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1. 发明专利

JP2006138874A Double optical pass double-etalon spectroscope 审中-公开
标题翻译：双光通道双通道光谱仪
公开(公告)号：JP2006138874A
公开(公告)日：2006-06-01
申请号：JP2006032382
申请日：2006-02-09
申请人： Cymer Inc , サイマー, インコーポレイテッドCymer, Inc.
发明人： SMITH SCOTT T , ERSHOV ALEXANDER I , BUCK JESSE D
IPC分类号： G01J3/26 , G01B9/02 , G01J3/36 , G01J3/447
CPC分类号： G01J3/26
摘要： PROBLEM TO BE SOLVED: To provide a very compact spectroscope which generates very accurate fringe data, and is capable of measuring bandwidth having the required accuracy for microlithography regarding to both Δλ
FWHM and Δλ
95% .
SOLUTION: In a spectroscope, more specifically, a first double optical pass etalon-based spectroscope, a second etalon adapted to the first double optical pass etalon is preferably utilized to form very accurate fringe data. The spectral components of the diffused beam are separated by angles, when they permeate through the etalon. A retroreflector reflects the permeated component to return through the etalon. The spectral components that are twice permeated advance through the second etalon to focus onto a photodetector as a photodiode array in the second preferred embodiment.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供一种非常紧凑的分光镜，其产生非常精确的条纹数据，并且能够测量对于Δλ FWHM 和Δλ的微光刻所需的精度的带宽， 95％。解决方案：在分光镜中，更具体地，优选地，利用第一双光学通过标准具的分光镜，适用于第一双光学通过标准具的第二标准具来形成非常精确的条纹数据。扩散光束的光谱分量当它们渗透通过标准具时被角度分离。后向反射镜反映渗透成分通过标准具返回。在第二优选实施例中，两次渗透的光谱分量通过第二标准具推进以聚焦到作为光电二极管阵列的光电检测器。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2001349781A DOUBLE PASS DOUBLE ETALON SPECTROMETER 失效
公开(公告)号：JP2001349781A
公开(公告)日：2001-12-21
申请号：JP2001103889
申请日：2001-02-26
申请人： CYMER INC
发明人： SMITH SCOTT T , ERSHOV ALEXANDER I , BUCK JESSE D
IPC分类号： G01B9/02 , G01J3/26 , G01J3/36
摘要： PROBLEM TO BE SOLVED: To provide an ETALON-based spectrometer. SOLUTION: In a preferred embodiment of a first double pass ETALON-based spectrometer, a second ETALON suitable to a first double pass ETALON is used to generated an extremely precise fringe data. The spectral component of a diffused beam is angularly separated when transmitted through the ETALON. A retro reflector reflects and returns the transmitted component through the ETALON. The spectral component transmitted twice is advanced through the second ETALON and converged onto a light detector that is a photodiode array in a second preferred embodiment. The spectrometer can generate the extremely precise fringe data with an extremely compact size and allows a band width measurement accompanied by a precision necessary for microlithography for both Δλ FWTH and Δλ95.

3. 发明专利

JP2008034871A Lithography laser light source with beam delivery 有权
标题翻译：光束激光光源与光束交付
公开(公告)号：JP2008034871A
公开(公告)日：2008-02-14
申请号：JP2007260176
申请日：2007-10-03
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： KLENE BRIAN C , DAS PALASH P , GROVE STEVEN L , ERSHOV ALEXANDER I , SMITH SCOTT T , PAN XIAOJIANG J , SANDSTROM RICHARD L
IPC分类号： H01L21/027 , H01S3/10 , G03F7/20 , H01S3/00 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： G03F7/70933 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： PROBLEM TO BE SOLVED: To provide a modular high repetition rate ultraviolet gas discharge laser (4) for a production line machine. SOLUTION: A system includes an enclosed and purged beam path for providing the laser beam to a desired location such as an entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine (2) and two separated discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam amplified in a second discharge chamber. A MOPA system allows outputting pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. The preferred embodiment allows providing illumination approximately constant throughout the operating life of the lithography system. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于生产线机器的模块化高重复率紫外线气体放电激光器（4）。解决方案：系统包括用于将激光束提供到期望位置（例如生产线机器的入口）的封闭和清除的光束路径。在优选实施例中，生产线机器是光刻机（2），并且提供两个分离的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体光束。 MOPA系统允许输出脉冲能量大约是可比较的单室激光系统的两倍，具有极大改善的光束质量。与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。优选实施例允许在光刻系统的整个使用寿命期间提供近似恒定的照明。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2002043669A 4 KHz GAS DISCHARGE LASER 失效
公开(公告)号：JP2002043669A
公开(公告)日：2002-02-08
申请号：JP2001185408
申请日：2001-06-19
申请人： CYMER INC
发明人： NEWMAN PETER C , DUFFEY THOMAS P , PARTLO WILLIAM N , SANDSTROM RICHARD L , MELCHER PAUL C , JOHNS DAVID M , SAETHRE ROBERT B , FLEUROV VLADIMIR B , NESS RICHARD M , RETTIG CURTIS L , SHANNON ROBERT A , UJAZDOWSKI RICHARD C , ROKNI SHAHRYAR , PAN XIAOJIANG J , KULGEYKO VLADIMIR , SMITH SCOTT T , ANDERSON STUART L , ALGOTS JOHN M , SPANGLER RONALD L , FOMENKOV IGOR V
IPC分类号： H01S3/134 , G01J1/42 , G01J9/00 , G03F7/20 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225
摘要： PROBLEM TO BE SOLVED: To provide an excimer laser which can generate a high-quality pulsed laser beam at a pulse rate of about 4,000 Hz with pulse energy of about >=5 mJ. SOLUTION: The excimer laser can generate a high-quality pulsed laser beam at a pulse rate of about 4,000 Hz with pulse energy of about >=5 mJ. In an appropriate embodiment, an ArF excimer laser which is designed specifically to a light source used for integrated circuit lithography is disclosed. An improved wavemeter provided with special software maintains the wavelength and pulse energy of the laser beam within prescribed limits by controlling a high-speed PZT driving tuning mirror and a pulse power charging voltage. In a certain ideal embodiment, discharge dust is eliminated from a discharge area within the period of about 0.25 millisecond between pulses by generating a sufficient gas flow by driving a single cross flow fan by means of two fan motors.

