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    • 1. 发明申请
    • LASER THIN FILM POLY-SILICON ANNEALING SYSTEM
    • 激光薄膜多晶硅退火系统
    • WO2005054949A3
    • 2005-12-15
    • PCT/US2004037617
    • 2004-11-12
    • CYMER INCPARTLO WILLIAM NDAS PALASH PHUDYMA RUSSELLTHOMAS MICHAEL
    • PARTLO WILLIAM NDAS PALASH PHUDYMA RUSSELLTHOMAS MICHAEL
    • B23K26/06G03F20060101H01L21/20H01S3/081H01S3/22H01S3/223H01S3/225H01S3/23
    • H01S3/0818B23K26/042B23K26/0622B23K26/0738B23K26/705H01L21/02532H01L21/02675H01S3/225H01S3/2255H01S3/2308H01S3/2366
    • A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in a film on a workpiece is disclosed, which may comprise a master oscillator power amplifier MOPA or power oscillator power amplifier configured XeF laser system producing a laser output light pulse beam at a high repetition rate and high power with a pulse to pulse dose control; an optical system producing an elongated thin pulsed working beam from the laser output light pulse beam. The apparatus may further comprise the laser system is configured as a POPA laser system and further comprising: relay optics operative to direct a first output laser light pulse beam from a first laser PO unit into a second laser PA unit; and, a timing and control module timing the creation of a gas discharge in the first and second laser units within plus or minus 3 ns, to produce the a second laser output light pulse beam as an amplification of the first laser output light pulse beam. The system may comprise divergence control in the oscillator laser unit. Divergence control may comprise an unstable resonator arrangement. The system may further comprise a beam pointing control mechanism intermediate the laser and the workpiece and a beam position control mechanism intermediate the laser and the workpiece. Beam parameter metrology may provide active feedback control to the beam pointing mechanism and active feedback control to the beam position control mechanism.
    • 公开了一种气体放电激光结晶装置和方法,用于在工件上进行膜内晶体结构或取向的变换,其可包括主振荡器功率放大器MOPA或功率振荡器功率放大器配置的XeF激光系统,产生激光输出光 脉冲束以高重复率和高功率以及脉冲到脉冲剂量控制; 光学系统从激光输出光脉冲束产生细长的薄脉冲工作光束。 该设备可以进一步包括激光系统被配置为POPA激光系统并且还包括:中继光学器件,用于将来自第一激光PO单元的第一输出激光脉冲光束引导到第二激光PA单元中; 以及定时和控制模块,用于在第一和第二激光单元中产生正或负3ns内的气体放电,以产生作为第一激光输出光脉冲束的放大的第二激光输出光脉冲束。 该系统可以包括振荡器激光器单元中的发散控制。 发散控制可以包括不稳定的谐振器布置。 该系统还可以包括位于激光器和工件之间的光束指向控制机构以及位于激光器和工件之间的光束位置控制机构。 波束参数测量可以提供对波束指向机构的主动反馈控制和对波束位置控制机构的主动反馈控制。
    • 2. 发明申请
    • LASER THIN FILM POLY-SILICON ANNEALING OPTICAL SYSTEM
    • 激光薄膜聚硅氧烷退火光学系统
    • WO2005053893A3
    • 2005-07-07
    • PCT/US2004037618
    • 2004-11-12
    • CYMER INCPARTLO WILLIAM NDAS PALASH PHUDYMA RUSSELTHOMAS MICHAEL
    • PARTLO WILLIAM NDAS PALASH PHUDYMA RUSSELTHOMAS MICHAEL
    • B23K26/06B23K26/073C30B1/02C30B13/24H01L21/20H01S3/22H01S3/223B23K26/00
    • B23K26/0732B23K26/0622B23K26/0738C30B1/023C30B13/24H01L21/2026
    • A high energy, high repetition rate workpiece surface heating method and apparatus are disclosed which may comprise a pulsed XeF laser operating operating at or above 4000 Hz and producing a laser output light pulse beam at a center wavelength of about 351 nm; an optical system narrowing the laser output light pulse beam to less than 20 µm in a short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam workpiece covering extent of the long axis; the optical system including a field stop intermediate the laser and the workpiece; the workpiece comprising a layer to be heated; wherein the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep side walls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece without blocking the beam profile at too high an intensity level 2. The apparatus may also have a high average power in the laser output light pulse beam as delivered to the workpiece and a linebow correction mechanism in a short axis optical assembly. The linebow correction mechanism may comprise a plurality of weak cross cylinders. The system may comprise a catadioptric projection system. The line width due to laser diffraction and divergence may be less than geometric limitations. The system may project adjacent peaks of the nominal XeF spectrum to improve overall depth of focus through the separate center wavelengths of each respective adjacent peak having a different focal plane at the workpiece. The system may comprise a linebow is correction mechanism within a field stop optical assembly correcting linebow at the field stop plane and within a workpiece projection optical assembly correcting linebow at the workpiece plane.
