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1. 发明授权

US07382527B2 EUV multilayer mirror with phase shifting layer 有权
标题翻译：具有相移层的EUV多层反射镜
公开(公告)号：US07382527B2
公开(公告)日：2008-06-03
申请号：US11401946
申请日：2006-04-12
申请人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G02B5/26
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
摘要翻译：多层反射镜旨在减少反射率的入射角依赖性。衬底由具有0.2nm RMS或更少表面粗糙度的低热抛光膨胀玻璃制成。在其形成的表面上是具有宽的全宽半峰值反射率的Ru / Si多层，并且形成的Ru / Si多层是具有高峰值反射率值的Mo / Si多层。与仅提供Ru / Si相比，具有比单独提供的Mo / Si多层的全宽半宽的反射率峰值更高的反射率。由于Ru吸收比Mo更多的EUV射线，因此可以获得比在Mo / Si多层上形成有Ru / Si多层的结构更高的反射率。具有宽全宽半最大值的多层膜在光谱反射率方面具有小的入射角反射率依赖性，从而在投影光学系统中实现高成像性能。

2. 发明授权

US07706058B2 Multilayer mirror, method for manufacturing the same, and exposure equipment 有权
标题翻译：多层镜，其制造方法和曝光设备
公开(公告)号：US07706058B2
公开(公告)日：2010-04-27
申请号：US12232241
申请日：2008-09-12
申请人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G02B5/26
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
摘要翻译：多层反射镜旨在减少反射率的入射角依赖性。衬底由具有0.2nm RMS或更少表面粗糙度的低热抛光膨胀玻璃制成。在其形成的表面上是具有宽的全宽半峰值反射率的Ru / Si多层，并且形成的Ru / Si多层是具有高峰值反射率值的Mo / Si多层。与仅提供Ru / Si相比，具有比单独提供的Mo / Si多层的全宽半宽的反射率峰值更高的反射率。由于Ru吸收比Mo更多的EUV射线，因此可以获得比在Mo / Si多层上形成有Ru / Si多层的结构更高的反射率。具有宽全宽半最大值的多层膜在光谱反射率方面具有小的入射角反射率依赖性，从而在投影光学系统中实现高成像性能。

3. 发明申请

US20090097104A1 Multilayer mirror, method for manufacturing the same, and exposure equipment 有权
标题翻译：多层镜，其制造方法和曝光设备
公开(公告)号：US20090097104A1
公开(公告)日：2009-04-16
申请号：US12232241
申请日：2008-09-12
申请人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G02B5/26
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
摘要翻译：多层反射镜旨在减少反射率的入射角依赖性。衬底由具有0.2nm RMS或更少表面粗糙度的低热抛光膨胀玻璃制成。在其形成的表面上是具有宽的全宽半峰值反射率的Ru / Si多层，并且形成的Ru / Si多层是具有高峰值反射率值的Mo / Si多层。与仅提供Ru / Si相比，具有比单独提供的Mo / Si多层的全宽半宽的反射率峰值更高的反射率。由于Ru吸收比Mo更多的EUV射线，因此可以获得比在Mo / Si多层上形成有Ru / Si多层的结构更高的反射率。具有宽全宽半最大值的多层膜在光谱反射率方面具有小的入射角反射率依赖性，从而在投影光学系统中实现高成像性能。

4. 发明申请

US20060192147A1 Multilayer mirror, method for manufacturing the same, and exposure equipment 有权
公开(公告)号：US20060192147A1
公开(公告)日：2006-08-31
申请号：US11401946
申请日：2006-04-12
申请人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G21G5/00 , A61N5/00
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.

5. 发明授权

US07440182B2 Multilayer mirror, method for manufacturing the same, and exposure equipment 有权
标题翻译：多层镜，其制造方法和曝光设备
公开(公告)号：US07440182B2
公开(公告)日：2008-10-21
申请号：US11907798
申请日：2007-10-17
申请人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G02B5/26
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
摘要翻译：多层反射镜旨在减少反射率的入射角依赖性。衬底由具有0.2nm RMS或更少表面粗糙度的低热抛光膨胀玻璃制成。在其形成的表面上是具有宽的全宽半峰值反射率的Ru / Si多层，并且形成的Ru / Si多层是具有高峰值反射率值的Mo / Si多层。与仅提供Ru / Si相比，具有比单独提供的Mo / Si多层的全宽半宽的反射率峰值更高的反射率。由于Ru吸收比Mo更多的EUV射线，因此可以获得比在Mo / Si多层上形成有Ru / Si多层的结构更高的反射率。具有宽全宽半最大值的多层膜在光谱反射率方面具有小的入射角反射率依赖性，从而在投影光学系统中实现高成像性能。

