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1. 发明申请

WO2009040011A3 HIGH APERTURE CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
标题翻译：高孔径预测目标
公开(公告)号：WO2009040011A3
公开(公告)日：2009-05-22
申请号：PCT/EP2008007631
申请日：2008-09-15
申请人： ZEISS CARL SMT AG , EPPLE ALEXANDER
发明人： EPPLE ALEXANDER
IPC分类号： G02B17/08 , G03F7/20
CPC分类号： G02B17/08 , G02B17/0892 , G03F7/70225 , G03F7/70341
摘要： A catadioptric projection objective has a plurality of optical elements arranged along an optical axis to image a pattern from an object field in an object surface of the objective to an image field in an image surface region of the objective at an image-side numerical aperture NA =1.35 with electromagnetic radiation defining an operating wavelength ?. The optical elements form a first objective part configured to image the pattern from the object surface into a first intermediate image, a second objective part configured to image the first intermediate image into a second intermediate image, the second objective part including a concave mirror having a reflective mirror surface positioned at or close to a pupil surface; and a third objective part configured to image the second intermediate image into the image surface. A first deflecting mirror is arranged to deflect radiation from the object surface towards the concave mirror, and a second deflecting mirror is arranged to deflect radiation from the concave mirror towards the image surface such that the image surface is parallel to the object surface. The projection objective has an immersion lens group having a convex object-side entry surface bounding at a gas or vacuum and an image-side exit surface in contact with an immersion liquid in operation. The immersion lens group is at least partly made of a high-index material with refractive index n = 1.6 at the operating wavelength.
摘要翻译：反折射投影物镜具有沿着光轴布置的多个光学元件，用于将物镜的物体表面中的物体的图案成像到图像侧数值孔径NA的物镜的图像表面区域中的图像场 = 1.35，其中电磁辐射限定了工作波长λ。所述光学元件形成第一物镜部分，被配置为将所述图案从所述物体表面成像为第一中间图像;第二物镜部分，被配置为将所述第一中间图像成像为第二中间图像，所述第二物镜部分包括凹面镜，位于或靠近瞳孔表面的反射镜表面; 以及构造成将所述第二中间图像成像到所述图像表面中的第三目标部分。第一偏转镜布置成将来自物体表面的辐射偏转到凹面镜，并且布置第二偏转镜以将来自凹面镜的辐射偏转到图像表面，使得图像表面平行于物体表面。投影物镜具有浸没透镜组，其具有在气体或真空下界定的凸面物体入射面和在操作中与浸没液体接触的像侧出射面。浸没透镜组至少部分地由在工作波长处的折射率n = 1.6的高折射率材料制成。

2. 发明申请

WO2008071274A1 KATADIOPTRISCHES OBJEKTIV 审中-公开
标题翻译：折反射物镜
公开(公告)号：WO2008071274A1
公开(公告)日：2008-06-19
申请号：PCT/EP2007/009659
申请日：2007-11-07
申请人： CARL ZEISS SMS GMBH , EPPLE, Alexander
发明人： EPPLE, Alexander
IPC分类号： G02B17/08
CPC分类号： G02B21/04 , G02B13/143 , G02B17/0816 , G02B17/0856
摘要： Es wird bereitgestellt ein katadioptrisches Objektiv (OB) mit einer ersten konvex gekrümmten Spiegelfläche (S1), einer zweiten konkav gekrümmten Spiegelfläche (S2), einer ersten Linse (L1 ) zwischen beiden Spiegelflächen (S1, S2) und mindestens einer weiteren Linse, wobei alle Linsen aus dem gleichen Material gebildet sind.
摘要翻译：本发明提供一种反射折射物镜，其具有第一凸出弯曲的反射镜表面（S1），第二凹曲面反射表面（S2），所述两个反射面（S1，S2）和至少一个另外的透镜之间的第一透镜（L1），其中所有的（OB）透镜由相同的材料形成。

