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1. 发明申请

WO2006053751A3 PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE INSTALLATION 审中-公开
标题翻译：投影镜头的微光刻投射曝光设备
公开(公告)号：WO2006053751A3
公开(公告)日：2006-10-12
申请号：PCT/EP2005012327
申请日：2005-11-17
申请人： ZEISS CARL SMT AG , BEIERL HELMUT , BLEIDISTEL SASCHA , SINGER WOLFGANG , GRUNER TORALF , EPPLE ALEXANDER , WABRA NORBERT , BEDER SUSANNE , WEBER JOCHEN , FELDMANN HEIKO , SCHWAER BAERBEL , ROGALSKY OLAF , KAZI ARI
发明人： BEIERL HELMUT , BLEIDISTEL SASCHA , SINGER WOLFGANG , GRUNER TORALF , EPPLE ALEXANDER , WABRA NORBERT , BEDER SUSANNE , WEBER JOCHEN , FELDMANN HEIKO , SCHWAER BAERBEL , ROGALSKY OLAF , KAZI ARIF
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70891
摘要： A microlithographic projection exposure installation comprises a projection lens system (20), which projects an object (24) onto a focal plane (28) and which has a lens (L3) with a curved surface (S). A liquid or solid medium (34) is located in the projection lens system (20) and directly abuts against the curved surface (S) over an area that can be used for the projection of the object (24). The projection exposure installation also comprises an adjustable manipulator (M) for reducing a curvature of field that is caused by a heating of the medium (34) during the projection operation.
摘要翻译：微光刻投射曝光设备包括：一个投影透镜（20），该图像的对象（24）到图像平面（28）和具有弯曲表面（S）的透镜（L3）。在投影透镜（20）是液体或固体培养基（34），紧邻所述弯曲表面（S）在一定范围内作为用于所述对象（24）的成像。的投影曝光装置还包括一个可调节的操纵器（M），以减少的场曲，这是由投影操作期间介质（34）的加热而引起的。

2. 发明申请

WO2006125617A3 METHOD FOR IMPROVING THE IMAGING PROPERTIES OF A PROJECTION OBJECTIVE, AND SUCH A PROJECTION OBJECTIVE 审中-公开
标题翻译：改进投影目标成像特性的方法及其投影目标
公开(公告)号：WO2006125617A3
公开(公告)日：2007-04-26
申请号：PCT/EP2006004929
申请日：2006-05-24
申请人： ZEISS CARL SMT AG , CONRADI OLAF , FELDMANN HEIKO , RICHTER GERALD , BLEIDISTEL SASCHA , FROMMEYER ANDREAS , GRUNER TORALF , HUMMEL WOLFGANG
发明人： CONRADI OLAF , FELDMANN HEIKO , RICHTER GERALD , BLEIDISTEL SASCHA , FROMMEYER ANDREAS , GRUNER TORALF , HUMMEL WOLFGANG
IPC分类号： G03F7/20
CPC分类号： G02B27/0068 , G02B3/0081 , G02B26/0825 , G03F7/7015 , G03F7/70266 , G03F7/70558 , Y10S359/90
摘要： The invention relates to a method -for improving the imaging properties of a micro lithography projection objective (50) , wherein the projection objective has a plurality of lenses (Ll, L2, L3 , L4 , L5 , L6, L7, L8) between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.
摘要翻译：本发明涉及一种用于改善微光刻投影物镜（50）的成像特性的方法，其中投影物镜具有多个透镜（L1，L2，L3，L4，L5，L6，L7，L8）物镜平面和图像平面，多个透镜中的第一透镜被分配用于主动变形透镜的第一操纵器（ml，Mn），第一透镜被变形以至少部分地校正像差，至少一个第二透镜所述多个透镜还被分配至少一个第二操纵器，并且所述第二透镜除了所述第一透镜之外也变形。此外，描述了用于选择投影物镜的多个透镜中的至少一个透镜作为主动变形元件和投影物镜的方法。

