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1. 发明专利

JP2008022026A Reliable, modular, production-quality narrow-band high repetition-rate f2 laser 审中-公开
标题翻译：可靠，模块化，生产质量窄带高反射率F2激光
公开(公告)号：JP2008022026A
公开(公告)日：2008-01-31
申请号：JP2007236405
申请日：2007-09-12
申请人： Cymer Inc , サイマー, インコーポレイテッドCymer, Inc.
发明人： HOFMANN THOMAS , HUEBER JEAN-MARC , DAS PALASH P , ISHIHARA TOSHIHIKO , THOMAS P DAFFY , JOHN T MELCHIOR , BESAUCELE HERVE A , MORTON RICHARD G , NESS RICHARD M , NEWMAN PETER C , PARTLO WILLIAM N , ROTHWEIL DANIEL A , SANDSTROM RICHARD L
IPC分类号： H01S3/03 , H01S3/097 , G03F7/20 , H01S3/137 , H01S3/225
CPC分类号： G03F7/70575
摘要： PROBLEM TO BE SOLVED: To provide a reliable, modular, production-quality narrow-band high repetition-rate F 2 laser. SOLUTION: A reliable, modular, production-quality excimer laser capable of producing 10 mJ laser pulses in the range of 1,000 Hz to 2,000 Hz or greater is provided. Replaceable modules include a laser chamber, a pulse power system including three modules, an optical resonator comprised of a line narrowing module and an output coupler module, a wavemeter module, an electrical control module, a cooling water module, and a gas control module. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供可靠的模块化生产质量窄带高重复率F 2 激光器。
解决方案：提供了一种可靠，模块化，生产质量准分子激光器，能够产生1,000 Hz至2,000 Hz或更大范围内的10 mJ激光脉冲。可替代模块包括激光室，包括三个模块的脉冲电力系统，包括线路窄化模块和输出耦合器模块的光学谐振器，波形计模块，电气控制模块，冷却水模块和气体控制模块。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2007281517A F2 laser with visible red and ir control 审中-公开
标题翻译： F2激光与可见的红色和红外控制
公开(公告)号：JP2007281517A
公开(公告)日：2007-10-25
申请号：JP2007181874
申请日：2007-07-11
申请人： Cymer Inc , サイマー, インコーポレイテッドCymer, Inc.
发明人： ECKHARDT D ONKERUSU , SANDSTROM RICHARD L , THOMAS P DAFFY
IPC分类号： H01S3/097 , H01S3/225 , H01L21/027 , H01S3/036
摘要： PROBLEM TO BE SOLVED: To provide an F2 excimer laser capable of producing laser pulses with pulse energies greater than 10 mJ at wavelength in the range of 157 nm, at repetition rates in the range of 1,000 to 2,000 Hz. SOLUTION: Using a laser, which is operated in the range of 1000 to 4000 Hz with energies, or pulse energies in the range of 10 to 5 mJ, as an illumination source, a stepper or a scanner equipment can produce integrated circuit resolution of 0.1 μm or less. In a preferred embodiment, the laser was tuned to the Fluorine 157.6 nm line using a set of two external prisms. In a second preferred embodiment, the laser is operated broad band and the 157.6 nm line is selected external to the resonance cavity. In a preferred embodiment, a line width of 0.2 pm is provided using injection seeding. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供能够产生在157nm范围内的波长下具有大于10mJ的脉冲能量的激光脉冲的F2准分子激光器，其重复率在1,000至2,000Hz的范围内。解决方案：使用在能量范围为1000至4000Hz范围内的激光器或10至5mJ范围内的脉冲能量作为照明源，步进器或扫描仪设备可以产生集成电路分辨率为0.1μm以下。在优选实施例中，使用一组两个外部棱镜将激光器调谐到氟157.6nm线。在第二优选实施例中，激光器被操作为宽带，并且157.6nm线选择在谐振腔外部。在优选实施例中，使用注射接种提供0.2μm的线宽。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2000077762A HIGH-RELIABILITY MODULAR PRODUCTION HIGH-QUALITY NARROW- BAND HIGH-REPETITION RATE ArF EXCIMER LASER 审中-公开
标题翻译：高可靠性模块化生产高品质窄带高回复率ArF EXCIMER激光
公开(公告)号：JP2000077762A
公开(公告)日：2000-03-14
申请号：JP17729499
申请日：1999-05-20
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： ISHIHARA TOSHIHIKO , THOMAS P DAFFY , JOHN T MELCHIOR , BESAUCELE HERVE A , MORTON RICHARD G , NESS RICHARD M , NEWMAN PETER C , PARTLO WILLIAM N , ROTHWEIL DANIEL A , SANDSTROM RICHARD L
IPC分类号： C23C14/06 , C23C14/16 , C23C14/22 , C23C14/24 , G01J9/00 , G02B1/10 , G02B5/18 , G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/1055 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/223 , H01S3/225 , H03K3/57 , H03K17/80
CPC分类号： G03F7/70025 , C23C14/0694 , C23C14/16 , C23C14/225 , C23C14/24 , G01J9/00 , G02B1/105 , G02B5/1852 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/03 , H01S3/036 , H01S3/08009 , H01S3/097 , H01S3/0971 , H01S3/09713 , H01S3/1055 , H01S3/134 , H01S3/1392 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H03K3/57 , H03K17/80
摘要： PROBLEM TO BE SOLVED: To obtain a laser pulse provided with a specified pulse energy for an exchange of a laser chamber, a modular pulse power system and a line band narrowing module at the repair of an excimer laser by a method wherein modules, which can be exchanged for the chamber, the power system and the module, are formed. SOLUTION: A pulse power system is formed into four separate modules of a high-voltage power supply module 20, a rectifier module 40, a compression head module 60 and a laser chamber module 80, each of the modules is used as the important parts of an excimer laser system, and on the occurrence of a breakdown of some parts of the parts of the system, each of the modules can be rapidly with the broken parts. An optical resonance chamber is constituted of an output coupler 88 along with two prism wavelength selectors and an R-max mirror. The laser pulse of the excimer laser system is a narrow-band laser pulse, is a pulse of 20 to 50 ns, a pulse of 157 nm of about 10 mJ and a pulse of a hertz ending 2000 pulse/second, and an excimer laser can produce a laser pulse provided with a pulse energy larger than a pulse energy of 5 mJ provided with a half width of a wavelength stability.
摘要翻译：要解决的问题：为了获得具有指定脉冲能量的激光脉冲，用于交换激光室，模拟脉冲电源系统和线频带变窄模块，通过一种方法修复准分子激光器，其中模块可以形成了房间，电力系统和模块的交换。解决方案：脉冲电力系统形成为高压电源模块20，整流模块40，压缩头模块60和激光室模块80的四个独立模块，每个模块用作重要部件准分子激光系统，并且在发生系统部件的某些部件的故障的情况下，每个模块可以迅速地与破碎的部件一起。光共振室由输出耦合器88以及两个棱镜波长选择器和R-max镜组成。准分子激光系统的激光脉冲是窄带激光脉冲，是20至50ns的脉冲，157nm的脉冲为约10mJ，脉冲为2000Hz脉冲/秒的赫兹，准分子激光可以产生具有大于具有波长稳定性的一半宽度的5mJ的脉冲能量的脉冲能量的激光脉冲。

