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1. 发明申请

WO2006077145A3 HOLOGRAM AND METHOD OF MANUFACTURING AN OPTICAL ELEMENT USING A HOLOGRAM 审中-公开
标题翻译：全息图及使用全息图制造光学元件的方法
公开(公告)号：WO2006077145A3
公开(公告)日：2006-09-21
申请号：PCT/EP2006000518
申请日：2006-01-20
申请人： ZEISS CARL SMT AG , HETZLER JOCHEN , BEDER SUSANNE , FELDMANN HEIKO
发明人： HETZLER JOCHEN , BEDER SUSANNE , FELDMANN HEIKO
IPC分类号： G01B9/021 , G01B11/24
CPC分类号： G01B9/021 , G01B9/02039 , G01B11/2441
摘要： A method of manufacturing an optical element (5) comprises testing an optical surface (3) of the optical element, using an interferometer Ia directing measuring light (23a) onto the optical surface wherein the measuring light traverses two successive holograms (44, 48) disposed in the beam path of the measuring light upstream of the optical surface.
摘要翻译：一种制造光学元件（5）的方法包括使用干涉仪1a测试光学元件的光学表面（3），干涉仪1a将测量光（23a）引导到光学表面上，其中测量光穿过两个连续的全息图（44,48）设置在光学表面上游的测量光束的光路中。

2. 发明申请

WO2006053751A3 PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE INSTALLATION 审中-公开
标题翻译：投影镜头的微光刻投射曝光设备
公开(公告)号：WO2006053751A3
公开(公告)日：2006-10-12
申请号：PCT/EP2005012327
申请日：2005-11-17
申请人： ZEISS CARL SMT AG , BEIERL HELMUT , BLEIDISTEL SASCHA , SINGER WOLFGANG , GRUNER TORALF , EPPLE ALEXANDER , WABRA NORBERT , BEDER SUSANNE , WEBER JOCHEN , FELDMANN HEIKO , SCHWAER BAERBEL , ROGALSKY OLAF , KAZI ARI
发明人： BEIERL HELMUT , BLEIDISTEL SASCHA , SINGER WOLFGANG , GRUNER TORALF , EPPLE ALEXANDER , WABRA NORBERT , BEDER SUSANNE , WEBER JOCHEN , FELDMANN HEIKO , SCHWAER BAERBEL , ROGALSKY OLAF , KAZI ARIF
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70891
摘要： A microlithographic projection exposure installation comprises a projection lens system (20), which projects an object (24) onto a focal plane (28) and which has a lens (L3) with a curved surface (S). A liquid or solid medium (34) is located in the projection lens system (20) and directly abuts against the curved surface (S) over an area that can be used for the projection of the object (24). The projection exposure installation also comprises an adjustable manipulator (M) for reducing a curvature of field that is caused by a heating of the medium (34) during the projection operation.
摘要翻译：微光刻投射曝光设备包括：一个投影透镜（20），该图像的对象（24）到图像平面（28）和具有弯曲表面（S）的透镜（L3）。在投影透镜（20）是液体或固体培养基（34），紧邻所述弯曲表面（S）在一定范围内作为用于所述对象（24）的成像。的投影曝光装置还包括一个可调节的操纵器（M），以减少的场曲，这是由投影操作期间介质（34）的加热而引起的。

3. 发明申请

WO2005114101A8 METHOD OF MANUFACTURING AN OPTICAL ELEMENT 审中-公开
标题翻译：制造光学元件的方法
公开(公告)号：WO2005114101A8
公开(公告)日：2006-02-09
申请号：PCT/EP2004005194
申请日：2004-05-14
申请人： ZEISS CARL SMT AG , ARNOLD RALF , DOERBAND BERND , SCHILLKE FRANK , BEDER SUSANNE
发明人： ARNOLD RALF , DOERBAND BERND , SCHILLKE FRANK , BEDER SUSANNE
IPC分类号： G01B11/24 , B24B13/015 , B24B49/12
CPC分类号： G01B11/2441
摘要： A method of manufacturing an optical element (5) includes testing the optical element (5) by using an interferometer optics (1) generating a beam (13) of measuring light illuminating only a sub-aperture of the tested optical element (5). The interferometer optics (1) comprises a hologram. Results of the sub-aperture measurement are stitched together to obtain a measuring result with respect to the full surface of the optical element (5). Further, a method of calibrating the interferometer optics (1) includes performing an interferometric measurement using a calibrating optics having a hologram covering only a sub-aperture of the full cross section of the beam (13) of measuring light generated by the interferometer optics (1) and stitching together the sub-aperture measurements to obtain a result indicative for the full cross section of the interferometer optics (1).
摘要翻译：制造光学元件（5）的方法包括通过使用产生仅照射被测光学元件（5）的子孔径的光的光束（13）的干涉仪光学元件（1）来测试光学元件（5）。干涉仪光学器件（1）包括全息图。将子孔径测量的结果缝合在一起以获得关于光学元件（5）的整个表面的测量结果。此外，校准干涉仪光学器件（1）的方法包括使用校准光学器件执行干涉测量，所述校准光学器件具有仅覆盖光束（13）的全横截面的子孔径的测量由干涉仪光学器件产生的光的全息图（ 1）并且将子孔径测量结合在一起以获得指示干涉仪光学器件（1）的全部横截面的结果。