5. 发明专利

JP2008294477A Super narrow band, two-chamber, high repetition rate gas discharge laser system 审中-公开
标题翻译：超级窄带，双室，高重复率排气激光系统
公开(公告)号：JP2008294477A
公开(公告)日：2008-12-04
申请号：JP2008215610
申请日：2008-08-25
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： KNOWLES DAVID S , BROWN DANIEL J W , BESAUCELE HERVE A , MYERS DAVID W , ERSHOV ALEXANDER I , PARTLO WILLIAM N , SANDSTROM RICHARD L , DAS PLASH P , ANDERSON STUART L , FOMENKOV IGOR V , UJAZDOWSKI RICHARD C , ONKELS ECKEHARD D , NESS RICHARD M , SMITH SCOTT T , HULBURD WILLIAM G , OICLES JEFFREY
IPC分类号： H01S3/225 , H01L21/027 , H01S3/00 , H01S3/034 , H01S3/036 , H01S3/038 , H01S3/134 , H01S3/23
CPC分类号： G03F7/7055 , H01S3/0057 , H01S3/036 , H01S3/0385 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2258
摘要： PROBLEM TO BE SOLVED: To provide a seed light injection module gas discharge laser system capable of generating a high quality-pulse laser beam with about 4,000 Hz of pulse repetition rate or more and a pulse energy of about 5 mJ or more. SOLUTION: The system is provided with two separate discharge chambers, and one is a part of a master oscillator that generates a super narrow band seed beam amplified in a second discharge chamber. The two discharge chambers can be separately controlled, and enable the system to optimize a wavelength parameter in the master oscillator and a pulse energy parameter in an amplifying chamber. A preferable embodiment of an ArF excimer laser system is configured as a MOPA, and is particularly designed to be used as a light source of an integrated circuit lithography. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种种子光注入模块气体放电激光系统，其能够产生具有大约4,000Hz的脉冲重复率或更大的脉冲能量和大约5mJ以上的脉冲能量的高质量脉冲激光束。解决方案：该系统设置有两个分开的放电室，一个是主振荡器的一部分，其产生在第二放电室中放大的超窄带种子光束。两个放电室可以单独控制，并且使系统能够优化主振荡器中的波长参数和放大室中的脉冲能量参数。 ArF准分子激光器系统的优选实施例被配置为MOPA，并且被特别设计为用作集成电路光刻的光源。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2008085364A Super narrow band two-chamber type high repetition rate gas discharge laser system 有权
标题翻译：超级窄带双层式高重复率气体放电激光系统
公开(公告)号：JP2008085364A
公开(公告)日：2008-04-10
申请号：JP2007310433
申请日：2007-11-30
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： KNOWLES DAVID S , BROWN DANIEL J W , BESAUCELE HERVE A , MYERS DAVID W , ERSHOV ALEXANDER I , PARTLO WILLIAM N , SANDSTROM RICHARD L , DAS PLASH P , ANDERSON STUART L , FOMENKOV IGOR V , UJAZDOWSKI RICHARD C , ONKELS ECKEHARD D , NESS RICHARD M , SMITH SCOTT T , HULBURD WILLIAM G , OICLES JEFFREY
IPC分类号： H01S1/00 , H01S3/0943 , G01J1/42 , G01J9/00 , G03F7/20 , H01L21/027 , H01S3/00 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： PROBLEM TO BE SOLVED: To provide a seeded light injection module gas discharge laser system capable of generating a high quality-pulse laser beam with about 4,000 Hz of pulse repetition rate or more and pulse energy of about 5 mJ or more. SOLUTION: The system is provided with two separate discharge chambers, and one is a part of a master oscillator that generates a super narrow band seeded beam amplified in a second discharge chamber. The two discharge chambers can be separately controlled, and enable the system to optimize a wavelength parameter in the master oscillator and a pulse energy parameter in an amplifying chamber. An ArF excimer laser system is configured as a MOPA, and is particularly designed to be used as a light source of an integrated circuit lithography. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够产生大约4000Hz的脉冲重复率或更大的脉冲能量约5mJ或更大的高质量脉冲激光束的种子光注入模块气体放电激光系统。解决方案：该系统设有两个独立的放电室，一个是主振荡器的一部分，其产生在第二放电室中放大的超窄带种子光束。两个放电室可以单独控制，并且使系统能够优化主振荡器中的波长参数和放大室中的脉冲能量参数。 ArF准分子激光器系统被配置为MOPA，并且被特别设计为用作集成电路光刻的光源。版权所有（C）2008，JPO＆INPIT

