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1. 发明申请

WO2008079349A2 SYSTEMS AND METHODS FOR UTILIZING SCANNING PROBE SHAPE CHARACTERIZATION 审中-公开
标题翻译：利用扫描探针形状表征的系统和方法
公开(公告)号：WO2008079349A2
公开(公告)日：2008-07-03
申请号：PCT/US2007/026193
申请日：2007-12-21
申请人： VEECO METROLOGY INC. , BAO, Tianming , LIU, Hao-chih , GREGORY, Dahlen, A. , JAIN, Rohit
发明人： BAO, Tianming , LIU, Hao-chih , GREGORY, Dahlen, A. , JAIN, Rohit
IPC分类号： G01Q30/06 , G01Q40/00
CPC分类号： G01Q40/00 , G01Q30/06 , Y10S977/878 , Y10S977/881
摘要： A scanning probe microscope's probe tip dimensions as they exist or existed for a certain data or measurement are inferred based on probe activity taking place since a probe characterization procedure was performed. The inferred probe tip dimensions can be used to correct nanoscale measurements taken by the probe to account for changes in the probe's geometry such as wear.
摘要翻译：扫描探针显微镜的探针尖端尺寸在存在或存在用于特定数据或测量时，基于探针活动发生，由于进行了探针表征过程，所以推断出扫描探针显微镜的探针尖端尺寸。推断出的探针尖端尺寸可以用于校正由探针采取的纳米尺度测量，以考虑探针几何形状的变化，例如磨损。

2. 发明申请

WO02037526A1 ELECTRON BEAM APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE COMPRISING THE APPARATUS 审中-公开
标题翻译：电子束装置和制造包含装置的半导体装置的方法
公开(公告)号：WO02037526A1
公开(公告)日：2002-05-10
申请号：PCT/JP2001/009629
申请日：2001-11-02
IPC分类号： G01N23/225 , G01Q30/06 , H01J37/06 , H01J37/073 , H01J37/18 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , H01J37/29 , H01L21/027 , H01L21/66
CPC分类号： H01J37/185 , G01N23/225 , G01N23/2251 , H01J37/06 , H01J37/073 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： An electron beam apparatus for evaluating a sample face which comprises a primary electro-optical system irradiating the sample with primary electron beams, a detection system, and a secondary electro-optical system directing the secondary electron beam generated from the sample face by irradiation with the primary electron beam to the detection system. The electron beam apparatus is characterized by comprising a multi-beam generator included in the primary electro-optical system to generate electrons emitted from an electron gun as primary electron beams, a scanning deflector included in the primary electro-optical system to scan the sample simultaneously with the primary electron beams, an objective lens included in common in the primary electro-optical system and the secondary electro-optical system to irradiate the sample with decelerated primary electron beams and to accelerate the secondary electron beams emitted from the irradiated point on the sample with the primary electron beams, a secondary electron beam separator included in the primary and secondary electro-optical systems to deflect the secondary electron beams passing through the objective lens from the primary electro-optical system to the secondary electro- optical system, a magnifying lens of at least one stage included in the secondary electro-optical lens to magnify the deflected secondary electron beams, and detectors included in the detection system and provided in accordance with the secondary electron beams for the secondary electro-optical system to detect secondary electron beams.
摘要翻译：一种用于评估样品面的电子束装置，其包括用一次电子束照射样品的初级电光学系统，检测系统和辅助电光学系统，其通过照射所述样品面产生的二次电子束一次电子束到检测系统。电子束装置的特征在于，包括在主电光系统中的多光束发生器，用于产生从电子枪发射的电子作为一次电子束，包括在初级电光系统中以同时扫描样品的扫描偏转器与一次电子束一样，包括在初级电光系统中的物镜和辅助电光系统以用减速的一次电子束照射样品并加速从样品上的照射点发射的二次电子束与一次电子束一起，包括在初级和次级电光系统中的二次电子束分离器，用于将通过物镜的二次电子束从初级电光系统偏转到次级电光系统，放大透镜包括在次级电光学透镜中的至少一个阶段 fy是偏转的二次电子束，以及包括在检测系统中并且根据用于次级电光系统的二次电子束提供的检测二次电子束的检测器。