6. 发明申请

US20050157384A1 Multilayer reflective mirrors for EUV, wavefront-aberration-correction methods for same, and EUV optical systems comprising same 审中-公开
标题翻译：用于EUV的多层反射镜，用于其的波前像差校正方法以及包含该反射镜的EUV光学系统
公开(公告)号：US20050157384A1
公开(公告)日：2005-07-21
申请号：US11025002
申请日：2004-12-28
申请人： Masayuki Shiraishi , Katsuhiko Murakami , Hiroyuki Kondo , Noriaki Kandaka
发明人： Masayuki Shiraishi , Katsuhiko Murakami , Hiroyuki Kondo , Noriaki Kandaka
IPC分类号： G02B5/08 , G03F7/20
CPC分类号： G03F7/706 , G02B5/08 , G03F7/70216 , G03F7/70258 , G03F7/70316
摘要： Multilayer mirrors are disclosed for use especially in “Extreme Ultraviolet” (“soft X-ray,” or “EUV”) optical systems. Each multilayer mirror includes a stack of alternating layers of a first material and a second material, respectively, to form an EUV-reflective surface. The first material has a refractive index substantially the same as a vacuum, and the second material has a refractive index that differs sufficiently from the refractive index of the first material to render the mirror reflective to EUV radiation. The wavefront profile of EUV light reflected from the surface is corrected by removing (“machining” away) at least one surficial layer of the stack in selected region(s) of the surface of the stack. Machining can be performed such that machined regions have smooth tapered edges rather than abrupt edges. The stack can include first and second layer groups that allow the unit of machining to be very small, thereby improving the accuracy with which wavefront-aberration correction can be conducted. Also disclosed are various at-wavelength techniques for measuring reflected-wavelength profiles of the mirror. The mirror surface can include a cover layer of a durable material having high transparency and that reduces variations in reflectivity of the surface caused by machining the selected regions.
摘要翻译：公开了多层反射镜用于特别是在“极光紫外线”（“软X射线”或“EUV”）光学系统中。每个多层反射镜分别包括第一材料和第二材料的交替层叠，以形成EUV反射表面。第一材料具有与真空基本相同的折射率，并且第二材料具有与第一材料的折射率充分不同的折射率，以使反射镜反射成EUV辐射。通过在堆叠的表面的选定区域中移除（“加工”）去除堆叠的至少一个表面层来校正从表面反射的EUV光的波前轮廓。可以进行加工，使得加工区域具有平滑的锥形边缘而不是突然的边缘。堆叠可以包括允许加工单元非常小的第一和第二层组，从而提高可以进行波前像差校正的精度。还公开了用于测量反射镜的反射波长分布的各种一般波长技术。镜面可以包括具有高透明度的耐用材料的覆盖层，并且减少由加工所选择的区域引起的表面的反射率的变化。

7. 发明申请

US20080049307A1 Multilayer mirror, method for manufacturing the same, and exposure equipment 有权
标题翻译：多层镜，其制造方法和曝光设备
公开(公告)号：US20080049307A1
公开(公告)日：2008-02-28
申请号：US11907798
申请日：2007-10-17
申请人： Nariaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Nariaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G02B5/09
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full- width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
摘要翻译：多层反射镜旨在减少反射率的入射角依赖性。衬底由具有0.2nm RMS或更少表面粗糙度的低热抛光膨胀玻璃制成。在其形成的表面上是具有宽的全宽半峰值反射率的Ru / Si多层，并且形成的Ru / Si多层是具有高峰值反射率值的Mo / Si多层。与单独提供的Ru / Si相比，具有比仅提供Mo / Si多层的全宽半宽的反射率峰值更高的反射率。由于Ru吸收比Mo更多的EUV射线，因此可以获得比在Mo / Si多层上形成有Ru / Si多层的结构更高的反射率。具有宽全宽半最大值的多层膜在光谱反射率方面具有小的入射角反射率依赖性，从而在投影光学系统中实现高成像性能。