3. 发明申请

WO2007025783A3 MICROLITHOGRAPHIC PROJECTION LIGHTING SYSTEM 审中-公开
标题翻译：微光刻投射曝光设备
公开(公告)号：WO2007025783A3
公开(公告)日：2007-05-10
申请号：PCT/EP2006008605
申请日：2006-09-04
申请人： ZEISS CARL SMT AG , KAMENOV VLADIMIR , KRAEHMER DANIEL , GRUNER TORALF , WEISSENRIEDER KARL-STEFAN , FELDMANN HEIKO , ZIRKEL ACHIM , PAZIDIS ALEXANDRA , THOME BRUNO , SIX STEPHAN
发明人： KAMENOV VLADIMIR , KRAEHMER DANIEL , GRUNER TORALF , WEISSENRIEDER KARL-STEFAN , FELDMANN HEIKO , ZIRKEL ACHIM , PAZIDIS ALEXANDRA , THOME BRUNO , SIX STEPHAN
IPC分类号： G03F7/20
CPC分类号： G02B1/11 , G03F7/70191 , G03F7/70308 , G03F7/70958
摘要： A microlithographic projection lighting system contains an optical element (36) that supports an antireflection coating (32) or a reflection coating in order to reduce or increase the reflectance. According to the invention, the antireflection coating is designed in such a manner that, over an angle of incident sector of 70°, the transmission coefficients of the antireflection coating for polarization states (42p 42s), which are orthogonal to one another, do not differ from one another by more than 10 %, preferably by no more than 3 %, and more preferably by no more than 1 %. The same applies to the reflection coefficients of the reflection coating. In order to correct for errors, which are caused by larger angular dependencies of the middle transmission or reflection coefficients and the effect upon the phase, the projection lighting system contains means (50) for homogenizing or distributing intensity, which are preferably placed in or in the vicinity of a field plane or pupil plane.
摘要翻译：微光刻投射曝光设备包括这有助于减少或抗反射涂层（32）和反射涂层的反射率的增加的光学元件（36）。根据本发明，Antiref法涂层被设计成使得在一定范围的70°远离的入射角，由不超过10％的Antire-柔性涂层相互正交的偏振态（42P 42S）的传输系数，优选不超过3％，更优选地，不超过1％，从彼此不同。这同样适用于反射涂层的反射系数。为了纠正错误，由平均传输或Ref和均质化的强度分布，其优选位于或靠近一个场或光瞳平面上引起含有该投射曝光系统的装置相（50）的效果的更大的角度依赖性lexionskoeffizienten 是。

4. 发明申请

WO2006077145A3 HOLOGRAM AND METHOD OF MANUFACTURING AN OPTICAL ELEMENT USING A HOLOGRAM 审中-公开
标题翻译：全息图及使用全息图制造光学元件的方法
公开(公告)号：WO2006077145A3
公开(公告)日：2006-09-21
申请号：PCT/EP2006000518
申请日：2006-01-20
申请人： ZEISS CARL SMT AG , HETZLER JOCHEN , BEDER SUSANNE , FELDMANN HEIKO
发明人： HETZLER JOCHEN , BEDER SUSANNE , FELDMANN HEIKO
IPC分类号： G01B9/021 , G01B11/24
CPC分类号： G01B9/021 , G01B9/02039 , G01B11/2441
摘要： A method of manufacturing an optical element (5) comprises testing an optical surface (3) of the optical element, using an interferometer Ia directing measuring light (23a) onto the optical surface wherein the measuring light traverses two successive holograms (44, 48) disposed in the beam path of the measuring light upstream of the optical surface.
摘要翻译：一种制造光学元件（5）的方法包括使用干涉仪1a测试光学元件的光学表面（3），干涉仪1a将测量光（23a）引导到光学表面上，其中测量光穿过两个连续的全息图（44,48）设置在光学表面上游的测量光束的光路中。