4. 发明申请

WO2005059617A3 PROJECTION OBJECTIVE HAVING A HIGH APERTURE AND A PLANAR END SURFACE 审中-公开
标题翻译：具有高孔径和平面端面的投影目标
公开(公告)号：WO2005059617A3
公开(公告)日：2006-02-09
申请号：PCT/EP2004014062
申请日：2004-12-10
申请人： ZEISS CARL SMT AG , BEDER SUSANNE , SINGER WOLFGANG
发明人： BEDER SUSANNE , SINGER WOLFGANG
IPC分类号： G02B17/00 , G03F7/20
CPC分类号： G02B17/0892 , G02B17/0828 , G03F7/70225 , G03F7/70341 , G03F7/7035 , G03F7/70958 , G03F7/70966
摘要： A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n = 1.6 at the operating wavelength.
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的适合于微光刻投影曝光机的投影物镜的平面上的投影物镜具有在投影物镜的工作波长处对于辐射而透明的多个光学元件。至少一个光学元件是在工作波长处由折射率n = 1.6的高折射率材料制成的高折射率光学元件。

5. 发明申请

WO2005081068A3 IMAGING SYSTEM FOR A MICROLITHOGRAPHICAL PROJECTION LIGHT SYSTEM 审中-公开
标题翻译：微米级投影曝光设备的图解系统
公开(公告)号：WO2005081068A3
公开(公告)日：2005-11-10
申请号：PCT/EP2005000277
申请日：2005-01-13
申请人： ZEISS CARL SMT AG , GRUNER TORALF , EPPLE ALEXANDER , KNEER BERNHARD , WABRA NORBERT , BEDER SUSANNE , DORSEL ANDREAS
发明人： GRUNER TORALF , EPPLE ALEXANDER , KNEER BERNHARD , WABRA NORBERT , BEDER SUSANNE , DORSEL ANDREAS
IPC分类号： G03F7/20
CPC分类号： G03F7/70225 , G03F7/70241 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： The invention relates to an imaging system of a microlithographical projection light system, comprising a projection lens (200, 300, 500, 600) which is used to reproduce a mask which can be positioned on a lens plane on a light-sensitive layer which can be positioned on an image plane; and a fluid inlet (205) which is used to fill an intermediate chamber between the image plane and a final optical element (201, 309, 506) of the projection lens, with immersion liquid (202, 310, 507, 601), on the image plane. The final optical element of the projection lens on the image plane is arranged, in the direction of gravity, after the image plane and the projection lens is embodied in such a manner that the immersion fluid, in the immersion state, comprises a convex curve, in the direction oriented away from the image plane, at least in one area. According to the invention, the final optical element (201, 309, 506) of the projection lens on the image plane is arranged below the image plane in such a manner that the immersion fluid (202, 310, 507, 601) is at least partially arranged in an essentially dish-shaped area on the final optical element on the image plane. Said system can also comprises a rotator which is used to rotate a substrate comprising the light-sensitive layer (401) between a transport position, wherein the light-sensitive layer is arranged on a substrate surface disposed in the counter direction to the direction of gravity, and a position of exposure, wherein the light-sensitive layer (401) is arranged on a substrate surface disposed in the direction of gravity.
摘要翻译：具有用于在光敏感层的图像平面上的定位在物平面掩模成像可定位的投影透镜（200，300，500，600）的微光刻投射曝光设备的成像系统; 和用于填充所述投射物镜的像平面和图像平面侧最后的光学元件（201，309，506）之间的间隙与浸没液体（202，310，507，601）的液体供给（205）; 其中投影透镜的图像平面侧最后一个光学元件沿像平面在重力方向上布置; 并且其中所述投影透镜被设计成使得在浸没模式中，所述浸没液体在远离所述像平面的方向上至少部分地凸出地弯曲。还可以预期的是，投影透镜的像面侧最后的光学元件（201，309，506）设置在图像平面下方，使得浸没液体（202，310，507，601）至少部分地基于所述像面侧的大致槽形区域部分地最后一个光学元件被安排。用于旋转具有输送方向之间的衬底的感光层（401）旋转器罐，被布置在位于一个相对的衬底表面的重力方向上的感光层，和一个曝光取向，其中在重力的方向上的感光层（401）可以设置平躺的基板表面。