3. 发明申请

WO2005111689A2 CATADIOPTRIC PROJECTION OBJECTIVE WITH INTERMEDIATE IMAGES 审中-公开
标题翻译：具有中间图像的目标投影
公开(公告)号：WO2005111689A2
公开(公告)日：2005-11-24
申请号：PCT/EP2005/005250
申请日：2005-05-13
申请人： CARL ZEISS SMT AG , DODOC, Aurelian , ULRICH, Wilhelm , EPPLE, Alexander
发明人： DODOC, Aurelian , ULRICH, Wilhelm , EPPLE, Alexander
IPC分类号： G02B17/08
CPC分类号： G03F7/70058 , G02B17/06 , G02B17/08 , G02B17/0804 , G02B17/0892 , G03F7/7015 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for imaging of a pattern, which is arranged on the object plane of the projection objective, on the image plane of the projection objective has a first objective part for imaging of an object field to form a first real intermediate image, a second objective part for production of a second real intermediate image using the radiation coming from the first objective part; and a third objective part for imaging of the second real intermediate image on the image plane. The second objective part is a catadioptric objective part with a concave mirror. A first folding mirror for deflection of the radiation coming from the object plane in the direction of the concave mirror and a second folding mirror for deflection of the radiation coming from the concave mirror in the direction of the image plane are provided. A field lens with a positive refractive power is arranged between the first intermediate image and/or the first folding mirror and the concave mirror, in an area close to the field of the first intermediate image.
摘要翻译：用于对投影物镜的物平面上配置的图案进行成像的反折射投射物镜具有用于对物场进行成像以形成第一实际中间图像的第一物镜部分，使用来自第一目标部分的辐射来生成第二实际中间图像的第二目标部分; 以及用于在图像平面上成像第二实际中间图像的第三目标部分。第二个目标部分是具有凹面镜的反射折射物镜部分。提供了用于使来自物体平面的辐射在凹面镜的方向上偏转的第一折叠镜和用于在像面方向偏转来自凹面镜的辐射的第二折叠镜。在第一中间图像和/或第一折叠镜和凹面镜之间，在靠近第一中间图像的场的区域内布置具有正屈光力的场透镜。

4. 发明申请

WO2005081068A3 IMAGING SYSTEM FOR A MICROLITHOGRAPHICAL PROJECTION LIGHT SYSTEM 审中-公开
标题翻译：微米级投影曝光设备的图解系统
公开(公告)号：WO2005081068A3
公开(公告)日：2005-11-10
申请号：PCT/EP2005000277
申请日：2005-01-13
申请人： ZEISS CARL SMT AG , GRUNER TORALF , EPPLE ALEXANDER , KNEER BERNHARD , WABRA NORBERT , BEDER SUSANNE , DORSEL ANDREAS
发明人： GRUNER TORALF , EPPLE ALEXANDER , KNEER BERNHARD , WABRA NORBERT , BEDER SUSANNE , DORSEL ANDREAS
IPC分类号： G03F7/20
CPC分类号： G03F7/70225 , G03F7/70241 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： The invention relates to an imaging system of a microlithographical projection light system, comprising a projection lens (200, 300, 500, 600) which is used to reproduce a mask which can be positioned on a lens plane on a light-sensitive layer which can be positioned on an image plane; and a fluid inlet (205) which is used to fill an intermediate chamber between the image plane and a final optical element (201, 309, 506) of the projection lens, with immersion liquid (202, 310, 507, 601), on the image plane. The final optical element of the projection lens on the image plane is arranged, in the direction of gravity, after the image plane and the projection lens is embodied in such a manner that the immersion fluid, in the immersion state, comprises a convex curve, in the direction oriented away from the image plane, at least in one area. According to the invention, the final optical element (201, 309, 506) of the projection lens on the image plane is arranged below the image plane in such a manner that the immersion fluid (202, 310, 507, 601) is at least partially arranged in an essentially dish-shaped area on the final optical element on the image plane. Said system can also comprises a rotator which is used to rotate a substrate comprising the light-sensitive layer (401) between a transport position, wherein the light-sensitive layer is arranged on a substrate surface disposed in the counter direction to the direction of gravity, and a position of exposure, wherein the light-sensitive layer (401) is arranged on a substrate surface disposed in the direction of gravity.
摘要翻译：具有用于在光敏感层的图像平面上的定位在物平面掩模成像可定位的投影透镜（200，300，500，600）的微光刻投射曝光设备的成像系统; 和用于填充所述投射物镜的像平面和图像平面侧最后的光学元件（201，309，506）之间的间隙与浸没液体（202，310，507，601）的液体供给（205）; 其中投影透镜的图像平面侧最后一个光学元件沿像平面在重力方向上布置; 并且其中所述投影透镜被设计成使得在浸没模式中，所述浸没液体在远离所述像平面的方向上至少部分地凸出地弯曲。还可以预期的是，投影透镜的像面侧最后的光学元件（201，309，506）设置在图像平面下方，使得浸没液体（202，310，507，601）至少部分地基于所述像面侧的大致槽形区域部分地最后一个光学元件被安排。用于旋转具有输送方向之间的衬底的感光层（401）旋转器罐，被布置在位于一个相对的衬底表面的重力方向上的感光层，和一个曝光取向，其中在重力的方向上的感光层（401）可以设置平躺的基板表面。