5. 发明申请

WO2009043790A3 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY 审中-公开
标题翻译：投影目标的微观算法
公开(公告)号：WO2009043790A3
公开(公告)日：2009-06-25
申请号：PCT/EP2008062835
申请日：2008-09-25
申请人： ZEISS CARL SMT AG , BEIERL HELMUT , FELDMANN HEIKO , HETZLER JOCHEN , TOTZECK MICHAEL
发明人： BEIERL HELMUT , FELDMANN HEIKO , HETZLER JOCHEN , TOTZECK MICHAEL
IPC分类号： G03F7/20 , G02B13/14
CPC分类号： G03F7/70341 , G02B1/02 , G02B21/33 , G03F7/70941
摘要： An assembly 11 of a projection objective for microlithography comprises a number of optical elements and an aperture 14. The optical element of the assembly 11 before the last optical element oriented towards the image is a planar convex lens 12, whose convex surface 2b is oriented towards the object, and whose planar surface 2a is oriented towards the image. As a last optical element of the assembly 11 oriented towards the image, an optical terminal element 17 is provided which comprises a planar plate 19. Between the planar surface 2b of the lens 12 and the planar plate 19 of the optical terminal element 17, thus at the object oriented surface of the planar plate, and also on the image oriented surface of the planar plate of the terminal element 17 a respective immersion liquid 13b or 13a is provided. The planar plate is thus in contact with the immersion liquids 13a and 13b on both sides. By this configuration it is assured that contaminations within the immersion liquid 13a disposed on the image oriented side do not impair the planar convex lens 12. Replacing the terminal element 17 or the planar plate 19 of the terminal element 17, however, is easily possible, as soon as their imaging properties become insufficient through contamination or other impairments.
摘要翻译：用于微光刻的投影物镜的组件11包括多个光学元件和孔14.在朝向图像定向的最后一个光学元件之前的组件11的光学元件是平面凸透镜12，其凸面2b朝向物体，其平面2a朝向图像。作为朝向图像的组件11的最后一个光学元件，提供了一个光学端子元件17，其包括平面板19.在透镜12的平面2b和光学端子元件17的平面板19之间，因此在平面板的物体取向表面以及端子元件17的平面板的图像取向表面上设置相应的浸液13b或13a。因此，平板与两侧的浸液13a，13b接触。通过这种结构，确保设置在图像取向侧的浸没液体13a内的污染物不会损害平面凸透镜12.然而，更换终端元件17的端子元件17或平板19是容易的，一旦它们的成像性质通过污染或其他损伤变得不足。

6. 发明申请

WO2006037444A3 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置
公开(公告)号：WO2006037444A3
公开(公告)日：2006-08-10
申请号：PCT/EP2005009966
申请日：2005-09-16
申请人： ZEISS CARL SMT AG , FELDMANN HEIKO , EPPLE ALEXANDER , BLAHNIK VLADAN
发明人： FELDMANN HEIKO , EPPLE ALEXANDER , BLAHNIK VLADAN
IPC分类号： G03F7/20
CPC分类号： G03F7/70258 , G03F7/70341
摘要： A microlithographic projection exposure apparatus contains a projection objective, whose last optical element on the image side is a dry terminating element (TE; TE2; TE3) that has no refractive power and is designed for dry operation of the projection objective (20; 220; 320). According to the invention, the projection exposure apparatus furthermore contains an immersion terminating element (TE'; TE2'; TE3') that has no refractive power and is designed for immersed operation of the projection objective. The immersion terminating element (TE'; TE2'; TE3') is replaceable with the dry terminating element (TE; TE2; TE3). Preferably, the dry terminating element (TE; TE2; TE3) and/or the immersion terminating element (TE'; TE2'; TE3') is composed of a plurality of plates (TP1, TP2; TP31', TP32'), which are made of materials having different refractive indices.
摘要翻译：微光刻投影曝光装置包括投影物镜，其投影物镜的最后一个光学元件是干燥的终端元件（TE; TE2; TE3），其不具有屈光力并被设计用于投影物镜（20; 220; 320）。根据本发明，投影曝光装置还包含没有屈光力的浸没终端元件（TE'; TE2'; TE3'），并被设计用于投影物镜的浸入操作。浸没端接元件（TE'; TE2'; TE3'）可以用干端接元件（TE; TE2; TE3）代替。优选地，干终端元件（TE; TE2; TE3）和/或浸没端接元件（TE'; TE2'; TE3'）由多个板（TP1，TP2; TP31'，TP32'）组成，其中由具有不同折射率的材料制成。

