专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08800451B2 Gas generator 有权
标题翻译：气体发生器
公开(公告)号：US08800451B2
公开(公告)日：2014-08-12
申请号：US13387591
申请日：2010-03-05
申请人： Tetsuya Sawada , Toshihiko Tamura , Masayuki Shiraishi
发明人： Tetsuya Sawada , Toshihiko Tamura , Masayuki Shiraishi
IPC分类号： B60R22/26 , C06D5/00
CPC分类号： F42B3/107 , F42B3/04
摘要： The present invention configures a gas generator (A) wherein, with regard to a plug assembly (2), a ring (22) is formed of insulative resin, electrode pins (21) are equipped midway with flange portions (21a), and these flange portions (21a) are integrally formed in a state embedded inside the ring (22), and, in addition, the diameter of the flange portions (21a) is made a larger diameter than the short sides of this opening portion (1a) of the holder (1), the sum of the sector angles (R) formed by the outer peripheral portions (21r) of the flange portions (21a) of the electrode pins (21) located outside the opening portion of the holder (1) and the electrode pins (21) is configured to be 180 degrees or greater, the flange portions (21a) of the electrode pins (21) are further made mutually non-contacting, and the minimum distance (D) between the electrode pins (21) and the periphery of the opening portion (1a) of the holder (1) through which these electrode pins (21) are inserted is made 0.5 mm.
摘要翻译：本发明构成了一种气体发生器（A），其中，相对于插头组件（2），由绝缘树脂形成环（22），电极销（21）在中间配置有凸缘部分（21a），并且这些凸缘部（21a）以嵌入在环（22）内的状态一体形成，另外，凸缘部（21a）的直径比该开口部（1a）的短边大所述保持器（1）由位于所述保持器（1）的开口部外侧的所述电极针（21）的所述凸缘部（21a）的外周部（21r）的外周部（21r）之间的扇形角（R）电极销（21）构成为180度以上，电极针（21）的凸缘部（21a）进一步相互不接触，电极针（21）之间的最小距离（D）并且通过其插入这些电极销（21）的保持器（1）的开口部分（1a）的周边是疯狂的 e 0.5 mm。

2. 发明授权

US08194322B2 Multilayer-film reflective mirror, exposure apparatus, device manufacturing method, and manufacturing method of multilayer-film reflective mirror 有权
标题翻译：多层膜反射镜，曝光装置，器件制造方法以及多层膜反射镜的制造方法
公开(公告)号：US08194322B2
公开(公告)日：2012-06-05
申请号：US12074903
申请日：2008-03-07
申请人： Masayuki Shiraishi
发明人： Masayuki Shiraishi
IPC分类号： G02B1/10
CPC分类号： B82Y10/00 , G02B5/0891 , G03F1/24 , G03F7/70958 , G21K1/062 , G21K2201/064 , G21K2201/067
摘要： Multilayer-film reflective mirrors are disclosed. An exemplary such mirror has a base and a multilayer film formed on the base. The multilayer film includes multiple layer pairs. Each layer pair includes a respective first layer and a respective second layer, wherein the first and second layers are laminated together in an alternating manner. The multilayer film has first and second regions that reflect extreme ultraviolet light. A first group of layers is disposed in the first and second regions and has a first periodic length. A second group disposed in the first region has a second periodic length different from the first periodic length, and a third group disposed in the second region has a substantially same periodic length as the first periodic length.
摘要翻译：公开了多层膜反射镜。示例性的这种反射镜具有形成在基底上的基底和多层膜。多层膜包括多层对。每个层对包括相应的第一层和相应的第二层，其中第一层和第二层以交替的方式层压在一起。多层膜具有反射极紫外光的第一和第二区域。第一组层设置在第一和第二区域中并具有第一周期长度。设置在第一区域中的第二组具有与第一周期长度不同的第二周期长度，并且设置在第二区域中的第三组具有与第一周期长度基本相同的周期长度。

