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1. 发明申请

US20060291132A1 Electrostatic chuck, wafer processing apparatus and plasma processing method 审中-公开
标题翻译：静电卡盘，晶片加工装置和等离子体处理方法
公开(公告)号：US20060291132A1
公开(公告)日：2006-12-28
申请号：US11370102
申请日：2006-03-08
申请人： Seiichiro Kanno , Tsunehiko Tsubone , Masakazu Isozaki , Toshio Masuda , Go Miya , Hiroho Kitada , Tooru Aramaki
发明人： Seiichiro Kanno , Tsunehiko Tsubone , Masakazu Isozaki , Toshio Masuda , Go Miya , Hiroho Kitada , Tooru Aramaki
IPC分类号： H01T23/00
CPC分类号： H01L21/67109 , H01L21/67103 , H01L21/6831
摘要： An electrostatic chuck which is built in a heater and can change, at a high speed, the temperature distribution of a wafer being processed by a plasma is provided at low cost. Also, there is provided a processing method which realizes uniform etching by suppressing CD variations in the plane of the wafer even when etching conditions change. The electrostatic chuck includes a base material in which multiple coolant grooves are formed, a high resistance layer which is formed on the base material, multiple heaters which are formed by thermally spraying conductors within the high resistance layer, multiple electrostatic chuck electrodes which are formed similarly by thermally spraying conductors within the high resistance layer, and temperature measuring means, and adjusts outputs of the heaters on the basis of temperature information of the temperature measuring means.
摘要翻译：以低成本提供内置在加热器中并能够以高速度改变由等离子体处理的晶片的温度分布的静电卡盘。此外，提供了一种通过抑制晶片的平面中的CD变化即使在蚀刻条件改变时实现均匀蚀刻的处理方法。静电卡盘包括形成有多个冷却剂槽的基材，形成在基材上的高电阻层，通过热喷涂高电阻层内的导体形成的多个加热器，形成类似的多个静电卡盘电极通过热电喷涂高电阻层内的导体和温度测量装置，并且基于温度测量装置的温度信息来调节加热器的输出。

2. 发明申请

US20060191482A1 Apparatus and method for processing wafer 审中-公开
标题翻译：晶圆处理装置及方法
公开(公告)号：US20060191482A1
公开(公告)日：2006-08-31
申请号：US11074717
申请日：2005-03-09
申请人： Seiichiro Kanno , Junichi Tanaka , Go Miya , Tsunehiko Tsubone , Akitaka Makino , Toshio Masuda
发明人： Seiichiro Kanno , Junichi Tanaka , Go Miya , Tsunehiko Tsubone , Akitaka Makino , Toshio Masuda
IPC分类号： C23C16/00
CPC分类号： H01L21/32137 , H01J37/32935 , H01J37/3299 , H01J2237/2001 , H01L21/67069 , H01L21/67109
摘要： A wafer processing apparatus capable of obtaining a uniform CD distribution within a wafer is provided. The wafer processing apparatus comprises at least two separate circuits of temperature regulating means provided in a wafer stage, a plurality of cooling gas pressure regulating means for feeding cooling gas between the semiconductor wafer and the wafer stage, means for regulating heater input power, and a control computer. The control computer receives input of line width dimensions resulting from processes in an arbitrary plurality of temperature conditions obtained by changing at least one of the conditions of the temperature of the temperature regulating agent, the cooling gas pressure, and the input power of the heater. The line width dimensions are used to calculate, and control, at least one of the temperature of the temperature regulating agent, the cooling gas pressure, and the input power of the heater for obtaining an arbitrary etching line width dimension.
摘要翻译：提供能够在晶片内获得均匀的CD分布的晶片处理装置。晶片处理装置包括设置在晶片台中的温度调节装置的至少两个分离电路，用于在半导体晶片和晶片台之间供给冷却气体的多个冷却气体压力调节装置，用于调节加热器输入功率的装置和控制电脑。控制计算机接收由通过改变温度调节剂的温度，冷却气体压力和加热器的输入功率的至少一个条件而获得的任意多个温度条件下的处理产生的线宽尺寸的输入。线宽尺寸用于计算和控制温度调节剂的温度，冷却气体压力和加热器的输入功率中的至少一个，以获得任意的蚀刻线宽度尺寸。