4. 发明专利

JP2001015831A GAS DISCHARGE LASER WITH GAS TEMPERATURE CONTROL 失效
公开(公告)号：JP2001015831A
公开(公告)日：2001-01-19
申请号：JP2000180563
申请日：2000-05-12
申请人： CYMER INC
发明人： SHANNON ROBERT A , BERGER DMITRY , PARTLO WILLIAM N , WATSON TOM A , THOMPSON PAUL S , ISHIHARA TOSHIHIKO , TEDESCO CARL E II , LARSON DONALD G , HARRINGTON STEVEN M , MORTON RICHARD G , AZZOLA JAMES H , OLIVER I ROGER , THOMAS P DAFFY , FOMENKOV IGOR V
IPC分类号： H01S3/225 , G03F7/20 , H01S3/036 , H01S3/041 , H01S3/134
摘要： PROBLEM TO BE SOLVED: To maintain laser gas temperature within desired limits during burst mode operation by providing a gas discharge laser with high response gas temperature control. SOLUTION: To maintain temperature near an average gas temperature, a structural body 61 equipped with passive fins is provided, and is located downstream of an electrode. Each fin has an equal surface area of about 135 cm2, for example. A total of, e.g. about 225 fins are arranged such that 8 fins are spaced apart from each other per inch. This unit gives a total surface area to a gas flow path of about 3 m3. It is estimated that this unit reduces cyclic short-term temperature variations by at least about 1/4. Although a temperature stabilizer having a longer or shorter surface area can be utilized, a surface area of at least 1 m2 is recommended. Other satisfactory empirical rules indicate that 1 to 4 times of the product of the area of a stabilizer and the surface area of a heat exchanger can be specified.

