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1. 发明专利

JP2006261689A Extremely narrow band two-chamber type high-repetition rate gas discharging laser system 审中-公开
标题翻译：极致窄带双层高速重启速率排气激光系统
公开(公告)号：JP2006261689A
公开(公告)日：2006-09-28
申请号：JP2006129553
申请日：2006-05-08
申请人： Cymer Inc , サイマー, インコーポレイテッドCymer, Inc.
发明人： MYERS DAVID W , BESAUCELE HERVE A , ERSHOV ALEXANDER I , PARTLO WILLIAM N , SANDSTROM RICHARD L , DAS PALASH P , ANDERSON STUART L , FOMENKOV IGOR V , UJAZDOWSKI RICHARD C , PAN XIAOJIANG J , ONKELS ECKEHARD D , NESS RICHARD M , BROWN DANIEL J W
IPC分类号： H01S3/03 , G01J9/00 , G03F7/20 , H01S3/00 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： PROBLEM TO BE SOLVED: To generate high quality pulsed laser beams at a pulse rate of about 4,000 Hz or greater and at a pulse energy of about 5 mJ or greater. SOLUTION: Two individual discharge chambers are provided and one of which is a part of a master oscillator producing a very narrow-band seed beam which is amplified in the second discharge chamber. The chambers can be controlled individually permitting individual optimization of wavelength parameters in the master oscillator and the optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system is configured as a MOPA (Master Oscillator Power Amplifier) and specifically designed for use as a light source for integrated-circuit pattern lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing a sufficient gas flow to permit operation at a pulse rate of 4,000 Hz or greater by clearing debris from a discharging region in a time shorter than approximately 0.25 milliseconds between pulses. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。解决方案：提供两个单独的放电室，其中一个是主振荡器的一部分，产生在第二放电室中放大的非常窄带子光束。可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中脉冲能量参数的优化。 ArF准分子激光器系统中的优选实施例被配置为MOPA（主振荡器功率放大器），并被专门设计为用作集成电路图案光刻的光源。在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在短于脉冲之间的大约0.25毫秒的时间内从放电区域清除碎屑，从而提供足够的气流以允许以4,000Hz或更高的脉冲速率运行。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2007150333A Injection seeded laser with precise timing control 审中-公开
标题翻译：注射式激光与精确时序控制
公开(公告)号：JP2007150333A
公开(公告)日：2007-06-14
申请号：JP2007000213
申请日：2007-01-04
申请人： Cymer Inc , サイマー, インコーポレイテッドCymer, Inc.
发明人： NESS RICHARD M , SANDSTOROM RICHARD L , PARTLO WILLIAM N , ERSHOV ALEXANDER I
IPC分类号： H01L21/027 , H01S3/0975 , G03F7/20 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/102 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/2366 , G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/0057 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/10092 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2258 , H01S3/2325 , H01S3/2333
摘要： PROBLEM TO BE SOLVED: To provide a narrow band laser system having two laser subsystems. SOLUTION: The first laser subsystem is configured to provide a very narrow band pulsed output beam which is used to injection-seed the second laser subsystem where the narrow band pulsed seed beam is amplified to produce a narrow band pulsed output beam. A pulse power supply is provided which is specially configured to precisely synchronize the discharges in the two laser subsystem so that the discharges are properly synchronized. A pulse power system is preferably included with a pulse transformer unit having two sets of transformer cores. A single upstream pulse compression circuit provides high voltage pulses in parallel to the primary winding of all of the cores in both sets. Separate secondary conductors (one passing through one set of cores and the other passing through the other set of cores) provide very high voltage pulses respectively to separate downstream circuits supplying discharge pulses to the electrodes in each of two separate laser chambers. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供具有两个激光子系统的窄带激光系统。解决方案：第一激光子系统被配置为提供非常窄的带状脉冲输出光束，其用于对第二激光子系统进行注入种子，其中窄带脉冲种子束被放大以产生窄带脉冲输出光束。提供脉冲电源，其特别配置为精确地同步两个激光子系统中的放电，使得放电正确同步。脉冲电力系统优选地包括具有两组变压器磁芯的脉冲变压器单元。单个上游脉冲压缩电路在两组中提供与所有磁芯的初级绕组并联的高电压脉冲。分离的次级导体（一个穿过一组芯，另一组穿过另一组芯）分别提供非常高的电压脉冲，以分离向两个单独的激光室中的每一个中的电极提供放电脉冲的下游电路。版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2006138874A Double optical pass double-etalon spectroscope 审中-公开
标题翻译：双光通道双通道光谱仪
公开(公告)号：JP2006138874A
公开(公告)日：2006-06-01
申请号：JP2006032382
申请日：2006-02-09
申请人： Cymer Inc , サイマー, インコーポレイテッドCymer, Inc.
发明人： SMITH SCOTT T , ERSHOV ALEXANDER I , BUCK JESSE D
IPC分类号： G01J3/26 , G01B9/02 , G01J3/36 , G01J3/447
CPC分类号： G01J3/26
摘要： PROBLEM TO BE SOLVED: To provide a very compact spectroscope which generates very accurate fringe data, and is capable of measuring bandwidth having the required accuracy for microlithography regarding to both Δλ
FWHM and Δλ
95% .
SOLUTION: In a spectroscope, more specifically, a first double optical pass etalon-based spectroscope, a second etalon adapted to the first double optical pass etalon is preferably utilized to form very accurate fringe data. The spectral components of the diffused beam are separated by angles, when they permeate through the etalon. A retroreflector reflects the permeated component to return through the etalon. The spectral components that are twice permeated advance through the second etalon to focus onto a photodetector as a photodiode array in the second preferred embodiment.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供一种非常紧凑的分光镜，其产生非常精确的条纹数据，并且能够测量对于Δλ FWHM 和Δλ的微光刻所需的精度的带宽， 95％。解决方案：在分光镜中，更具体地，优选地，利用第一双光学通过标准具的分光镜，适用于第一双光学通过标准具的第二标准具来形成非常精确的条纹数据。扩散光束的光谱分量当它们渗透通过标准具时被角度分离。后向反射镜反映渗透成分通过标准具返回。在第二优选实施例中，两次渗透的光谱分量通过第二标准具推进以聚焦到作为光电二极管阵列的光电检测器。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2001298233A HIGH ENERGY GAS DISCHARGE LASER WITH HELIUM-PURGED LINE NARROWING UNIT 失效
公开(公告)号：JP2001298233A
公开(公告)日：2001-10-26
申请号：JP2000403713
申请日：2000-11-30
申请人： CYMER INC
发明人： PARTLO WILLIAM N , SANDSTROM RICHARD L , RAYMOND F SHIBURUSUKII , FOMENKOV IGOR V , ERSHOV ALEXANDER I
IPC分类号： H01S3/03 , G03F7/20 , H01S3/036 , H01S3/04 , H01S3/041 , H01S3/1055 , H01S3/225
摘要： PROBLEM TO BE SOLVED: To meet the demand for reliable line narrowing devices and technologies for high frequency and high work coefficient gas discharge lasers. SOLUTION: Helium gas purge for a line narrowing device based on a grating for minimizing the thermal distortion in a line narrowing laser for generating high energy laser beams at high frequencies. The applicants showed substantial improvement of the efficiency with use of the helium gas purge, compared to the nitrogen gas purges in the prior art. In preferred embodiments, a helium gas flow is guided across the grating surface. In other embodiments, the purge gas pressure is reduced to lessen the optical effects of the hot gas layer.