3. 发明授权

US07147747B2 Plasma processing apparatus and plasma processing method 有权
标题翻译：等离子体处理装置和等离子体处理方法
公开(公告)号：US07147747B2
公开(公告)日：2006-12-12
申请号：US10377826
申请日：2003-03-04
申请人： Go Miya , Hiroyuki Kitsunai , Junichi Tanaka , Toshio Masuda , Hideyuki Yamamoto
发明人： Go Miya , Hiroyuki Kitsunai , Junichi Tanaka , Toshio Masuda , Hideyuki Yamamoto
IPC分类号： H01L21/00 , C23C16/00
CPC分类号： G01N21/73 , H01J37/32935 , H01J37/32963 , H01L21/67253 , H05H1/0037
摘要： A plasma processing apparatus having a process chamber in which an object to be processed is subjected to plasma processing includes a light-receiving part for a spectrometer unit, an arithmetic unit, a database, a determination unit and an apparatus controller. The determination unit determines a condition in the processing chamber that an end point of seasoning is reached. The determination of the condition is performed so that one or more differences between one or more output signals derived from a batch of plasma emission data by multivariate analysis and one or more output signals derived from a preceding batch of plasma emission data are found, an average value of the differences in one batch, a difference between a maximum and a minimum of the differences in one batch and a standard deviation of the differences in one batch are determined, and the values are compared with a preset threshold.
摘要翻译：一种具有处理室的等离子体处理装置，其中待处理物体经受等离子体处理，其包括用于分光计单元的光接收部分，运算单元，数据库，确定单元和装置控制器。确定单元确定处理室中达到调味品终点的状态。执行条件的确定，使得发现通过多变量分析从一批等离子体发射数据得到的一个或多个输出信号与从前一批等离子体发射数据得到的一个或多个输出信号之间的一个或多个差异，平均值确定一批中的差异值，确定一批中的差异的最大值和最小值之间的差异以及一批中的差异的标准偏差，并将该值与预设阈值进行比较。

4. 发明授权

US07147748B2 Plasma processing method 有权
标题翻译：等离子体处理方法
公开(公告)号：US07147748B2
公开(公告)日：2006-12-12
申请号：US10779742
申请日：2004-02-18
申请人： Go Miya , Hiroyuki Kitsunai , Junichi Tanaka , Toshio Masuda , Hideyuki Yamamoto
发明人： Go Miya , Hiroyuki Kitsunai , Junichi Tanaka , Toshio Masuda , Hideyuki Yamamoto
IPC分类号： H01L21/00 , C23C16/00
CPC分类号： G01N21/73 , H01J37/32935 , H01J37/32963 , H01L21/67253 , H05H1/0037
摘要： A plasma processing method using a plasma processing apparatus having a process chamber in which a substrate is subjected to a plasma processing, a light-receiving part, a spectrometer unit, an arithmetic unit, a database, a determination unit for determining that an end point of seasoning is reached as a condition of the process chamber, and an apparatus controller. The method includes the steps of converting a multi-channel signal output from the spectrometer unit into a batch of output signals, finding differences between the output signals and output signals of a preceding batch, determining the average value of the differences in one batch, the difference between the maximum and the minimum of the differences in one batch and the standard deviation of the differences in one batch, and comparing the determined values with a preset threshold.
摘要翻译：一种使用等离子体处理装置的等离子体处理方法，该等离子体处理装置具有其中对基板进行等离子体处理的处理室，受光部，光谱仪单元，运算单元，数据库，确定单元，用于确定终点调味料作为处理室的条件，以及设备控制器。该方法包括以下步骤：将从光谱仪单元输出的多通道信号转换为一批输出信号，发现前一批次的输出信号和输出信号之间的差异，确定一批中的差异的平均值，一批中的差异的最大值和最小值之间的差异以及一批中的差异的标准偏差，并将确定的值与预设阈值进行比较。

