专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06633055B2 Electronic fuse structure and method of manufacturing 有权
标题翻译：电子熔断器结构及制造方法
公开(公告)号：US06633055B2
公开(公告)日：2003-10-14
申请号：US09303509
申请日：1999-04-30
申请人： Claude L. Bertin , Erik L. Hedberg , Max G. Levy , Timothy D. Sullivan , William R. Tonti
发明人： Claude L. Bertin , Erik L. Hedberg , Max G. Levy , Timothy D. Sullivan , William R. Tonti
IPC分类号： H01L2974
CPC分类号： H01L23/5256 , H01L2924/0002 , H01L2924/00
摘要： A gap conductor structure for an integrated electronic circuit that may function as an electronic fuse device or as a low capacitance inter level signal line is integrated as part of the semi-conductor chip wiring. The gap conducting structure includes one or more air gap regions of predefined volume that fully or partially exposes a length of interlevel conductor layer in an IC. Alternately, the air gap region may wholly located within the dielectric region below a corresponding conductor and separated by insulator. When functioning as a fuse, the gap region acts to reduce thermal conductivity away from the exposed portion of the conductor enabling generation of higher heat currents in the conducting line with lower applied voltages sufficient to melt a part of the conducting line. The presence of gaps, and hence, the fuses, are scalable and may be tailored to the capacity of currents they must carry with the characteristics of the fuses defined by a circuit designer. Furthermore, conducting structures completely or partially exposed in the air gap may function as low capacitance minimum delay transmission lines.
摘要翻译：作为半导体芯片布线的一部分，集成电子电路的可用作电子熔断器件或低电容级间信号线的间隙导体结构被集成。间隙导电结构包括一个或多个预定体积的气隙区域，其完全或部分地暴露IC中的层间导体层的长度。或者，气隙区域可以完全位于相应导体下方的电介质区域内并被绝缘体分隔开。当用作熔丝时，间隙区域用于降低远离导体的暴露部分的热导率，使得能够以较低的施加电压在导线中产生更高的热流，从而熔化导电线的一部分。间隙的存在以及保险丝的存在是可扩展的，并且可以根据电路设计者定义的保险丝的特性来适应其必须携带的电流的容量。此外，在气隙中完全或部分暴露的导电结构可用作低电容最小延迟传输线

2. 发明授权

US06388305B1 Electrically programmable antifuses and methods for forming the same 有权
标题翻译：电子可编程反熔丝及其形成方法
公开(公告)号：US06388305B1
公开(公告)日：2002-05-14
申请号：US09466495
申请日：1999-12-17
申请人： Claude L. Bertin , Erik L. Hedberg , Russell J. Houghton , Max G. Levy , Rick L. Mohler , William R. Tonti , Wayne M. Trickle
发明人： Claude L. Bertin , Erik L. Hedberg , Russell J. Houghton , Max G. Levy , Rick L. Mohler , William R. Tonti , Wayne M. Trickle
IPC分类号： H01L2900
CPC分类号： H01L21/763 , H01L23/5252 , H01L27/10861 , H01L27/10894 , H01L2924/0002 , H01L2924/00
摘要： A first one time, voltage programmable logic element is provided in a semiconductor substrate of first conductivity type that comprises a first layer beneath a surface of the substrate, the first layer having a second conductivity type; and a trench formed through the surface and passing through the first layer. The trench comprises an interior surface, a dielectric material lining the interior surface and a conductive material filling the lined trench. The first logic element is configured so that a predetermined voltage or higher applied between the conductive material and the first layer causes a breakdown within a region of the trench. A second one time, voltage programmable logic element is provided in a semiconductor substrate of first conductivity type that comprises a first layer formed in a surface of the substrate, the first layer having a second conductivity type; and a trench formed through the surface and passing through the first layer. The trench comprises an interior surface, a first dielectric material lining the interior surface and a second dielectric material filling the lined trench. The second logic element further comprises a dielectric layer formed over a portion of the first layer and contacting the first dielectric material lining the trench at a merge location; and an electrode extending over a portion of both the dielectric layer and the filled trench. The second logic element is configured so that a predetermined voltage or higher applied between the electrode and the first layer causes a breakdown near the merge location.
摘要翻译：首先，电压可编程逻辑元件设置在第一导电类型的半导体衬底中，该第一导电类型的半导体衬底包括在衬底的表面下面的第一层，第一层具有第二导电类型; 以及通过表面形成并穿过第一层的沟槽。沟槽包括内表面，衬在内表面的电介质材料和填充衬里沟槽的导电材料。第一逻辑元件被配置为使得施加在导电材料和第一层之间的预定电压或更高的电压导致沟槽区域内的击穿。第二次，电压可编程逻辑元件设置在第一导电类型的半导体衬底中，该半导体衬底包括形成在衬底的表面中的第一层，第一层具有第二导电类型; 以及通过表面形成并穿过第一层的沟槽。沟槽包括内表面，衬在内表面的第一电介质材料和填充衬里沟槽的第二电介质材料。第二逻辑元件还包括形成在第一层的一部分上并且在合并位置处接触衬套在沟槽上的第一介电材料的电介质层; 以及在电介质层和填充沟槽的一部分上延伸的电极。第二逻辑元件被配置为使得施加在电极和第一层之间的预定电压或更高的电压导致合并位置附近的击穿。

