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11. 发明申请

WO2005054949A3 LASER THIN FILM POLY-SILICON ANNEALING SYSTEM 审中-公开
标题翻译：激光薄膜多晶硅退火系统
公开(公告)号：WO2005054949A3
公开(公告)日：2005-12-15
申请号：PCT/US2004037617
申请日：2004-11-12
申请人： CYMER INC , PARTLO WILLIAM N , DAS PALASH P , HUDYMA RUSSELL , THOMAS MICHAEL
发明人： PARTLO WILLIAM N , DAS PALASH P , HUDYMA RUSSELL , THOMAS MICHAEL
IPC分类号： B23K26/06 , G03F20060101 , H01L21/20 , H01S3/081 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/0818 , B23K26/042 , B23K26/0622 , B23K26/0738 , B23K26/705 , H01L21/02532 , H01L21/02675 , H01S3/225 , H01S3/2255 , H01S3/2308 , H01S3/2366
摘要： A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in a film on a workpiece is disclosed, which may comprise a master oscillator power amplifier MOPA or power oscillator power amplifier configured XeF laser system producing a laser output light pulse beam at a high repetition rate and high power with a pulse to pulse dose control; an optical system producing an elongated thin pulsed working beam from the laser output light pulse beam. The apparatus may further comprise the laser system is configured as a POPA laser system and further comprising: relay optics operative to direct a first output laser light pulse beam from a first laser PO unit into a second laser PA unit; and, a timing and control module timing the creation of a gas discharge in the first and second laser units within plus or minus 3 ns, to produce the a second laser output light pulse beam as an amplification of the first laser output light pulse beam. The system may comprise divergence control in the oscillator laser unit. Divergence control may comprise an unstable resonator arrangement. The system may further comprise a beam pointing control mechanism intermediate the laser and the workpiece and a beam position control mechanism intermediate the laser and the workpiece. Beam parameter metrology may provide active feedback control to the beam pointing mechanism and active feedback control to the beam position control mechanism.
摘要翻译：公开了一种气体放电激光结晶装置和方法，用于在工件上进行膜内晶体结构或取向的变换，其可包括主振荡器功率放大器MOPA或功率振荡器功率放大器配置的XeF激光系统，产生激光输出光脉冲束以高重复率和高功率以及脉冲到脉冲剂量控制; 光学系统从激光输出光脉冲束产生细长的薄脉冲工作光束。该设备可以进一步包括激光系统被配置为POPA激光系统并且还包括：中继光学器件，用于将来自第一激光PO单元的第一输出激光脉冲光束引导到第二激光PA单元中; 以及定时和控制模块，用于在第一和第二激光单元中产生正或负3ns内的气体放电，以产生作为第一激光输出光脉冲束的放大的第二激光输出光脉冲束。该系统可以包括振荡器激光器单元中的发散控制。发散控制可以包括不稳定的谐振器布置。该系统还可以包括位于激光器和工件之间的光束指向控制机构以及位于激光器和工件之间的光束位置控制机构。波束参数测量可以提供对波束指向机构的主动反馈控制和对波束位置控制机构的主动反馈控制。

