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1. 发明申请

WO2007141185A2 HOMOGENIZER WITH REDUCED INTERFERENCE 审中-公开
标题翻译：均质机减少干扰
公开(公告)号：WO2007141185A2
公开(公告)日：2007-12-13
申请号：PCT/EP2007/055323
申请日：2007-05-31
申请人： CARL ZEISS LASER OPTICS GMBH , EGGER, Rafael , MÜNZ, Holger
发明人： EGGER, Rafael , MÜNZ, Holger
IPC分类号： G02B27/48 , G02B27/09 , H01S3/00 , B23K26/06
CPC分类号： B23K26/0604 , B23K26/0613 , G02B27/0927 , G02B27/0961 , G03F7/70583 , H01S3/005
摘要： The invention relates to a method for creating a target intensity distribution (20) in a target field (3) from a first input light beam (4) propagating in a first propagation direction and a second input light beam (5), whereby said first input light beam (4) and said second input light beam (5) entering a light entrance surface (6a, 6b) of a cylindrical lens array (1a) of a homogenizer. According to the invention said second input light beam (5) propagates in a second propagation direction differing from said first propagation direction. The invention further relates to an optical system for creating a target intensity distribution (20) in a target field (3) comprising: a first light source for generating a first input light beam (4) and a second light source for generating a second input light beam (5), or a single light source for generating a light beam and a beam splitter for splitting said light beam into said first input light beam and said second input light beam, a first directing device for directing said first input light beam (4) to propagate in a first propagation direction and a ho mogenizer having a cylindrical lens array (1a) with a light entrance surface (6a, 6b) for being entered by said first input light beam (4) and said second input light beam (5). According to the invention there exists a second directing device for directing said second input light beam (5) propagating in a second propagation direction differing from said first propagation direction when entering said light entrance surface (6a, 6b).
摘要翻译：本发明涉及一种用于在从第一传播方向传播的第一输入光束（4）和第二输入光束（5）中产生目标场（3）中的目标强度分布（20）的方法，其中所述第一输入光束（4）和所述第二输入光束（5）进入均质器的柱面透镜阵列（1a）的光入射表面（6a，6b）。根据本发明，所述第二输入光束（5）沿与第一传播方向不同的第二传播方向传播。本发明还涉及一种用于在目标场（3）中产生目标强度分布（20）的光学系统，包括：第一光源，用于产生第一输入光束（4）和第二光源，用于产生第二输入光束（5）或用于产生光束的单个光源和用于将所述光束分成所述第一输入光束和所述第二输入光束的分束器，用于引导所述第一输入光束（ 4）在第一传播方向上传播，具有柱面透镜阵列（1a）的具有光入射表面（6a，6b）的霍尔发生器由所述第一输入光束（4）和所述第二输入光束（ 5）。根据本发明，当进入所述光入射表面（6a，6b）时，存在用于引导在与所述第一传播方向不同的第二传播方向上传播的所述第二输入光束（5）的第二引导装置。

2. 发明申请

WO2006114294A3 ILLUMINATION SYSTEM FOR A MICROLITHGRAPHIC EXPOSURE APPARATUS 审中-公开
公开(公告)号：WO2006114294A3
公开(公告)日：2006-11-02
申请号：PCT/EP2006/003864
申请日：2006-04-26
申请人： CARL ZEISS SMT AG , SOHMER, Alexander , DODOC, Aurelian , FELDMANN, Heiko , ULRICH, Wilhelm , FÜRTER, Gerhard , EGGER, Rafael , MÖGELE, Artur , RAUM, Michael
发明人： SOHMER, Alexander , DODOC, Aurelian , FELDMANN, Heiko , ULRICH, Wilhelm , FÜRTER, Gerhard , EGGER, Rafael , MÖGELE, Artur , RAUM, Michael
IPC分类号： G02B19/00 , G02B13/14 , G03F7/20
摘要： An illumination system (12) of a microlithographic exposure apparatus (10) comprises a condenser (601; 602; 603; 604; 605; 606) for transforming a pupil plane (54) into a field plane (62) . The condenser has a lens group (L14, L15, L16, L17; L24, L25, L26, L27, L28; L34, L35, L36, L37; L44, L45, L46; L53, L54, L55) that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle (70) focused by the condenser (601; 602; 603; 604; 605) on an on-axis field point (72) converges within each lens of the lens group. At least one lens (L15, L16, L17; L25, L26; L34, L44, L45; L54) of the lens group has a concave surface. The illumination system may further comprise a field stop objective (66; 666, 666') that at least partly corrects a residual pupil aberration of the condenser (601; 602; 603; 604; 605; 606).