5. 发明授权

US06677167B2 Wafer processing apparatus and a wafer stage and a wafer processing method 失效
标题翻译：晶片处理装置和晶片台以及晶片处理方法
公开(公告)号：US06677167B2
公开(公告)日：2004-01-13
申请号：US10086722
申请日：2002-03-04
申请人： Seiichiro Kanno , Hironobu Kawahara , Mitsuru Suehiro , Saburou Kanai , Toshio Masuda
发明人： Seiichiro Kanno , Hironobu Kawahara , Mitsuru Suehiro , Saburou Kanai , Toshio Masuda
IPC分类号： H01L2166
CPC分类号： H01L21/67109
摘要： A wafer processing apparatus comprising a wafer stage, wherein a semiconductor wafer is mounted on the wafer stage so as to process the semiconductor wafer, wherein a holding mechanism of the wafer stage is commonly used for a plurality of wafer stages, and accordingly, the wafer stage can be changed into a wafer stage having a different function so as to process the semiconductor wafer.
摘要翻译：一种晶片处理装置，包括晶圆台，其中半导体晶片安装在晶片台上以便处理半导体晶片，其中晶片台的保持机构通常用于多个晶片台，因此，晶片可以将阶段改变为具有不同功能的晶片台，以便处理半导体晶片。

6. 发明授权

US07772970B2 Vehicle display device 有权
标题翻译：车载显示装置
公开(公告)号：US07772970B2
公开(公告)日：2010-08-10
申请号：US11783111
申请日：2007-04-05
申请人： Toshio Masuda , Kenichi Yamamoto , Kenji Hijikata , Satoshi Satomura , Hiroshi Oishi , Toyohide Sunaguchi , Yoshio Iwakami , Munenori Homma , Kouji Kaneda , Atsushi Atake , Tatsuru Fukuda , Masayuki Ushiki , Minoru Yuki , Tsuyoshi Kobayashi , Masahito Motoi , Naoki Shibata , Hiroshi Ogiwara , Katsumasa Igarashi , Junzo Shinozuka , Akihisa Nakamura
发明人： Toshio Masuda , Kenichi Yamamoto , Kenji Hijikata , Satoshi Satomura , Hiroshi Oishi , Toyohide Sunaguchi , Yoshio Iwakami , Munenori Homma , Kouji Kaneda , Atsushi Atake , Tatsuru Fukuda , Masayuki Ushiki , Minoru Yuki , Tsuyoshi Kobayashi , Masahito Motoi , Naoki Shibata , Hiroshi Ogiwara , Katsumasa Igarashi , Junzo Shinozuka , Akihisa Nakamura
IPC分类号： B60Q1/00
CPC分类号： F02D11/105 , B60K2350/1092 , F02D2200/604 , Y02T10/84
摘要： The present invention provides a vehicle display device which can display fuel consumption information of a vehicle in a useful and optimum mode for a driver. A meter_EUC calculates an instantaneous fuel consumption of a vehicle based on a mileage and a fuel injection quantity within a set time, calculates an average fuel consumption of the vehicle based on respective cumulative values of the mileage and the fuel injection quantity repeatedly calculated for every set time, and displays the deviation of the instantaneous fuel consumption with respect to the average fuel consumption as fuel consumption information on a fuel consumption meter. The display on the fuel consumption meter is performed by swinging a pointer with respect to a neutral position. When the deviation takes a positive value, the pointer is swung in the pulse direction with a swinging width corresponding to the deviation quantity, while when the deviation takes a negative value, the pointer is swung in the minus direction with a swinging width corresponding to the deviation quantity.
摘要翻译：本发明提供一种能够以驾驶员的有用且最佳模式显示车辆的燃料消耗信息的车辆显示装置。根据在设定时间内的里程和燃料喷射量计算车辆的瞬时燃料消耗量，根据对于每个集合重复计算的里程和燃料喷射量的累计值，计算出车辆的平均燃料消耗量时间，并且将相对于平均燃料消耗的瞬时燃料消耗的偏差显示为燃料消耗计量器上的燃料消耗信息。通过相对于中立位置摆动指针来执行燃料消耗计的显示。当偏差为正值时，指针以对应于偏差量的摆动宽度在脉冲方向上摆动，而当偏差为负值时，指针以负方向摆动，摆动宽度对应于偏差量。