3. 发明授权

US07491955B2 EUV light source, EUV exposure system, and production method for semiconductor device 有权
标题翻译： EUV光源，EUV曝光系统和半导体器件的制造方法
公开(公告)号：US07491955B2
公开(公告)日：2009-02-17
申请号：US11629498
申请日：2005-06-22
申请人： Masayuki Shiraishi
发明人： Masayuki Shiraishi
IPC分类号： G01N21/33 , G01J3/10 , H05H1/24
CPC分类号： H05G2/003 , H05G2/005
摘要： An Sn—Ga type alloy having a composition in which the atomic % of Sn is 15% or less is accommodated inside a heated tank 4. The Sn alloy pressurized by the pressurizing pump is conducted to a nozzle 1, so that a liquid-form Sn alloy is caused to jet from the tip end of this nozzle 1 disposed inside a vacuum chamber 7. The liquid-form Sn alloy that is caused to jet from the nozzle 1 has a spherical shape as a result of surface tension, and forms a target 2. Laser light generated by an Nd:YAG laser light source 8 disposed on the outside of the vacuum chamber 7 is focused by a lens 9 and introduced into the vacuum chamber 7. The target 2 that is irradiated by the laser is converted into a plasma, and radiates light that includes EUV light.
摘要翻译：具有Sn原子％为15％以下的Sn-Ga型合金被容纳在加热槽4内。由加压泵加压的Sn合金被导入喷嘴1，从而形成液态使Sn合金从设置在真空室7内的喷嘴1的前端射出。由喷嘴1喷射的液态Sn合金由于表面张力而呈球形，形成由设置在真空室7外部的Nd：YAG激光光源8产生的激光由透镜9聚焦并被引入真空室7.被激光照射的靶2被转换成等离子体，并辐射包含EUV光的光。

4. 发明授权

US07382527B2 EUV multilayer mirror with phase shifting layer 有权
标题翻译：具有相移层的EUV多层反射镜
公开(公告)号：US07382527B2
公开(公告)日：2008-06-03
申请号：US11401946
申请日：2006-04-12
申请人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G02B5/26
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
摘要翻译：多层反射镜旨在减少反射率的入射角依赖性。衬底由具有0.2nm RMS或更少表面粗糙度的低热抛光膨胀玻璃制成。在其形成的表面上是具有宽的全宽半峰值反射率的Ru / Si多层，并且形成的Ru / Si多层是具有高峰值反射率值的Mo / Si多层。与仅提供Ru / Si相比，具有比单独提供的Mo / Si多层的全宽半宽的反射率峰值更高的反射率。由于Ru吸收比Mo更多的EUV射线，因此可以获得比在Mo / Si多层上形成有Ru / Si多层的结构更高的反射率。具有宽全宽半最大值的多层膜在光谱反射率方面具有小的入射角反射率依赖性，从而在投影光学系统中实现高成像性能。

5. 发明授权

US07203275B2 Multilayer film reflector and X-ray exposure system 有权
标题翻译：多层膜反射体和X射线曝光系统
公开(公告)号：US07203275B2
公开(公告)日：2007-04-10
申请号：US11272610
申请日：2005-11-14
申请人： Masayuki Shiraishi
发明人： Masayuki Shiraishi
IPC分类号： G21K1/06
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F7/70233 , G03F7/70958 , G21K1/062 , G21K2201/067 , H01L21/0332
摘要： The present invention makes it possible to obtain a multilayer film reflective mirror 61 comprising a first multilayer film 67 which is formed by alternately laminating Mo layers 671 and Si layers 673 on a substrate 63, and a second multilayer film 65 which is formed on top of the first multilayer film 67, and which is formed by alternately laminating Mo layers 651 and Si layers 653, wherein the thickness of the Mo layers in the first multilayer film is substantially equal to or smaller than the thickness of the Mo layers in the second multilayer film, and the ratio of the thickness of the Mo layers to the thickness of the Si layers in the first multilayer film is different from the ratio of these thicknesses in the second multilayer film. As a result, a multilayer film reflective mirror with a low internal stress in which a drop in the reflectivity is suppressed can be obtained.
摘要翻译：本发明使得可以获得多层膜反射镜61，其包括通过在基板63上交替层叠Mo层671和Si层673而形成的第一多层膜67和形成在基板63上的第二多层膜65 第一多层膜67，其通过交替层叠Mo层651和Si层653而形成，其中第一多层膜中的Mo层的厚度基本上等于或小于第二层中的Mo层的厚度膜，并且Mo层的厚度与第一多层膜中的Si层的厚度的比例与第二多层膜中的这些厚度的比率不同。结果，可以获得其中反射率下降被抑制的具有低内应力的多层膜反射镜。

