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1. 发明申请

WO2017053353A1 BACKSCATTERED ELECTRONS (BSE) IMAGING USING MULTI-BEAM TOOLS 审中-公开
标题翻译：使用多光束工具的后置电子（BSE）成像
公开(公告)号：WO2017053353A1
公开(公告)日：2017-03-30
申请号：PCT/US2016/052766
申请日：2016-09-21
申请人： KLA-TENCOR CORPORATION
发明人： MCCORD, Mark , SIMMONS, Richard , MASNAGHETTI, Douglas , KNIPPELMEYER, Rainer
IPC分类号： H01L21/66
CPC分类号： H01J37/045 , H01J37/244 , H01J37/28 , H01J2237/0435 , H01J2237/057 , H01J2237/24475 , H01J2237/2448
摘要： Multi-beam scanning electron microscope inspection systems are disclosed. A multi-beam scanning electron microscope inspection system may include an electron source and a beamlet control mechanism. The beamlet control mechanism may be configured to produce a plurality of beamlets utilizing electrons provided by the electron source and deliver one of the plurality of beamlets toward a target at a time instance. The multi-beam scanning electron microscope inspection system may also include a detector configured to produce an image of the target at least partially based on electrons backscattered out of the target.
摘要翻译：公开了多光束扫描电子显微镜检查系统。多光束扫描电子显微镜检查系统可以包括电子源和子束控制机构。子束控制机构可以被配置为利用由电子源提供的电子产生多个子束，并且在时间上将多个子束中的一个朝向目标传送。多光束扫描电子显微镜检查系统还可以包括检测器，其被配置为至少部分地基于从目标反射散射的电子产生目标的图像。

2. 发明申请

WO2015126246A1 PROXIMITY EFFECT CORRECTION IN A CHARGED PARTICLE LITHOGRAPHY SYSTEM 审中-公开
标题翻译：充电粒子系统中的近似效应校正
公开(公告)号：WO2015126246A1
公开(公告)日：2015-08-27
申请号：PCT/NL2015/050105
申请日：2015-02-19
申请人： MAPPER LITHOGRAPHY IP B.V.
发明人： WIELAND, Marco Jan-Jaco
IPC分类号： H01J37/317
CPC分类号： H01J37/3174 , H01J37/045 , H01J37/3007 , H01J37/3026 , H01J37/3177 , H01J2237/043 , H01J2237/0435 , H01J2237/31769
摘要： The invention relates to a method for performing charged particle beam proximity effect correction, comprising the steps of: receiving a digital layout pattern to be patterned onto a target using one or more charged particle beams; selecting a base proximity function comprising a sum of an alpha and a beta proximity function, wherein said alpha proximity function models a short range proximity effect and said beta proximity function models a long range proximity effect, wherein a constant η is defined as a ratio between the beta proximity function and the alpha proximity function in said sum, with 0
摘要翻译：本发明涉及一种用于执行带电粒子束邻近效应校正的方法，包括以下步骤：使用一个或多个带电粒子束将待图案化的数字布局图案接收到目标上; 选择包括α和β接近函数之和的基本接近函数，其中所述α接近函数模拟短距离邻近效应，并且所述β接近函数模拟远距离邻近效应，其中常数η被定义为所述和的β接近函数和α接近函数为0 <η<1; 确定对应于所述基本邻近效应函数的修改的接近度函数，其中所述α邻近函数已被Dirac delta函数代替，并且使用电子处理器执行所述数字布局图案与所述修改的接近函数的去卷积，以产生经校正的布局模式。

