1434031A2
    • 2004-06-30
    • EP03258036.7
    • 2003-12-19
    • Samsung Electronics Co., Ltd.
    • Kang, Seok-jinLee, Moon-chulChung, Seok-whanJung, Kyu-dongHong,, Seog-woo
    • G01C19/56G01P9/04
    • G01C19/5762B81B3/0059B81B2201/0242B81B2203/051B81B2203/053
    • A vertical MEMS gyroscope operated by horizontal driving includes a substrate, a support layer fixed on an upper surface of an area of the substrate, a driving structure floating above the substrate and having a portion fixed to the upper surface of the support layer and another portion in parallel with the fixed portion, the driving structure having a predetermined area capable of vibrating in a predetermined direction parallel to the substrate, a detection structure fixed to the driving structure on a same plane as the driving structure, and having a predetermined area capable of vibrating in a vertical direction with respect to the substrate, a cap wafer bonded with the substrate positioned above the driving structure and the detection structure, and a fixed vertical displacement detection electrode formed at a predetermined location of an underside of the cap wafer, for detecting displacement of the detection structure in the vertical direction.
    • 通过水平驱动操作的垂直MEMS陀螺仪包括:基板,固定在基板区域的上表面上的支撑层,浮动在基板上方的驱动结构,并且具有固定到支撑层上表面的部分和另一部分 与固定部分平行地,驱动结构具有能够在平行于基板的预定方向上振动的预定区域,在与驱动结构相同的平面上固定到驱动结构的检测结构,并且具有能够 相对于基板在垂直方向上振动,与位于驱动结构上方的基板接合的盖晶片和检测结构,以及形成在盖晶片的下侧的预定位置处的固定垂直位移检测电极,用于检测 检测结构在垂直方向的位移。
    • 8. 发明公开
    • Anti-stiction method and apparatus for drying wafer using centrifugal force
    • 抗逆转录病毒和Vorrichtung zum Trocknen von Wafern,死Zentrifugalkraft verwendet
    • EP1270505A2
    • 2003-01-02
    • EP02014541.3
    • 2002-07-01
    • SAMSUNG ELECTRONICS CO., LTD.
    • Cho, Jin-wooLee, Moon-chulLee, Eun-sung
    • B81B3/00
    • H01L21/67034B81C1/00928
    • An anti-stiction method and apparatus for drying a wafer using a centrifugal force is provided. The anti-stiction method includes the steps of (a) removing a sacrificial layer stacked between the wafer and the micro structure, using an etching solution, (b) rinsing the etched micro structure and the etched wafer in a rinse solution for a predetermined time so that the etching solution between the micro structure and the wafer is replaced with the rinse solution, and (c) mounting the rinsed wafer in a mounting unit connected to a rotation axis and eliminating the rinse solution left between the wafer and the micro structure by the rotation of the axis. The wafer is mounted in the mounting unit in a vertical position so that the micro structure faces outwards from the rotation axis. Accordingly, a stiction phenomenon between the micro structure manufactured by a MEMS process and the wafer in a drying process can be prevented.
    • 提供了一种使用离心力干燥晶片的防静电方法和装置。 抗静电方法包括以下步骤:(a)使用蚀刻溶液去除叠置在晶片和微结构之间的牺牲层,(b)在冲洗溶液中冲洗蚀刻的微结构和蚀刻的晶片达预定时间 使得微结构和晶片之间的蚀刻溶液被冲洗溶液代替,并且(c)将冲洗的晶片安装在连接到旋转轴线的安装单元中,并且通过以下步骤消除晶片和微结构之间留下的冲洗溶液: 轴的旋转。 晶片以垂直位置安装在安装单元中,使得微结构从旋转轴线向外。 因此,可以防止由MEMS工艺制造的微结构与干燥工艺中的晶片之间的静电现象。