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1. 发明授权

US06828575B2 Photonic crystals: a medium exhibiting anomalous cherenkov radiation 失效
公开(公告)号：US06828575B2
公开(公告)日：2004-12-07
申请号：US10672015
申请日：2003-09-26
申请人： Chiyan Luo , Mihai Ibanescu , Steven G. Johnson , John D. Joannopoulos
发明人： Chiyan Luo , Mihai Ibanescu , Steven G. Johnson , John D. Joannopoulos
IPC分类号： G21G400
CPC分类号： G01T1/22
摘要： A system for exhibiting Cherenkov radiation is provided. The system includes a beam of charged particles. A photonic crystal structure receives said beam of charged particles. The charged particles moves in said photonic crystal structure so that Cherenkov radiation is produced at all velocities without requiring resonances in the effective material constants of said photonic crystal structure.

2. 发明授权

US06590959B2 High-intensity sources of short-wavelength electromagnetic radiation for microlithography and other uses 失效
标题翻译：用于微光刻和其他用途的高强度短波电磁辐射源
公开(公告)号：US06590959B2
公开(公告)日：2003-07-08
申请号：US09887983
申请日：2001-06-21
申请人： Noriaki Kandaka , Hideki Komatsuda
发明人： Noriaki Kandaka , Hideki Komatsuda
IPC分类号： G21G400
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033
摘要： Sources are disclosed for producing short-wavelength electromagnetic radiation (EMR) such as extreme ultraviolet (“EUV” or “soft X-ray”) radiation useful in microlithography. The sources collect a greater amount of the EMR produced by a plasma than conventional sources and form the collected EMR into an illumination EMR flux having higher intensity than conventionally. The EMR flux desirably has a rotationally symmetrical intensity distribution. The plasma is produced by two electrodes contained in a vacuum chamber. A high-voltage pulsed power supply applies a plasma-creating potential across the electrodes. EMR produced by the plasma is collected, typically by a reflective element configured to form a collimated beam of EMR. The electrodes are configured and oriented such that, as the collimated beam passes by the electrodes, the electrodes exhibit minimal blocking of the EMR flux. The electrodes can include a center electrode and a surrounding hollow cylindrical electrode separated from the center electrode by an insulating member. The axis of rotational symmetry of the electrodes desirably is substantially parallel to the propagation axis of the EMR flux.
摘要翻译：公开了用于生产短波长电磁辐射（EMR）的源，例如用于微光刻的极紫外（“EUV”或“软X射线”）辐射。来源收集比常规光源产生的等离子体更大量的EMR，并将收集的EMR形成具有比传统的更高强度的照明EMR通量。 EMR通量理想地具有旋转对称的强度分布。等离子体由包含在真空室中的两个电极产生。高压脉冲电源在电极之间施加等离子体产生电位。通常通过被配置成形成EMR的准直束的反射元件来收集由等离子体产生的EMR。电极被配置和定向成使得当准直光束通过电极时，电极表现出最小的EMR通量的阻塞。电极可以包括中心电极和通过绝缘构件与中心电极分离的周围的中空圆柱形电极。电极的旋转对称轴理想地基本上平行于EMR通量的传播轴。