6. 发明授权

US08945802B2 Flare-measuring mask, flare-measuring method, and exposure method 有权
标题翻译：闪光测量面罩，闪光测量方法和曝光方法
公开(公告)号：US08945802B2
公开(公告)日：2015-02-03
申请号：US12654438
申请日：2009-12-18
申请人： Masayuki Shiraishi
发明人： Masayuki Shiraishi
IPC分类号： G03F7/20 , G06F17/50 , G01N21/59 , G03F1/00 , G03F1/44
CPC分类号： G03F1/44 , G01N21/4738 , G03F1/14 , G03F1/144 , G03F1/22 , G03F1/70 , G03F1/84 , G03F7/70941
摘要： A method for measuring flare information of a projection optical system includes arranging, on an object plane of the projection optical system, a sectoral pattern surrounded by a first side, a second side which is inclined at a predetermined angle with respect to the first side, and an inner diameter portion and an outer diameter portion which connect both ends of the first side and both ends of the second side; projecting an image of the sectoral pattern via the projection optical system; and determining the flare information based on a light amount of the image of the sectoral pattern and a light amount provided at a position away from the image. With the flare measuring method, it is possible to correctly measure the flare information in an arbitrary angle range of the sectoral pattern.
摘要翻译：一种用于测量投影光学系统的耀斑信息的方法包括：在投影光学系统的物平面上布置由第一侧围绕的扇形图案，相对于第一侧以预定角度倾斜的第二侧，以及连接第一侧的两端和第二侧的两端的内径部和外径部; 通过投影光学系统投影扇形图案的图像; 以及基于扇区图案的图像的光量和设置在远离图像的位置处的光量来确定闪光信息。通过闪光测量方法，可以在扇形图案的任意角度范围内正确地测量耀斑信息。

7. 发明授权

US07948675B2 Surface-corrected multilayer-film mirrors with protected reflective surfaces, exposure systems comprising same, and associated methods 有权
标题翻译：具有受保护反射表面的表面校正多层膜反射镜，包括其的曝光系统以及相关方法
公开(公告)号：US07948675B2
公开(公告)日：2011-05-24
申请号：US12070622
申请日：2008-02-19
申请人： Masayuki Shiraishi
发明人： Masayuki Shiraishi
IPC分类号： G02B5/08
CPC分类号： G02B5/0891 , G02B1/105 , G02B1/14
摘要： Multilayer-film reflective mirrors are disclosed that exhibit desired optical characteristics and resistance to reflective-surface degradation. An exemplary multilayer-film mirror includes a base and a multilayer film on the base. The multilayer film is made of first and second layers alternatingly laminated at a prescribed period length. The surface of the multilayer film has an irregular surface profile, relative to the surface profile of the base. The multilayer film reflects incident extreme ultraviolet (EUV) light. A third layer, situated on and covering the surface of the multilayer film, is formed of a substance having substantially the same refractive index to EUV light as the refractive index of a vacuum. The third layer has a surface profile substantially the same as the surface contour of the base. The third layer is covered with a protective layer.
摘要翻译：公开了表现出期望的光学特性和抗反射表面退化的多层膜反射镜。示例性的多层膜反射镜包括基底和在基底上的多层膜。多层膜以规定的周期长度交替层叠的第一层和第二层制成。多层膜的表面相对于基底的表面轮廓具有不规则的表面轮廓。多层膜反射入射极紫外（EUV）光。位于多层膜表面上并覆盖多层膜表面的第三层由与真空的折射率相当的EUV光的折射率基本相同的物质形成。第三层具有与基部的表面轮廓基本相同的表面轮廓。第三层被保护层覆盖。