3. 发明申请

WO2012165955A4 CHARGED PARTICLE MULTI-BEAMLET APPARATUS 审中-公开
标题翻译：带电粒子多波束装置
公开(公告)号：WO2012165955A4
公开(公告)日：2013-04-04
申请号：PCT/NL2012050376
申请日：2012-05-30
申请人： MAPPER LITHOGRAPHY IP BV , ZONNEVYLLE AERNOUT CHRISTIAAN , KRUIT PIETER
发明人： ZONNEVYLLE AERNOUT CHRISTIAAN , KRUIT PIETER
IPC分类号： H01J37/317
CPC分类号： H01J37/3007 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J37/3177 , H01J2237/0435 , H01J2237/04924 , H01J2237/1205 , H01J2237/15 , H01J2237/1532
摘要： The invention relates to a method and a device for manipulation of one or more charged particle beams of a plurality of charged particle beamlets in a charged particle multi-beamlet apparatus. The manipulator device comprises a planar substrate comprising an array of through openings in the plane of the substrate, each of these through openings is arranged for passing the at least one charged particle beamlet there through, wherein each of the through openings is provided with one or more electrodes arranged around the through opening, and a electronic control circuit for providing control signals to the one or more electrodes of each through opening, wherein the electronic control circuit is arranged for providing the one or more electrodes of each individual through opening with an at least substantially analog adjustable voltage.
摘要翻译：本发明涉及用于在带电粒子多小波束装置中操纵多个带电粒子小射束中的一个或多个带电粒子束的方法和设备。该操纵器装置包括平面衬底，该平面衬底包括在衬底的平面中的一排通孔，这些通孔中的每一个被布置用于使至少一个带电粒子小射束通过，其中每个通孔设置有一个或布置在通孔周围的更多电极以及用于向每个通孔的一个或多个电极提供控制信号的电子控制电路，其中电子控制电路被布置为通过开口为每个个体的一个或多个电极提供at 至少基本上模拟可调电压。

4. 发明申请

WO2012128967A3 MULTIPLE-BEAM SYSTEM FOR HIGH-SPEED ELECTRON-BEAM INSPECTION 审中-公开
标题翻译：用于高速电子束检测的多束系统
公开(公告)号：WO2012128967A3
公开(公告)日：2012-12-13
申请号：PCT/US2012028336
申请日：2012-03-08
申请人： KLA TENCOR CORP , HAN LIQUN , JIANG XINRONG , GREENE JOHN D
发明人： HAN LIQUN , JIANG XINRONG , GREENE JOHN D
IPC分类号： H01J37/26 , H01J37/141 , H01J37/244
CPC分类号： G01N23/2251 , G01N2223/102 , G01N2223/611 , H01J37/04 , H01J37/28 , H01J2237/0435 , H01J2237/04926 , H01J2237/1205 , H01J2237/15 , H01J2237/2446
摘要： One embodiment disclosed relates to a multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate. A beam splitter lens array is configured to split the illumination beam to form a primary beamlet array, and a scanning system is configured to scan the primary beamlet array over an area of the surface of the target substrate. In addition, a detection system configured to detect individual secondary electron beamlets. Another embodiment disclosed relates to a method of imaging a surface of a target substrate using a multiple-beamlet electron beam column. Other features and embodiments are also disclosed.
摘要翻译：所公开的一个实施例涉及用于对目标衬底的表面进行成像的多子束电子束成像装置。分束器透镜阵列被配置为分割照射束以形成主子束阵列，并且扫描系统被配置为在目标基板的表面的区域上扫描主子束阵列。另外，配置成检测单独的二次电子小射束的检测系统。所公开的另一实施例涉及一种使用多子束电子束柱成像目标衬底的表面的方法。其他特征和实施例也被公开。

