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1. 发明申请

WO2017211627A1 MAGNETFREIE ERZEUGUNG VON IONENPULSEN 审中-公开
标题翻译：离子脉冲的磁性产生
公开(公告)号：WO2017211627A1
公开(公告)日：2017-12-14
申请号：PCT/EP2017/063084
申请日：2017-05-31
申请人： VACOM VAKUUM KOMPONENTEN & MESSTECHNIK GMBH
发明人： GRANOVSKIJ, Mihail , BDZOCH, Juraij , UCHATSCH, Sergej , ZIMARE, Anton
IPC分类号： H01J49/14 , H01J27/08 , H01J49/40
CPC分类号： H01J49/147 , H01J27/08 , H01J49/40
摘要： Die Erfindung betrifft Vorrichtung eine Vorrichtung und ein Verfahren zum Erzeugen, Speichern und Freisetzen von Ionen aus einer Restgasatmosphäre, umfassend eine Elektronenquelle zum Freisetzen von Elektronen, eine für die von der Elektronenquelle freigesetzten Elektronen durchlässige Anode mit einer durch die Elektronen gebildeten negativen Raumladungsverteilung innerhalb eines von der Anode mindestens teilweise umgebenen Ionen-Speicherraums und einer von der Anode elektrisch isolierten Pulselektrode zum Extrahieren der Ionen aus dem Speicherraum, wobei sich innerhalb des Ionen-Speicherraumes keine weiteren Elektroden befinden und der Ionen-Speicherraum ausschließlich infolge der durch die Elektronen erzeugten negativen Raumladungsverteilung eine für die durch Ionisation der Restgasatmosphäre erzeugten Ionen attraktive räumliche Potentialverteilung aufweist und Ionen speichert.
摘要翻译：
本发明涉及一种装置，设备以及用于生成，存储和从Restgasatmosph＆AUML释放离子的方法;重，包括用于释放电子的电子源，A F导航用途ř谁从电子源殿下＆释放AUML ; ssige阳极与内电子的负空间电荷分布所形成的至少部分地由所述阳极离子存储空间所包围，并且一个从阳极脉冲电极电绝缘，用于从贮存室提取离子，其中存在的离子储存空间内没有其它电极和离子存储空间只ROAD巫妖由于通过电子的负空间电荷的分布，A F导航用途R以Restgasatmosph BEAR吸引力重新产生的离子的R电离产生的热量＆AUML ;.具有umliche电位分布和离子存储

2. 发明申请

WO2016096457A1 IONIZATION DEVICE AND MASS SPECTROMETER THEREWITH 审中-公开
标题翻译：离子装置和大容量光谱仪
公开(公告)号：WO2016096457A1
公开(公告)日：2016-06-23
申请号：PCT/EP2015/078506
申请日：2015-12-03
申请人： CARL ZEISS SMT GMBH
发明人： ALIMAN, Michel , CHUNG, Hin Yiu Anthony , FEDOSENKO, Gennady , REUTER, Rüdiger , LAUE, Alexander , KEUDELL, Achim von , BÖKE, Marc , BENTER, Thorsten , WINTER, Jörg , AWAKOWICZ, Peter , GORKHOVER, Leonid
IPC分类号： H01J27/08 , H01J49/12 , H01J49/14
CPC分类号： H01J49/145 , H01J27/08 , H01J37/08 , H01J49/12
摘要： The invention relates to an ionization device (1), comprising: a plasma generating device (4) for generating metastable particles (6a) and/or ions (6b) of an ionization gas (6) in a primary plasma region (9), a field generating device (13) for generating a glow discharge (12) in a secondary plasma region (10), an inlet (2) for supplying a gas (3) to be ionized into the secondary plasma region (10), and a further inlet (5) for supplying the metastable particles (6a) and/or the ions (6b) of the ionization gas (6) into the secondary plasma region (10). The invention also relates to a mass spectrometer (20) comprising such an ionization device (1 ) and a detector (17), disposed downstream of the outlet (16) of the ionization device (1), for the mass-spectrometric analysis of the ionized gas (3a, 3a').
摘要翻译：本发明涉及电离装置（1），其包括：用于在初级等离子体区域（9）中产生电离气体（6）的亚稳颗粒（6a）和/或离子（6b）的等离子体产生装置（4）用于在次级等离子体区域（10）中产生辉光放电（12）的场产生装置（13），用于供给待离子化到二次等离子体区域（10）中的气体（3）的入口（2）用于将亚稳颗粒（6a）和/或电离气体（6）的离子（6b）供应到次级等离子体区域（10）中的另外的入口（5）。本发明还涉及一种质谱仪（20），其包括设置在离子化装置（1）的出口（16）下游的这种离子化装置（1）和检测器（17），用于质谱分析电离气体（3a，3a'）。