7. 发明授权

US07546197B2 Driving force control device of vehicle 有权
标题翻译：车辆驱动力控制装置
公开(公告)号：US07546197B2
公开(公告)日：2009-06-09
申请号：US11783266
申请日：2007-04-06
申请人： Toshio Masuda , Kenichi Yamamoto , Kenji Hijikata , Satoshi Satomura , Atsushi Atake , Kouji Kaneda , Tatsuru Fukuda , Minoru Yuki , Masayuki Ushiki , Tsuyoshi Kobayashi , Masahito Motoi , Naoki Shibata , Hiroshi Ogiwara , Katsumasa Igarashi , Junzo Shinozuka , Akihisa Nakamura
发明人： Toshio Masuda , Kenichi Yamamoto , Kenji Hijikata , Satoshi Satomura , Atsushi Atake , Kouji Kaneda , Tatsuru Fukuda , Minoru Yuki , Masayuki Ushiki , Tsuyoshi Kobayashi , Masahito Motoi , Naoki Shibata , Hiroshi Ogiwara , Katsumasa Igarashi , Junzo Shinozuka , Akihisa Nakamura
IPC分类号： G06F19/00
CPC分类号： F02D11/105 , F02D41/2422 , F02D2200/604
摘要： A driving force control device can set driving force characteristics which conform to tastes of drivers using one vehicle thus giving the easy-to-drive feeling to the drivers. An E/G13ECU possesses three modes 1 to 3 as control modes and selects one mode from these modes based on a manipulation input using a mode selection switch. Further, any one of the mode out of these modes 1 to 3 is preset in the E/G13ECU as a temporary changeover mode, and the E/G13ECU changes over a mode selected by the mode selection switch and the preset temporary changeover mode alternatively by the temporary changeover switch.
摘要翻译：驱动力控制装置可以设置符合使用一个车辆的驾驶员的口味的驱动力特性，从而给驾驶员提供易于驾驶的感觉。 E / G13ECU具有三种模式1至3作为控制模式，并且基于使用模式选择开关的操纵输入从这些模式中选择一种模式。此外，这些模式1至3中的模式中的任何一种在E / G13ECU中被预设为临时切换模式，并且E / G13ECU通过模式选择开关选择的模式和预设的临时切换模式交替地改变临时切换开关。

8. 发明申请

US20070247975A1 Vehicle display device 有权
标题翻译：车载显示装置
公开(公告)号：US20070247975A1
公开(公告)日：2007-10-25
申请号：US11783275
申请日：2007-04-06
申请人： Toshio Masuda , Kenichi Yamamoto , Kenji Hijikata , Satoshi Satomura , Hiroshi Oishi , Toyohide Sunaguchi , Yoshio Iwakami , Munenori Homma , Atsushi Atake , Kouji Kaneda , Tatsuru Fukuda , Minoru Yuki , Masayuki Ushiki , Tsuyoshi Kobayashi , Masahito Motoi , Naoki Shibata , Hiroshi Ogiwara , Katsumasa Igarashi , Junzo Shinozuka , Akihisa Nakamura
发明人： Toshio Masuda , Kenichi Yamamoto , Kenji Hijikata , Satoshi Satomura , Hiroshi Oishi , Toyohide Sunaguchi , Yoshio Iwakami , Munenori Homma , Atsushi Atake , Kouji Kaneda , Tatsuru Fukuda , Minoru Yuki , Masayuki Ushiki , Tsuyoshi Kobayashi , Masahito Motoi , Naoki Shibata , Hiroshi Ogiwara , Katsumasa Igarashi , Junzo Shinozuka , Akihisa Nakamura
IPC分类号： G04B19/22
CPC分类号： G01D7/08 , G01D1/18 , G01D7/12 , G07C5/0825 , G07C5/0841
摘要： The present invention provides a vehicle display device which allows a driver to instantaneously grasp driving force information. A meter_ECU displays a driving force display image which displays driving force information of a vehicle on an MID, displays an acceleration-torque line (driving force characteristic line) L corresponding to the currently selected mode M and, at the same time, changes a power level which is indicated in a power display region P set within the acceleration-torque line L interlockingly with an accelerator operation of a driver. Due to such a constitution, the vehicle display device allows the driver to instantaneously grasp the driving force information.
摘要翻译：本发明提供一种车辆显示装置，其允许驾驶员即时掌握驱动力信息。米_ECU显示在MID上显示车辆的驱动力信息的驱动力显示图像，显示与当前选择的模式M对应的加速度 - 转矩线（驱动力特性线）L，并且同时改变功率在加速扭矩线L内设置的功率显示区域P中指示的电平与驾驶员的加速器操作互锁。由于这样的构成，车辆用显示装置能够使驾驶员立即掌握驱动力信息。