7. 发明申请

WO2006114294A2 ILLUMINATION SYSTEM FOR A MICROLITHGRAPHIC EXPOSURE APPARATUS 审中-公开
标题翻译：微波曝光装置照明系统
公开(公告)号：WO2006114294A2
公开(公告)日：2006-11-02
申请号：PCT/EP2006003864
申请日：2006-04-26
申请人： ZEISS CARL SMT AG , SOHMER ALEXANDER , DODOC AURELIAN , FELDMANN HEIKO , ULRICH WILHELM , FUERTER GERHARD , EGGER RAFAEL , MOEGELE ARTUR , RAUM MICHAEL
发明人： SOHMER ALEXANDER , DODOC AURELIAN , FELDMANN HEIKO , ULRICH WILHELM , FUERTER GERHARD , EGGER RAFAEL , MOEGELE ARTUR , RAUM MICHAEL
IPC分类号： G02B19/00
CPC分类号： G03F7/70075 , G02B17/0892 , G02B27/0043
摘要： An illumination system (12) of a microlithographic exposure apparatus (10) comprises a condenser (601; 602; 603; 604; 605; 606) for transforming a pupil plane (54) into a field plane (62) . The condenser has a lens group (L14, L15, L16, L17; L24, L25, L26, L27, L28; L34, L35, L36, L37; L44, L45, L46; L53, L54, L55) that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle (70) focused by the condenser (601; 602; 603; 604; 605) on an on-axis field point (72) converges within each lens of the lens group. At least one lens (L15, L16, L17; L25, L26; L34, L44, L45; L54) of the lens group has a concave surface. The illumination system may further comprise a field stop objective (66; 666, 666') that at least partly corrects a residual pupil aberration of the condenser (601; 602; 603; 604; 605; 606) .
摘要翻译：微光刻曝光设备（10）的照明系统（12）包括用于将光瞳平面（54）变换成场平面（62）的冷凝器（601; 602; 603; 604; 605; 606）。冷凝器具有透镜组（L14，L15，L16，L17; L24，L25，L26，L27，L28; L34，L35，L36，L37; L44，L45，L46; L53，L54，L55）连续镜头。这些透镜被布置为使得在轴上场点（72）上由聚光器（601; 602; 603; 604; 605）聚焦的光束（70）会聚在透镜组的每个透镜内。透镜组的至少一个透镜（L15，L16，L17; L25，L26; L34，L44，L45; L54）具有凹面。照明系统还可以包括至少部分校正冷凝器（601; 602; 603; 604; 605; 606）的残余光瞳像差的场停止物镜（66; 666,666'）。