5. 发明申请

WO2005096098A2 PROJECTION OBJECTIVE, PROJECTION EXPOSURE APPARATUS AND REFLECTIVE RETICLE FOR MICROLITHOGRAPHY 审中-公开
标题翻译：投影目标，投影曝光装置和反射镜
公开(公告)号：WO2005096098A2
公开(公告)日：2005-10-13
申请号：PCT/EP2005/002898
申请日：2005-03-18
申请人： CARL ZEISS SMT AG , DODOC, Aurelian , ULRICH, Wilhelm , BADER, Dieter , EPPLE, Alexander
发明人： DODOC, Aurelian , ULRICH, Wilhelm , BADER, Dieter , EPPLE, Alexander
IPC分类号： G03F
CPC分类号： G03F7/70291 , G03F7/70225 , G03F7/70283
摘要： A projection objective for microlithography serves for imaging a pattern of a mask arranged in its object surface into an image field arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an imageside numerical aperture NA > 0.85 and a demagnifying imaging scale where |b|
摘要翻译：用于微光刻的投影物镜用于将布置在其物体表面中的掩模的图案成像成具有缩小的成像刻度的布置在其图像表面中的图像场。它具有沿着投影物镜的光轴布置的多个光学元件，光学元件被设计和布置成使得投影物镜具有图像数值孔径NA> 0.85和缩小成像刻度，其中|| b | | <0.05，并且具有适合于大于1mm的微光刻的最小图像场直径的平面图像场。

6. 发明申请

WO2003052462A3 CATADIOPTRIC REDUCTION LENS 审中-公开
公开(公告)号：WO2003052462A3
公开(公告)日：2003-06-26
申请号：PCT/EP2002/013887
申请日：2002-12-07
申请人： CARL ZEISS SMT AG , SHAFER, David, R. , EPPLE, Alexander
发明人： SHAFER, David, R. , EPPLE, Alexander
IPC分类号： G02B17/08
摘要： A catadioptric projection lens for imaging a pattern arranged in an object plane onto an image plane while creating a real intermediate image, having a catadioptric first lens section having a concave mirror and a beam-deflection device, as well as a dioptric second lens section that follows the catadioptric lens section, between its object plane and image plane. The beam-deflection device has a first reflective surface for deflecting radiation coming from the object plane to the concave mirror. Positive refractive power is arranged following the first reflective surface, between the latter and the concave mirror, within an optical near-field of the object plane, within which the height of the principal ray of the outermost field point of radiation coming from the object exceeds the marginal-ray height. The intermediate image lies well ahead of a second reflective surface that is provided for the purpose of allowing arranging the object plane and image plane such that they will be parallel to one another. A lens is provided between the intermediate image and second reflective surface.