3. 发明申请

WO9915851A9 METHOD AND APPARATUS FOR OBTAINING IMPROVED VERTICAL METROLOGY MEASUREMENTS 审中-公开
标题翻译：用于获得改进的垂直计量测量的方法和装置
公开(公告)号：WO9915851A9
公开(公告)日：1999-06-03
申请号：PCT/US9820184
申请日：1998-09-23
申请人： VEECO INSTR INC
发明人： BABCOCK KENNETH L , ELINGS VIRGIL B , GURLEY JOHN A , KJOLLER KEVIN
IPC分类号： G01B11/30 , G01B5/28 , G01B7/34 , G01B21/30 , G01Q10/06 , G01Q30/04 , G01Q30/06 , G01Q60/00 , G01Q70/08
CPC分类号： G01Q10/06 , G01B7/34 , G01Q30/04 , Y10S977/852
摘要： A probe-based surface characterization or metrology instrument accounts for errors in the vertical positioning of its probe and errors in detecting the vertical position of its probe. These errors are accounted for by subtracting reference scan data from measurement scan data. The measurement scan data is obtained from an area that includes the feature of interest as well as a portion of a reference area that includes the feature of interest, as well as a portion of the reference area which is featureless. The reference scan data is obtained from an area that includes the reference area and that, preferably, excludes the features of interest. This procedure is particularly well-suited for measuring pole tip recession in a magnetic head.
摘要翻译：基于探针的表面表征或计量仪器考虑了其探针的垂直定位误差和检测其探针垂直位置的误差。通过从测量扫描数据中减去参考扫描数据来解释这些误差。从包括感兴趣特征的区域以及包括感兴趣特征的参考区域的一部分以及无特征的参考区域的一部分获得测量扫描数据。参考扫描数据从包括参考区域的区域获得，并且优选地排除感兴趣的特征。该过程特别适用于测量磁头中的极尖衰退。

4. 发明申请

WO2019161188A1 METROLOGY DEVICE WITH AUTOMATED COMPENSATION AND/OR ALERT FOR ORIENTATION ERRORS 审中-公开
公开(公告)号：WO2019161188A1
公开(公告)日：2019-08-22
申请号：PCT/US2019/018204
申请日：2019-02-15
申请人： THE L.S. STARRETT COMPANY
发明人： WILKINSON, Jeffrey M.
IPC分类号： G01B5/00 , G01B5/012 , G01Q20/00 , G01Q30/06
摘要： A metrology device with automated compensation and/or alert for orientation errors. The device may include a processor, a probe portion and at least one orientation sensor. The probe provides an output representative of a raw measurement of a characteristic of a device under test and the orientation sensor provides a sensor output representative of an orientation of the metrology device to the device under test. The processor applies a correction factor to the raw measurement in response to the sensor output to establish a compensated measurement to compensate for misalignment of the metrology device to the device under test. In addition, or alternatively, the processor provides an alert indicating the existence and/or extent of the misalignment.

5. 发明申请

WO2016143052A1 走査型プローブ顕微鏡审中-公开
标题翻译：扫描探针显微镜
公开(公告)号：WO2016143052A1
公开(公告)日：2016-09-15
申请号：PCT/JP2015/056918
申请日：2015-03-10
申请人：株式会社島津製作所
发明人：新井　浩 , 大田　昌弘 , 松田　政夫
IPC分类号： G01Q30/06
CPC分类号： G01Q30/06
摘要：　走査型プローブ顕微鏡１０は、探針１１１と、試料Ｓを保持する試料ホルダ１１３と、試料Ｓの表面を探針１１１で走査するように探針１１１と試料ホルダ１１３を相対的に移動させる走査部（スキャナ１１４）と、探針１１１と試料Ｓの間に生じる相互作用を計測する計測部１１５を有し、相互作用の計測結果に基づいて該表面の像を作成するものであって、計測部１１５により得られる計測データを保存する計測データ保存部（データ保存部１２０）と、前記表面の走査中における所定の複数のタイミングにおいて、各タイミング以前の所定の期間内に得られた計測データ保存部中の計測データをフーリエ変換することにより、ノイズ除去前周波数スペクトルデータを作成するノイズ除去前周波数スペクトルデータ作成部１２２と、ノイズ除去処理用データからバックグラウンド及び所定の周波数帯のデータのいずれか一方又は両方を除去することにより、ノイズ除去後周波数スペクトルデータを作成するノイズ除去後周波数スペクトルデータ作成部１２３と、ノイズ除去後周波数スペクトルデータを逆フーリエ変換することにより試料表面像作成用データを作成するノイズ除去後計測データ作成部１２４と、試料表面像作成用データが作成される毎に、該試料表面像作成用データに基づいて前記表面の像を作成する試料表面像作成部１２５とを備える。
摘要翻译：提供了一种扫描探针显微镜10，其包括探针111，用于保持样品S的样品架113，用于使探针111和样品架113相对于彼此移动的扫描单元（扫描仪114）利用探针111的样品S的表面和用于测量探针111和样品S之间的相互作用的测量单元115，并且基于其测量结果产生样品表面的图像，其中，扫描探针显微镜10设置有：存储由测量单元115获得的测量数据的测量数据存储单元（数据存储单元120）在噪声去除频谱数据创建单元122中，在表面的扫描期间的预定多个定时，通过在预定时间段内获得的测量数据存储单元中的测量数据进行傅立叶变换来生成预噪声去除频谱数据到每个时间; 后噪声去除频谱数据创建单元123，其通过从噪声去除处理数据中去除预定频带的背景和数据中的一个或两个来创建噪声去除频谱数据; 噪声去除测量数据创建单元124，通过对后噪声去除频谱数据进行反傅立叶变换来创建样本表面图像创建数据; 以及样本表面图像创建单元125，其在每次创建样本表面图像创建数据时根据样本表面图像创建数据创建表面的图像。