5. 发明申请

WO2012128967A2 MULTIPLE-BEAM SYSTEM FOR HIGH-SPEED ELECTRON-BEAM INSPECTION 审中-公开
标题翻译：用于高速电子束检测的多光束系统
公开(公告)号：WO2012128967A2
公开(公告)日：2012-09-27
申请号：PCT/US2012/028336
申请日：2012-03-08
申请人： KLA-TENCOR CORPORATION , HAN, Liqun , JIANG, Xinrong , GREENE, John D.
发明人： HAN, Liqun , JIANG, Xinrong , GREENE, John D.
IPC分类号： H01J37/26 , H01J37/141 , H01J37/244
CPC分类号： G01N23/2251 , G01N2223/102 , G01N2223/611 , H01J37/04 , H01J37/28 , H01J2237/0435 , H01J2237/04926 , H01J2237/1205 , H01J2237/15 , H01J2237/2446
摘要： One embodiment disclosed relates to a multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate. A beam splitter lens array is configured to split the illumination beam to form a primary beamlet array, and a scanning system is configured to scan the primary beamlet array over an area of the surface of the target substrate. In addition, a detection system configured to detect individual secondary electron beamlets. Another embodiment disclosed relates to a method of imaging a surface of a target substrate using a multiple-beamlet electron beam column. Other features and embodiments are also disclosed.
摘要翻译：公开的一个实施例涉及用于对目标基板的表面进行成像的多子束电子束成像装置。分束镜透镜阵列被配置为分离照明光束以形成主子束阵列，并且扫描系统被配置为在目标基板的表面的区域上扫描主子束阵列。另外，被配置为检测单个二次电子束的检测系统。所公开的另一实施例涉及使用多子束电子束柱对目标衬底的表面进行成像的方法。还公开了其它特征和实施例。

6. 发明申请

WO2011051304A1 MODULATION DEVICE AND CHARGED PARTICLE MULTI-BEAMLET LITHOGRAPHY SYSTEM USING THE SAME 审中-公开
标题翻译：使用该方法的调制装置和充电颗粒多波束光刻系统
公开(公告)号：WO2011051304A1
公开(公告)日：2011-05-05
申请号：PCT/EP2010/066198
申请日：2010-10-26
申请人： MAPPER LITHOGRAPHY IP B.V. , WIELAND, Marco Jan-Jaco , JAGER, Remco , VAN VEEN, Alexander Hendrik Vincent , STEENBRINK, Stijn Willem Herman Karel
发明人： WIELAND, Marco Jan-Jaco , JAGER, Remco , VAN VEEN, Alexander Hendrik Vincent , STEENBRINK, Stijn Willem Herman Karel
IPC分类号： H01J37/317 , H01J37/04
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/07 , H01J37/3174 , H01J2237/0262 , H01J2237/0435 , H01J2237/0437 , H01J2237/31774
摘要： The invention relates to a charged-particle multi -beamlet lithography system for transferring a pattern onto the surface of a target using a plurality of charged particle beamlets. The system includes a beam generator (3), a beamlet blanker array (9), a shielding structure (111) and a projection system. The beam generator is arranged for generating a plurality of charged particle beamlets. The beamlet blanker array is arranged for patterning the plurality of beamlets in accordance with a pattern. The beamlet blanker array comprises a plurality of modulators (101) and a plurality of light sensitive elements (107), a light sensitive element being arranged to receive pattern data carrying light beams and to convert the light beams into electrical signals. The light sensitive elements are electrically connected to one or more modulators for providing the received pattern data. The shielding structure (111) is of an electrically conductive material for substantially shielding electric fields generated in proximity of the light sensitive elements from the modulators, wherein the shielding structure is arranged to be set at a predetermined potential. The projection system is arranged for projecting the patterned beamlets onto the target surface.
摘要翻译：本发明涉及使用多个带电粒子子束将图案转印到靶表面上的带电粒子多光束光刻系统。该系统包括光束发生器（3），子束消隐器阵列（9），屏蔽结构（111）和投影系统。光束发生器布置成用于产生多个带电粒子子束。子束消隐器阵列被布置成根据图案图案化多个子束。子束消隐器阵列包括多个调制器（101）和多个光敏元件（107），光敏元件布置成接收携带光束的图案数据并将光束转换成电信号。光敏元件电连接到一个或多个调制器以提供接收到的图案数据。屏蔽结构（111）是导电材料，用于基本上屏蔽来自调制器的光敏元件附近产生的电场，其中屏蔽结构被设置成预定电位。投影系统布置成将图案化的子束投影到目标表面上。