3. 发明申请

WO2010093380A1 ION SOURCE CLEANING IN SEMICONDUCTOR PROCESSING SYSTEMS 审中-公开
标题翻译：半导体加工系统中的离子源清洁
公开(公告)号：WO2010093380A1
公开(公告)日：2010-08-19
申请号：PCT/US2009/053520
申请日：2009-08-12
申请人： ADVANCED TECHNOLOGY MATERIALS, INC. , SWEENEY, Joseph, D. , YEDAVE, Sharad, N. , BYL, Oleg , KAIM, Robert , ELDRIDGE, David , FENG, Lin , BISHOP, Steven, E. , OLANDER, W., Karl , TANG, Ying
发明人： SWEENEY, Joseph, D. , YEDAVE, Sharad, N. , BYL, Oleg , KAIM, Robert , ELDRIDGE, David , FENG, Lin , BISHOP, Steven, E. , OLANDER, W., Karl , TANG, Ying
IPC分类号： H01L21/265
CPC分类号： H01J37/08 , C23C14/48 , C23C14/54 , C23C14/564 , H01J27/08 , H01J37/16 , H01J37/18 , H01J37/3171 , H01J37/32862 , H01J2237/0209 , H01J2237/022 , H01J2237/082 , H01J2237/22
摘要： Cleaning of an ion implantation system or components thereof, utilizing temperature and/or a reactive cleaning reagent enabling growth/etching of the cathode in an indirectly heated cathode for an ion implantation system by monitoring the cathode bias power and taking corrective action depending upon compared values to etch or regrow the cathode.
摘要翻译：使用温度和/或反应性清洗剂清洁离子注入系统或其组件，使得能够通过监测阴极偏置功率并根据比较值采取校正动作来增加/蚀刻用于离子注入系统的间接加热的阴极中的阴极以蚀刻或再生阴极。

4. 发明申请

WO2009152127A3 TECHNIQUES FOR PROVIDING A MULTIMODE ION SOURCE 审中-公开
标题翻译：提供多个离子源的技术
公开(公告)号：WO2009152127A3
公开(公告)日：2010-03-18
申请号：PCT/US2009046701
申请日：2009-06-09
申请人： VARIAN SEMICONDUCTOR EQUIPMENT , KURUNCZI PETER E , DORAI RAJESH , BILOIU COSTEL , PLATOW WILHELM P
发明人： KURUNCZI PETER E , DORAI RAJESH , BILOIU COSTEL , PLATOW WILHELM P
IPC分类号： H01L21/265
CPC分类号： H01J37/08 , H01J27/08 , H01J27/16 , H01J37/3171 , H01J2237/061 , H01J2237/0817 , H01J2237/082 , H01J2237/0827 , H01J2237/304
摘要： Techniques for providing a multimode ion source are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation comprising an ion source that operates in multiple modes such that a first mode is an arc-discharge mode and a second mode is an RF mode.
摘要翻译：公开了提供多模离子源的技术。在一个特定示例性实施例中，可以将技术实现为用于离子注入的装置，其包括以多种模式操作的离子源，使得第一模式是电弧放电模式，而第二模式是RF模式。

