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1. 发明授权

US06285743B1 Method and apparatus for soft X-ray generation 有权
标题翻译：用于软X射线产生的方法和装置
公开(公告)号：US06285743B1
公开(公告)日：2001-09-04
申请号：US09395162
申请日：1999-09-14
申请人： Hiroyuki Kondo , Noriaki Kandaka
发明人： Hiroyuki Kondo , Noriaki Kandaka
IPC分类号： G21K500
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/702 , G21K1/06 , H05G2/008
摘要： A soft X-ray source includes a mirror having a focal point, the mirror being one of parabolic and ellipsoidal, a nozzle delivering a target material to a plasma generation point substantially coincident with the focal point, and a laser source delivering a pulsed laser beam to the plasma generation point, wherein a plasma is generated at the plasma generation point upon irradiation by the pulsed laser beam, the plasma emitting soft X-rays that are formed into beams by the mirror, the beams being parallel if the mirror is parabolic and converging if the mirror is ellipsoidal.
摘要翻译：软X射线源包括具有焦点的反射镜，所述反射镜是抛物面和椭圆体之一，喷嘴将目标材料传送到基本上与焦点重合的等离子体产生点，以及激光源，其传送脉冲激光束到等离子体产生点，其中在通过脉冲激光束照射时在等离子体产生点处产生等离子体，等离子体发射通过反射镜形成光束的软X射线，如果反射镜是抛物线的，则束平行，如果镜子是椭圆的会聚。

2. 发明申请

US20050157384A1 Multilayer reflective mirrors for EUV, wavefront-aberration-correction methods for same, and EUV optical systems comprising same 审中-公开
标题翻译：用于EUV的多层反射镜，用于其的波前像差校正方法以及包含该反射镜的EUV光学系统
公开(公告)号：US20050157384A1
公开(公告)日：2005-07-21
申请号：US11025002
申请日：2004-12-28
申请人： Masayuki Shiraishi , Katsuhiko Murakami , Hiroyuki Kondo , Noriaki Kandaka
发明人： Masayuki Shiraishi , Katsuhiko Murakami , Hiroyuki Kondo , Noriaki Kandaka
IPC分类号： G02B5/08 , G03F7/20
CPC分类号： G03F7/706 , G02B5/08 , G03F7/70216 , G03F7/70258 , G03F7/70316
摘要： Multilayer mirrors are disclosed for use especially in “Extreme Ultraviolet” (“soft X-ray,” or “EUV”) optical systems. Each multilayer mirror includes a stack of alternating layers of a first material and a second material, respectively, to form an EUV-reflective surface. The first material has a refractive index substantially the same as a vacuum, and the second material has a refractive index that differs sufficiently from the refractive index of the first material to render the mirror reflective to EUV radiation. The wavefront profile of EUV light reflected from the surface is corrected by removing (“machining” away) at least one surficial layer of the stack in selected region(s) of the surface of the stack. Machining can be performed such that machined regions have smooth tapered edges rather than abrupt edges. The stack can include first and second layer groups that allow the unit of machining to be very small, thereby improving the accuracy with which wavefront-aberration correction can be conducted. Also disclosed are various at-wavelength techniques for measuring reflected-wavelength profiles of the mirror. The mirror surface can include a cover layer of a durable material having high transparency and that reduces variations in reflectivity of the surface caused by machining the selected regions.
摘要翻译：公开了多层反射镜用于特别是在“极光紫外线”（“软X射线”或“EUV”）光学系统中。每个多层反射镜分别包括第一材料和第二材料的交替层叠，以形成EUV反射表面。第一材料具有与真空基本相同的折射率，并且第二材料具有与第一材料的折射率充分不同的折射率，以使反射镜反射成EUV辐射。通过在堆叠的表面的选定区域中移除（“加工”）去除堆叠的至少一个表面层来校正从表面反射的EUV光的波前轮廓。可以进行加工，使得加工区域具有平滑的锥形边缘而不是突然的边缘。堆叠可以包括允许加工单元非常小的第一和第二层组，从而提高可以进行波前像差校正的精度。还公开了用于测量反射镜的反射波长分布的各种一般波长技术。镜面可以包括具有高透明度的耐用材料的覆盖层，并且减少由加工所选择的区域引起的表面的反射率的变化。