8. 发明申请

US20100149509A1 Optical system, exposure apparatus, and method of manufacturing electronic device 有权
标题翻译：光学系统，曝光装置和制造电子装置的方法
公开(公告)号：US20100149509A1
公开(公告)日：2010-06-17
申请号：US12585571
申请日：2009-09-17
申请人： Masayuki Shiraishi , Takuro Ono
发明人： Masayuki Shiraishi , Takuro Ono
IPC分类号： G03B27/72 , G02B7/00 , G02B5/08 , G02B26/02 , G03B27/32
CPC分类号： G03F7/7025 , G02B5/005 , G02B17/0657 , G03F7/70091
摘要： An aperture diaphragm plate is provided to define a light flux on a pupil plane of an optical system or a plane or surface disposed in the vicinity of the pupil plane. An aperture, which is formed in the aperture diaphragm plate, has a three-dimensional shape corresponding to an optimum pupil shape of the optical system. It is possible to improve the imaging characteristic brought about by the optical system by providing the optimum pupil shape of the optical system.
摘要翻译：设置孔径光阑板以限定光学系统的光瞳平面上的光束或者设置在瞳平面附近的平面或表面。形成在孔径光阑板中的孔具有对应于光学系统的最佳光瞳形状的三维形状。通过提供光学系统的最佳光瞳形状，可以提高光学系统带来的成像特性。

9. 发明申请

US20080123073A1 Optical element, exposure apparatus using the same, and device manufacturing method 审中-公开
标题翻译：光学元件，使用其的曝光装置和装置制造方法
公开(公告)号：US20080123073A1
公开(公告)日：2008-05-29
申请号：US11984616
申请日：2007-11-20
申请人： Masayuki Shiraishi , Katsuhiko Murakami
发明人： Masayuki Shiraishi , Katsuhiko Murakami
IPC分类号： G03B27/54 , G02B5/08
CPC分类号： G03F7/70958 , B82Y10/00 , B82Y40/00 , G02B5/0891 , G03B27/54 , G03F1/24 , G03F7/70316 , G03F7/70783 , G03F7/70941
摘要： There is disclosed an optical element, comprising, a supporting substrate, a multilayer film being supported on the substrate and reflecting extreme ultraviolet light, and an alloy layer provided between the multilayer film and the substrate.
摘要翻译：公开了一种光学元件，包括：支撑基板，支撑在基板上并反射极紫外光的多层膜，以及设置在多层膜和基板之间的合金层。

10. 发明申请

US20070248127A1 Optical-element-cooling devices and exposure apparatus comprising optical elements including same 审中-公开
标题翻译：光学元件冷却装置和包括包括其的光学元件的曝光装置
公开(公告)号：US20070248127A1
公开(公告)日：2007-10-25
申请号：US11711958
申请日：2007-02-27
申请人： Masayuki Shiraishi
发明人： Masayuki Shiraishi
IPC分类号： H01S3/04 , H01L21/3115
CPC分类号： G03F7/70891 , G02B7/008 , G02B7/1815
摘要： Cooling devices are disclosed for use with mirrors and other optical elements subject to heating during use, especially as used in lithographic exposure apparatus. The cooling devices pose minimal risk of damage caused by coolant leaks, provide simplified maintenance, and reduce vibrations while providing good cooling performance. An exemplary cooling device includes a cooling element (e.g., Peltier element) proximal to the optical element and a heat-conduction member mounted on the heat-dissipating side of the cooling element. The heat-conduction member extends, within the exposure apparatus, away from the optical element, and the extended portion of the heat-conduction member is cooled.
摘要翻译：公开了冷却装置，用于在使用期间受到加热的反射镜和其它光学元件，特别是在光刻曝光设备中使用。冷却装置对冷却剂泄漏造成的损坏风险最小，提供简化的维护，并减少振动，同时提供良好的冷却性能。示例性的冷却装置包括靠近光学元件的冷却元件（例如，珀耳贴元件）和安装在冷却元件的散热侧上的热传导部件。导热构件在曝光装置内延伸远离光学元件，并且导热构件的延伸部分被冷却。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式