3. 发明授权

US06576917B1 Adjustable bore capillary discharge 有权
标题翻译：可调孔毛细管排出
公开(公告)号：US06576917B1
公开(公告)日：2003-06-10
申请号：US09490662
申请日：2000-01-24
申请人： William T. Silfvast
发明人： William T. Silfvast
IPC分类号： G21G400
CPC分类号： H05G2/003 , B82Y10/00 , G01J3/10 , G03F7/70033 , G03F7/70916 , G03F7/70983 , H01J61/12 , H01J61/28 , H01J61/30 , H05G2/005
摘要： An emitting capillary discharge light source is modified by means to provide for constant, capillary discharge chamber diameter despite interior surface erosion during operation of the light source in order to maintain capillary bore size. The emissions are generated within the capillary discharge chamber and discharged from its outlet. The emission also carries debris generated from within the capillary discharge chamber by erosion of its inner walls reducing its initial inner diameter. The debris is deleterious to the mirrors and other components positioned in the emission stream whereas the erosion distorts the plasma beam. This increase in the initial inner diameter of the discharge chamber leads rapidly to poor imaging of the light stream. By keeping the inner bore diameter of the capillary discharge chamber constant, i.e., 110%, and preferably 105%, of the initial inner bore diameter, the imaging problem is overcome.
摘要翻译：发射毛细管放电光源通过在光源操作期间内表面侵蚀以提供恒定的毛细管放电室直径的方法进行修改，以保持毛细管孔尺寸。排放物在毛细管排放室内产生并从其出口排出。排放物还通过其内壁侵蚀减少其初始内径而携带由毛细管排放室内产生的碎屑。碎屑对反射镜和位于排放流中的其它组分是有害的，而侵蚀使等离子体束发生变形。放电室的初始内径的这种增加迅速导致光流的差的成像。通过保持毛细管排出室的内孔直径恒定，即初始内径直径的110％，优选105％，克服了成像问题。

4. 发明授权

US06421421B1 Extreme ultraviolet based on colliding neutral beams 失效
标题翻译：基于碰撞中性梁的极紫外光源
公开(公告)号：US06421421B1
公开(公告)日：2002-07-16
申请号：US09815633
申请日：2001-03-23
申请人： Malcolm W. McGeoch
发明人： Malcolm W. McGeoch
IPC分类号： G21G400
CPC分类号： H05G2/003
摘要： A source of photons includes a discharge chamber, a plurality of ion beam sources in the discharge chamber and a neutralizing mechanism. Each of the ion beam sources electrostatically accelerates a beam of ions of a working gas toward a plasma discharge region. The neutralizing mechanism at least partially neutralizes the ion beams before they enter the plasma discharge region. The neutralized beams enter the plasma discharge region and form a hot plasma that radiates photons. The photons may be in the soft X-ray or extreme ultraviolet wavelength range and, in one embodiment, have wavelengths in a range of about 10-15 nanometers.
摘要翻译：光子源包括放电室，放电室中的多个离子束源和中和机构。每个离子束源将等离子体放电区域的工作气体的离子束静电加速。中和机构在进入等离子体放电区域之前至少部分地中和离子束。中和的光束进入等离子体放电区域并形成辐射光子的热等离子体。光子可以在软X射线或极紫外波长范围内，并且在一个实施例中，波长具有在约10-15纳米的范围内。

5. 发明授权

US06738452B2 Gasdynamically-controlled droplets as the target in a laser-plasma extreme ultraviolet light source 失效
标题翻译：气体动力学控制的液滴作为激光等离子体极紫外光源中的目标
公开(公告)号：US06738452B2
公开(公告)日：2004-05-18
申请号：US10156879
申请日：2002-05-28
申请人： Roy D. McGregor , Robert A. Bunnell , Michael B. Petach , Rocco A. Orsini
发明人： Roy D. McGregor , Robert A. Bunnell , Michael B. Petach , Rocco A. Orsini
IPC分类号： G21G400
CPC分类号： H05G2/003 , H05G2/006 , H05G2/008
摘要： A target material delivery system in the form of a nozzle (50) for an EUV radiation source (10). The nozzle (50) includes a target material supply line (66) having an orifice (68) through which droplets (76) of a liquid target material (64) are emitted, where the droplets (76) have a predetermined size, speed and spacing therebetween. The droplets (76) are mixed with a carrier gas (74) in a mixing chamber (54) enclosing the target material chamber (60) and the mixture of the droplets (76) and the carrier gas (74) enter a drift tube (56) from the mixing chamber (54). The droplets (76) are emitted into an accelerator chamber (124) from the drift tube (56) where the speed of the droplets (76) is increased to control the spacing therebetween. A vapor extractor (90) can be mounted to the accelerator chamber (124) or the drift tube (56) to remove the carrier gas (74) and target material vapor, which would otherwise adversely affect the EUV radiation generation.
摘要翻译：一种用于EUV辐射源（10）的喷嘴（50）形式的目标材料输送系统。喷嘴（50）包括具有孔（68）的目标材料供应管线（66），通过该孔口喷射液体目标材料（64）的液滴（76），其中液滴（76）具有预定尺寸，速度和间隔。液滴（76）与包围目标材料室（60）的混合室（54）中的载体气体（74）混合，并且液滴（76）和载气（74）的混合物进入漂移管 56）。液滴（76）从漂移管（56）发射到加速器室（124）中，其中液滴（76）的速度增加以控制它们之间的间隔。蒸汽提取器（90）可以安装到加速器室（124）或漂移管（56）以去除载气（74）和目标材料蒸气，否则会对EUV辐射产生不利影响。