7. 发明申请

WO2008019803A1 CATADIOPTRIC PROJECTION OBJECTIVE WITH PUPIL MIRROR. PROJECTION EXPOSURE APPARATUS AND METHOD 审中-公开
标题翻译：目标与PUPIL镜像的目标投影。投影曝光装置和方法
公开(公告)号：WO2008019803A1
公开(公告)日：2008-02-21
申请号：PCT/EP2007/007093
申请日：2007-08-10
申请人： CARL ZEISS SMT AG , EPPLE, Alexander
发明人： EPPLE, Alexander
IPC分类号： G03F7/20
CPC分类号： G03F7/70225 , G03F7/70266 , G03F7/70275
摘要： A catadioptric projection objective (100) for imaging a pattern from an object field (07) arranged in an object surface (05) of the projection objective (100) onto an image field (IF) arranged in an image surface (IS) of the projection objective has a first objective part (LG1) configured to image the pattern from the object surface into a first intermediate image (IMI1), and having a first pupil surface (P1), a second objective part (HG) configured to image the first intermediate image (IMI1) into a second intermediate image (IMI2), and having a second pupil surface (P2) optically conjugate to the first pupil surface (P1), and a third objective part (LG2, LG3, LG4) configured to image the second intermediate image (IMI2) into the image surface (IS), and having a third pupil surface (P3) optically conjugate to the first and second pupil surface. A pupil mirror (113) having a reflective pupil mirror surface positioned at or dose to one of the first, second and third pupil surface. A pupil mirror manipulator operatively connected to the pupil mirror (113) and configured to vary the shape of the reflective surface of the pupil mirror allows for dynamically correcting imaging aberrations originating from lens heating, compaction and other radiation induced imaging aberrations occurring during Operation of the projection objective.
摘要翻译：一种用于将布置在投影物镜（100）的物体表面（05）中的物体场（07）上的图案成像到布置在所述投影物镜（100）的图像表面（IS）中的图像场（IF）上的图形的反射折射投影物镜（100）投影物镜具有第一目标部分（LG1），其被配置为将图案从物体表面成像为第一中间图像（IMI1），并且具有第一光瞳表面（P1），第二目标部分（HG）中间图像（IMI1）转换成第二中间图像（IMI2），并且具有与第一光瞳表面（P1）光学共轭的第二光瞳表面（P2）;以及第三目标部分（LG2，LG3，LG4）第二中间图像（IMI2）进入图像表面（IS），并且具有与第一和第二光瞳表面光学共轭的第三光瞳表面（P3）。具有位于第一，第二和第三光瞳表面之一或剂量的反射瞳孔镜表面的瞳孔镜（113）。可操作地连接到瞳孔反射镜（113）并且被配置为改变瞳孔反射镜的形状的瞳孔镜操纵器允许动态地校正源自镜片加热，压实和其他辐射诱导的成像像差的成像像差投影目标。

8. 发明申请

WO2006128613A1 MICROLITHOGRAPHY PROJECTION OBJECTIVE 审中-公开
标题翻译：微观投影目标
公开(公告)号：WO2006128613A1
公开(公告)日：2006-12-07
申请号：PCT/EP2006/004876
申请日：2006-05-23
申请人： CARL ZEISS SMT AG , KALLER, Julian , DODOC, Aurelian , FELDMANN, Heiko , KAMENOV, Vladimir , EPPLE, Alexander
发明人： KALLER, Julian , DODOC, Aurelian , FELDMANN, Heiko , KAMENOV, Vladimir , EPPLE, Alexander
IPC分类号： G03F7/20
CPC分类号： G03F7/70225 , G02B17/08 , G03F7/702 , G03F7/70283 , G03F7/70941
摘要： Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
摘要翻译：关于在这样的投影物镜中抑制假光，描述用于成像到平面中的布置在物体平面中的图案的微光刻投影物镜。

9. 发明申请

WO2005098506A1 CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
标题翻译：目标投影目标
公开(公告)号：WO2005098506A1
公开(公告)日：2005-10-20
申请号：PCT/EP2005/003646
申请日：2005-04-07
申请人： CARL ZEISS SMT AG , EPPLE, Alexander
发明人： EPPLE, Alexander
IPC分类号： G02B17/08
CPC分类号： G02B17/0804 , G02B17/0808 , G02B17/0812 , G02B17/0816 , G02B17/0836 , G02B17/0844 , G02B17/0848 , G02B17/086 , G02B17/0892 , G03F7/70058 , G03F7/70225 , G03F7/70275 , G03F7/70341
摘要： A catadioptric projection objective for imaging an off-axis effective object field arranged in an object surface of the projection objective onto an off-axis effective image field arranged in an image surface of the projection objective has: an optical axis; an effective object field situated entirely outside the optical axis and having a length A in a first direction and a width B in a second direction perpendicular to the first direction such that a circular area of minimum size enclosing the effective object field de-fines a radius R EOF of the effective object field according to: (I); and a circular design object field centered around the optical axis having a design object field radius R DOF , where the pro-jection objective is essentially corrected with respect to image aberra-tions in zones having radial coordinates smaller than R DOF and wherein the projection objective is not fully corrected in zones having radial coor-dinates larger than RDOF. The conditions: R DOF = γ R EOF and 1 γ 1 are possible with a compact design. Arcuate effective object fields are preferably used.
摘要翻译：用于将布置在投影物镜的物体表面中的离轴有效物体场成像到布置在投影物镜的图像表面中的离轴有效像场的反射折射投影物镜具有：光轴; 完全位于光轴外侧并且具有第一方向上的长度A和垂直于第一方向的第二方向上的宽度B的有效对象场，使得围绕有效对象场的最小尺寸的圆形区域减小半径有效对象场的REOF：（I）; 以及围绕具有设计对象场半径RDOF的光轴为中心的圆形设计对象场，其中，对于具有径向坐标小于RDOF的区域中的图像像差，基本上校正预测目标，并且其中投影物镜不是在具有大于RDOF的径向加工区域的区域中完全校正。条件：满足RDOF = gamma REOF和1 1是可能的紧凑的设计。优选使用弧形有效对象字段。