5. 发明专利

JP2000340869A F2 LASER WITH VISIBLE RED AND IR CONTROL 失效
公开(公告)号：JP2000340869A
公开(公告)日：2000-12-08
申请号：JP2000123351
申请日：2000-03-21
申请人： CYMER INC
发明人： ECKHARDT D ONKERUSU , SANDSTROM RICHARD L , THOMAS P DAFFY
IPC分类号： H01S3/097 , H01S3/036
摘要： PROBLEM TO BE SOLVED: To obtain an F2 excimer laser capable of producing, at repetition rates in the range of 1,000 to 2,000 Hz or higher, laser pulses with pulse energy greater than 10 mJ, at wavelength of about 157 nm. SOLUTION: When laser operating in the range of 1,000 to 4,000 Hz with pulse energy in the range of 10 to 5 mJ is used as an illumination source. Stepper or scanner equipment can produce integrated circuit resolution of 0.1 μm or less. Here the laser is turned to the F2 157.6 nm line using a set of two external prisms. Also the laser is operated in broad band, and the 157.6 nm line is selected external to the resonance cavity. A line width of 0.2 pm may be also provided using injection seeding.

6. 发明专利

JP2000058944A HIGHLY RELIABLE MODULAR MANUFACTURE HIGH-QUALITY NARROW BAND HIGH REPEAT RATE F2 LASER 失效
公开(公告)号：JP2000058944A
公开(公告)日：2000-02-25
申请号：JP17729599
申请日：1999-05-20
申请人： CYMER INC
发明人： HOFMANN THOMAS , HUEBER JEAN-MARC , DAS PALASH P , ISHIHARA TOSHIHIKO , THOMAS P DAFFY , JOHN T MELCHIOR , BESAUCELE HERVE A , MORTON RICHARD G , NESS RICHARD M , NEWMAN PETER C , PARTLO WILLIAM N , ROTHWEIL DANIEL A , SANDSTROM RICHARD L
IPC分类号： H01S3/03 , G03F7/20 , H01S3/137 , H01S3/225
摘要： PROBLEM TO BE SOLVED: To provide a highly reliable modular high-quality narrow band F2 laser with high repeat rate. SOLUTION: A module includes a laser chamber 211, a pulse power system including three modules, an optical resonator consisting of a line band narrowing module and an output coupler module, a wave meter module, an electric control module, a cooling water module, and a gas control module. important reform is performed for the pulse power unit for making out shorter start up time and reformed pulse energy control. These reforms are performed inclusive of an increased capacity high-voltage power source 208 which is equipped with a voltage bleed down circuit related to accurate trimming; and a reformed commutator module 209 which generates high voltage pulses from a capacitor charged by a high-voltage power source, and amplifies the pulse voltage to about twenty three times with a very quick voltage transformer having secondary winding consisting of the stainless steel rod of single four segments.

7. 发明专利

JP2001274488A INJECTION SEEDED F2 LITHOGRAPHY LASER 失效
公开(公告)号：JP2001274488A
公开(公告)日：2001-10-05
申请号：JP2000404079
申请日：2000-12-11
申请人： CYMER INC
发明人： ONKELS ECKEHARD D , DAS PALASH P , THOMAS P DAFFY , SANDSTROM RICHARD L , ERSHOV ALEXANDER I , PARTLO WILLIAM N
IPC分类号： G03F7/20 , H01L21/027 , H01S3/036 , H01S3/038 , H01S3/097 , H01S3/134 , H01S3/225 , H01S3/23
摘要： PROBLEM TO BE SOLVED: To provide a laser in more detail an injection seeded laser which is used for integrated-circuit lithography. SOLUTION: A tunable injection seeded very narrow band F2 lithography laser is provided. In the laser, the modular design feature of a long-life releasable lithography laser is combined with a special F2 line narrowing and tuning technique which is applied to a seed beam operated in a first gain medium, in such a way that a beam generates a very narrow laser beam which is used to stimulate narrow-band lasing in a second gain medium and which is useful for integrated-circuit lithography.

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