3. 发明申请

WO2007048507A1 BEAM SEPARATING OPTICAL ELEMENT 审中-公开
标题翻译：光束分离光学元件
公开(公告)号：WO2007048507A1
公开(公告)日：2007-05-03
申请号：PCT/EP2006/009852
申请日：2006-10-12
申请人： CARL ZEISS LASER OPTICS GMBH , LE MAIRE, Michel , TRITSCHLER, Thorsten , SHKLOVER, Vitaly , MÜNZ, Holger , EGGER, Rafael , DERST, Gerhard
发明人： LE MAIRE, Michel , TRITSCHLER, Thorsten , SHKLOVER, Vitaly , MÜNZ, Holger , EGGER, Rafael , DERST, Gerhard
IPC分类号： G02B27/09
CPC分类号： G02B27/0905 , B23K26/066 , G02B27/0972 , G02B27/0977 , G02B27/0988
摘要： The invention relates to a beam seperating optical element (26) for limiting an illuminating field of an incident optical beam (24) comprising: a first surface (28) and a second surface (30), said first surface and said second surface enclosing an angle and forming an edge (32), said edge spatially separating said incident optical beam into at least two sub-beam (34, 36), and having a deviation from a predetermined shape of not more than 20 µm/m length.
摘要翻译：本发明涉及一种用于限制入射光束（24）的照明场的光束分离光学元件（26），包括：第一表面（28）和第二表面（30），所述第一表面和所述第二表面包围并且形成边缘（32），所述边缘将所述入射光束空间上分离成至少两个子光束（34,36），并且具有与不大于20μm/ m长的预定形状的偏差。

4. 发明申请

WO2006114294A2 ILLUMINATION SYSTEM FOR A MICROLITHGRAPHIC EXPOSURE APPARATUS 审中-公开
标题翻译：微波曝光装置照明系统
公开(公告)号：WO2006114294A2
公开(公告)日：2006-11-02
申请号：PCT/EP2006003864
申请日：2006-04-26
申请人： ZEISS CARL SMT AG , SOHMER ALEXANDER , DODOC AURELIAN , FELDMANN HEIKO , ULRICH WILHELM , FUERTER GERHARD , EGGER RAFAEL , MOEGELE ARTUR , RAUM MICHAEL
发明人： SOHMER ALEXANDER , DODOC AURELIAN , FELDMANN HEIKO , ULRICH WILHELM , FUERTER GERHARD , EGGER RAFAEL , MOEGELE ARTUR , RAUM MICHAEL
IPC分类号： G02B19/00
CPC分类号： G03F7/70075 , G02B17/0892 , G02B27/0043
摘要： An illumination system (12) of a microlithographic exposure apparatus (10) comprises a condenser (601; 602; 603; 604; 605; 606) for transforming a pupil plane (54) into a field plane (62) . The condenser has a lens group (L14, L15, L16, L17; L24, L25, L26, L27, L28; L34, L35, L36, L37; L44, L45, L46; L53, L54, L55) that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle (70) focused by the condenser (601; 602; 603; 604; 605) on an on-axis field point (72) converges within each lens of the lens group. At least one lens (L15, L16, L17; L25, L26; L34, L44, L45; L54) of the lens group has a concave surface. The illumination system may further comprise a field stop objective (66; 666, 666') that at least partly corrects a residual pupil aberration of the condenser (601; 602; 603; 604; 605; 606) .
摘要翻译：微光刻曝光设备（10）的照明系统（12）包括用于将光瞳平面（54）变换成场平面（62）的冷凝器（601; 602; 603; 604; 605; 606）。冷凝器具有透镜组（L14，L15，L16，L17; L24，L25，L26，L27，L28; L34，L35，L36，L37; L44，L45，L46; L53，L54，L55）连续镜头。这些透镜被布置为使得在轴上场点（72）上由聚光器（601; 602; 603; 604; 605）聚焦的光束（70）会聚在透镜组的每个透镜内。透镜组的至少一个透镜（L15，L16，L17; L25，L26; L34，L44，L45; L54）具有凹面。照明系统还可以包括至少部分校正冷凝器（601; 602; 603; 604; 605; 606）的残余光瞳像差的场停止物镜（66; 666,666'）。