12. 发明申请

WO03100826A8 LITHOGRAPHY LASER WITH BEAM DELIVERY AND BEAM POINTING CONTROL 审中-公开
标题翻译：光束传输和光束控制的光刻激光器
公开(公告)号：WO03100826A8
公开(公告)日：2004-11-25
申请号：PCT/US0314387
申请日：2003-05-05
申请人： CYMER INC , DAS PALASH P , WEBB R KYLE , GIOVANARDI MARCO , FRANCIS GREGORY , DORN HUCKLEBERRY B , ERLANDSEN KYLE P , NELSON JOHN W , SANDSTROM RICHARD L , ERSHOV ALEXANDER I
发明人： DAS PALASH P , WEBB R KYLE , GIOVANARDI MARCO , FRANCIS GREGORY , DORN HUCKLEBERRY B , ERLANDSEN KYLE P , NELSON JOHN W , SANDSTROM RICHARD L , ERSHOV ALEXANDER I
IPC分类号： H01L21/027 , G02B26/08 , G02B27/09 , G03F7/20 , H01L20060101 , H01L21/00 , H01S3/00 , H01S3/034 , H01S3/036 , H01S3/04 , H01S3/041 , H01S3/0971 , H01S3/10 , H01S3/13 , H01S3/134 , H01S3/136 , H01S3/137 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： G03F7/7055 , G02B26/0816 , G02B27/0972 , G03F7/70025 , G03F7/70041 , G03F7/70058 , H01S3/005 , H01S3/0057 , H01S3/036 , H01S3/041 , H01S3/0971 , H01S3/136 , H01S3/137 , H01S3/225 , H01S3/2333 , H01S3/2366
摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source (Fig. 1) with a beam delivery to a production line machine (2). The system includes an enclosed (4) and purged beam path (14C) with a beam pointing control (40A) (40B) (6) for delivery of the laser beam to a desired location such as the entrance port of the production line machine (2). In preferred embodiments, the production line machine is a lithography machine (2) and two separate discharge chambers (8)(10) are provided, one of which is a part of a master oscillator (8) producing a very narrow band seed beam (14A), which is amplified in the second discharge chamber (10). This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.
摘要翻译：本发明提供了一种模块化的高重复频率紫外线气体放电激光光源（图1），光束传输到生产线机器（2）。该系统包括具有光束指向控制器（40A）（40B）（6）的封闭（4）和清洗光束路径（14C），用于将激光束传送到期望位置，例如生产线机器的入口 2）。在优选实施例中，生产线机器是光刻机器（2），并且提供两个单独的放电室（8）（10），其中一个是主振荡器（8）的一部分，产生非常窄带的种子束在第二放电室（10）中被放大。该MOPA系统的输出脉冲能量大约是可比较的单腔激光系统的两倍，大大改善了光束质量。

13. 发明申请

WO9919950A8 PULSE ENERGY CONTROL FOR EXCIMER LASER 审中-公开
标题翻译：激光激光的脉冲能量控制
公开(公告)号：WO9919950A8
公开(公告)日：1999-06-24
申请号：PCT/US9818138
申请日：1998-09-01
申请人： CYMER INC , SANDSTROM RICHARD L , BESAUCELE HERVE A , FOMENKOV IGOR V , DAS PALASH P
发明人： SANDSTROM RICHARD L , BESAUCELE HERVE A , FOMENKOV IGOR V , DAS PALASH P
IPC分类号： G03F7/20 , H01S3/03 , H01S3/036 , H01S3/08 , H01S3/134 , H01S3/137 , H01S3/225 , H01S3/18
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70216 , G03F7/70558 , G03F7/70575 , H01S3/03 , H01S3/036 , H01S3/08009 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256
摘要： A process for controlling pulse energy in burst of pulses produced by an excimer laser. The energy of each pulse in each burst is measured. The rate of change of pulse energy with charging voltage is determined. A pulse energy error is determined for a previous pulse of the present burst. An integrated dose error is also determined for all previous pulses in the current burst. A charging voltage for the next pulse is determined using the pulse energy error, the integrated dose error, the rate of change of energy with charging voltage and a reference voltage. In a preferred embodiment, the rate of change of energy with voltage is determined by dithering the voltage during two pulses of each burst, once lower and once higher. The reference voltage is a voltage calculated using prior voltage and energy data. In this embodiment the method of determining the reference voltage during a first portion of the pulse is different from the method used during a latter portion of the burst. During the first set of pulses, for each pulse, (40 in this embodiment) a specified voltage calculated using voltage and energy data from a corresponding pulse in a previous burst is utilized as a prediction of the voltage needed to produce a pulse energy converging on a target pulse energy. For pulses (41) and thereafter the reference voltage for each pulse is the specified voltage for the previous pulse.
摘要翻译：用于通过准分子激光器产生的脉冲脉冲串来控制脉冲能量的过程。测量每个脉冲中每个脉冲的能量。确定脉冲能量随充电电压的变化率。针对当前脉冲串的先前脉冲确定脉冲能量误差。还针对当前突发中的所有先前脉冲确定积分剂量误差。使用脉冲能量误差，积分剂量误差，带充电电压的能量变化率和参考电压来确定下一个脉冲的充电电压。在优选实施例中，通过在每个脉冲串的两个脉冲期间抖动电压来确定能量与电压的变化率，一次较低和一次更高。参考电压是使用先前的电压和能量数据计算的电压。在该实施例中，在脉冲的第一部分期间确定参考电压的方法与在脉冲串的后一部分期间使用的方法不同。在第一组脉冲期间，对于每个脉冲（在本实施例中为40）使用来自先前脉冲串中的相应脉冲的电压和能量数据计算的指定电压被用作产生脉冲能量收敛所需的电压的预测目标脉冲能量。对于脉冲（41），此后每个脉冲的参考电压是先前脉冲的指定电压。