5. 发明申请

WO2009052544A1 ION IMPLANTATION DEVICE 审中-公开
标题翻译：离子植入装置
公开(公告)号：WO2009052544A1
公开(公告)日：2009-04-30
申请号：PCT/AU2007/001709
申请日：2007-10-26
申请人： SESSELMANN, Steven, Arnold , HENDRON, John
发明人： SESSELMANN, Steven, Arnold , HENDRON, John
IPC分类号： H01J37/08
CPC分类号： H01J37/08 , H01J27/08 , H01J37/3171 , H01J2237/061 , H01J2237/062 , H01J2237/082
摘要： A novel device and method for ionizing and implanting molecules of gas into a vacuum system, the said device having a heated filament cathode, nested inside an annular anode, the said cathode filament being heated by a low voltage current, and negatively biased with respect to the anode by a high voltage potential, the device, when operating, creates a steady planar current of electrons from the said cathode to the said anode, the gas to be ionized is fed through the said filament, where the gas molecules are first heated, then consequently stripped of one or more of their electrons.
摘要翻译：一种用于将气体分子电离和注入真空系统的新型装置和方法，所述装置具有嵌套在环形阳极内的加热灯丝阴极，所述阴极灯丝被低电压电流加热，并且相对于该阳极由高电压电位而工作时，该装置在工作时产生电子从所述阴极到所述阳极的稳定的平面电流，待离子化的气体通过所述细丝进入，其中气体分子首先被加热，从而剥离其中一个或多个电子。

6. 发明申请

WO01088947A1 CONTROL SYSTEM FOR INDIRECTLY HEATED CATHODE ION SOURCE 审中-公开
标题翻译：用于间接加热阴极离子源的控制系统
公开(公告)号：WO01088947A1
公开(公告)日：2001-11-22
申请号：PCT/US2001/015635
申请日：2001-05-15
IPC分类号： H01J27/02 , H01J27/08 , H01J37/08 , H01J27/14
CPC分类号： H01J27/022 , H01J27/08
摘要： An indirectly heated cathode ion source includes an extraction current sensor for sensing ion current extracted from the arc chamber and an ion source controller for controlling the filament power supply, the bias power supply and/or the arc power supply. The ion source controller may compare the sensed extraction current with a reference extraction current and determine an error value based on the difference between the sensed extraction current and the reference extraction current. The power supplies of the indirectly heated cathode ion source are controlled to minimize the error value, thus maintaining a substantially constant extraction current. The ion source controller utilizes a control algorithm, for example a closed feedback loop, to control the power supplies in response to the error value. In a first control algorithm, the bias current IB supplied by the bias power supply is varied so as to control the extraction current IE. Further according to the first control algorithm, the filament current IF and the arc voltage VA are maintained constant. According to a second control algorithm, the filament current IF is varied so as to control the extraction current IE. Further according to the second control algorithm, the bias current IB and the arc voltage VA are maintained constant.
摘要翻译：间接加热的阴极离子源包括用于感测从电弧室提取的离子电流的提取电流传感器和用于控制灯丝电源，偏置电源和/或电弧电源的离子源控制器。离子源控制器可以将感测的提取电流与参考提取电流进行比较，并且基于感测的提取电流与参考提取电流之间的差来确定误差值。控制间接加热的阴极离子源的电源以使误差值最小化，从而保持基本上恒定的提取电流。离子源控制器利用控制算法，例如闭合反馈回路，以响应误差值来控制电源。在第一控制算法中，改变由偏置电源提供的偏置电流IB，以便控制提取电流IE。此外，根据第一控制算法，灯丝电流IF和电弧电压VA保持恒定。根据第二控制算法，改变灯丝电流IF，以控制提取电流IE。此外，根据第二控制算法，偏置电流IB和电弧电压VA保持恒定。