9. 发明授权

US07058470B2 Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor 有权
标题翻译：监控和/或控制半导体制造装置的方法及其系统
公开(公告)号：US07058470B2
公开(公告)日：2006-06-06
申请号：US10999006
申请日：2004-11-30
申请人： Junichi Tanaka , Hiroyuki Kitsunai , Akira Kagoshima , Daisuke Shiraishi , Hideyuki Yamamoto , Shoji Ikuhara , Toshio Masuda
发明人： Junichi Tanaka , Hiroyuki Kitsunai , Akira Kagoshima , Daisuke Shiraishi , Hideyuki Yamamoto , Shoji Ikuhara , Toshio Masuda
IPC分类号： G06F19/00
CPC分类号： H01L22/20 , G05B13/048 , G05B19/41865 , G05B23/024 , G05B2219/31357 , G05B2219/32058 , H01L21/67276 , H01L2924/0002 , Y02P90/12 , Y02P90/14 , Y02P90/18 , Y02P90/20 , H01L2924/00
摘要： A semiconductor processing apparatus for processing a semiconductor wafer includes a sensor for monitoring a processing state of the semiconductor processing apparatus, a processing result input unit which inputs measured values for processing results of a semiconductor wafer processed by the semiconductor processing apparatus, and a model equation generation unit relying on sensed data acquired by the sensor and the measured values to generate a model equation for predicting a processing result using the sensed data as an explanatory variable. The apparatus includes a processing result prediction unit which predicts a processing result based on the model equation and the sensed data, and a process recipe control unit which compares the predicted processing result with a previously set value to control a processing condition or input parameter. The process recipe control unit includes a controller which controls at least one of a plurality of different processing performances for processing of the semiconductor wafer.
摘要翻译：用于处理半导体晶片的半导体处理装置包括：用于监视半导体处理装置的处理状态的传感器;输入由半导体处理装置处理的半导体晶片的处理结果的测量值的处理结果输入单元;以及模型方程依赖于由传感器获取的感测数据和测量值，以产生用于使用感测数据作为解释变量来预测处理结果的模型方程。该装置包括：处理结果预测单元，其基于模型方程和感测数据预测处理结果;以及处理配方控制单元，其将预测的处理结果与预先设定的值进行比较，以控制处理条件或输入参数。处理配方控制单元包括控制器，用于控制用于处理半导体晶片的多个不同处理性能中的至少一个。

10. 发明授权

US06923885B2 Plasma processing system and apparatus and a sample processing method 有权
标题翻译：等离子体处理系统和设备及样品处理方法
公开(公告)号：US06923885B2
公开(公告)日：2005-08-02
申请号：US10732286
申请日：2003-12-11
申请人： Toshio Masuda , Tatehito Usui , Mitsuru Suehiro , Hiroshi Kanekiyo , Hideyuki Yamamoto , Kazue Takahashi , Hiromichi Enami
发明人： Toshio Masuda , Tatehito Usui , Mitsuru Suehiro , Hiroshi Kanekiyo , Hideyuki Yamamoto , Kazue Takahashi , Hiromichi Enami
IPC分类号： H01L21/3065 , H01J37/32 , H01L21/00 , C23C16/00
CPC分类号： H01L21/67069 , G01N21/68 , H01J37/32082 , H01J37/32935 , H01J37/32972
摘要： A plasma processing apparatus having a sample bench located in a vacuum chamber, a structure disposed at a position opposed to a sample placed on the sample bench and facing a plasma generated in the vacuum chamber, and at least one through-hole disposed in the structure through which a gas flows into the vacuum chamber. An optical transmitter is mounted on a back of the at least one through-hole through which light from the sample passes, which light is detected by way of the optical transmitter.
摘要翻译：一种等离子体处理装置，其具有位于真空室中的样品台，设置在与放置在样品台上的样品相对的位置并且面对在真空室中产生的等离子体的结构，以及设置在该结构中的至少一个通孔气体通过该气体流入真空室。光传输器安装在所述至少一个通孔的背面上，来自所述样品的光通过所述至少一个通孔穿过，所述光通过所述光发射器检测。

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