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1. 发明申请

WO2014158479A1 ION SOURCE HAVING NEGATIVELY BIASED EXTRACTOR 审中-公开
标题翻译：离子源具有负极性的提升机
公开(公告)号：WO2014158479A1
公开(公告)日：2014-10-02
申请号：PCT/US2014/017143
申请日：2014-02-19
申请人： SCHLUMBERGER CANADA LIMITED , SERVICES PETROLIERS SCHLUMBERGER , SCHLUMBERGER HOLDINGS LIMITED , SCHLUMBERGER TECHNOLOGY B.V. , PRAD RESEARCH AND DEVELOPMENT LIMITED , SCHLUMBERGER TECHNOLOGY CORPORATION
发明人： PERKINS, Luke T. , LEVITT, Benjamin , WRAIGHT, Peter , LIBERMAN, Arthur D.
IPC分类号： G01V5/04 , H01J27/02 , G01V5/10
CPC分类号： H01J27/024
摘要： An ion source for use in a radiation generator includes an active cathode configured to emit electrons on a trajectory away from the active cathode, at least some of the electrons as they travel interacting with an ionizable gas to produce ions. In addition, there is at least one extractor downstream of the active cathode having a potential such that the ions are attracted toward the at least one extractor.
摘要翻译：用于辐射发生器的离子源包括被配置为在远离有源阴极的轨迹上发射电子的活性阴极，至少一些电子当它们与可电离气体相互作用以产生离子时。此外，在活性阴极的下游存在至少一个提取器，其具有使得离子被吸向至少一个提取器的电位。

2. 发明申请

WO2014062515A1 ION SOURCE HAVING A SHUTTER ASSEMBLY 审中-公开
标题翻译：离子源有快门组件
公开(公告)号：WO2014062515A1
公开(公告)日：2014-04-24
申请号：PCT/US2013/064626
申请日：2013-10-11
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
发明人： BLAHNIK, Jeffrey Charles , WEAVER, William T.
IPC分类号： H01J27/04 , H01J27/08 , H01J37/08 , H01J37/317 , H01J27/02 , H01J37/302
CPC分类号： H01J27/024 , H01J27/08 , H01J37/08 , H01J37/302 , H01J37/3171 , H01J2237/043 , H01J2237/30472 , H01J2237/3171
摘要： An ion source includes arc chamber housing defining an arc chamber. The arc chamber housing has an extraction plate in a fixed position, and the extraction plate defines a plurality of extraction apertures. The ion source also includes a shutter assembly positioned outside of the arc chamber proximate the extraction plate. The shutter assembly is configured to block at least a portion of one of the plurality of extraction apertures during one time interval. The ion source combined with relative movement of a workpiece to be treated with an ion beam extracted from the ion source enables a two dimensional ion implantation pattern to be formed on the workpiece using only one ion source.
摘要翻译：离子源包括限定电弧室的电弧室壳体。电弧室壳体具有固定位置的提取板，并且提取板限定多个提取孔。离子源还包括位于靠近提取板的弧形室外部的快门组件。快门组件构造成在一个时间间隔期间阻挡多个提取孔中的一个的至少一部分。离子源与从离子源提取的离子束相关的待处理工件的相对运动结合使得仅使用一个离子源就能在工件上形成二维离子注入图案。

3. 发明申请

WO2012138482A1 APPARATUS AND METHOD FOR MULTIPLE SLOT ION IMPLANTATION 审中-公开
标题翻译：多种植入物的装置和方法
公开(公告)号：WO2012138482A1
公开(公告)日：2012-10-11
申请号：PCT/US2012/030148
申请日：2012-03-22
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. , RENAU, Anthony , GODET, Ludovic , MILLER, Timothy J. , OLSON, Joseph
发明人： RENAU, Anthony , GODET, Ludovic , MILLER, Timothy J. , OLSON, Joseph
IPC分类号： H01J37/317 , H01J37/302 , H01J37/08 , H01J27/02
CPC分类号： H01J37/3023 , H01J27/024 , H01J37/08 , H01J37/3172 , H01J37/32357 , H01J37/32422 , H01J37/32623 , H01J37/32752 , H01J2237/31711
摘要： An ion implantation system (200) comprises a plasma source (204) for providing plasma (140) and a workpiece holder (210) arranged to receive a bias with respect to the plasma to attract ions across a plasma sheath toward the substrate. The system may also include an extraction plate arrangement (101) comprising a multiplicity of different apertures (112, 114, 116) each arranged to provide an ion beam (122, 124, 126) having tons distributed over a range o angles of incidence on the workpiece, wherein a first ion beam extracted from first aperture has a first beam profile that differs from a second ion beam extracted from a second aperture.
摘要翻译：离子注入系统（200）包括用于提供等离子体（140）的等离子体源（204）和布置成接收相对于等离子体的偏压的工件保持器（210），以将等离子体护套上的离子吸引到衬底。该系统还可以包括提取板装置（101），其包括多个不同的孔（112,114,116），每个孔被布置成提供离子束（122,124,126），其具有分布在o个入射角范围上的吨所述工件，其中从第一孔提取的第一离子束具有与从第二孔提取的第二离子束不同的第一光束轮廓。