6. 发明专利

DE102006038454A1 Projection objective for microlithographic projection exposure apparatus, has optical subsystem that projects intermediate image into image-plane with image-plane side projection ratio of specific value 未知
公开(公告)号：DE102006038454A1
公开(公告)日：2007-07-05
申请号：DE102006038454
申请日：2006-08-16
申请人： ZEISS CARL SMT AG
发明人： BEDER SUSANNE , FELDMANN HEIKO , KRAEHMER DANIEL
IPC分类号： G02B13/14 , G03F7/20
摘要： The objective (100) produces an intermediate image (IMI) and comprises an optical subsystem (130) on an image-plane side that projects the IMI into an image-plane (IP) with an image-plane side projection ratio. The ratio has an absolute value of 0.3. An independent claim is included for micro-structured component manufacturing method.

7. 发明专利

DE102006021161A1 Projection lens e.g. refractive projection lens, for microlithography, has lens part in image side with free space that is filled with different liquids relative to refractive index during different modes of operation of projection lens 未知
$Projection lens e.g. refractive projection lens, for microlithography, has lens part in image side with free space that is filled with different liquids relative to refractive index during different modes of operation of projection lens$
公开(公告)号：DE102006021161A1
公开(公告)日：2006-11-30
申请号：DE102006021161
申请日：2006-05-06
申请人： ZEISS CARL SMT AG
发明人： ULRICH WILHELM , SINGER WOLFGANG , GRUNER TORALF , BEDER SUSANNE , FELDMANN HEIKO
IPC分类号： G02B13/14
摘要： The lens has a lens part (10) in an object side arranged adjacent to an object plane, and including a set of optical units. Another lens part (11) in an image side is arranged adjacent to an image plane, and has a free space (16) for collecting liquid. A portion of an optical termination unit limits the free space in the object side, where the lens is operable in different operating modes of operation. The free space is filled with different liquids relative to a refractive index during the different modes of operation of the lens. Independent claims are also included for the following: (1) a refractive projection lens for imaging an object arranged in an object plane (2) a catadioptric projection lens for imaging an object arranged in an object plane (3) a projection illumination system comprising a projection lens (4) a method for changing a projection lens (5) a method for manufacturing a projection lens.

8. 发明专利

DE602005018648D1 未知
公开(公告)号：DE602005018648D1
公开(公告)日：2010-02-11
申请号：DE602005018648
申请日：2005-07-08
申请人： ZEISS CARL SMT AG
发明人： SHAFER DAVID , ULRICH WILHELM , DODOC AURELIAN , VON BUENAU RUDOLF , MANN HANS-JUERGEN , EPPLE ALEXANDER , BEDER SUSANNE , SINGER WOLFGANG
IPC分类号： G03F7/00 , G02B17/00 , G02B17/08

9. 发明专利

DE102007062894A1 Lithographic projection lens has optical array of optical elements between object plane and image plane, and optical array has two correction elements for correcting aberration 未知
公开(公告)号：DE102007062894A1
公开(公告)日：2008-07-24
申请号：DE102007062894
申请日：2007-12-21
申请人： ZEISS CARL SMT AG
发明人： FELDMANN HEIKO , BEDER SUSANNE , DODOC AURELIAN , EPPLE ALEXANDER , ROSTALSKI HANS-JUERGEN
IPC分类号： G02B13/14 , G02B17/08 , G03F7/20
摘要： The projection lens (10) has an optical array of optical elements between an object plane (O) and an image plane (B). The optical array has two correction elements (K1,K2) for correcting aberration, by which corrective element is arranged optically in a closed pupil plane (P) and another corrective element is arranged in an area, which is optically closed neither in a pupil plane nor in a field plane.

10. 发明专利

DE102004056476A1 Immersion lithographic lens used in the production of semiconductor components comprises a first optical element and a second optical element following the first optical element in the direction of a beam path through the lens 未知
公开(公告)号：DE102004056476A1
公开(公告)日：2006-05-24
申请号：DE102004056476
申请日：2004-11-23
申请人： ZEISS CARL SMT AG
发明人： GELLRICH BERNHARD , WURMBRAND ANDREAS , HOLDERER HUBERT , FISCHER JUERGEN , BEDER SUSANNE , LOERING ULRICH
IPC分类号： G03F7/20
摘要： Immersion lithographic lens (1) comprises a first optical element (9) and a second optical element (11) following the first optical element in the direction of a beam path (5) through the lens. An immersion medium (13) is located in the direction of the beam path after the second optical element. A liquid (14) is arranged between the first and second optical elements. An independent claim is also included for a projection exposure device containing the above lens.

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