14. 发明申请

WO2005094205A3 VERY HIGH ENERGY, HIGH STABILITY GAS DISCHARGE LASER SURFACE TREATMENT SYSTEM 审中-公开
标题翻译：高能量，高稳定性气体放电激光表面处理系统
公开(公告)号：WO2005094205A3
公开(公告)日：2007-08-09
申请号：PCT/US2004024160
申请日：2004-07-26
申请人： TCZ GMBH , DAS PALASH P , BOLLIGER BRUCE E , PATEL PARTHIV , KLENE BRIAN C , MELCHER PAUL C , SAETHRE ROBERT B
发明人： DAS PALASH P , BOLLIGER BRUCE E , PATEL PARTHIV , KLENE BRIAN C , MELCHER PAUL C , SAETHRE ROBERT B
IPC分类号： H01S3/22 , B23K26/00 , B23K26/06 , B23K26/40 , H01S3/00 , H01S3/097 , H01S3/225 , H01S3/23
CPC分类号： B23K26/0604 , B23K26/0624 , B23K2201/40 , C30B29/06 , C30B33/02 , C30B35/00 , H01S3/0057 , H01S3/097 , H01S3/225 , H01S3/2253 , H01S3/2333 , H01S3/2366
摘要： A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in the substrate of a workpiece is disclosed with may comprise, a multichambers laser system comprising, a first laser unit, and laser timing and control module, the timing and control module operates to create a gas discharge transiting the second discharge region, within plus or minus 3 ns and as a POPO, combining optics combine the out beams, and time creates pulse separation in the combined output a preselected time plus or minus 3 ns.
摘要翻译：公开了一种气体放电激光结晶装置和用于在工件的基板中进行晶体化妆或取向的变换的方法，其可以包括：多室激光系统，包括第一激光单元和激光定时和控制模块，定时并且控制模块操作以在正或负3ns内产生经过第二放电区域的气体放电，并且作为POPO，组合光学器件组合出射束，并且时间在组合输出中产生预选时间加或减3ns 。

15. 发明专利

JP2006261689A Extremely narrow band two-chamber type high-repetition rate gas discharging laser system 审中-公开
标题翻译：极致窄带双层高速重启速率排气激光系统
公开(公告)号：JP2006261689A
公开(公告)日：2006-09-28
申请号：JP2006129553
申请日：2006-05-08
申请人： Cymer Inc , サイマー, インコーポレイテッドCymer, Inc.
发明人： MYERS DAVID W , BESAUCELE HERVE A , ERSHOV ALEXANDER I , PARTLO WILLIAM N , SANDSTROM RICHARD L , DAS PALASH P , ANDERSON STUART L , FOMENKOV IGOR V , UJAZDOWSKI RICHARD C , PAN XIAOJIANG J , ONKELS ECKEHARD D , NESS RICHARD M , BROWN DANIEL J W
IPC分类号： H01S3/03 , G01J9/00 , G03F7/20 , H01S3/00 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： PROBLEM TO BE SOLVED: To generate high quality pulsed laser beams at a pulse rate of about 4,000 Hz or greater and at a pulse energy of about 5 mJ or greater. SOLUTION: Two individual discharge chambers are provided and one of which is a part of a master oscillator producing a very narrow-band seed beam which is amplified in the second discharge chamber. The chambers can be controlled individually permitting individual optimization of wavelength parameters in the master oscillator and the optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system is configured as a MOPA (Master Oscillator Power Amplifier) and specifically designed for use as a light source for integrated-circuit pattern lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing a sufficient gas flow to permit operation at a pulse rate of 4,000 Hz or greater by clearing debris from a discharging region in a time shorter than approximately 0.25 milliseconds between pulses. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。解决方案：提供两个单独的放电室，其中一个是主振荡器的一部分，产生在第二放电室中放大的非常窄带子光束。可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中脉冲能量参数的优化。 ArF准分子激光器系统中的优选实施例被配置为MOPA（主振荡器功率放大器），并被专门设计为用作集成电路图案光刻的光源。在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在短于脉冲之间的大约0.25毫秒的时间内从放电区域清除碎屑，从而提供足够的气流以允许以4,000Hz或更高的脉冲速率运行。版权所有（C）2006，JPO＆NCIPI