4. 发明申请

WO2012042143A1 PROCÉDÉ ET DISPOSITIF POUR LA FORMATION D'UN FAISCEAU PLASMA 审中-公开
标题翻译：用于形成等离子体束的方法和装置
公开(公告)号：WO2012042143A1
公开(公告)日：2012-04-05
申请号：PCT/FR2011/052090
申请日：2011-09-14
申请人： ASTRIUM SAS , ECOLE POLYTECHNIQUE , CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE , AANESLAND, Ane , CHABERT, Pascal , IRZYK, Michael , MAZOUFFRE, Stéphane
发明人： AANESLAND, Ane , CHABERT, Pascal , IRZYK, Michael , MAZOUFFRE, Stéphane
IPC分类号： H05H1/24 , H05H1/54 , H01J27/16
CPC分类号： H05H1/24 , F03H1/0025 , H01J27/024 , H01J27/16 , H05H1/54
摘要： La présente invention concerne un procédé et un dispositif pour la formation d'un faisceau plasma. Selon l'invention: ·on détecte (en 12 et/ou en 13) la qualité de la neutralité électrique dudit faisceau plasma (PB); et ·on règle les potentiels alternés de polarisation de la grille d'extraction et d'accélération (4) de façon que ledit faisceau plasma (PB) soit au moins approximativement électriquement neutre.
摘要翻译：本发明涉及一种用于形成等离子体束的方法和装置。根据本发明：检测等离子体束（PB）的电中性的质量（在12和/或13）; 并且调整提取和加速栅格（4）的交变极化电位，使得等离子体束（PB）至少大致电中性。

5. 发明申请

WO2011156864A1 NANOPOROUS VACUUM PUMP 审中-公开
标题翻译： NANOPOROUS真空泵
公开(公告)号：WO2011156864A1
公开(公告)日：2011-12-22
申请号：PCT/AU2011/000729
申请日：2011-06-17
申请人： GBC SCIENTIFIC EQUIPMENT PTY. LTD. , SAINT, Andrew
发明人： SAINT, Andrew
IPC分类号： B01D69/00 , H01J49/04
CPC分类号： F04B37/10 , F04B19/006 , H01J27/02 , H01J27/024 , H01J41/12 , H01J49/02 , H01J49/10 , H01J49/168 , H01J49/24
摘要： The invention provides an element (12), comprising: a nanoporous insulating film (20) (such as a thin nanoporous diamond film) and first and second conducting layers (18a, 18b) on first and second opposed sides respectively of the film (20). Also provided are a vacuum pump (10), an ion source (80) and an ion trap (98), each comprising such an element (12).
摘要翻译：本发明提供了一种元件（12），包括：纳米多孔绝缘膜（20）（例如薄纳米多孔金刚石膜）和分别在膜（20）的第一和第二相对侧上的第一和第二导电层（18a，18b））。还提供了真空泵（10），离子源（80）和离子阱（98），每个包括这样的元件（12）。

6. 发明申请

WO2009053689A2 ION BEAM EXTRACTION ASSEMBLY IN AN ION IMPLANTER 审中-公开
标题翻译：离子注入器中的离子束提取装置
公开(公告)号：WO2009053689A2
公开(公告)日：2009-04-30
申请号：PCT/GB2008/003574
申请日：2008-10-20
申请人： APPLIED MATERIALS, INC. , SPRAGGON, Lee , MURRELL, Adrian
发明人： SPRAGGON, Lee , MURRELL, Adrian
CPC分类号： H01J27/024 , H01J37/08 , H01J37/3171
摘要： The present invention relates to an ion beam extraction assembly for use in an ion beam generation apparatus such as those used, for example, in an ion implanter. An ion beam extraction assembly is provided for mounting within an ion beam generating apparatus comprising an ion source such that the extraction assembly is operable to extract ions from the ion source as an ion beam. The extraction assembly comprises an electrode assembly separate from the ion source, an electrode of the electrode assembly defining at least partly a path through the extraction assembly for passage of an ion beam. At least a part of the electrode assembly adjacent the path is tungsten and at least a part of the electrode assembly that is remote from the path is formed from a less expensive and/or lighter material.
摘要翻译：本发明涉及离子束提取组件，其用于例如在离子注入机中使用的离子束产生装置。提供离子束提取组件用于安装在包括离子源的离子束产生装置内，使得提取组件可操作以从离子源提取离子作为离子束。提取组件包括与离子源分离的电极组件，电极组件的电极至少部分地限定穿过提取组件的用于离子束通过的路径。邻近路径的电极组件的至少一部分是钨，并且远离路径的电极组件的至少一部分由较便宜和/或较轻的材料形成。