3. 发明授权

US06504903B1 Laser-excited plasma light source, exposure apparatus and its making method, and device manufacturing method 有权
标题翻译：激光等离子体光源，曝光装置及其制作方法以及器件制造方法
公开(公告)号：US06504903B1
公开(公告)日：2003-01-07
申请号：US09722817
申请日：2000-11-28
申请人： Hiroyuki Kondo , Noriaki Kandaka
发明人： Hiroyuki Kondo , Noriaki Kandaka
IPC分类号： H01L21027
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/707 , G03F7/70708 , G03F7/70916 , G03F7/70925
摘要： The end of a nozzle of a laser-excited plasma light source is made of a specific material, such as silicon Si, the transmittance of which to EUV light is higher than those of heavy metals. Therefore, even if the temperature of the end of the nozzle is higher than the melting point of the specific material because of the high temperature of the plasma produced around the focal point, the end of the nozzle is therefore eroded, and sputtered particles of the material adhere to a light-collecting mirror provided near the nozzle, the degradation of the reflectance of the light-collecting mirror is mitigated compared to the transmittance of the sputtered particles (specific material) to EUV light is higher than those of heavy metals.
摘要翻译：激光激发等离子体光源的喷嘴的端部由诸如硅Si的特定材料制成，其对EUV光的透射率高于重金属的透光率。因此，即使由于在焦点周围产生的等离子体的高温，喷嘴的端部的温度高于特定材料的熔点，因此喷嘴的端部被腐蚀，并且溅射的颗粒材料附着在靠近喷嘴的集光反射镜上，与溅射的颗粒（特定材料）对EUV光的透射率相比，聚光镜的反射率的降低比重金属高。

4. 发明授权

US06339634B1 Soft x-ray light source device 有权
标题翻译：软X射线光源装置
公开(公告)号：US06339634B1
公开(公告)日：2002-01-15
申请号：US09409063
申请日：1999-09-30
申请人： Noriaki Kandaka , Hiroyuki Kondo , Soichi Owa , Tomoko Ohtsuki
发明人： Noriaki Kandaka , Hiroyuki Kondo , Soichi Owa , Tomoko Ohtsuki
IPC分类号： H01J3526
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70233 , G21K1/06 , H05G2/008
摘要： A high-pressure krypton gas is supplied to the interior of a vessel from a gas introduction pipe. Light emitted from an optical fiber group formed by bundling together optical fibers constituting the output ends of fiber amplifiers or fiber lasers passes through a lens and exciting laser light introduction window, and is focused on the krypton gas jetting from the tip end of the nozzle. As a result, the krypton gas is excited as a plasma and soft X-rays are generated. The soft X-rays are reflected by a rotating multi-layer coat parabolic mirror and are emitted to the outside as a parallel beam of soft X-rays. Since light from fiber amplifiers is used as exciting light, and since numerous optical fibers are bundled together to form a light source, a large quantity of soft X-rays can easily be obtained.
摘要翻译：高压氪气从气体导入管供给到容器的内部。通过将构成光纤放大器或光纤激光器的输出端的光纤捆扎在一起形成的光纤组发出的光通过透镜和激光激光引入窗口，并且聚焦在从喷嘴的尖端喷射的氪气。结果，氪气被激发为等离子体并产生软X射线。软X射线被旋转的多层外壳抛物面反射镜反射并作为平行的X射线照射到外部。由于来自光纤放大器的光被用作激发光，并且由于许多光纤被捆绑在一起以形成光源，因此可以容易地获得大量的软X射线。