10. 发明申请

WO2005081068A2 ABBILDUNGSSYSTEM FÜR EINE MIKROLITHOGRAPHISCHE PROJEKTIONSBELICHTUNGSANLAGE 审中-公开
标题翻译： PICTURE SYSTEM FOR A微光刻投射曝光设备
公开(公告)号：WO2005081068A2
公开(公告)日：2005-09-01
申请号：PCT/EP2005/000277
申请日：2005-01-13
申请人： CARL ZEISS SMT AG , GRUNER, Toralf , EPPLE, Alexander , KNEER, Bernhard , WABRA, Norbert , BEDER, Susanne , DORSEL, Andreas
发明人： GRUNER, Toralf , EPPLE, Alexander , KNEER, Bernhard , WABRA, Norbert , BEDER, Susanne , DORSEL, Andreas
IPC分类号： G03F7/20
CPC分类号： G03F7/70225 , G03F7/70241 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： Abbildungssystem einer mikrolithographischen Projektionsbelichtungsanlage, mit einem Projektionsobjektiv (200, 300, 500, 600) zur Abbildung einer in einer Objektebene positionierbaren Maske auf eine in einer Bildebene positionierbare lichtempfindliche Schicht; und einer Flüssigkeitszufuhr (205) zum Füllen eines Zwischenraums zwischen der Bildebene und einem bildebenenseitig letzten optischen Element (201, 309, 506) des Projektionsobjektivs mit Immersionsflüssigkeit (202, 310, 507, 601); wobei das bildebenenseitig letzte optische Element des Projektionsobjektivs in Schwerkraftrichtung nachfolgend zur Bildebene angeordnet ist; und wobei das Projektionsobjektiv derart ausgelegt ist, dass im Immersionsbetrieb die Immersionsflüssigkeit in zur Bildebene abgewandter Richtung wenigstens bereichsweise konvex gekrümmt ist. Es wird auch vorgesehen, dass das bildebenenseitig letzte optische Element (201, 309, 506) des Projektionsobjektivs unter der Bildebene derart angeordnet ist, dass die Immersionsflüssigkeit (202, 310, 507, 601) zumindest teilweise in einem im wesentlichen wannenförmigen Bereich auf dem bildebenenseitig letzten optischen Element angeordnet wird. Auch kann ein Rotator zum Drehen eines die lichtempfindliche Schicht (401) aufweisenden Substrats zwischen einer Transportorientierung, in der die lichtempfindliche Schicht auf einer entgegengesetzt zur Schwerkraftrichtung liegenden Substratoberfläche angeordnet ist, und einer Belichtungsorientierung, in welcher die lichtempfindliche Schicht (401) auf einer in Schwerkraftrichtung liegenden Substratoberfläche angeordnet ist, vorgesehen sein.
摘要翻译：具有用于在光敏感层的图像平面上的定位在物平面掩模成像可定位的投影透镜（200，300，500，600）的微光刻投射曝光设备的成像系统; 和用于填充所述投射物镜的像平面和图像平面侧最后的光学元件（201，309，506）之间的间隙与浸没液体（202，310，507，601）的液体供给（205）; 其中所述投射物镜的像面侧最后光学元件被布置在图像平面下方的重力方向; 并且其中，所述投射物镜被设计成使得在浸液操作中，浸没液体在背离图像面方向至少部分地凸形弯曲远离。还可以预期的是，投影透镜的像面侧最后的光学元件（201，309，506）设置在图像平面下方，使得浸没液体（202，310，507，601）至少部分地基于所述像面侧的大致槽形区域部分地最后的光学元件被布置。用于旋转具有输送方向之间的衬底的感光层（401）旋转器罐，被布置在位于一个相对的衬底表面的重力方向上的感光层，和一个曝光取向，其中在重力的方向上的感光层（401）布置，可以提供下面的基底表面。

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