7. 发明申请

WO2007149727A2 METHOD AND APPARATUS FOR EXTRACTING IONS FROM AN ION SOURCE FOR USE IN ION IMPLANTATION 审中-公开
标题翻译：用于从离子植入中使用离子源提取离子的方法和装置
公开(公告)号：WO2007149727A2
公开(公告)日：2007-12-27
申请号：PCT/US2007070929
申请日：2007-06-12
申请人： SEMEQUIP INC , HORSKY THOMAS N , MILGATE ROBERT W , SACCO GEORGE P , KRULL WADE ALLEN
发明人： HORSKY THOMAS N , MILGATE ROBERT W , SACCO GEORGE P , KRULL WADE ALLEN
IPC分类号： H01L21/306 , H01J20060101 , H01J7/24 , H01J37/08 , H01J37/317
CPC分类号： H01J37/08 , C23C14/48 , C23C14/564 , H01J9/38 , H01J27/024 , H01J37/3171 , H01J2209/017 , H01J2237/006 , H01J2237/022 , H01J2237/0812 , H01J2237/083 , H01J2237/31701 , H01L21/265
摘要： Thermal control is provided for an extraction electrode of an ion-beam producing system that prevents formation of deposits and unstable operation and enables use with ions produced from condensable vapors and with ion sources capable of cold and hot operation. Electrical heating of the extraction electrode is employed for extracting decaborane or octadecaborane ions. Active cooling during use with a hot ion source prevents electrode destruction, permitting the extraction electrode to be of heat- conductive and fluorine-resistant aluminum composition. The service lifetime of the system is enhanced by provisions for in-situ etch cleaning of the ion source and extraction electrode, using reactive halogen gases, and by having features that extend the service duration between cleanings, including accurate vapor flow control and accurate focusing of the ion beam optics. A remote plasma source delivers F or Cl ions to the de- energized ion source for the purpose of cleaning deposits in the ion source and the extraction electrode. These techniques enable long equipment uptime when running condensable feed gases such as sublimated vapors, and are particularly applicable for use with so-called cold ion sources and universal ion sources. Methods and apparatus are described which enable long equipment uptime when decaborane and octadecaborane are used as feed materials, as well as when vaporized elemental arsenic and phosphorus are used, and which serve to enhance beam stability during ion implantation.
摘要翻译：为离子束产生系统的提取电极提供热控制，其防止沉积物的形成和不稳定的操作，并且能够与可冷凝蒸气和能够冷热操作的离子源产生的离子一起使用。提取电极的电加热用于提取十硼烷或十八硼烷离子。使用热离子源时的主动冷却可防止电极破坏，从而使引出电极具有导热性和防氟铝组成。通过使用反应性卤素气体对离子源和引出电极进行原位蚀刻清洗，并且具有延长清洗之间的使用持续时间的特征，包括准确的蒸汽流量控制和精确的聚焦，增强了系统的使用寿命离子束光学。远程等离子体源将F或Cl离子输送到去电离子源，以清除离子源和萃取电极中的沉积物。这些技术使得在运行可冷凝的进料气体如升华蒸汽时长的设备正常运行时间，并且特别适用于所谓的冷离子源和通用离子源。描述了使用十硼烷和十八硼烷作为原料的长设备正常运行时间，以及当使用蒸发的元素砷和磷时，并且用于提高离子注入期间的束稳定性的方法和装置。