8. 发明授权

US08121254B2 Optical element, exposure apparatus using this, and device manufacturing method 有权
标题翻译：光学元件，使用它的曝光装置和装置制造方法
公开(公告)号：US08121254B2
公开(公告)日：2012-02-21
申请号：US12509292
申请日：2009-07-24
申请人： Katsuhiko Murakami , Takaharu Komiya
发明人： Katsuhiko Murakami , Takaharu Komiya
IPC分类号： G21K1/06 , G21K5/00
CPC分类号： G02B17/0657 , B82Y10/00 , G02B5/0816 , G02B5/0891 , G02B5/26 , G03F7/70308 , G03F7/70316 , G03F7/70575 , G03F7/70916 , G03F7/70958 , G21K1/062
摘要： On a multilayer film mirror, a protective layer is formed having a varied composition in the depth direction. The protective layer includes an interface side layer formed on a thin film layer, i.e., the outermost layer of a multilayer film, a surface side layer provided on the interface side layer as the outermost surface of an optical element, and an intermediate layer. The interface side layer has properties such as providing relative absorption of non-exposure light from a light source. The surface side layer suppresses oxidation of the surface of the multilayer film.
摘要翻译：在多层膜反射镜上形成在深度方向上具有不同组成的保护层。保护层包括形成在薄膜层上的界面侧层，即多层膜的最外层，设置在作为光学元件的最外表面的界面侧层上的表面侧层和中间层。界面侧层具有诸如提供来自光源的非曝光光的相对吸收的性质。表面侧层抑制多层膜的表面的氧化。

9. 发明申请

US20080266651A1 OPTICAL APPARATUS, MULTILAYER-FILM REFLECTIVE MIRROR, EXPOSURE APPARATUS, AND DEVICE 审中-公开
标题翻译：光学装置，多层反射镜，曝光装置和装置
公开(公告)号：US20080266651A1
公开(公告)日：2008-10-30
申请号：US12034585
申请日：2008-02-20
申请人： Katsuhiko Murakami , Takaharu Komiya
发明人： Katsuhiko Murakami , Takaharu Komiya
IPC分类号： G02B5/08
CPC分类号： G03F7/70958 , G02B5/0833 , G02B5/0891 , G03F7/70233
摘要： An optical apparatus comprises a plurality of multilayer-film reflective mirrors that are capable of reflecting a electromagnetic wave in an extreme ultraviolet region. The multilayer-film reflective mirrors are arranged along an optical axis of the electromagnetic wave, and at least two of the multilayer-film reflective mirrors have reflecting, wavelength characteristics being different from each other, in a wavelength region other than the extreme ultraviolet region.
摘要翻译：光学装置包括能够在极紫外区域反射电磁波的多个多层膜反射镜。多层膜反射镜沿着电磁波的光轴布置，并且至少两个多层膜反射镜在除了极紫外区域之外的波长区域中具有彼此不同的反射波长特性。

10. 发明申请

US20100190113A1 OPTICAL ELEMENT, EXPOSURE APPARATUS USING THIS, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：光学元件，使用这种曝光装置，以及器件制造方法
公开(公告)号：US20100190113A1
公开(公告)日：2010-07-29
申请号：US12509292
申请日：2009-07-24
申请人： Katsuhiko Murakami , Takaharu Komiya
发明人： Katsuhiko Murakami , Takaharu Komiya
IPC分类号： G03F7/20 , G03B27/54 , G02B5/22
CPC分类号： G02B17/0657 , B82Y10/00 , G02B5/0816 , G02B5/0891 , G02B5/26 , G03F7/70308 , G03F7/70316 , G03F7/70575 , G03F7/70916 , G03F7/70958 , G21K1/062
摘要： On a multilayer film mirror, a protective layer is formed having a varied composition in the depth direction. The protective layer includes an interface side layer formed on a thin film layer, i.e., the outermost layer of a multilayer film, a surface side layer provided on the interface side layer as the outermost surface of an optical element, and an intermediate layer. The interface side layer has properties such as providing relative absorption of non-exposure light from a light source. The surface side layer suppresses oxidation of the surface of the multilayer film.
摘要翻译：在多层膜反射镜上形成在深度方向上具有不同组成的保护层。保护层包括形成在薄膜层上的界面侧层，即多层膜的最外层，设置在作为光学元件的最外表面的界面侧层上的表面侧层和中间层。界面侧层具有诸如提供来自光源的非曝光光的相对吸收的性质。表面侧层抑制多层膜的表面的氧化。

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