7. 发明申请

WO1997036463A1 SOURCE OF FAST NEUTRAL MOLECULES 审中-公开
标题翻译：快速中性分子的来源
公开(公告)号：WO1997036463A1
公开(公告)日：1997-10-02
申请号：PCT/RU1997000072
申请日：1997-03-18
申请人： NAUCHNO-PROIZVODSTVENNOE PREDPRIYATIE "e;NOVATECH"e; , METEL, Alexandr Sergeevich , GRIGORIEV, Sergei Nikolaevich
发明人： NAUCHNO-PROIZVODSTVENNOE PREDPRIYATIE "e;NOVATECH"e;
IPC分类号： H05H03/00
CPC分类号： H05H3/02 , H01J27/08
摘要： The source of fast neutral molecules comprises: a gas-discharge chamber (1) with anode (5), cathode (7) and discharge power source (8); a charge-exchange chamber (2) with additional electrodes (16); an accelerator grid (3) consisting of grid elements (18) that are electrically insulated from one another; and an acceleration voltage source (4). The width of the accelerator grid (3) exceeds the charge-exchange path length of ions in the working range of gas pressures, where L = 1/n sigma , n being the gas molecule density in the charge-exchange chamber and sigma the cross section of the charge-exchange. The negative pole of the accelerator voltage source (4) is connected via a resistor (11) to the charge-exchange chamber (2), via resistors (17) to the additional electrodes and via resistors (19) to the grid elements (18). This arrangement simplifies regulation of the device and makes it more reliable. When electrical spark-over occurs, cathode arc spots are formed only on the accelerator grid (3), preventing damage to articles undergoing treatment and improving their quality.
摘要翻译：快中性分子的来源包括：具有阳极（5），阴极（7）和放电电源（8）的气体放电室（1）。具有附加电极（16）的电荷交换室（2）; 由彼此电绝缘的栅格元件（18）组成的加速器栅格（3）; 和加速电压源（4）。加速器网格（3）的宽度超过气体压力工作范围内离子的电荷交换路径长度，其中L = 1 / n sigma，n是电荷交换室中的气体分子密度，部分费用交换。加速器电压源（4）的负极通过电阻器（11）经由电阻器（17）经由电阻器（11）连接到附加电极并且经由电阻器（19）连接到电网元件（18））。这种布置简化了器件的调节并使其更可靠。当发生电火花发生时，仅在加速器网格（3）上形成阴极电弧点，防止对正在进行处理的物品造成损害并提高其质量。

8. 发明申请

WO1997004474A1 AN ION BEAM APPARATUS 审中-公开
标题翻译：离子束装置
公开(公告)号：WO1997004474A1
公开(公告)日：1997-02-06
申请号：PCT/GB1996001715
申请日：1996-07-19
申请人： APPLIED MATERIALS, INC. , BURGIN, David, Richard , LOOME, David , POVALL, Simon
发明人： APPLIED MATERIALS, INC.
IPC分类号： H01J37/15
CPC分类号： H01J27/022 , H01J27/08 , H01J37/08 , H01J37/15 , H01J2237/31701
摘要： An ion beam apparatus comprises a source of ions (1), an evacuatable chamber (11), first and second electrodes (3, 5) disposed within the chamber for forming an ion beam from ions from the ion source, the first electrode being electrically insulated from the second electrode. At least one insulating member (31, 33), at least part of which is within the chamber provides the insulation, wherein a part of the insulating member is positioned adjacent the wall of the chamber. Alternatively, means for feeding coolant proximate the insulating member is provided to withdraw heat from the insulating member.
摘要翻译：离子束装置包括离子源（1），可抽空室（11），设置在室内的第一和第二电极（3,5），用于从离子源的离子形成离子束，第一电极是电与第二电极绝缘。至少一个绝缘构件（31,33）至少一部分位于室内，提供绝缘，其中绝缘构件的一部分邻近室的壁定位。或者，提供用于在绝缘构件附近供给冷却剂的装置，以从绝缘构件中提取热量。

