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1. 发明申请

WO2006037444A3 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置
公开(公告)号：WO2006037444A3
公开(公告)日：2006-08-10
申请号：PCT/EP2005009966
申请日：2005-09-16
申请人： ZEISS CARL SMT AG , FELDMANN HEIKO , EPPLE ALEXANDER , BLAHNIK VLADAN
发明人： FELDMANN HEIKO , EPPLE ALEXANDER , BLAHNIK VLADAN
IPC分类号： G03F7/20
CPC分类号： G03F7/70258 , G03F7/70341
摘要： A microlithographic projection exposure apparatus contains a projection objective, whose last optical element on the image side is a dry terminating element (TE; TE2; TE3) that has no refractive power and is designed for dry operation of the projection objective (20; 220; 320). According to the invention, the projection exposure apparatus furthermore contains an immersion terminating element (TE'; TE2'; TE3') that has no refractive power and is designed for immersed operation of the projection objective. The immersion terminating element (TE'; TE2'; TE3') is replaceable with the dry terminating element (TE; TE2; TE3). Preferably, the dry terminating element (TE; TE2; TE3) and/or the immersion terminating element (TE'; TE2'; TE3') is composed of a plurality of plates (TP1, TP2; TP31', TP32'), which are made of materials having different refractive indices.
摘要翻译：微光刻投影曝光装置包括投影物镜，其投影物镜的最后一个光学元件是干燥的终端元件（TE; TE2; TE3），其不具有屈光力并被设计用于投影物镜（20; 220; 320）。根据本发明，投影曝光装置还包含没有屈光力的浸没终端元件（TE'; TE2'; TE3'），并被设计用于投影物镜的浸入操作。浸没端接元件（TE'; TE2'; TE3'）可以用干端接元件（TE; TE2; TE3）代替。优选地，干终端元件（TE; TE2; TE3）和/或浸没端接元件（TE'; TE2'; TE3'）由多个板（TP1，TP2; TP31'，TP32'）组成，其中由具有不同折射率的材料制成。

2. 发明申请

WO2009063002A1 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置的照明系统
公开(公告)号：WO2009063002A1
公开(公告)日：2009-05-22
申请号：PCT/EP2008/065462
申请日：2008-11-13
申请人： CARL ZEISS SMT AG , FIOLKA, Damian , BLAHNIK, Vladan
发明人： FIOLKA, Damian , BLAHNIK, Vladan
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70091 , G03F7/70566
摘要： The invention concerns an illumination system of a microlithographic projection exposure apparatus, wherein the illumination system (200, 700) in operation of the projection exposure apparatus illuminates an object plane (OP) of a projection objective (40) of the projection exposure apparatus, and wherein the illumination system (200, 700) is so adapted that light components (10, 20) in point-symmetrical relationship with each other, which are produced in operation of the illumination system and which are only superposed in the object plane (OP) have mutually orthogonal polarization states.
摘要翻译：本发明涉及一种微光刻投影曝光装置的照明系统，其中投影曝光装置的操作中的照明系统（200,700）照亮投影曝光装置的投影物镜（40）的物平面（OP），以及其中所述照明系统（200,700）适于使得在所述照明系统的操作中产生且仅重叠在所述物平面（OP）中的点对称关系的光分量（10,20）具有相互正交的极化状态。

3. 发明申请

WO2006133800A1 LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE DEFECTS OF THE SAME 审中-公开
标题翻译：图像投影目标和校正其图像缺陷的方法
公开(公告)号：WO2006133800A1
公开(公告)日：2006-12-21
申请号：PCT/EP2006/005059
申请日：2006-05-26
申请人： CARL ZEISS SMT AG , LÖRING, Ulrich , BLAHNIK, Vladan , ULRICH, Wilhelm , KRÄHMER, Daniel , WABRA, Norbert
发明人： LÖRING, Ulrich , BLAHNIK, Vladan , ULRICH, Wilhelm , KRÄHMER, Daniel , WABRA, Norbert
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/7015
摘要： A lithography projection objective for imaging a pattern to be arranged in an object plane of the projection objective onto a substrate to be arranged in an image plane of the projection objective comprises a multiplicity of optical elements that are arranged along an optical axis of the projection objective. The optical elements comprise a first group (18) , following the object plane (13) , of optical elements, and a last optical element (20) , which follows the first group and is next to the image plane (15) and which defines an exit surface of the projection objective and is arranged at a working distance from the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. A positioning device is provided that positions at least the last optical element during immersion operation such that aberrations induced by disturbance are at least partially compensated.
摘要翻译：用于将要布置在投影物镜的物平面中的图案成像到要布置在投影物镜的像平面中的基板上的光刻投影物镜包括沿着投影物镜的光轴布置的多个光学元件。光学元件包括跟随物体平面（13）的光学元件的第一组（18），以及最后的光学元件（20），其位于第一组之后且邻近图像平面（15）并且限定投影物镜的出射表面并且设置在距离像平面的工作距离处。投影物镜相对于像差是可调谐的或调谐的，在最后的光学元件和图像平面之间的体积由折射率基本上大于1的浸没介质填充的情况下。提供了至少位置的定位装置在浸没操作期间的最后一个光学元件，使得由干扰引起的像差被至少部分补偿。

4. 发明申请

WO2006037444A2 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微型投影曝光装置
公开(公告)号：WO2006037444A2
公开(公告)日：2006-04-13
申请号：PCT/EP2005/009966
申请日：2005-09-16
申请人： CARL-ZEISS SMT AG , FELDMANN, Heiko , EPPLE, Alexander , BLAHNIK, Vladan
发明人： FELDMANN, Heiko , EPPLE, Alexander , BLAHNIK, Vladan
IPC分类号： G03F7/20
CPC分类号： G03F7/70258 , G03F7/70341
摘要： A microlithographic projection exposure apparatus contains a projection objective, whose last optical element on the image side is a dry terminating element (TE; TE2; TE3) that has no refractive power and is designed for dry operation of the projection objective (20; 220; 320). According to the invention, the projection exposure apparatus furthermore contains an immersion terminating element (TE’; TE2’; TE3’) that has no refractive power and is designed for immersed operation of the projection objective. The immersion terminating element (TE’; TE2’; TE3’) is replaceable with the dry terminating element (TE; TE2; TE3). Preferably, the dry terminating element (TE; TE2; TE3) and/or the immersion terminating element (TE’; TE2’; TE3’) is composed of a plurality of plates (TP1, TP2; TP31’, TP32’), which are made of materials having different refractive indices.
摘要翻译：微光刻投影曝光设备包含投影物镜，其图像侧的最后一个光学元件是没有折射光焦度的干式终端元件（TE; TE2; TE3），并被设计用于投影物镜（20; 220; 320）。根据本发明，投影曝光设备还包含不具有屈光力且设计用于投影物镜的浸入式操作的浸没式终端元件（TE'; TE2'; TE3'）。浸入式终端元件（TE'; TE2'; TE3'）可以用干式终端元件（TE; TE2; TE3）代替。优选地，干终端元件（TE; TE2; TE3）和/或浸没终端元件（TE'; TE2'; TE3'）由多个板（TP1，TP2; TP31'，TP32'）组成，由具有不同折射率的材料制成。

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