3. 发明授权

US06812122B2 Method for forming a voltage programming element 有权
标题翻译：用于形成电压编程元件的方法
公开(公告)号：US06812122B2
公开(公告)日：2004-11-02
申请号：US10095889
申请日：2002-03-12
申请人： Claude L. Bertin , Erik L. Hedberg , Russell J. Houghton , Max G. Levy , Rick L. Mohler , William R. Tonti , Wayne M. Trickle
发明人： Claude L. Bertin , Erik L. Hedberg , Russell J. Houghton , Max G. Levy , Rick L. Mohler , William R. Tonti , Wayne M. Trickle
IPC分类号： H01L2144
CPC分类号： H01L21/763 , H01L23/5252 , H01L27/10861 , H01L27/10894 , H01L2924/0002 , H01L2924/00
摘要： Method for forming a first one time, voltage programmable logic element in a semiconductor substrate of first conductivity type, forming a first layer beneath a surface of the substrate, the first layer having a second conductivity type. A trench is formed through the surface and passing through the first layer. The trench comprises an interior surface, a dielectric material lining the interior surface and a conductive material filling the lined trench. The first logic element is configured so that a predetermined voltage or higher applied between the conductive material and the first layer causes a breakdown within a region of the trench.
摘要翻译：用于形成第一导电类型的半导体衬底中的第一次电压可编程逻辑元件的方法，在所述衬底的表面下方形成第一层，所述第一层具有第二导电类型。沟槽通过表面形成并穿过第一层。沟槽包括内表面，衬在内表面的电介质材料和填充衬里沟槽的导电材料。第一逻辑元件被配置为使得施加在导电材料和第一层之间的预定电压或更高的电压导致沟槽区域内的击穿。