8. 发明申请

WO2006121602A1 ION SOURCE WITH MULTI-PIECE OUTER CATHODE 审中-公开
标题翻译：离子源与多个外部阴极
公开(公告)号：WO2006121602A1
公开(公告)日：2006-11-16
申请号：PCT/US2006/015477
申请日：2006-04-25
申请人： GUARDIAN INDUSTRIES CORP. , WALTON, Hugh, A.
发明人： WALTON, Hugh, A.
IPC分类号： H01J27/02 , H01J37/08
CPC分类号： H01J27/143 , H01J27/024 , H01J2237/083
摘要： In certain example embodiments of this invention, there is provided an ion source including an anode (25) and a cathode (5) . In certain example embodiments, a multi-piece outer cathode (5b') is provided. The multi-piece outer cathode (5b') allows precision adjustments to be made, thereby permitting adjustment of the magnetic gap between the inner and outer cathodes. This allows improved performance to be realized, and/or prolonged operating life of certain components. This may also permit multiple types of gap adjustment to be performed with different sized outer cathode- end pieces. In certain example embodiments, cathode fabrication costs may also be reduced.
摘要翻译：在本发明的某些示例性实施例中，提供了一种包括阳极（25）和阴极（5）的离子源。在某些示例性实施例中，提供多片外阴极（5b'）。多片外阴极（5b'）允许进行精密调节，从而允许调节内阴极和外阴极之间的磁隙。这允许实现改进的性能，和/或延长某些部件的使用寿命。这也可以允许使用不同尺寸的外部阴极端部件执行多种类型的间隙调节。在某些示例性实施例中，也可以降低阴极制造成本。

9. 发明申请

WO1998018150A1 ION GUN 审中-公开
标题翻译：离子枪
公开(公告)号：WO1998018150A1
公开(公告)日：1998-04-30
申请号：PCT/GB1997002923
申请日：1997-10-23
申请人： NORDIKO LIMITED , PROUDFOOT, Gary
发明人： NORDIKO LIMITED
IPC分类号： H01J27/02
CPC分类号： H01J27/024 , H01J27/18 , H01J37/08
摘要： The present invention relates to a low energy ion gun (3; 103) for use in ion beam processing comprising: a plasma chamber (5) comprising an open ended, conductive, non-magnetic body, a first end of which is closed by a flat or minimally dished dielectric member and with electrodes (6) at a second end thereof opposite the first end; primary magnet means (16) arranged around the body for trapping electrons adjacent the wall of the plasma chamber in use of the ion gun and an r.f. induction device including a substantially flat coil (12) which lies adjacent to the dielectric member for inductively generating a plasma in the plasma chamber, characterised in that the electrodes include a first multi-aperture grid (29; 127) arranged for connection to a first positive potential source and positioned to contact the plasma in the plasma chamber; a second multi-aperture grid (29a; 128) arranged for connection to a second potential source of lower potential than the first source so as to produce a first acceleration field for accelerating ions towards and through the second grid; and a third multi-aperture grid (30; 129) arranged for connection to a third potential source of lower potential than the second potential source so as to produce a second acceleration field for accelerating ions towards and through the third grid, the apertures of the first, second and third grids being aligned so that particles emerging from an aperture of the first grid are accelerated through a corresponding aperture of the second grid and then through a corresponding aperture of the third grid in the form of a beamlet, a plurality of beamlets from the third grid forming a beam downstream of the third grid.
摘要翻译：本发明涉及用于离子束处理的低能离子枪（3; 103），其包括：等离子体室（5），其包括开放式导电的非磁性体，其第一端由平坦或微小的电介质构件，并且在与第一端相对的第二端处具有电极（6）; 初级磁体装置（16）布置在身体周围，用于在使用离子枪和r.f.中捕获邻近等离子体室的壁的电子。感应装置包括位于电介质构件附近的用于在等离子体室中感应地产生等离子体的基本平坦的线圈（12），其特征在于，所述电极包括第一多孔格栅（29; 127），其布置成连接到第一正电位源并定位成与等离子体室中的等离子体接触; 第二多孔格栅（29a; 128）布置成连接到比第一源低的电位的第二电位源，以便产生用于加速离子朝向和穿过第二栅格的第一加速场; 以及第三多孔格栅（30; 129），布置成连接到比所述第二电位源低的电位的第三电位源，以产生用于加速离子朝向和穿过所述第三栅极的第二加速场，第一，第二和第三格栅被对准，使得从第一格栅的孔径出射的粒子被加速穿过第二格栅的对应的孔，然后通过子束形式的第三格栅的相应孔径，多个子束从第三格栅形成在第三格栅下游的光束。

10. 发明申请

WO1997045567A1 FLOW-THROUGH ION BEAM SOURCE 审中-公开
标题翻译：流通的离子束源
公开(公告)号：WO1997045567A1
公开(公告)日：1997-12-04
申请号：PCT/US1997009575
申请日：1997-05-29
申请人： THE REGENTS OF THE UNIVERSITY OF CALIFORNIA , SPRINGER, Robert, W.
发明人： THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
IPC分类号： C23C16/00
CPC分类号： H01J27/024 , C23C14/221 , Y10S438/961
摘要： A method and an apparatus (40) for forming a charge neutral ion beam (17) which is useful in producing thin films of material on electrically conductive or non-conductive substrates are provided.
摘要翻译：提供一种用于形成电荷中性离子束（17）的方法和装置（40），其用于在导电或非导电基底上制造材料薄膜。

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