5. 发明申请

WO2006021419A2 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC EXPOSURE APPARATUS 审中-公开
标题翻译：微型曝光设备的照明系统
公开(公告)号：WO2006021419A2
公开(公告)日：2006-03-02
申请号：PCT/EP2005/009093
申请日：2005-08-23
申请人： CARL ZEISS SMT AG , SINGER, Wolfgang , WANGLER, Johannes , EGGER, Rafael , ULRICH, Wilhelm
发明人： SINGER, Wolfgang , WANGLER, Johannes , EGGER, Rafael , ULRICH, Wilhelm
CPC分类号： G03F7/70108 , G03F7/70183
摘要： An illumination system of a microlithographic exposure apparatus (PEA) has an optical axis (OA) and a beam transforming device (20; 120; 220; 320; 420; 520; 1020; 1120; 1220; 1320; 1420; 1520). This device comprises a first mirror (122; 222; 322; 422; 522; 1122; 1222; 1322; 1422; 1522) with a first reflective surface (124; 224; 424; 524; 1124; 1224) having a shape that is defined by rotating a straight line, which is inclined with respect to the optical axis (OA), around the optical axis (OA). The device further comprises a second mirror (126, 126a, 126b; 226a, 226b; 326a, 326b; 426a; 426b; 526; 1126; 1226; 1326a, 1326b; 1426a, 1426b; 1526a, 1526b) with a second reflective surface (130, 130a, 130b; 1130) having a shape that is defined by rotating a curved line around the optical axis (OA). At least one of the mirrors has a central aperture (128) containing the optical axis (OA). This device may form a zoom-collimator (1020; 1120; 1220; 1320; 1420; 1520) for an EUV illumination system that transforms a diverging light bundle into a collimated light bundle of variable shape and/or diameter.
摘要翻译：微光刻曝光装置（PEA）的照明系统具有光轴（OA）和光束转换装置（20; 120; 220; 320; 420; 520; 1020; 1120; 1220; 1220）。 1320; 1420; 1520）。该装置包括具有第一反射表面（124; 224; 424; 524; 1124; 1224）的第一反射镜（122; 222; 322; 422; 522; 1122; 1222; 1322; 1422; 1522）通过围绕光轴（OA）旋转相对于光轴（OA）倾斜的直线来限定。该装置还包括具有第二反射表面（126,126a，126b; 226a，226b; 326a，326b; 426a; 426b; 526; 1126; 1226; 1326a，1326b; 1426a，1426b; 1526a，1526b）具有通过围绕所述光轴（OA）旋转曲线而限定的形状的光源（130,130a，130b; 1130）。至少一个反射镜具有包含光轴（OA）的中心孔（128）。该设备可以形成用于EUV照明系统的变焦准直仪（1020; 1120; 1220; 1320; 1420; 1520），该EUV照明系统将发散光束变换成可变形状和/或直径的准直光束。

