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1. 发明专利

JP2010182698A Extreme ultraviolet light source 审中-公开
标题翻译：极光紫外线光源
公开(公告)号：JP2010182698A
公开(公告)日：2010-08-19
申请号：JP2010110262
申请日：2010-05-12
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： MELNYCHUK STEPHAN T , PARTLO WILLIAM N , FOMENKOV IGOR V , OLIVER I ROGER , NESS RICHARD M , BOWERING NORBERT , KHODYKIN OLEH , RETTIG CURTIS L , BLUMENSTOCK GERRY M , DYER TIMOTHY S , SIMMONS RODNEY D , HOFFMAN JERZY R , JOHNSON R MARK
IPC分类号： H05G2/00 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a reliable, high-repetition rate, production line compatible high energy photon source. SOLUTION: Very hot plasma containing an active material is produced in a vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit having a pulse transformer, provides electrical pulses having sufficient energy and an electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by the applicants, in-band EUV light energy at the intermediate focus is 45 Watts, extendable to 105.8 Watts. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供可靠，高重复率，生产线兼容的高能光子源。
解决方案：在真空室中产生含有活性物质的非常热的等离子体。活性物质是具有期望的极紫外（EUV）范围内的发射线的原子元素。包括充电电容器和具有脉冲变压器的磁压缩电路的脉冲电源提供具有足够的能量和电势的电脉冲，以足以以超过5瓦的速率以中间焦点产生EUV光。在由申请人设计的优选实施例中，中间焦点的带内EUV光能量为45瓦，可扩展到105.8瓦。版权所有（C）2010，JPO＆INPIT

2. 发明专利

JP2013179073A Extreme ultraviolet light source 审中-公开
标题翻译：极光紫外线光源
公开(公告)号：JP2013179073A
公开(公告)日：2013-09-09
申请号：JP2013097975
申请日：2013-05-07
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： MELNYCHUK STEPHAN T , PARTLO WILLIAM N , FOMENKOV IGOR V , OLIVER I ROGER , NESS RICHARD M , BOWERING NORBERT , KHODYKIN OLEH , RETTIG CURTIS L , BLUMENSTOCK GERRY M , DYER TIMOTHY S , SIMMONS RODNEY D , HOFFMAN JERZY R , JOHNSON R MARK
IPC分类号： G21K5/00 , H05G2/00 , G01J1/00 , G03F7/20 , G21K5/02 , H01L21/027 , H01S3/00 , H05H1/06 , H05H1/24
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要： PROBLEM TO BE SOLVED: To provide a high energy photon source having reliability, high in repetition rate, and good in compatibility with production lines.SOLUTION: Very hot plasma containing an active material is produced in a vacuum chamber. The active material is an atom having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source that includes a charging capacitor and a magnetic compression circuit having a pulse converter, provides electrical pulses having energy and an electrical potential sufficient to produce the EUV light at an intermediate focus at rates exceeding 5 Watts. In a preferred embodiment designed by the applicants, in-band EUV light energy at the intermediate focus is 45 Watts, further extendable to 105.8 Watts.
摘要翻译：要解决的问题：提供具有可靠性，高重复率和与生产线相容性好的高能光子源。解决方案：在真空室中产生含有活性材料的非常热的等离子体。活性物质是具有期望的极紫外（EUV）范围内的发射线的原子。包括充电电容器和具有脉冲转换器的磁压缩电路的脉冲电源提供电脉冲，其具有足以以超过5瓦的速率在中间焦点处产生EUV光的能量和电势。在由申请人设计的优选实施例中，中间焦点的带内EUV光能量为45瓦，进一步可扩展至105.8瓦。

3. 发明专利

JP2011181935A Collector for euv light source 有权
标题翻译： EUV光源收集器
公开(公告)号：JP2011181935A
公开(公告)日：2011-09-15
申请号：JP2011062167
申请日：2011-03-22
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： PARTLO WILLIAM N , ALGOTS J MARTIN , BLUMENSTOCK GERRY M , BOWERING NORBERT , ERSHOV ALEXANDER I , FOMENKOV IGOR V , PAN XIAOJIANG J
IPC分类号： H01L21/027 , G02B5/10 , G03F7/20 , G21K1/06 , H01L21/304 , H05G2/00
摘要： PROBLEM TO BE SOLVED: To provide a method and an apparatus for removing debris from a reflecting surface of an EUV (Extreme ultraviolet) collector in an EUV light source. SOLUTION: A current source (DC voltage source) 220 may be connected to a collector mirror 150, a metallic backing material (aluminum or nickel) for the mirror 150. The mirror 150 may be heated to a temperature higher than the temperature of ambient gas (helium gas) filling the inside of a chamber 26. In another aspect of debris cleaning, introduction of RF from an antenna schematically shown by an RF frequency voltage 230 and 232 in the chamber 26 may be incorporated. The RF may be connected to the mirror 150 or the metallic backing material, and in this case, a dark shield made of an appropriate conductive material and connected to the earth potential may be formed by covering the back face of the collector mirror 150, and is separated from the mirror by an insulator (air gap) and a voltage (DC from the DC power source 220 connected to the mirror 150 as well). COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种在EUV光源中从EUV（极紫外）捕集器的反射表面去除碎屑的方法和装置。解决方案：电流源（DC电压源）220可以连接到收集器反射镜150，用于反射镜150的金属背衬材料（铝或镍）。反射镜150可以被加热到高于温度环境气体（氦气）填充在室26的内部。在碎片清洁的另一方面，可以并入从RF 26电压230和232中示意性地示出的天线引入RF。 RF可以连接到反射镜150或金属背衬材料，并且在这种情况下，可以通过覆盖收集镜150的背面形成由适当的导电材料制成并连接到地电位的暗屏蔽，通过绝缘体（气隙）和电压（也连接到反射镜150的直流电源220的DC）与反射镜分离。版权所有（C）2011，JPO＆INPIT