8. 发明申请

WO2007131161A2 OPTICAL LENS SYSTEM 审中-公开
标题翻译：光学透镜系统
公开(公告)号：WO2007131161A2
公开(公告)日：2007-11-15
申请号：PCT/US2007068227
申请日：2007-05-04
申请人： ZEISS CARL SMT AG , SHAFER DAVID , DODOC AURELIAN , FELDMANN HEIKO , ZELLNER JOHANNES , ULRICH WILHELM , WALTER HOLGER , LOERING ULRICH , KRAEHMER DANIEL , GUERTER GERHARD
发明人： SHAFER DAVID , DODOC AURELIAN , FELDMANN HEIKO , ZELLNER JOHANNES , ULRICH WILHELM , WALTER HOLGER , LOERING ULRICH , KRAEHMER DANIEL , GUERTER GERHARD
CPC分类号： G02B13/143 , G02B13/26 , G03F7/70241
摘要： In general, in one aspect, the invention features a system that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in the projection objective are disclosed.
摘要翻译：通常，在一个方面，本发明的特征在于一种系统，其包括配置成在多个汞发射线处发射辐射的水银光源，被设置为接收由水银光源发射的辐射的投影物镜，以及被配置为定位晶片相对于投影物镜。在操作期间，投影物镜将来自光源的辐射引导到晶片，其中晶片处的辐射包括来自多于一个发射线的能量。公开了用于投影物镜的光学透镜系统。

9. 发明申请

WO2006029796A3 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置
公开(公告)号：WO2006029796A3
公开(公告)日：2006-08-03
申请号：PCT/EP2005009804
申请日：2005-09-13
申请人： ZEISS CARL SMT AG , BROTSACK MARKUS , DEGUENTHER MARKUS , ULRICH WILHELM , WIETZORREK JOACHIM , WANGLER JOHANNES , FELDMANN HEIKO , ZEILER ANDREAS
发明人： BROTSACK MARKUS , DEGUENTHER MARKUS , ULRICH WILHELM , WIETZORREK JOACHIM , WANGLER JOHANNES , FELDMANN HEIKO , ZEILER ANDREAS
IPC分类号： G03F7/20
CPC分类号： G03F7/70191
摘要： An illumination system (12) for a microlithographic projection exposure apparatus (10) comprises a masking device (36) and a masking objective (38; 138; 238) which projects the masking device (36) onto an image plane (18). The illumination system further includes an optical correction element (46; 34'; 146a, 146b; 242; 242a, 242b, 242c) having a surface (48; 44; 44'; 148a, 148b) that is either aspherically shaped or supports diffractive structures that have at least substantially the effect of an aspherical surface. This surface is arranged at least approximately in a field plane (40; 140) which precedes the image plane (18) of the masking objective The aspherically acting surface is designed such that a principal ray distribution generated by the illumination system (12; 112; 212) in the image plane matches a principal ray distribution required by a projection objective (16).
摘要翻译：用于微光刻投影曝光装置（10）的照明系统（12）包括将掩模装置（36）投影到图像平面（18）上的掩蔽装置（36）和掩蔽物镜（38; 138; 238）。所述照明系统还包括具有表面（48; 44; 44'; 148a，148b）的光学校正元件（46; 34'; 146a，146b; 242; 242a，242b，242c），所述表面是非球面形或支撑衍射具有至少基本上非球面表面效果的结构。该表面至少大致布置在掩模对象的图像平面（18）之前的场平面（40; 140）中。非球面作用表面被设计成使得由照明系统（12; 112; 在图像平面中匹配投影物镜（16）所需的主光线分布。

10. 发明专利

DE102008041991A1 Illuminating system for use in projection exposure system, has curved field generation module with optically active surfaces which are designed such that curved light-bundle is formed by stream deflection of incident light-bundle 未知
公开(公告)号：DE102008041991A1
公开(公告)日：2009-04-09
申请号：DE102008041991
申请日：2008-09-11
申请人： ZEISS CARL SMT AG
发明人： EPPLE ALEXANDER , FELDMANN HEIKO
IPC分类号： G03F7/20 , F21V5/00 , G02B27/09
摘要： The system (7) has a curved field generation module (15) with two optically active surfaces, which run steadily over an aperture along main extension direction, where the aperture is formed by the incident illumination light-bundle. The surfaces are designed such that a curved illumination light-bundle is formed by stream deflection of the incident illumination light-bundle. The field generation module comprises two optical components comprising optically operative surfaces, which run parallel to a bundle center stream (10). An independent claim is also included for a method for manufacturing a micro structured component with a projection exposure system.

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