4. 发明授权

US06233184B1 Structures for wafer level test and burn-in 失效
标题翻译：晶圆级测试和老化的结构
公开(公告)号：US06233184B1
公开(公告)日：2001-05-15
申请号：US09191954
申请日：1998-11-13
申请人： John E. Barth , Claude L. Bertin , Jeffrey H. Dreibelbis , Wayne F. Ellis , Wayne J. Howell , Erik L. Hedberg , Howard L. Kalter , William R. Tonti , Donald L. Wheater
发明人： John E. Barth , Claude L. Bertin , Jeffrey H. Dreibelbis , Wayne F. Ellis , Wayne J. Howell , Erik L. Hedberg , Howard L. Kalter , William R. Tonti , Donald L. Wheater
IPC分类号： G11C2900
CPC分类号： G01R31/2855 , G01R31/2806 , G01R31/2831 , G01R31/31905 , H01L2224/05624 , H01L2224/13 , H01L2224/45144 , H01L2224/45147 , H01L2924/00014
摘要： Wafer test and burn-in is accomplished with state machine or programmable test engines located on the wafer being tested. Each test engine requires less than 10 connections and each test engine can be connected to a plurality of chips, such as a row or a column of chips on the wafer. Thus, the number of pads of the wafer that must be connected for test is substantially reduced while a large degree of parallel testing is still provided. The test engines also permit on-wafer allocation of redundancy in parallel so that failing chips can be repaired after burn-in is complete. In addition, the programmable test engines can have their code altered so test programs can be modified to account for new information after the wafer has been fabricated. The test engines are used during burn-in to provide high frequency write signals to DRAM arrays that provide a higher effective voltage to the arrays, lowering the time required for burn-in. Connections to the wafer and between test engines and chips are provided along a membrane attached to the wafer. Membrane connectors can be formed or opened after the membrane is connected to the wafer so shorted chips can be disconnected. Preferably the membrane remains on the wafer after test, burn-in and dicing to provide a chip scale package. Thus, the very high cost of TCE matched materials, such as glass ceramic contactors, for wafer burn-in is avoided while providing benefit beyond test and burn-in for packaging.
摘要翻译：晶圆测试和老化是通过位于被测晶片上的状态机或可编程测试引擎完成的。每个测试引擎需要少于10个连接，并且每个测试引擎可以连接到多个芯片，例如晶片上的行或一列芯片。因此，仍然提供必须连接用于测试的晶片的焊盘数量，同时还提供大量的并行测试。测试引擎还允许并行的片上分配冗余，以便在老化完成后可以修复故障的芯片。此外，可编程测试引擎可以对其代码进行更改，因此可以修改测试程序以在晶圆制造之后考虑新的信息。在老化期间使用测试引擎向DRAM阵列提供高频写入信号，为阵列提供更高的有效电压，从而降低老化所需的时间。沿着连接到晶片的膜提供与晶片和测试引擎与芯片之间的连接。膜连接器可以在膜连接到晶片之后形成或打开，因此短路芯片可以断开。优选地，膜在测试之后保留在晶片上，老化和切割以提供芯片级封装。因此，避免了TCE匹配材料（例如玻璃陶瓷接触器）用于晶片老化的非常高的成本，同时提供超出测试和包装封装的优点。

5. 发明授权

US06177807B1 High frequency valid data strobe 失效
标题翻译：高频有效数据选通
公开(公告)号：US06177807B1
公开(公告)日：2001-01-23
申请号：US09322465
申请日：1999-05-28
申请人： Claude L. Bertin , John A. Fifield , Erik L. Hedberg , Russell J. Houghton , William R. Tonti
发明人： Claude L. Bertin , John A. Fifield , Erik L. Hedberg , Russell J. Houghton , William R. Tonti
IPC分类号： G03K1716
CPC分类号： G06F13/4086 , H03K5/06 , H04L25/0298
摘要： A processor with a memory send/received control circuit including a bus drive circuit and a detector circuit connected via control bus line to the control input of the memory. A data input line, or output line, or data input/output line is connected between the processor and the memory. A transmission line stub having a length that is incrementally variable is connected to the memory control input side of the control line 14. The impedance Z0 of the transmission line stub is equal to that of the control line and is open circuited at the end which results in voltage doubling to achieve high speed synchronization between control signals and data signals and to ensure valid data at high clock rates.
摘要翻译：具有存储器发送/接收控制电路的处理器，包括总线驱动电路和经由控制总线连接到存储器的控制输入端的检测器电路。数据输入线或输出线或数据输入/输出线连接在处理器和存储器之间。具有递增可变长度的传输线短截线连接到控制线14的存储器控制输入侧。传输线短截线的阻抗Z0等于控制线的阻抗Z0，并在结束时开路在电压倍增以实现控制信号和数据信号之间的高速同步，并确保在高时钟速率下的有效数据。