5. 发明专利

JP2008034871A Lithography laser light source with beam delivery 有权
标题翻译：光束激光光源与光束交付
公开(公告)号：JP2008034871A
公开(公告)日：2008-02-14
申请号：JP2007260176
申请日：2007-10-03
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： KLENE BRIAN C , DAS PALASH P , GROVE STEVEN L , ERSHOV ALEXANDER I , SMITH SCOTT T , PAN XIAOJIANG J , SANDSTROM RICHARD L
IPC分类号： H01L21/027 , H01S3/10 , G03F7/20 , H01S3/00 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： G03F7/70933 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： PROBLEM TO BE SOLVED: To provide a modular high repetition rate ultraviolet gas discharge laser (4) for a production line machine. SOLUTION: A system includes an enclosed and purged beam path for providing the laser beam to a desired location such as an entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine (2) and two separated discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam amplified in a second discharge chamber. A MOPA system allows outputting pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. The preferred embodiment allows providing illumination approximately constant throughout the operating life of the lithography system. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于生产线机器的模块化高重复率紫外线气体放电激光器（4）。解决方案：系统包括用于将激光束提供到期望位置（例如生产线机器的入口）的封闭和清除的光束路径。在优选实施例中，生产线机器是光刻机（2），并且提供两个分离的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体光束。 MOPA系统允许输出脉冲能量大约是可比较的单室激光系统的两倍，具有极大改善的光束质量。与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。优选实施例允许在光刻系统的整个使用寿命期间提供近似恒定的照明。版权所有（C）2008，JPO＆INPIT

6. 发明专利

JP2000200933A DURABLE ETALON BASED OUTPUT COUPLER 失效
公开(公告)号：JP2000200933A
公开(公告)日：2000-07-18
申请号：JP37622599
申请日：1999-12-02
申请人： CYMER INC
发明人： ERSHOV ALEXANDER I
IPC分类号： G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/08 , H01S3/081 , H01S3/0971 , H01S3/098 , H01S3/105 , H01S3/1055 , H01S3/137 , H01S3/139 , H01S3/223 , H01S3/225
摘要： PROBLEM TO BE SOLVED: To enable improvement in durability by making the apex angle of first and second prisms of an etalon satisfy a specific relation and beam enters and goes out at the Brewster's angle. SOLUTION: A durable etalon, based output coupler 164 used in an ArF laser chamber 63, has a line narrowing module 67 with an adjusting mirror 74, a grating 76 and three prism expanders comprising prisms 68, 70, 72. Beam goes in a first prism 164A at an angle of about 57 degrees which is close to the Brewster's angle, is subjected to another refraction in a second surface of a prism 164B, and forms Brewster's angle of about 57 degrees with the surface. Each parallel surface inside the prisms 164A, 164B has a reflectance of about 4% regarding a normal light of 193 nm. The prism material has refractive index of nm, adjustment gas has a refractive index of na, and an apex angle α of a prism is to satisfy an equation.

7. 发明专利

JPH11191660A GAS DOPED NARROW-BAND EXCIMER LASER 失效
公开(公告)号：JPH11191660A
公开(公告)日：1999-07-13
申请号：JP28979498
申请日：1998-10-12
申请人： CYMER INC
发明人： HOFMANN THOMAS , DAS PALASH P , TOSHIHIKO ISHIHARA , ERSHOV ALEXANDER I
IPC分类号： H01S3/038 , G03F7/20 , H01S3/02 , H01S3/03 , H01S3/034 , H01S3/036 , H01S3/08 , H01S3/0971 , H01S3/1055 , H01S3/225
摘要： PROBLEM TO BE SOLVED: To provide an excimer laser, more specifically a gas-doped narrow- band excimer laser. SOLUTION: A gas-doped narrow-band excimer laser is constituted of a laser chamber formed of a fluorine-compatible material, two long electrodes, at least a pre-ionization device, and a mixed laser gas constituted of a first rare gas, fluorine, buffer gas, and stabilizing additive of 100 ppm or below which are all prescribed in pressure. Here, the stabilizing additive agent is selected so as to be composed of 10 ppm or below of oxygen and a certain mount of second rare gas which is heavier in mass than that of the first rare gas.