6. 发明授权

US06728337B2 Star pinch plasma source of photons or neutrons 失效
标题翻译：星形等离子体源的光子或中子
公开(公告)号：US06728337B2
公开(公告)日：2004-04-27
申请号：US10165998
申请日：2002-06-10
申请人： Malcolm W. McGeoch
发明人： Malcolm W. McGeoch
IPC分类号： G21G400
CPC分类号： H05G2/003 , G03F7/70033
摘要： A source of photons or neutrons includes a housing that defines a discharge chamber, a first group of ion beam sources directed toward a plasma discharge region in the discharge chamber, the first group of ion beam sources including a first electrode and an inner shell, and a second electrode spaced from the plasma discharge region. The source of photons or neutrons further includes a first power supply for energizing the first group of ion beam sources to electrostatically accelerate toward the plasma discharge region ion beams which are at least partially neutralized before they enter the plasma discharge region, and a second power supply coupled between the first and second electrodes for delivering a heating current to the plasma discharge region. The ion beams and the heating current form a hot plasma that radiates photons or neutrons. The source of photons or neutrons may further include a second group of ion beam sources. The photons may be in the soft X-ray or extreme ultraviolet wavelength range and, in one embodiment, have wavelengths in a range of about 10-15 nanometers.
摘要翻译：光子或中子源包括限定放电室的壳体，指向放电室中的等离子体放电区域的第一组离子束源，第一组离子束源包括第一电极和内壳，以及与等离子体放电区间隔开的第二电极。光子或中子的源还包括用于激励第一组离子束源的静电加速的等离子体放电区离子束的第一电源，所述离子束在它们进入等离子体放电区域之前至少部分被中和，第二电源耦合在第一和第二电极之间，用于将加热电流传送到等离子体放电区域。离子束和加热电流形成辐射光子或中子的热等离子体。光子或中子的源可以进一步包括第二组离子束源。光子可以在软X射线或极紫外波长范围内，并且在一个实施例中，波长具有在约10-15纳米的范围内。

7. 发明授权

US06630678B2 Ultraviolet air purifying apparatus 有权
公开(公告)号：US06630678B2
公开(公告)日：2003-10-07
申请号：US09767998
申请日：2001-01-23
申请人： Steve Guzorek
发明人： Steve Guzorek
IPC分类号： G21G400
CPC分类号： F24F3/16 , F24F13/02 , F24F2003/1667
摘要： An ultraviolet device used for flooding an air duct of an air ventilation system with ultraviolet light comprising a mounting portion, the mounting portion that is mountable to an air duct, at least one mounting bracket which is interchangeably mountable to the mounting portion and at least one ultraviolet light lamp, the lamp is mountable to the mounting bracket wherein the angle at which the lamp mounts to said mounting bracket may be configured to maximize the coverage of ultraviolet light within the air duct.