6. 发明授权

US06426904B2 Structures for wafer level test and burn-in 失效
标题翻译：晶圆级测试和老化的结构
公开(公告)号：US06426904B2
公开(公告)日：2002-07-30
申请号：US09803500
申请日：2001-03-09
申请人： John E. Barth , Claude L. Bertin , Jeffrey H. Dreibelbis , Wayne F. Ellis , Wayne J. Howell , Erik L. Hedberg , Howard L. Kalter , William R. Tonti , Donald L. Wheater
发明人： John E. Barth , Claude L. Bertin , Jeffrey H. Dreibelbis , Wayne F. Ellis , Wayne J. Howell , Erik L. Hedberg , Howard L. Kalter , William R. Tonti , Donald L. Wheater
IPC分类号： G11C2900
CPC分类号： G01R31/2855 , G01R31/2806 , G01R31/2831 , G01R31/31905 , H01L2224/05624 , H01L2224/13 , H01L2224/45144 , H01L2224/45147 , H01L2924/00014
摘要： Wafer test and burn-in is accomplished with state machine or programmable test engines located on the wafer being tested. Each test engine requires less than 10 connections and each test engine can be connected to a plurality of chips, such as a row or a column of chips on the wafer. Thus, the number of pads of the wafer that must be connected for test is substantially reduced while a large degree of parallel testing is still provided. The test engines also permit on-wafer allocation of redundancy in parallel so that failing chips can be repaired after burn-in is complete. In addition, the programmable test engines can have their code altered so test programs can be modified to account for new information after the wafer has been fabricated. The test engines are used during burn-in to provide high frequency write signals to DRAM arrays that provide a higher effective voltage to the arrays, lowering the time required for burn-in. Connections to the wafer and between test engines and chips are provided along a membrane attached to the wafer. Membrane connectors can be formed or opened after the membrane is connected to the wafer so shorted chips can be disconnected. Preferably the membrane remains on the wafer after test, burn-in and dicing to provide a chip scale package. Thus, the very high cost of TCE matched materials, such as glass ceramic contactors, for wafer burn-in is avoided while providing benefit beyond test and burn-in for packaging.
摘要翻译：晶圆测试和老化是通过位于被测晶片上的状态机或可编程测试引擎完成的。每个测试引擎需要少于10个连接，并且每个测试引擎可以连接到多个芯片，例如晶片上的行或一列芯片。因此，仍然提供必须连接用于测试的晶片的焊盘数量，同时还提供大量的并行测试。测试引擎还允许并行的片上分配冗余，以便在老化完成后可以修复故障的芯片。此外，可编程测试引擎可以对其代码进行更改，因此可以修改测试程序以在晶圆制造之后考虑新的信息。在老化期间使用测试引擎向DRAM阵列提供高频写入信号，为阵列提供更高的有效电压，从而降低了老化所需的时间。沿着连接到晶片的膜提供与晶片和测试引擎与芯片之间的连接。膜连接器可以在膜连接到晶片之后形成或打开，因此短路芯片可以断开。优选地，膜在测试之后保留在晶片上，老化和切割以提供芯片级封装。因此，避免了TCE匹配材料（例如玻璃陶瓷接触器）用于晶片老化的非常高的成本，同时提供超出测试和包装封装的优点。