5. 发明授权

US06326617B1 Photoelectron spectroscopy apparatus 有权
标题翻译：光电子能谱仪
公开(公告)号：US06326617B1
公开(公告)日：2001-12-04
申请号：US09145064
申请日：1998-09-01
申请人： Toshihisa Tomie , Hideaki Shimizu , Hiroyuki Kondo , Noriaki Kandaka
发明人： Toshihisa Tomie , Hideaki Shimizu , Hiroyuki Kondo , Noriaki Kandaka
IPC分类号： C01N2300
CPC分类号： G01N23/04
摘要： Photoelectron spectroscopy apparatus are disclosed that comprise a photoelectron detector and that exhibit improved performance of the photoelectron detector and thus more reliable and accurate analysis of photoelectron energy. In performing energy analysis of photoelectrons, the photoelectron detector measures the time distribution at which photoelectrons emitted from a specimen surface traverse a flight tube when the specimen is irradiated with X-rays from a pulse X-ray source. A magnetic field generator is situated near the specimen to collect and collimate photoelectrons emitted from the specimen surface and form a photoelectron flux inside a flight tube. Any one of a deflection electrode, electrostatic lens, magnetic field lens, or electromagnetic lens, or a combination thereof, is placed at the distal end of the flight tube in front of the photoelectron detector to disperse the photoelectron flux and increase the surface area in which the photoelectron flux is incident to the photoelectron-detection surface.
摘要翻译：公开了包含光电子检测器并且显示出光电子检测器的改进性能并且因此更可靠和准确地分析光电子能量的光电子能谱仪。在对光电子进行能量分析时，光电检测器测定从X射线源向X射线照射样本时，从试样表面射出的光电子横穿飞行管的时间分布。磁场发生器位于样品附近，以收集和准直从样品表面发射的光电子，并在飞行管内形成光电子通量。偏转电极，静电透镜，磁场透镜或电磁透镜中的任何一个或其组合放置在光电子检测器前面的飞行管的远端，以分散光电子通量并增加其中的表面积光电子通量入射到光电子检测表面。

6. 发明授权

US06385290B1 X-ray apparatus 有权
标题翻译： X光装置
公开(公告)号：US06385290B1
公开(公告)日：2002-05-07
申请号：US09395163
申请日：1999-09-14
申请人： Hiroyuki Kondo , Noriaki Kandaka
发明人： Hiroyuki Kondo , Noriaki Kandaka
IPC分类号： G21K106
CPC分类号： B82Y10/00 , G03F7/70025 , G03F7/70033 , G03F7/70041 , G03F7/707 , G03F7/70708 , G03F7/70916 , G03F7/70925
摘要： A x-ray apparatus includes an x-ray source, an x-ray optical system, wherein the x-ray optical system extracts x-rays of a specific wavelength from the x-ray source and converts the x-rays into a beam, and an irradiation source that causes radiation to be incident on surfaces of optical elements contained in the x-ray apparatus.
摘要翻译： X射线装置包括x射线源，X射线光学系统，其中x射线光学系统从x射线源提取特定波长的x射线，并将x射线转换成光束，以及使辐射入射到包含在x射线装置中的光学元件的表面上的照射源。

7. 发明授权

US06324255B1 X-ray irradiation apparatus and x-ray exposure apparatus 有权
标题翻译： X射线照射装置和X射线曝光装置
公开(公告)号：US06324255B1
公开(公告)日：2001-11-27
申请号：US09372596
申请日：1999-08-12
申请人： Hiroyuki Kondo , Noriaki Kandaka
发明人： Hiroyuki Kondo , Noriaki Kandaka
IPC分类号： H05G200
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/7085 , H05G2/008
摘要： An x-ray irradiation apparatus and x-ray exposure apparatus provide improved x-ray generation. The x-ray irradiation apparatus includes a target material feed-out device to provide a target material in a feed-out direction to a specified target position and a laser to provide laser light to the specified target position to cause the target material to emit x-rays. In some configurations, an x-ray generation position control device may be used to determine and control a position of x-ray generation, a rotary mechanism may be operatively connected to the target material feed-out device to axially rotate the target material feed-out device about the feed-out direction, and/or a target feed-out control device may be used to detect and control the position of the target material feed-out device.
摘要翻译： X射线照射装置和X射线曝光装置提供改善的x射线产生。 X射线照射装置包括：目标材料送出装置，用于在指定目标位置的送出方向上提供目标材料;以及激光器，用于向指定的目标位置提供激光以使靶材料发射x 数字在一些配置中，可以使用x射线产生位置控制装置来确定和控制X射线产生的位置，旋转机构可以可操作地连接到目标材料送出装置以轴向旋转靶材料馈送装置，可以使用关于送出方向的出料装置和/或目标送出控制装置来检测和控制目标材料送出装置的位置。