8. 发明授权

US06563907B1 Radiation source with shaped emission 有权
标题翻译：辐射源与成型发射
公开(公告)号：US06563907B1
公开(公告)日：2003-05-13
申请号：US10005600
申请日：2001-12-07
申请人： Glenn D. Kubiak , William C. Sweatt
发明人： Glenn D. Kubiak , William C. Sweatt
IPC分类号： G21G400
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70083 , H05H2240/00
摘要： Employing a source of radiation, such as an electric discharge source, that is equipped with a capillary region configured into some predetermined shape, such as an arc or slit, can significantly improve the amount of flux delivered to the lithographic wafers while maintaining high efficiency. The source is particularly suited for photolithography systems that employs a ringfield camera. The invention permits the condenser which delivers critical illumination to the reticle to be simplified from five or more reflective elements to a total of three or four reflective elements thereby increasing condenser efficiency. It maximizes the flux delivered and maintains a high coupling efficiency. This architecture couples EUV radiation from the discharge source into a ring field lithography camera.
摘要翻译：使用诸如放电源的辐射源（如放电源）配置有一些预定形状的诸如电弧或狭缝的毛细管区域，可以显着提高输送到光刻晶片的磁通量，同时保持高效率。该光源特别适用于采用环形相机的光刻系统。本发明允许将对光罩进行临界照明的冷凝器从五个或更多个反射元件简化为总共三个或四个反射元件，从而提高冷凝器效率。它最大限度地提高了焊剂的流动，保持了高的耦合效率。该架构将EUV辐射从放电源耦合到环形光刻照相机中。

9. 发明授权

US06452199B1 Plasma focus high energy photon source with blast shield 失效
标题翻译：等离子体聚焦高能光子源与防风罩
公开(公告)号：US06452199B1
公开(公告)日：2002-09-17
申请号：US09442582
申请日：1999-11-18
申请人： William N. Partlo , Igor V. Fomenkov , Daniel L. Birx
发明人： William N. Partlo , Igor V. Fomenkov , Daniel L. Birx
IPC分类号： G21G400
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005
摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the active gas. A blast shield positioned just beyond the location of the high density pinch provides a physical barrier which confines the pinch limiting its axial elongation. A small port is provided in the blast shield that permits the radiation but not the plasma to pass through the shield. In a preferred embodiment a surface of the shield facing the plasma is dome-shaped.
摘要翻译：高能光子源。一对等离子体夹紧电极位于真空室中。该室包含工作气体，其包括贵重缓冲气体和被选择用于提供所需光谱线的活性气体。脉冲电源以足够高的电压提供电脉冲，以在电极之间产生放电，以在工作气体中产生非常高温度，高密度的等离子体夹持，从而在活性气体的谱线处提供辐射。位于刚刚超出高密度夹点位置的防爆罩提供了限制其限制其轴向伸长的夹紧的物理屏障。防爆罩中设有一个允许辐射而不是等离子体通过防护罩的小型端口。在优选实施例中，面向等离子体的屏蔽的表面是圆顶形的。

10. 发明授权

US06818900B2 Optical radiation sensor system and method for measuring radiation transmittance of a fluid 失效
标题翻译：用于测量流体辐射透射率的光学辐射传感器系统和方法
公开(公告)号：US06818900B2
公开(公告)日：2004-11-16
申请号：US09882297
申请日：2001-06-18
申请人： James W. Ellis , Mike Sasges , Peter Van Doodewaard , Alex Verdun
发明人： James W. Ellis , Mike Sasges , Peter Van Doodewaard , Alex Verdun
IPC分类号： G21G400
CPC分类号： G01J1/429 , A61L2/10 , C02F1/325 , C02F2201/326 , G01N21/534
摘要： An optical radiation sensor device for detecting radiation in a radiation field having a thickness. A preferred embodiment of the device includes a radiation source and a radiation sensor element positioned to receive radiation from the radiation source. A motor (or other motive means) is provided to alter the thickness of the radiation field from a first thickness to a second thickness. The sensor element is capable of detecting and responding to incident radiation from radiation source at the first thickness and at the second thickness. The optical radiation sensor device allows for determination of radiation (preferably ultraviolet radiation) transmittance of a fluid of interest.
摘要翻译：一种用于检测具有厚度的辐射场中的辐射的光辐射传感器装置。设备的优选实施例包括辐射源和放射线传感器元件，其被定位成接收来自辐射源的辐射。提供电动机（或其他动力装置）以将辐射场的厚度从第一厚度改变到第二厚度。传感器元件能够检测并响应来自第一厚度和第二厚度处的辐射源的入射辐射。光学辐射传感器装置允许确定感兴趣的流体的辐射（优选紫外线辐射）透射率。

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