9. 发明申请

WO2017176675A1 IMPROVED ION SOURCE REPELLER SHIELD 审中-公开
标题翻译：改进的离子源驱动罩
公开(公告)号：WO2017176675A1
公开(公告)日：2017-10-12
申请号：PCT/US2017/025845
申请日：2017-04-04
申请人： AXCELIS TECHNOLOGIES, INC.
发明人： COLVIN, Neil , HSIEH, Tseh-Jen , SILVERSTEIN, Paul
IPC分类号： H01J27/08 , H01J9/32 , H01J37/08
CPC分类号： H01J37/32431 , G21F1/06 , H01J9/32 , H01J11/28 , H01J27/08 , H01J37/08 , H01J37/3171 , H01J37/32541 , H01J37/32559 , H01J2237/0213 , H01J2237/022 , H01J2237/03 , H01J2237/31701
摘要： An arc chamber has a liner having a recessed surface and a hole having a first diameter. The liner has a lip extending upwardly from the surface toward the surface that surrounds the hole and has a second diameter. An electrode has a shaft and head. The shaft has a third diameter that is less than the first diameter and passes through the body and hole and is electrically isolated from the liner by an annular gap. The head has a fourth diameter and a third surface having an electrode lip extending downwardly from the third surface toward the second surface. The electrode lip has a fifth diameter that is between the second and fourth diameters. A spacing between the liner lip and electrode lip defines a labyrinth seal and generally prevents contaminants from entering the annular gap.
摘要翻译：弧室具有具有凹入表面和具有第一直径的孔的衬套。该衬里具有从该表面向着围绕该孔的表面向上延伸并具有第二直径的唇缘。一个电极有一个轴和头。轴具有第三直径，其小于第一直径并且穿过主体和孔并且通过环形间隙与衬套电隔离。头部具有第四直径和第三表面，第三表面具有从第三表面朝向第二表面向下延伸的电极唇缘。电极唇具有在第二和第四直径之间的第五直径。衬套唇缘和电极唇缘之间的间距限定了迷宫式密封，并且通常防止污染物进入环形间隙。

10. 发明申请

WO2017127525A1 IMPROVED ION SOURCE CATHODE SHIELD 审中-公开
标题翻译：改进的离子源阴极屏蔽
公开(公告)号：WO2017127525A1
公开(公告)日：2017-07-27
申请号：PCT/US2017/014106
申请日：2017-01-19
申请人： AXCELIS TECHNOLOGIES, INC.
发明人： COLVIN, Neil , HSIEH, Tseh-Jen , SILVERSTEIN, Paul
IPC分类号： H01J27/02 , H01J27/08
CPC分类号： H01J17/06 , H01J17/186 , H01J27/022 , H01J27/08 , H01J37/08 , H01J37/3171 , H01J2237/006 , H01J2237/061
摘要： An ion source has an arc chamber having an arc chamber body. An electrode extends into an interior region of the arc chamber body, and a cathode shield has a body that is cylindrical having an axial hole. The axial hole is configured to pass the electrode therethrough. First and second ends of the body have respective first and second gas conductance limiters. The first gas conductance limiter extends from an outer diameter of the body and has a U-shaped lip. The second gas conductance limiter has a recess for a seal to protect the seal from corrosive gases and maintain an integrity of the seal. A gas source introduces a gas to the arc chamber body. A liner has an opening configured to pass the cathode shield therethrough, where the liner has a recess.
摘要翻译：离子源具有具有电弧室主体的电弧室。电极延伸到电弧室主体的内部区域中，并且阴极护罩具有具有轴向孔的圆柱形主体。轴向孔构造成使电极穿过其中。本体的第一和第二端具有相应的第一和第二气体传导限制器。第一气体传导限制器从主体的外径延伸并具有U形唇缘。第二气体传导限制器具有用于密封件的凹槽，以保护密封件免受腐蚀性气体影响并保持密封件的完整性。气源将气体引入电弧室主体。衬里具有开口，该开口构造成使阴极护罩穿过其中，其中衬里具有凹部。

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