16. 发明专利

JP2008022026A Reliable, modular, production-quality narrow-band high repetition-rate f2 laser 审中-公开
标题翻译：可靠，模块化，生产质量窄带高反射率F2激光
公开(公告)号：JP2008022026A
公开(公告)日：2008-01-31
申请号：JP2007236405
申请日：2007-09-12
申请人： Cymer Inc , サイマー, インコーポレイテッドCymer, Inc.
发明人： HOFMANN THOMAS , HUEBER JEAN-MARC , DAS PALASH P , ISHIHARA TOSHIHIKO , THOMAS P DAFFY , JOHN T MELCHIOR , BESAUCELE HERVE A , MORTON RICHARD G , NESS RICHARD M , NEWMAN PETER C , PARTLO WILLIAM N , ROTHWEIL DANIEL A , SANDSTROM RICHARD L
IPC分类号： H01S3/03 , H01S3/097 , G03F7/20 , H01S3/137 , H01S3/225
CPC分类号： G03F7/70575
摘要： PROBLEM TO BE SOLVED: To provide a reliable, modular, production-quality narrow-band high repetition-rate F 2 laser. SOLUTION: A reliable, modular, production-quality excimer laser capable of producing 10 mJ laser pulses in the range of 1,000 Hz to 2,000 Hz or greater is provided. Replaceable modules include a laser chamber, a pulse power system including three modules, an optical resonator comprised of a line narrowing module and an output coupler module, a wavemeter module, an electrical control module, a cooling water module, and a gas control module. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供可靠的模块化生产质量窄带高重复率F 2 激光器。
解决方案：提供了一种可靠，模块化，生产质量准分子激光器，能够产生1,000 Hz至2,000 Hz或更大范围内的10 mJ激光脉冲。可替代模块包括激光室，包括三个模块的脉冲电力系统，包括线路窄化模块和输出耦合器模块的光学谐振器，波形计模块，电气控制模块，冷却水模块和气体控制模块。版权所有（C）2008，JPO＆INPIT

17. 发明专利

JP2008034871A Lithography laser light source with beam delivery 有权
标题翻译：光束激光光源与光束交付
公开(公告)号：JP2008034871A
公开(公告)日：2008-02-14
申请号：JP2007260176
申请日：2007-10-03
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： KLENE BRIAN C , DAS PALASH P , GROVE STEVEN L , ERSHOV ALEXANDER I , SMITH SCOTT T , PAN XIAOJIANG J , SANDSTROM RICHARD L
IPC分类号： H01L21/027 , H01S3/10 , G03F7/20 , H01S3/00 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： G03F7/70933 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： PROBLEM TO BE SOLVED: To provide a modular high repetition rate ultraviolet gas discharge laser (4) for a production line machine. SOLUTION: A system includes an enclosed and purged beam path for providing the laser beam to a desired location such as an entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine (2) and two separated discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam amplified in a second discharge chamber. A MOPA system allows outputting pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. The preferred embodiment allows providing illumination approximately constant throughout the operating life of the lithography system. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于生产线机器的模块化高重复率紫外线气体放电激光器（4）。解决方案：系统包括用于将激光束提供到期望位置（例如生产线机器的入口）的封闭和清除的光束路径。在优选实施例中，生产线机器是光刻机（2），并且提供两个分离的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体光束。 MOPA系统允许输出脉冲能量大约是可比较的单室激光系统的两倍，具有极大改善的光束质量。与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。优选实施例允许在光刻系统的整个使用寿命期间提供近似恒定的照明。版权所有（C）2008，JPO＆INPIT