6. 发明申请

WO2016010963A1 HIGH SPEED ADAPTIVE-MULTI-LOOP MODE IMAGING ATOMIC FORCE MICROSCOPY 审中-公开
标题翻译：高速自适应多环模式成像原子力显微镜
公开(公告)号：WO2016010963A1
公开(公告)日：2016-01-21
申请号：PCT/US2015/040273
申请日：2015-07-14
申请人： RUTGERS, THE STATE UNIVERSITY OF NEW JERSEY
发明人： ZOU, Qingze , REN, Juan , LIU, Jiangbo
IPC分类号： G01Q30/06 , G01Q30/12 , B82Y35/00
CPC分类号： G01Q10/065 , G01Q60/34
摘要： A method for imaging a sample using a high speed dynamic mode atomic force microscope may include scanning a tip of a cantilever probe over a surface of the sample, regulating a vibration amplitude of the tip to remain constant at a set point value (A set ), via a first signal generated in a first feedback controller, measuring a mean tapping deflection of the tip, regulating the mean tapping deflection via a second signal generated in a second feedback controller, tracking and measuring an adjustment to the measured mean tapping deflection during the regulating. The method may further include generating an image topography of the sample based on the first signal, the second signal, and the measured adjustment of the mean tapping deflection of the cantilever probe.
摘要翻译：使用高速动态模式原子力显微镜对样品进行成像的方法可以包括在样品的表面上扫描悬臂探头的尖端，调节尖端的振动幅度以保持恒定在设定值（Aset），通过在第一反馈控制器中产生的第一信号，测量尖端的平均分接偏转，通过在第二反馈控制器中产生的第二信号来调节平均分接偏转，跟踪和测量在调节期间测得的平均分接偏转的调整。该方法可以进一步包括基于第一信号，第二信号和悬臂探头的平均敲击偏转的测量的调整来生成样本的图像形貌。

7. 发明申请

WO01073413A1 METHODS FOR THE AUTOMATED TESTING OF RETICLE FEATURE GEOMETRIES 审中-公开
标题翻译：自动测试特征几何的方法
公开(公告)号：WO01073413A1
公开(公告)日：2001-10-04
申请号：PCT/US2001/006111
申请日：2001-02-26
IPC分类号： G01N21/88 , G01N21/956 , G01Q30/06 , G03F1/00 , G06T7/00 , H01L21/027
CPC分类号： G06T7/0006 , G01N21/8851 , G01N2021/95676 , G03F1/44 , G06T2207/30148
摘要： A method for inspecting features on a reticle is provided. The method includes providing a layout design of a test feature and transferring the layout design of the test feature onto the reticle. After the test feature is transferred onto the reticle, an image of the transferred layout design is captured to determine whether or not the transfert is acceptable. This determination is made by comparing the captured image of the transferred layout design against the layout design of the test feature. The comparison ascertains deviations between the captured image and the layout design and determines if the deviations fall within a user specified range.
摘要翻译：提供了一种用于检查掩模版上的特征的方法。该方法包括提供测试特征的布局设计并将测试特征的布局设计传递到掩模版上。在将测试特征转移到掩模版之后，捕获转移的布局设计的图像以确定转移是否可接受。通过将传送的布局设计的捕获图像与测试特征的布局设计进行比较来进行该确定。比较确定捕获图像和布局设计之间的偏差，并确定偏差是否落在用户指定的范围内。

