基本信息:
- 专利标题： ION SOURCE HAVING A SHUTTER ASSEMBLY
- 专利标题（中）：离子源有快门组件
- 申请号：PCT/US2013/064626 申请日：2013-10-11
- 公开(公告)号：WO2014062515A1 公开(公告)日：2014-04-24
- 发明人： BLAHNIK, Jeffrey Charles , WEAVER, William T.
- 申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
- 申请人地址： 35 Dory Road Gloucester, Massachusetts 01930 US
- 专利权人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
- 当前专利权人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
- 当前专利权人地址： 35 Dory Road Gloucester, Massachusetts 01930 US
- 代理机构： DAISAK, Daniel
- 优先权： US13/651,685 20121015
- 主分类号： H01J27/04
- IPC分类号： H01J27/04 ; H01J27/08 ; H01J37/08 ; H01J37/317 ; H01J27/02 ; H01J37/302
摘要：
An ion source includes arc chamber housing defining an arc chamber. The arc chamber housing has an extraction plate in a fixed position, and the extraction plate defines a plurality of extraction apertures. The ion source also includes a shutter assembly positioned outside of the arc chamber proximate the extraction plate. The shutter assembly is configured to block at least a portion of one of the plurality of extraction apertures during one time interval. The ion source combined with relative movement of a workpiece to be treated with an ion beam extracted from the ion source enables a two dimensional ion implantation pattern to be formed on the workpiece using only one ion source.
摘要（中）：
离子源包括限定电弧室的电弧室壳体。 电弧室壳体具有固定位置的提取板，并且提取板限定多个提取孔。 离子源还包括位于靠近提取板的弧形室外部的快门组件。 快门组件构造成在一个时间间隔期间阻挡多个提取孔中的一个的至少一部分。 离子源与从离子源提取的离子束相关的待处理工件的相对运动结合使得仅使用一个离子源就能在工件上形成二维离子注入图案。