18. 发明专利

JP2001274496A HIGH-SPEED WAVELENGTH CORRECTION TECHNIQUE REGARDING LASER 失效
公开(公告)号：JP2001274496A
公开(公告)日：2001-10-05
申请号：JP2001034446
申请日：2001-02-09
申请人： CYMER INC
发明人： EVERAGE GEORGE J , FOMENKOV IGOR V , DAS PALASH P , SANDSTROM RICHARD L , ERIE FREDERICK G , ALGOTS JOHN M
IPC分类号： G03F7/20 , H01L21/027 , H01S3/034 , H01S3/036 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/225
摘要： PROBLEM TO BE SOLVED: To provide a high-speed wavelength correction technique regarding a laser. SOLUTION: A discharge laser with a high-speed chirp correction is provided. A high-speed wavelength chirp correction device contains at least one piezoelectric drive and a high-speed wavelength detection means, and it comprises the feedback response time shorter than 1.0 msec. In a preferable execution form, a simple learning algorithm which is used to promote the adjustment of an adjusting mirror is mentioned in anticipation of a learned chirp pattern. This correction technique contains combination of a comparatively slow stepper motor and a very-high-speed piezoelectric driver. In another preferable execution shape, the wavelength of a certain pulse is measured, and, on the basis of a pulse interval in which the wavelength of a next pulse is corrected on the basis of the measurement, a chirp correction is performed. The correction technique can function in the high-speed repetition number of 2,000 Hz or more.

19. 发明专利

JP2000294864A SMART LASER PROVIDED WITH AUTOMATIC BEAM QUALITY CONTROL 失效
公开(公告)号：JP2000294864A
公开(公告)日：2000-10-20
申请号：JP2000077242
申请日：2000-02-14
申请人： CYMER INC
发明人： ERIE FREDERICK G , DAS PALASH P , BUCK JESSE D
IPC分类号： H01L21/027 , G02B5/18 , G03F7/20 , H01S3/08 , H01S3/1055 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/225
摘要： PROBLEM TO BE SOLVED: To easily, quickly, and accurately control laser beam output parameters by exercising control through a computer controller for adjusting grating bends, based on a supplied band width information. SOLUTION: A new laser frame 5A is additionally provided with a chamber position step motor in order to automatically adjust the horizontal position of a chamber in the direction of '3A'. A new LNP 7A contains a prism plate stepper motor 32, a R-max tilt stepper motor 34, and a grating bending motor. All the step motors are controlled by a computer controller 24A. A grating bending stepper motor 30 is added to control bends in grating 16. The system applies either of compressive force to cause legs 17A and 17B to move away from each other so as to produce a concave bend in the line surface of the grating 16 and tensile force to pull the legs 17A and 17B together so as to produce a convex bend in the line surface of the grating 16.

20. 发明专利

JPH11191660A GAS DOPED NARROW-BAND EXCIMER LASER 失效
公开(公告)号：JPH11191660A
公开(公告)日：1999-07-13
申请号：JP28979498
申请日：1998-10-12
申请人： CYMER INC
发明人： HOFMANN THOMAS , DAS PALASH P , TOSHIHIKO ISHIHARA , ERSHOV ALEXANDER I
IPC分类号： H01S3/038 , G03F7/20 , H01S3/02 , H01S3/03 , H01S3/034 , H01S3/036 , H01S3/08 , H01S3/0971 , H01S3/1055 , H01S3/225
摘要： PROBLEM TO BE SOLVED: To provide an excimer laser, more specifically a gas-doped narrow- band excimer laser. SOLUTION: A gas-doped narrow-band excimer laser is constituted of a laser chamber formed of a fluorine-compatible material, two long electrodes, at least a pre-ionization device, and a mixed laser gas constituted of a first rare gas, fluorine, buffer gas, and stabilizing additive of 100 ppm or below which are all prescribed in pressure. Here, the stabilizing additive agent is selected so as to be composed of 10 ppm or below of oxygen and a certain mount of second rare gas which is heavier in mass than that of the first rare gas.

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