7. 发明专利

JP2001264688A FAR ULTRAVIOLET RAYS CATADIOPTRIC ANAMORPHIC TELESCOPE 失效
公开(公告)号：JP2001264688A
公开(公告)日：2001-09-26
申请号：JP2000403667
申请日：2000-11-29
申请人： CYMER INC
发明人： SMITH SCOTT T
IPC分类号： G02B13/08 , G02B13/14 , G02B17/08 , G02B27/09 , G03F7/20 , H01S3/00 , H01S3/10 , H01S3/225
摘要： PROBLEM TO BE SOLVED: To provide a far ultraviolet rays catadioptric anamorphic telescope to be used for narrowing the band of the beam width of a pulse laser comprising a pulse electric discharge laser. SOLUTION: The telescope is provided with an off-axis projected spherical surface reflector and a reflection/refraction optical element combined by off-axis, and is generally known as a Mangin mirror 206, a first refraction surface and a reflection rear surface are arranged and an aberration derived by the off-axis deflection of a beam 202 is cancelled. The telescope 205 is especially useful for far ultraviolet rays (DUV) by wave length being shorter than about 250 nm. In a certain application, diffraction grating or another wave length scattering element arrayed to reversely reflecting a selection wave length is irradiated in the telescope. In another application, the telescope combined with the diffraction grating is incorporated inside a laser optical cavity so that the band of the output wave length of the laser is narrowed. Besides, an improved general purpose DUV beam expander is provided.

8. 发明专利

AU2002245334A1 High resolution etalon-grating monochromator spectrometer 未知
公开(公告)号：AU2002245334A1
公开(公告)日：2002-08-12
申请号：AU2002245334
申请日：2002-01-28
申请人： CYMER INC
发明人： ERSHOV ALEXANDER I , FOMENKOV IGOR V , SMITH SCOTT T , SANDSTROM RICHARD L , BROWN DANIEL J W
IPC分类号： G01J3/26 , G01J1/42 , G01J3/12 , G01J3/22 , G01J9/02 , G21K1/06 , H01S3/134 , H01S3/137 , G01B9/02 , G01J3/18

9. 发明专利

AU9450901A Four KHz gas discharge laser 未知
公开(公告)号：AU9450901A
公开(公告)日：2002-01-02
申请号：AU9450901
申请日：2001-05-23
申请人： CYMER INC
发明人： NEWMAN PETER C , DUFFEY THOMAS P , PARTLO WILLIAM N , SANDSTROM RICHARD L , MECHER PAUL C , JOHNS DAVID M , SAETHRE ROBERT B , FLEUROV VLADIMIR B , NESS RICHARD M , RETTIG CURTIS L , SHANNON ROBERT A , UJAZDOWSKI RICHARD C , ROKNI SHAHRYAR , PAN XIAOJIANG J , KULGEYKO VLADIMIR , SMITH SCOTT T , ANDERSON STUART L , ALGOTS JOHN M , SPANGLER RONALD L , FOMENKOV IGOR V
IPC分类号： H01S3/134 , G01J1/42 , G01J9/00 , G03F7/20 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.

10. 发明专利

AU3499001A Double pass double etalon spectrometer 未知
公开(公告)号：AU3499001A
公开(公告)日：2001-09-03
申请号：AU3499001
申请日：2001-02-08
申请人： CYMER INC
发明人： SMITH SCOTT T , ERSHOV ALEXANDER I , BUCK JESSE D
IPC分类号： G01B9/02 , G01J3/26 , G01J3/36 , G01J3/51

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