8. 发明授权

US07382527B2 EUV multilayer mirror with phase shifting layer 有权
标题翻译：具有相移层的EUV多层反射镜
公开(公告)号：US07382527B2
公开(公告)日：2008-06-03
申请号：US11401946
申请日：2006-04-12
申请人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G02B5/26
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
摘要翻译：多层反射镜旨在减少反射率的入射角依赖性。衬底由具有0.2nm RMS或更少表面粗糙度的低热抛光膨胀玻璃制成。在其形成的表面上是具有宽的全宽半峰值反射率的Ru / Si多层，并且形成的Ru / Si多层是具有高峰值反射率值的Mo / Si多层。与仅提供Ru / Si相比，具有比单独提供的Mo / Si多层的全宽半宽的反射率峰值更高的反射率。由于Ru吸收比Mo更多的EUV射线，因此可以获得比在Mo / Si多层上形成有Ru / Si多层的结构更高的反射率。具有宽全宽半最大值的多层膜在光谱反射率方面具有小的入射角反射率依赖性，从而在投影光学系统中实现高成像性能。

9. 发明授权

US07706058B2 Multilayer mirror, method for manufacturing the same, and exposure equipment 有权
标题翻译：多层镜，其制造方法和曝光设备
公开(公告)号：US07706058B2
公开(公告)日：2010-04-27
申请号：US12232241
申请日：2008-09-12
申请人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G02B5/26
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
摘要翻译：多层反射镜旨在减少反射率的入射角依赖性。衬底由具有0.2nm RMS或更少表面粗糙度的低热抛光膨胀玻璃制成。在其形成的表面上是具有宽的全宽半峰值反射率的Ru / Si多层，并且形成的Ru / Si多层是具有高峰值反射率值的Mo / Si多层。与仅提供Ru / Si相比，具有比单独提供的Mo / Si多层的全宽半宽的反射率峰值更高的反射率。由于Ru吸收比Mo更多的EUV射线，因此可以获得比在Mo / Si多层上形成有Ru / Si多层的结构更高的反射率。具有宽全宽半最大值的多层膜在光谱反射率方面具有小的入射角反射率依赖性，从而在投影光学系统中实现高成像性能。

10. 发明授权

US06590959B2 High-intensity sources of short-wavelength electromagnetic radiation for microlithography and other uses 失效
标题翻译：用于微光刻和其他用途的高强度短波电磁辐射源
公开(公告)号：US06590959B2
公开(公告)日：2003-07-08
申请号：US09887983
申请日：2001-06-21
申请人： Noriaki Kandaka , Hideki Komatsuda
发明人： Noriaki Kandaka , Hideki Komatsuda
IPC分类号： G21G400
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033
摘要： Sources are disclosed for producing short-wavelength electromagnetic radiation (EMR) such as extreme ultraviolet (“EUV” or “soft X-ray”) radiation useful in microlithography. The sources collect a greater amount of the EMR produced by a plasma than conventional sources and form the collected EMR into an illumination EMR flux having higher intensity than conventionally. The EMR flux desirably has a rotationally symmetrical intensity distribution. The plasma is produced by two electrodes contained in a vacuum chamber. A high-voltage pulsed power supply applies a plasma-creating potential across the electrodes. EMR produced by the plasma is collected, typically by a reflective element configured to form a collimated beam of EMR. The electrodes are configured and oriented such that, as the collimated beam passes by the electrodes, the electrodes exhibit minimal blocking of the EMR flux. The electrodes can include a center electrode and a surrounding hollow cylindrical electrode separated from the center electrode by an insulating member. The axis of rotational symmetry of the electrodes desirably is substantially parallel to the propagation axis of the EMR flux.
摘要翻译：公开了用于生产短波长电磁辐射（EMR）的源，例如用于微光刻的极紫外（“EUV”或“软X射线”）辐射。来源收集比常规光源产生的等离子体更大量的EMR，并将收集的EMR形成具有比传统的更高强度的照明EMR通量。 EMR通量理想地具有旋转对称的强度分布。等离子体由包含在真空室中的两个电极产生。高压脉冲电源在电极之间施加等离子体产生电位。通常通过被配置成形成EMR的准直束的反射元件来收集由等离子体产生的EMR。电极被配置和定向成使得当准直光束通过电极时，电极表现出最小的EMR通量的阻塞。电极可以包括中心电极和通过绝缘构件与中心电极分离的周围的中空圆柱形电极。电极的旋转对称轴理想地基本上平行于EMR通量的传播轴。

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