7. 发明授权

US06255899B1 Method and apparatus for increasing interchip communications rates 失效
标题翻译：提高芯片间通信速率的方法和装置
公开(公告)号：US06255899B1
公开(公告)日：2001-07-03
申请号：US09388164
申请日：1999-09-01
申请人： Claude L. Bertin , Anthony R. Bonaccio , Erik L. Hedberg , Howard L. Kalter , Thomas M. Maffitt , Jack A. Mandelman , Edward J. Nowak , William R. Tonti
发明人： Claude L. Bertin , Anthony R. Bonaccio , Erik L. Hedberg , Howard L. Kalter , Thomas M. Maffitt , Jack A. Mandelman , Edward J. Nowak , William R. Tonti
IPC分类号： H01L2500
CPC分类号： H01L25/0657 , H01L24/73 , H01L2224/05571 , H01L2224/05573 , H01L2224/16225 , H01L2224/16235 , H01L2224/17181 , H01L2224/32225 , H01L2224/48227 , H01L2224/73253 , H01L2224/73265 , H01L2225/06517 , H01L2225/0652 , H01L2225/06555 , H01L2225/06589 , H01L2924/00014 , H01L2924/09701 , H01L2924/14 , H01L2924/15153 , H01L2924/1517 , H01L2924/15192 , H01L2924/16152 , H01L2924/19041 , H01L2924/19105 , H01L2924/30107 , H01L2924/3011 , H01L2924/00012 , H01L2924/00 , H01L2224/05599
摘要： An assembly is provided that includes an interposer having first and second substantially flat, opposed surfaces, and at least one speed critical signal line extending directly through the interposer from the first surface to the second surface. A first IC is coupled to the first surface of the interposer and has a first external connection mechanism coupled to the at least one speed critical signal line. A second IC is coupled to the second surface of the interposer and has a first external connection mechanism coupled to the at least one speed critical signal line. Preferably at least one non-speed critical signal line is provided within the interposer and is coupled to a second external connection mechanism of the first IC and/or the second IC for delivering non-speed critical signals thereto or for receiving such signals therefrom. A chip carrier having a cavity formed therein also may be provided wherein the second surface of the interposer is coupled to the chip carrier and the second IC is disposed within the cavity. One or more carrier signal lines may be provided within the chip carrier and coupled between the interposer and the second IC. The first and/or the second IC also may comprise control logic adapted to select a number of drivers within either IC that drive a particular signal line.
摘要翻译：提供了一种组件，其包括具有第一和第二基本上平坦的相对表面的插入件以及至少一个直线从第一表面延伸到第二表面的速度临界信号线。第一IC耦合到插入器的第一表面，并且具有耦合到至少一个速度临界信号线的第一外部连接机构。第二IC耦合到插入器的第二表面，并且具有耦合到至少一个速度临界信号线的第一外部连接机构。优选地，在插入器内提供至少一个非速度临界信号线，并且耦合到第一IC和/或第二IC的第二外部连接机构，用于向其递送非速度关键信号或用于从其接收这样的信号。还可以提供其中形成有空腔的芯片载体，其中插入器的第二表面耦合到芯片载体，并且第二IC设置在空腔内。可以在芯片载体内提供一个或多个载波信号线，并且耦合在插入器和第二IC之间。第一和/或第二IC还可以包括适于选择驱动特定信号线的IC内的多个驱动器的控制逻辑。

8. 发明授权

US06574763B1 Method and apparatus for semiconductor integrated circuit testing and burn-in 失效
标题翻译：用于半导体集成电路测试和老化的方法和装置
公开(公告)号：US06574763B1
公开(公告)日：2003-06-03
申请号：US09473886
申请日：1999-12-28
申请人： Claude L. Bertin , Erik L. Hedberg , Russell J. Houghton , William R. Tonti
发明人： Claude L. Bertin , Erik L. Hedberg , Russell J. Houghton , William R. Tonti
IPC分类号： G01R3128
CPC分类号： G01R31/287
摘要： A burn-in process is provided for a memory array having redundant bits and addressable storage locations. The burn-in process includes the steps of raising the temperature of the memory array to a pre-determined temperature, testing all bits in the array, detecting faulty bits and operable bits, replacing faulty bits with redundant operable bits, correcting any defects in the array in-situ, and lowering the temperature of the memory array to ambient temperature to complete the burn-in process. An apparatus for carrying out the above process is provided that includes a test circuit for generating a test pattern and for applying the test pattern to the memory array so as to test all bits within the memory array. A comparison circuit, coupled to the test circuit and adapted to couple to the memory array, compares an actual response and an expected response of the memory array to the test pattern and detects faulty and operable bits based thereon. A failed address buffer register, coupled to the comparison circuit and to the test circuit, stores an address of each addressable storage location that has a faulty bit. Sparing control logic, coupled to the failed address buffer register and adapted to couple to the memory array, reads out each address stored by the failed address buffer register and replaces each faulty bit with a redundant operable bit.
摘要翻译：为具有冗余位和可寻址存储位置的存储器阵列提供老化过程。老化过程包括以下步骤：将存储器阵列的温度升高到预定温度，测试阵列中的所有位，检测故障位和可操作位，用冗余的可操作位代替故障位，校正在阵列原位，并将存储器阵列的温度降低到环境温度以完成老化过程。提供了一种用于执行上述处理的装置，其包括用于生成测试图案并将测试图案应用于存储器阵列的测试电路，以便测试存储器阵列内的所有位。耦合到测试电路并且适于耦合到存储器阵列的比较电路将存储器阵列的实际响应和预期响应与测试模式进行比较，并基于此检测故障和可操作的位。耦合到比较电路和测试电路的故障地址缓冲寄存器存储具有错误位的每个可寻址存储位置的地址。冗余控制逻辑耦合到故障地址缓冲寄存器并适于耦合到存储器阵列，读出由故障地址缓冲寄存器存储的每个地址，并用冗余可操作位替换每个故障位。