4. 发明专利

JP2007298980A Collector for euv light source 审中-公开
标题翻译： EUV光源收集器
公开(公告)号：JP2007298980A
公开(公告)日：2007-11-15
申请号：JP2007101959
申请日：2007-04-09
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： PARTLO WILLIAM N , ALGOTS J MARTIN , BLUMENSTOCK GERRY M , BOWERING NORBERT , ERSHOV ALEXANDER I , FOMENKOV IGOR V , PAN XIAOJIANG J
IPC分类号： G02B5/10 , G02B5/00 , G03F7/20 , G21C11/00 , G21K1/06 , H01J1/50 , H01L21/027
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G21K1/062
摘要： PROBLEM TO BE SOLVED: To provide a method for removing debris from the reflecting surface of an EUV collector, in an EUV light source. SOLUTION: The method and a system comprise the reflecting surface containing a first material and the debris comprising a second material and/or compounds of the second material, and the system and method comprise a controlled sputtering ion source (containing a gas containing the atoms of the sputtering ion material); and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, with the ionized state being selected to have a distribution about a selected energy peak that has high probability of sputtering the second material and very low probability of sputtering the first material. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种在EUV光源中从EUV收集器的反射表面去除碎屑的方法。解决方案：该方法和系统包括含有第一材料的反射表面和包含第二材料和/或第二材料的化合物的碎屑，并且该系统和方法包括受控的溅射离子源（含有含有溅射离子材料的原子）; 以及将溅射离子材料的原子激发成离子化状态的刺激机构，其中选择离子化状态以具有围绕第二材料溅射的可能性高的选定能量峰的分布，并且溅射第一材料的可能性非常低。版权所有（C）2008，JPO＆INPIT

5. 发明专利

AU2003230870A1 EXTREME ULTRAVIOLET LIGHT SOURCE 未知
公开(公告)号：AU2003230870A1
公开(公告)日：2003-10-27
申请号：AU2003230870
申请日：2003-04-09
申请人： CYMER INC
发明人： RETTIG CURTIS L , BLUMENSTOCK GERRY M , DYER TIMOTHY S , SIMMONS RODNEY D , HOFFMAN JERZY R , JOHNSON R MARK , MELNYCHUK STEPHEN T , PARTLO WILLIAM N , FOMENKOV IGOR V , OLIVER I ROGER , NESS RICHARD M , BOWERING NORBERT , KHODYKIN OLEH
IPC分类号： G21K5/00 , G01J1/00 , G03F7/20 , G21K5/02 , H01L21/027 , H01S3/00 , H05G2/00 , H05H1/06 , H05H1/24
摘要： An apparatus for generating EUV radiation is disclosed which may include a target material, a system generating a laser beam for interaction with the target material and a pair of electrodes. A pulse power electrical circuit may be provided for generating a discharge between said electrodes to produce EUV radiation from said target material.

6. 发明专利

AU2003230870A8 Extreme ultraviolet light source 未知
公开(公告)号：AU2003230870A8
公开(公告)日：2003-10-27
申请号：AU2003230870
申请日：2003-04-09
申请人： CYMER INC
发明人： SIMMONS RODNEY D , FOMENKOV IGOR V , HOFFMAN JERZY R , KHODYKIN OLEH , BOWERING NORBERT , PARTLO WILLIAM N , MELNYCHUK STEPHEN T , JOHNSON R MARK , RETTIG CURTIS L , NESS RICHARD M , BLUMENSTOCK GERRY M , OLIVER I ROGER , DYER TIMOTHY S
IPC分类号： G21K5/00 , G01J1/00 , G03F7/20 , G21K5/02 , H01L21/027 , H01S3/00 , H05G2/00 , H05H1/06 , H05H1/24 , H05H1/34 , H05H1/04
摘要： An apparatus for generating EUV radiation is disclosed which may include a target material, a system generating a laser beam for interaction with the target material and a pair of electrodes. A pulse power electrical circuit may be provided for generating a discharge between said electrodes to produce EUV radiation from said target material.