7. 发明申请

WO2005024881A3 PARTICLE-OPTICAL SYSTEMS, COMPONENTS AND ARRANGEMENTS 审中-公开
标题翻译：颗粒光学系统，组件和布置
公开(公告)号：WO2005024881A3
公开(公告)日：2007-05-31
申请号：PCT/US2004029079
申请日：2004-09-07
申请人： ZEISS CARL SMT AG , APPLIED MATERIALS ISRAEL , KNIPPELMEYER RAINER , KIENZLE OLIVER , KEMEN THOMAS , MUELLER HEIKO , UHLEMANN STEPHAN , HAIDER MAXIMILIAN , CASARES ANTONIO , ROGERS STEVEN
发明人： KNIPPELMEYER RAINER , KIENZLE OLIVER , KEMEN THOMAS , MUELLER HEIKO , UHLEMANN STEPHAN , HAIDER MAXIMILIAN , CASARES ANTONIO , ROGERS STEVEN
IPC分类号： G21K5/10 , G01N23/00 , H01J20060101 , H01J37/09 , H01J37/153 , H01J37/28
CPC分类号： H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
摘要： A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.
摘要翻译：粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

8. 发明申请

WO2006048353A1 VORRICHTUNG ZUR STRUKTURIERUNG EINES PARTIKELSTRAHLS 审中-公开
标题翻译：设备用于构建粒子束
公开(公告)号：WO2006048353A1
公开(公告)日：2006-05-11
申请号：PCT/EP2005/054517
申请日：2005-09-12
申请人： LEICA MICROSYSTEMS LITHOGRAPHY GMBH , DÖRING, Hans-Joachim , HEINITZ, Joachim
发明人： DÖRING, Hans-Joachim , HEINITZ, Joachim
IPC分类号： H01J37/317
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/0435 , H01J2237/31774 , H01J2237/31776
摘要： Es ist eine Vorrichtung (50) zur Strukturierung eines Partikelstrahls (31) offenbart. Der Partikelstrahl (31) beleuchtet die Vorrichtung (50) zumindest teilweise flächig. Die Vorrichtung (50) ist mit einer Vielzahl von hintereinander geschalteten Aperturplatten (51, 52, 53, 54) versehen. Aus Richtung des Partikelstrahls (31) gesehen, erzeugt eine erste Aperturplatte (51) aus dem flächigen Partikelstrahl durch eine Vielzahl von Öffnungen (61) mehrere Teilstrahlen. Eine zweite Aperturplatte (52), die kleinere Öffnungen (62) besitzt als die erste Aperturplatte (51) ist dieser nachgeschaltet. Es folgt eine dritte Aperturplatte (53), die eine Austastplatte ist, und eine vierte Aperturplatte (54) ist zur Feldhomogenisierung vorgesehen.
摘要翻译：它是一个粒子束的结构的装置（50），（31）中被公开。粒子射线（31）照射至少所述装置（50）部分地平面的。具有多个级联孔径板（51，52，53，54）提供的所述的装置（50）。通过的多个开口（61）的多个部分光束的从所述粒子束的方向观察（31）生成的扁平颗粒束的第一孔径板（51）。第二孔径板（52），较小的开口（62）比所述第一孔径板（51）连接的该下游。有如下的第三孔（53），这是一个盲板和第四孔（54）被设置用于场均匀化。