8. 发明申请

WO2022245208A1 SYSTEM FOR PERFORMING ATOMIC FORCE MICROSCOPY, INCLUDING A GRID PLATE QUALIFICATION TOOL 审中-公开
公开(公告)号：WO2022245208A1
公开(公告)日：2022-11-24
申请号：PCT/NL2022/050265
申请日：2022-05-18
申请人： NEARFIELD INSTRUMENTS B.V.
发明人： SADEGHIAN MARNANI, Hamed , TOACSEN, Ioan-Andrei
IPC分类号： G01Q30/06 , G01Q40/02
摘要： An atomic force microscopy tool (AFM) configured for receiving a plate including a coordinate reference pattern on the plate, for providing a position reference for the AFM; and a device for qualifying a coordinate reference pattern in the AFM, comprising a fixed reference frame, a pattern encoder for reading the reference pattern, an actuation stage for relatively moving the plate and the pattern encoder parallel to the plate, a displacement measurement system for measuring a displacement of the plate or pattern encoder relative to the fixed reference frame, and a controller for controlling the actuation stage, the encoder, and the measurement system, arranged to identify imperfections in the coordinate reference pattern and their locations by controlling the displacement measurement system; and arranged for storing each imperfection coupled to the location determined.

9. 发明申请

WO2021079157A1 METHOD OF IMAGING A SURFACE USING A SCANNING PROBE MICROSCOPE AND CORRESPONDING SYSTEM USING THE METHOD 审中-公开
公开(公告)号：WO2021079157A1
公开(公告)日：2021-04-29
申请号：PCT/GB2020/052705
申请日：2020-10-23
申请人： INFINITESIMA LIMITED
发明人： HUMPHRIS, Andrew
IPC分类号： G01Q10/04 , G01Q10/06 , G01Q20/02 , G01Q30/06 , G01Q40/00
摘要： A method of imaging a surface using a scanning probe microscope, the scanning probe microscope comprising a probe having a cantilever extending from a base support (2) to a free end, and a probe tip carried by the free end of the cantilever, and a steering mirror (13), the method comprising: scanning the probe laterally across the surface so that the probe follows a scanning motion across the surface; steering a detection beam onto the probe via the steering mirror, the detection beam reflecting from the probe in the form of a return beam; moving the steering mirror so that the detection beam follows a tracking motion which is synchronous with the scanning motion and the detection beam remains steered onto the probe by the steering mirror; using the return beam to obtain image measurements, each image measurement being indicative of a measured height of a respective point on the surface; obtaining an associated height error measurement for each point on the surface by comparing a target value of the steering mirror position to the actual position of the steering mirror position, each height error measurement being indicative of a respective error in the measured height; and using the height error measurements to correct the image measurements so as to generate corrected image measurements.

10. 发明申请

WO2008157373A3 POSITION CONTROL FOR SCANNING PROBE SPECTROSCOPY 审中-公开
标题翻译：扫描探针光谱的位置控制
公开(公告)号：WO2008157373A3
公开(公告)日：2009-02-12
申请号：PCT/US2008066949
申请日：2008-06-13
申请人： RHK TECHNOLOGY INC , KOLLIN ADAM
发明人： KOLLIN ADAM
IPC分类号： G01Q10/02 , G01Q10/04 , G01Q10/06 , G01Q20/00 , G01Q30/06 , G01Q40/00
CPC分类号： G01Q10/06 , G01Q30/06
摘要： A method of position control for scanning probe spectroscopy of a specimen. Probe positional error is determined by comparing images generated from a sequence of scans to identify differences between positions of at least a portion of a reference characteristic of the specimen in the images. A probe is moved to a target location for spectroscopic analysis, as a function of the determined probe positional error.
摘要翻译：一种用于扫描样本的探针光谱的位置控制方法。通过比较从扫描序列生成的图像来识别图像中的样本的参考特征的至少一部分的位置之间的差异来确定探针位置误差。根据确定的探头位置误差，将探头移动到目标位置进行光谱分析。

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