7. 发明申请

WO2004092693A3 COLLECTOR FOR EUV LIGHT SOURCE 审中-公开
标题翻译： EUV光源收集器
公开(公告)号：WO2004092693A3
公开(公告)日：2005-05-19
申请号：PCT/US2004010972
申请日：2004-04-07
申请人： CYMER INC , PARTLO WILLIAM N , ALGOTS J MARTIN , BLUMENSTOCK GERRY M , BOWERING NORBERT , ERSHOV ALEXANDER I , FOMENKOV IGOR V , PAN XIAOJIANG J
发明人： PARTLO WILLIAM N , ALGOTS J MARTIN , BLUMENSTOCK GERRY M , BOWERING NORBERT , ERSHOV ALEXANDER I , FOMENKOV IGOR V , PAN XIAOJIANG J
IPC分类号： G02B5/00 , G03F7/20 , G21C11/00 , G21K1/06 , H01J1/50 , A61N5/00
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G21K1/062
摘要： A debris removable system (20) for removing a plasma produced residue debris on a reflecting surface (360) of an EUV source (26), which includes a stimulating mechanism (72) for exciting and ionizing the atoms to clean the reflecting surface (360): a collecting mirror (370); a filter (150); and a debris shield (202).
摘要翻译：一种用于去除在EUV源（26）的反射表面（360）上产生的残余物碎屑的碎片可移除系统（20），其包括用于激发和电离原子以清洁反射表面的刺激机构（360））：收集镜（370）; 过滤器（150）; 和碎片护罩（202）。

8. 发明申请

WO2004081503A3 DISCHARGE PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：排放生产等离子体光源
公开(公告)号：WO2004081503A3
公开(公告)日：2005-10-06
申请号：PCT/US2004006551
申请日：2004-03-03
申请人： CYMER INC , PARTLO WILLIAM N , BLUMENSTOCK GERRY M , BOWERING NORBERT , BRUZZONE KENT A , COBB DENNIS W , DYER TIMOTHY S , DUNLOP JOHN , FOMENKOV IGOR V , HYSHAM JAMES CHRISTOPHER , OLIVER ROGER I , PALENSCHAT FREDERICK A , PAN XIAOJIANG J , RETTIG CURTIS L , SIMMONS RODNEY S , WALKER JOHN , WEBB KYLE R , HOFMANN THOMAS , KHODYKIN OLEH
发明人： PARTLO WILLIAM N , BLUMENSTOCK GERRY M , BOWERING NORBERT , BRUZZONE KENT A , COBB DENNIS W , DYER TIMOTHY S , DUNLOP JOHN , FOMENKOV IGOR V , HYSHAM JAMES CHRISTOPHER , OLIVER ROGER I , PALENSCHAT FREDERICK A , PAN XIAOJIANG J , RETTIG CURTIS L , SIMMONS RODNEY S , WALKER JOHN , WEBB KYLE R , HOFMANN THOMAS , KHODYKIN OLEH
IPC分类号： G01J20060101 , G03F7/20 , H01J1/52 , H01S3/00 , H01S3/225 , H05G2/00 , H05H1/06
CPC分类号： H01S3/005 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70908 , G03F7/70916 , H01S3/225 , H05G2/003 , H05G2/005 , H05H1/06
摘要： An EUV source (20) includes a debris mitigation apparatus (60) employing a metal halogen gas producing a metal halide from debris exiting the plasma, a debris shield (36) having a plurality of curvilinear shield members (102) having inner and outer surface connected by light passages (104) and electrodes (28,88) for providing a discharged plasma (32) in a chamber (22).
摘要翻译： EUV源（20）包括使用从离开等离子体的碎屑产生金属卤化物的金属卤素气体的碎片减缓装置（60），具有多个曲线形屏蔽构件（102）的碎片屏蔽（36），其具有内表面和外表面通过光通道（104）和用于在腔室（22）中提供排出的等离子体（32））的电极（28,88）连接。

10. 发明公开

EP1493039A4 EXTREME ULTRAVIOLET LIGHT SOURCE 审中-公开
标题翻译：极端紫外光源
公开(公告)号：EP1493039A4
公开(公告)日：2009-11-11
申请号：EP03723976
申请日：2003-04-09
申请人： CYMER INC
发明人： MELNYCHUK STEPHEN T , PARTLO WILLIAM N , FOMENKOV IGOR V , OLIVER I ROGER , NESS RICHARD M , BOWERING NORBERT , KHODYKIN OLEH , RETTIG CURTIS L , BLUMENSTOCK GERRY M , DYER TIMOTHY S , SIMMONS RODNEY D , HOFFMAN JERZY R , JOHNSON R MARK
IPC分类号： G21K5/00 , H05G2/00 , G01J1/00 , G03F7/20 , G21K5/02 , H01L21/027 , H01S3/00 , H05H1/06 , H05H1/24
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06

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