9. 发明申请

WO2004107050A3 CHARGED PARTICLE BEAMLET EXPOSURE SYSTEM 审中-公开
标题翻译：充电颗粒光束曝光系统
公开(公告)号：WO2004107050A3
公开(公告)日：2005-04-21
申请号：PCT/NL2004000381
申请日：2004-05-27
申请人： MAPPER LITHOGRAPHY IP BV , KRUIT PIETER , WIELAND MARCO JAN-JACO
发明人： KRUIT PIETER , WIELAND MARCO JAN-JACO
IPC分类号： H01J37/08 , H01J37/30 , H01J37/317
CPC分类号： H01J37/3007 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0435 , H01J2237/045 , H01J2237/0453 , H01J2237/0492 , H01J2237/1501
摘要： The invention relates to a charged-particle-optical system for a charged particle beam exposure apparatus, said system comprising: - a first aperture means comprising at least a first substantially round aperture for partially shielding an emitted charged particle beam for forming a charged particle beamlet; - a lens system comprising at least one lens for focussing a charged particle beamlet from said first aperture within or in the vicinity of an image focal plane of said lens; - a deflector means, substantially located in said image focal plane, comprising at least one beamlet deflector for the deflection of a passing charged particle beamlet upon the reception of a control signal, and - a second aperture means comprising at least one second substantially round aperture positioned in the conjugate plane of the first aperture, and said second aperture being aligned with said first aperture and said beamlet deflector for blocking said charged particle beamlet upon deflection by said beamlet deflector and to transmit it otherwise.
摘要翻译：本发明涉及一种用于带电粒子束曝光装置的带电粒子光学系统，所述系统包括： - 第一孔径装置，其包括至少第一基本上圆形的孔，用于部分屏蔽发射的带电粒子束以形成带电粒子束 ; - 透镜系统，包括至少一个透镜，用于聚焦所述透镜的图像焦平面内或附近的来自所述第一孔的带电粒子束; - 基本上位于所述图像焦平面中的偏转器装置，包括至少一个子束偏转器，用于在接收到控制信号时偏转通过的带电粒子子束;以及 - 第二孔装置，包括至少一个第二基本上圆形的孔定位在第一孔的共轭平面中，并且所述第二孔与所述第一孔和所述小梁偏转器对准，用于在所述子束偏转器偏转时阻挡所述带电粒子子束，否则传递。

10. 发明申请

WO00046846A1 CHARGED PARTICLE BEAM EXPOSURE APPARATUS AND EXPOSURE METHOD 审中-公开
标题翻译：充电颗粒光束曝光装置和曝光方法
公开(公告)号：WO00046846A1
公开(公告)日：2000-08-10
申请号：PCT/JP2000/000595
申请日：2000-02-03
IPC分类号： G03F7/20 , H01J37/147 , H01J37/317 , H01L21/027
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/1474 , H01J37/3174 , H01J2237/0435
摘要： A BAA charged particle beam exposure apparatus having an improved circuit for generating a signal applied to a deflector for BAA raster scanning and having an improved throughput. The charged particle beam exposure apparatus comprises a charged particle beam source, a blanking aperture array (BAA) where apertures having electrodes on both sides are arranged, a charged particle beam deflector, a focusing lens for focusing the charged particle beam, a deflection control circuit for controlling the deflector, and an exposure control circuit for controlling the electrodes of the BAA. A constant-current source (46) constituting a circuit for generating a scanning signal is of a type in which the current value such as of a digital-analogue converter (DAC) is variable. Therefore the scanning rate is variable, and the current value of the constant-current source is set so that the actual measured scanning rate may be a predetermined one.
摘要翻译：一种BAA带电粒子束曝光装置，其具有用于产生施加到用于BAA光栅扫描的偏转器的信号并且具有改善的生产量的改进的电路。带电粒子束曝光装置包括带电粒子束源，其中布置有两侧电极的孔的消隐孔阵列（BAA），带电粒子束偏转器，用于聚焦带电粒子束的聚焦透镜，偏转控制电路用于控制偏转器，以及用于控制BAA的电极的曝光控制电路。构成用于产生扫描信号的电路的恒流源（46）是诸如数模转换器（DAC）等电流值可变的类型。因此，扫描速率是可变的，并且设定恒流源的当前值，使得实际测量的扫描速率可以是预定的。

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