9. 发明授权

US06518112B2 High performance, low power vertical integrated CMOS devices 失效
公开(公告)号：US06518112B2
公开(公告)日：2003-02-11
申请号：US09899262
申请日：2001-07-06
申请人： Michael D. Armacost , Claude L. Bertin , Erik L. Hedberg , Jack A. Mandelman
发明人： Michael D. Armacost , Claude L. Bertin , Erik L. Hedberg , Jack A. Mandelman
IPC分类号： H01L31119
CPC分类号： H01L27/11 , H01L21/823885 , H01L21/84 , H01L27/1104 , H01L27/1203 , Y10S257/903
摘要： A vertical Field Effect Transistor (FET) that may be an N-type FET (NFET) or a P-type FET (PFET); a multi-device vertical structure that may be two or more NFETs or two or more PFETs; logic gates including at least one vertical FET or at least one multi-device vertical; a Static Random Access Memory (SRAM) cell and array including at least one vertical FET; a memory array including at least one such SRAM cell; and the process of forming the vertical FET structure, the vertical multi-device (multi-FET) structure, the logic gates and the SRAM cell. The vertical FETs are epitaxially grown layered stacks of NPN or PNP with the side of a polysilicon gate layer adjacent the device's channel layer. The multi-FET structure may be formed by forming sides of two or more gates adjacent to the same channel layer or, by forming multiple channel layers in the same stack, e.g., PNPNP or NPNPN, each with its own gate, i.e., the side of a polysilicon gate layer. The SRAM cell may be radiation hardened by selectively thickening gate layers to increase storage node capacitance, providing high resistance cell wiring or by including a multi-layered gate oxide layer of NO or ONO, or by any combination thereof.

10. 发明授权

US06420925B1 Programmable latch device with integrated programmable element 有权
标题翻译：具有集成可编程元件的可编程锁存器件
公开(公告)号：US06420925B1
公开(公告)日：2002-07-16
申请号：US09757267
申请日：2001-01-09
申请人： John A. Fifield , Erik L. Hedberg , Claude L. Bertin , Nicholas M. van Heel
发明人： John A. Fifield , Erik L. Hedberg , Claude L. Bertin , Nicholas M. van Heel
IPC分类号： H01H3776
CPC分类号： H03K3/356008 , G11C17/18
摘要： According to the present invention, a programable latch device for use in personalizing a semiconductor device is provided that overcomes the limitations of the prior art. The preferred embodiment programmable latch device can use both fuses and antifuses as programmable elements. The programmable latch device provides a solid digital output indicative of the state of the programmable device, and can be reliably read to provide customization and personalization of associated semiconductor devices. The preferred embodiment programable latch device includes an integrated fuse or antifuse as a programmable element in the latch device. By integrating the programmable element into the latch, device size and complexity is minimized. In particular, the number of transistors required drops considerably when compared to prior art approaches.
摘要翻译：根据本发明，提供了用于个性化半导体器件的可编程锁存器件，其克服了现有技术的限制。优选实施例可编程锁存器件可以使用熔丝和反熔丝作为可编程元件。可编程锁存器件提供指示可编程器件状态的实心数字输出，并且可被可靠地读取以提供相关半导体器件的定制和个性化。优选实施例可编程锁存装置包括作为锁存装置中的可编程元件的集成熔丝或反熔丝。通过将可编程元件集成到锁存器中，器件尺寸和复杂度最小化。特别地，与现有技术方法相比，所需的晶体管的数量显着下降。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式