6. 发明申请

WO2008155224A1 ILLUMINATION SYSTEM 审中-公开
标题翻译：照明系统
公开(公告)号：WO2008155224A1
公开(公告)日：2008-12-24
申请号：PCT/EP2008/056951
申请日：2008-06-05
申请人： CARL ZEISS LASER OPTICS GmbH , EGGER, Rafael
发明人： EGGER, Rafael
IPC分类号： G02B27/09 , B23K26/073
CPC分类号： B23K26/0738 , G02B13/08 , G02B27/0966
摘要： An integrated ground fault detection circuit in accordance with an embodiment of the present application includes a shunt resistor provided on a positive rail of a DC bus, a high voltage pocket including a sensory circuit connected to the shunt resistor and operable to detect a fault condition indicating a short circuit and a transmitter section operable to continuously transmit a fault condition signal indicating the fault condition and a low voltage pocket including a receiver operable to receive the fault condition signal from the sensory circuit and a logic unit, connected to the receiver, and operable to provide a fault output signal indicating the presence of a fault condition based on the fault condition signal.
摘要翻译：根据本申请的实施例的集成接地故障检测电路包括设置在DC总线的正极上的分流电阻器，包括连接到分流电阻器的感觉电路的高压口袋，并且可操作以检测指示短路和发送器部分，其可操作以连续发送指示故障状况的故障状态信号;以及低压口袋，包括可接收来自感觉电路的故障状态信号的接收器和连接到接收器的逻辑单元，并且可操作基于故障状态信号提供指示存在故障状况的故障输出信号。

7. 发明申请

WO2007141185A3 HOMOGENIZER WITH REDUCED INTERFERENCE 审中-公开
标题翻译：均质器具有减少的干扰
公开(公告)号：WO2007141185A3
公开(公告)日：2008-02-28
申请号：PCT/EP2007055323
申请日：2007-05-31
申请人： ZEISS CARL LASER OPTICS GMBH , EGGER RAFAEL , MUENZ HOLGER
发明人： EGGER RAFAEL , MUENZ HOLGER
IPC分类号： G02B27/48 , B23K26/06 , G02B27/09 , H01S3/00
CPC分类号： B23K26/0604 , B23K26/0613 , G02B27/0927 , G02B27/0961 , G03F7/70583 , H01S3/005
摘要： The invention relates to a method for creating a target intensity distribution (20) in a target field (3) from a first input light beam (4) propagating in a first propagation direction and a second input light beam (5), whereby said first input light beam (4) and said second input light beam (5) entering a light entrance surface (6a, 6b) of a cylindrical lens array (1a) of a homogenizer. According to the invention said second input light beam (5) propagates in a second propagation direction differing from said first propagation direction. The invention further relates to an optical system for creating a target intensity distribution (20) in a target field (3) comprising: a first light source for generating a first input light beam (4) and a second light source for generating a second input light beam (5), or a single light source for generating a light beam and a beam splitter for splitting said light beam into said first input light beam and said second input light beam, a first directing device for directing said first input light beam (4) to propagate in a first propagation direction and a ho mogenizer having a cylindrical lens array (1a) with a light entrance surface (6a, 6b) for being entered by said first input light beam (4) and said second input light beam (5). According to the invention there exists a second directing device for directing said second input light beam (5) propagating in a second propagation direction differing from said first propagation direction when entering said light entrance surface (6a, 6b).
摘要翻译：本发明涉及一种用于在从第一传播方向传播的第一输入光束（4）和第二输入光束（5）中产生目标场（3）中的目标强度分布（20）的方法，其中所述第一输入光束（4）和所述第二输入光束（5）进入均质器的柱面透镜阵列（1a）的光入射表面（6a，6b）。根据本发明，所述第二输入光束（5）沿与第一传播方向不同的第二传播方向传播。本发明还涉及一种用于在目标场（3）中产生目标强度分布（20）的光学系统，包括：用于产生第一输入光束（4）的第一光源和用于产生第二输入的第二光源光束（5）或用于产生光束的单个光源和用于将所述光束分成所述第一输入光束和所述第二输入光束的分束器，用于引导所述第一输入光束的第一引导装置 4）在第一传播方向上传播，并且具有具有由所述第一输入光束（4）和所述第二输入光束（4）进入的光入射表面（6a，6b）的柱面透镜阵列 5）。根据本发明，当进入所述光入射表面（6a，6b）时，存在用于引导在与所述第一传播方向不同的第二传播方向上传播的所述第二输入光束（5）的第二引导装置。

