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    • 3. 发明申请
    • ロールツーロール方式の表面処理装置並びにこれを用いた成膜方法及び成膜装置
    • 卷对卷型表面处理装置,成膜方法和使用其的成膜装置
    • WO2018038141A1
    • 2018-03-01
    • PCT/JP2017/030065
    • 2017-08-23
    • 住友金属鉱山株式会社
    • 大上 秀晴
    • C23C14/56C23C16/54H05K3/00H05K3/16
    • コストを抑えつつ長尺基材にシワがほとんど発生しないよう処理することが可能なロールツーロール方式の長尺基材の表面処理装置を提供する。 真空チャンバー内においてロールツーロールで搬送される長尺樹脂フィルムを外周面に巻き付けて内部を循環する冷媒で冷却する2個のキャンロールと、これら2個のキャンロールの外周面に対向する位置に設けられたマグネトロンスパッタリングカソードに代表される表面処理手段とを有する表面処理装置であって、これら2個のキャンロールのうち、最も上流側に位置する第1キャンロール以外の第2キャンロールは外周面からガスを放出するガス放出機構を備えている。
    • 提供一种卷对卷长表面基材表面处理装置,其能够进行处理以使得在抑制成本的同时在长基材上不易产生褶皱。 和两个可以滚动面临两者的外圆周表面可以滚冷却制冷剂的内部伤口周围循环是通过辊对辊在真空室中传送的长树脂膜的外周面,在一个位置 除了位于两个罐卷的最上游侧的第一罐卷以外的第二罐卷设有外圆周 以及用于从表面释放气体的气体释放机构。
    • 5. 发明申请
    • SPUTTERING PROCESS
    • 喷涂工艺
    • WO01011676A2
    • 2001-02-15
    • PCT/US2000/021447
    • 2000-08-04
    • C23C14/34C23C14/02C23C14/20C23C14/54H05K3/00H05K3/06H05K3/16H05K3/40H01L21/48
    • C23C14/022C23C14/205C23C14/541H05K3/0011H05K3/0032H05K3/16H05K2201/0154H05K2203/016H05K2203/1105H05K2203/1536H05K2203/165
    • A method for coating substrates having sides of the substrate with unequal adhesion properties includes the steps of non-symmetrically coating the substrate by coating a first side under a first set of coating conditions and coating a second side under a second set of operating conditions wherein the operating conditions used to coat each side are varied so as to compensate for the unequal adhesion properties of the sides. Also, a method for substrate preparation comprising the steps of: providing an annealed thermoplastic substrate base layer having a first surface and a second surface; stabilizing the substrate base layer in an environment having a baseline temperature and relative humidity; drilling vias in the base layer; subjecting the first and second surfaces of the base layer to ion processing so as to remove contaminants caused by drilling the vias and to prepare the first and second surfaces for sputtering; metalizing the base layer by first sputtering at least one metal layer onto the first surface of the base layer and subsequently sputtering at least one metal layer onto the second surface of the base layer said sputtering of the metal layers being controlled so as to prevent the temperature of the base layer from exceeding the annealing temperature of the base layer; allowing the metalized base layer to stabilize in an environment having the baseline temperature and relative humidity an then subjecting the metalized base layer to further processing so as to modify the metal layers into conductive patterns.
    • 本发明涉及一种用于涂布侧面具有不均匀粘附性质的基材的方法。 该方法包括以下步骤:通过根据第一组涂布条件涂布第一侧并根据第二组使用条件涂布第二侧来不对称地涂布基材; 用于涂布每个侧面,以便补偿侧面的不均匀粘合性能。 本发明还涉及一种制备基材的方法,该方法包括:提供具有第一表面和第二表面的退火热塑性支承基层; 在具有基础温度和相对湿度的环境中稳定基底的基底层; 冲压基层中的通孔; 对基层的第一和第二表面进行离子处理,以便一方面去除由通孔的钻孔引起的杂质,另一方面准备第一和第二表面 喷涂的第二表面; 首先将至少一个金属层喷涂到基层的第一表面上,然后将至少一个金属层喷涂到基层的第二表面上; 调整金属层的这种喷涂以防止基层的温度超过基层的退火温度; 使金属化基层稳定在此后具有所述基础温度和相对湿度的环境中; 对所述金属化基层进行另一处理以将金属层转换成导电印痕。
    • 9. 发明申请
    • SPUTTERING PROCESS
    • 溅射过程
    • WO0111676A3
    • 2001-09-07
    • PCT/US0021447
    • 2000-08-04
    • ALLIED SIGNAL INC
    • POMMER RICHARD JAVERY STEPHEN MROETERS GLEN
    • C23C14/34C23C14/02C23C14/20C23C14/54H05K3/00H05K3/06H05K3/16H05K3/40H01L21/48
    • C23C14/022C23C14/205C23C14/541H05K3/0011H05K3/0032H05K3/16H05K2201/0154H05K2203/016H05K2203/1105H05K2203/1536H05K2203/165
    • A method for coating substrates having sides of the substrate with unequal adhesion properties includes the steps of non-symmetrically coating the substrate by coating a first side under a first set of coating conditions and coating a second side under a second set of operating conditions wherein the operating conditions used to coat each side are varied so as to compensate for the unequal adhesion properties of the sides. Also, a method for substrate preparation comprising the steps of: providing an annealed thermoplastic substrate base layer having a first surface and a second surface; stabilizing the substrate base layer in an environment having a baseline temperature and relative humidity; drilling vias in the base layer; subjecting the first and second surfaces of the base layer to ion processing so as to remove contaminants caused by drilling the vias and to prepare the first and second surfaces for sputtering; metalizing the base layer by first sputtering at least one metal layer onto the first surface of the base layer and subsequently sputtering at least one metal layer onto the second surface of the base layer said sputtering of the metal layers being controlled so as to prevent the temperature of the base layer from exceeding the annealing temperature of the base layer; allowing the metalized base layer to stabilize in an environment having the baseline temperature and relative humidity an then subjecting the metalized base layer to further processing so as to modify the metal layers into conductive patterns.
    • 一种用于涂覆具有不同粘合性质的基材侧面的基材的方法,包括以下步骤:在第一组涂布条件下涂布第一面并在第二组操作条件下涂布第二面而不对对涂布基材,其中, 用于涂覆每一面的操作条件是变化的,以便补偿侧面的不相等的粘合性能。 另外,一种基板制备方法,包括以下步骤:提供具有第一表面和第二表面的退火的热塑性基材基层; 在具有基线温度和相对湿度的环境中稳定基底基底层; 在基层钻孔; 对基层的第一表面和第二表面进行离子处理,以除去通过钻孔而导致的污染物并制备用于溅射的第一和第二表面; 通过首先将至少一个金属层溅射到基底层的第一表面上并随后将至少一个金属层溅射到基底层的第二表面上来金属化基底层,所述金属层的溅射被控制以便防止温度 的基层超过基层的退火温度; 允许金属化基层在具有基线温度和相对湿度的环境中稳定,然后对金属化基层进行进一步处理,以将金属层改性为导电图案。