8. 发明专利

JPH11191648A NARROW FREQUENCY BAND EXCIMER LASER 失效
公开(公告)号：JPH11191648A
公开(公告)日：1999-07-13
申请号：JP28716298
申请日：1998-10-09
申请人： CYMER INC
发明人： TOSHIHIKO ISHIHARA , DAS PALASH P , HOFMANN THOMAS , ERSHOV ALEXANDER I
IPC分类号： H01S3/038 , G03F7/20 , H01S3/02 , H01S3/03 , H01S3/034 , H01S3/036 , H01S3/08 , H01S3/0971 , H01S3/1055 , H01S3/225
摘要： PROBLEM TO BE SOLVED: To enhance energy dose control and reproducibility by suppressing the partial pressure of fluorine below a specified percentage and increasing the reflection of an output coupler above a specified percentage. SOLUTION: A narrow frequency band excimer laser comprises a laser chamber 8 made of a material coexisting with fluorine provided with two elongated electrode rods and at least a pre-ionization unit and filled with a laser gas composed of a rare gas, fluorine, a buffer gas and oxygen having concentration of 2-500 ppm with a total pressure being limited, and a beam intensifier module having at least one beam expansion prism, a lattice and a tuning means for lattice. In a preferred embodiment, partial pressure of fluorine is set lower than 0.10% and the reflection of an output coupler is increased to 25% or above.

9. 发明专利

JPH1174601A LASER WITH EXTREMELY NARROW BAND USING UNSTABLE RESONANCE CAVITY 失效
公开(公告)号：JPH1174601A
公开(公告)日：1999-03-16
申请号：JP18488198
申请日：1998-06-30
申请人： CYMER INC
发明人： ERSHOV ALEXANDER I
IPC分类号： G02B5/18 , G03F7/20 , H01S3/08 , H01S3/1055 , H01S3/13 , H01S3/137 , H01S3/225
摘要： PROBLEM TO BE SOLVED: To obtain a laser with narrow band operating over a long term while improving the wavelength stability by combining a beam expander with a line narrowing system for correcting the wave front distortion caused by a tubular mirror. SOLUTION: An output coupler comprises a partial reflection tubular convex mirror 68 and the output from a gain medium 65 is made narrow in a line narrowing module. The line narrowing module comprises a prism beam expander 70 for enlarging a beam in one direction perpendicular to the axis of the tubular mirror 68, a turning total reflector 72, and a lattice 74. The lattice 74 has an adjustable curve and adjusted to correct a wave front distortion caused by the tubular mirror 68. The lattice is curved by a compression spring, and a threaded micrometer push bolt 76 for applying a compressive force to the inside of legs 78, 80 extending from the opposite ends of the lattice 74. Apertures 82, 84 limit the cross-sectional dimensions of a beam.

10. 发明专利

JP2012099502A System for protecting internal component of euv light source from plasma-generated debris 审中-公开
标题翻译：用于保护来自等离子体生物反应器的EUV光源的内部组分的系统
公开(公告)号：JP2012099502A
公开(公告)日：2012-05-24
申请号：JP2012023033
申请日：2012-02-06
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： BOWERING NORBERT L , AM HANSON BYRON , ALEXANDER N BYKANOV , OLEH KHODYKIN , ERSHOV ALEXANDER I , PARTLO WILLIAM N
IPC分类号： H05G2/00 , H01L21/027
CPC分类号： G03F7/70925 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , G21K2201/06 , H05G2/001
摘要： PROBLEM TO BE SOLVED: To provide an extreme ultraviolet (EUV) light generator providing EUV light from a plasma.SOLUTION: A system and a method are provided for protecting an optical element surface of an EUV light source plasma production chamber from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield including at least one hollow tube positioned between an optical element and a plasma formation site is disclosed. The tube is oriented to capture debris while allowing light to pass through a lumen of the tube via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield heated to a temperature sufficient to remove one or more species of a debris material deposited on the shield is disclosed. Furthermore, in another aspect of an embodiment of the present invention, a system in which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned is disclosed.
摘要翻译：要解决的问题：提供从等离子体提供EUV光的极紫外（EUV）光发生器。解决方案：提供一种系统和方法，用于保护EUV光源等离子体生成室的光学元件表面免受由等离子体形成产生的碎片。在本发明的实施例的一个方面中，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。在本发明的一个实施例的另一方面，公开了一种加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度的屏蔽。此外，在本发明的实施例的另一方面，公开了一种系统，其中屏蔽件从光源等离子体室移动到清洁罩的清洁室。版权所有（C）2012，JPO＆INPIT

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