8. 发明申请

WO2006066706A3 OPTICAL ILLUMINATION SYSTEM FOR CREATING A LINE BEAM 审中-公开
标题翻译：用于创建线束的光学照明系统
公开(公告)号：WO2006066706A3
公开(公告)日：2006-10-12
申请号：PCT/EP2005012879
申请日：2005-12-02
申请人： ZEISS CARL LASER OPTICS GMBH , MUENZ HOLGER , HERKOMMER ALOIS , EGGER RAFAEL
发明人： MUENZ HOLGER , HERKOMMER ALOIS , EGGER RAFAEL
IPC分类号： G02B27/09 , B23K26/06 , B23K26/067 , B23K26/073
CPC分类号： G02B27/0927 , B23K26/0604 , B23K26/0608 , B23K26/066 , B23K26/067 , B23K26/0732 , B23K26/0738 , G02B27/0966
摘要： The invention relates to an optical system to create from a beam of light an intensity distribution on a surface. According to the invention the optical system comprises at least a first optical element which splits the incident beam into a plurality of beams some of which at least partially overlap in a first direction on said surface and at least a second optical element which displaces at least one of said beams in a second direction on said surface.
摘要翻译：本发明涉及一种从光束产生表面上的强度分布的光学系统。根据本发明，光学系统至少包括第一光学元件和第二光学元件，第一光学元件将入射光束分成多个光束，所述多个光束中的一些在第一方向上至少部分地重叠在所述表面上，所述第二光学元件将至少一个所述梁在第二方向上在所述表面上。

9. 发明申请

WO2006066706A2 OPTICAL ILLUMINATION SYSTEM FOR CREATING A LINE BEAM 审中-公开
标题翻译：用于创建线束的光学照明系统
公开(公告)号：WO2006066706A2
公开(公告)日：2006-06-29
申请号：PCT/EP2005/012879
申请日：2005-12-02
申请人： CARL ZEISS LASER OPTICS GMBH , MUENZ, Holger , HERKOMMER, Alois , EGGER, Rafael
发明人： MUENZ, Holger , HERKOMMER, Alois , EGGER, Rafael
IPC分类号： G02B27/09 , B23K26/06 , B23K26/067 , B23K26/073
CPC分类号： G02B27/0927 , B23K26/0604 , B23K26/0608 , B23K26/066 , B23K26/067 , B23K26/0732 , B23K26/0738 , G02B27/0966
摘要： The invention relates to an optical system to create from a beam of light an intensity distribution on a surface. According to the invention the optical system comprises at least a first optical element which splits the incident beam into a plurality of beams some of which at least partially overlap in a first direction on said surface and at least a second optical element which displaces at least one of said beams in a second direction on said surface.
摘要翻译：本发明涉及一种从光束产生表面强度分布的光学系统。根据本发明，光学系统包括至少第一光学元件，其将入射光束分成多个光束，其中一些光束中的至少一部分在所述表面上沿第一方向至少部分重叠，并且至少第二光学元件移位至少一个的所述光束在所述表面上的第二方向上。

10. 发明申请

WO0243284A3 LASER COMMUNICATION SYSTEM 审中-公开
标题翻译：激光通信
公开(公告)号：WO0243284A3
公开(公告)日：2004-01-08
申请号：PCT/EP0113425
申请日：2001-11-20
申请人： MUELLER ANDREAS , EGGER RAFAEL
发明人： MUELLER ANDREAS , EGGER RAFAEL
IPC分类号： H04B10/112 , H04B10/10
CPC分类号： H04B10/1121
摘要： The invention relates to a laser communication system that comprises a laser transmitter for generating a laser beam, and a laser receiver for receiving said laser beam. The position of a component of the laser transmitter can be modified by means of an electrically actuated positioning element, the beam direction and/or beam divergence of the laser beam being influenced by the position of the component. A control voltage is generated in accordance with the beam intensity of the laser beam measured in the laser receiver and is fed to the positioning element to adjust the position of the component.
摘要翻译：一种激光通信系统包括一个激光发射单元的用于产生激光束和激光接收单元，用于接收激光束。激光发射单元的一个部件的位置通过一个电操纵的定位构件，其中所述波束方向和/或从所述部件位置的激光束的光束发散可以影响改变。在激光束接收单元的激光束强度测量的依赖关系时，产生控制电压，该电压被提供给所述定位元件，用于调节所述设备的位置。

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