    • 公开了一种高能量,高重复率的工件表面加热方法和装置,其可以包括在4000Hz以上工作的脉冲XeF激光器,并在约351nm的中心波长处产生激光输出光脉冲光束; 将激光输出光脉冲光束在激光输出光脉冲光束的短轴上变窄到小于20μm的光学系统,并且扩大激光输出光脉冲光束以形成长轴的光束工件覆盖范围的长轴 ; 该光学系统包括在激光和工件之间的中止场; 所述工件包括待加热层; 其中所述光学系统将激光输出光脉冲光束在场停止处以足以保持具有足够陡峭侧壁的强度分布的放大倍率来允许场停止在工件处保持足够陡峭的光束轮廓而不阻挡光束轮廓 在太高的强度水平2.该装置还可以在输送到工件的激光输出光脉冲光束中具有高的平均功率,以及在短轴光学组件中具有弯管校正机构。 弯管矫正机构可以包括多个弱交叉圆筒。 该系统可以包括反折射投影系统。 由激光衍射和发散引起的线宽可能小于几何限制。 该系统可以投射标称XeF谱的相邻峰值,以通过在工件处具有不同焦平面的各个相邻峰值的分开的中心波长来提高整体焦深。 系统可以包括在场停止光学组件中的弯头矫正机构,其在场停止平面处以及工件投影光学组件中在工件平面处校正弯头。
    • 10. 发明申请
    • MODIFIED MESSENGER RNA STABILIZING SEQUENCES FOR EXPRESSING GENES IN BACTERIAL CELLS
    • 用于在细菌细胞中表达基因的修饰信使RNA稳定序列
    • WO2008140615A3
    • 2009-05-14
    • PCT/US2007088060
    • 2007-12-19
    • NOVOZYMES INCTHOMAS MICHAELERICHSEN GLORIAWIDNER WILLIAM
    • THOMAS MICHAELERICHSEN GLORIAWIDNER WILLIAM
    • C12N15/75
    • C07K14/32C12N15/75
    • The present invention relates to methods of producing a polypeptide having biological activity in a bacterial cell, comprising: (a) cultivating a bacterial host cell in a medium conducive for production of the polypeptide, wherein the bacterial host cell comprises a nucleic acid construct comprising a promoter region operably linked to a polynucleotide sequence encoding the polypeptide and a modified mRNA processing/stabilizing sequence located downstream of the promoter region and upstream of the ribosome binding site of the polynucleotide sequence encoding the polypeptide, wherein the modified mRNA processing/stabilizing sequence promotes higher expression of the polynucleotide sequence compared to an unmodified mRNA processing/stabilizing sequence; and (b) isolating the polypeptide having biological activity from the cultivation medium. The present invention also relates to such modified mRNA processing/stabilizing sequences, nucleic acid constructs, and bacterial host cells and to methods of obtaining such bacterial host cells.
    • 本发明涉及生产在细菌细胞中具有生物活性的多肽的方法,包括:(a)在有助于产生多肽的培养基中培养细菌宿主细胞,其中细菌宿主细胞包含核酸构建体,其包含 与编码多肽的多核苷酸序列可操作地连接的启动子区和位于编码多肽的多核苷酸序列的启动子区域的下游和修饰的mRNA加工/稳定序列的修饰的mRNA加工/稳定序列,其中修饰的mRNA加工/稳定序列促进更高 与未修饰的mRNA加工/稳定序列相比,多核苷酸序列的表达; 和(b)从培养基中分离具有生物活性的多肽。 本发明还涉及这种修饰的mRNA加工/稳定序列,核酸构建体和细菌宿主细胞以及获得这种细菌宿主细胞的方法。