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1. 发明申请

WO2007050022A2 WRITING APPARATUSES AND METHODS 审中-公开
标题翻译：写作手段和方法
公开(公告)号：WO2007050022A2
公开(公告)日：2007-05-03
申请号：PCT/SE2006/001213
申请日：2006-10-26
申请人： MICRONIC LASER SYSTEMS AB , STIBLERT, Lars , SANDSTROM, Torbjorn , LUBEREK, Jarek , LOCK, Tomas
发明人： STIBLERT, Lars , SANDSTROM, Torbjorn , LUBEREK, Jarek , LOCK, Tomas
IPC分类号： G03F7/20
CPC分类号： G03F7/24 , B41J2/442 , G02F1/1303 , G02F2203/12 , G03F7/70275 , G03F7/70291 , G03F7/70358 , G03F7/70366 , G03F7/70383 , G03F7/70391 , G03F7/704 , G03F7/70425 , G03F7/70783 , G03F7/70791 , H04N1/06 , H04N1/0607 , H04N1/0628 , H04N1/0664 , H04N1/0671 , H05K1/0393 , H05K3/0082
摘要： Patterns are written on workpieces, such as, glass sheets and/or plastic sheets used in, for example, electronic display devices such as LCDs. The workpiece may be larger than about 1500 mm may be used. An optical writing head with a plurality of writing units may be used. The workpiece and the writing head may be moved relative to one another to provide oblique writing.
摘要翻译：图案写在工件上，例如用于例如LCD等电子显示装置中的玻璃板和/或塑料片。可以使用工件大于约1500mm。可以使用具有多个写入单元的光学写入头。工件和书写头可以相对于彼此移动以提供斜写。

2. 发明申请

WO2007098935A3 PLATFORMS, APPARATUSES, SYSTEMS AND METHODS FOR PROCESSING AND ANALYZING SUBSTRATES 审中-公开
公开(公告)号：WO2007098935A3
公开(公告)日：2007-09-07
申请号：PCT/EP2007/001725
申请日：2007-02-28
申请人： MICRONIC LASER SYSTEMS AB , SANDSTRÖM, Torbjörn , STIBLERT, Lars , LUBEREK, Jarek , LOCK, Tomas
发明人： SANDSTRÖM, Torbjörn , STIBLERT, Lars , LUBEREK, Jarek , LOCK, Tomas
IPC分类号： G03F7/20 , H05K3/00
摘要： Devices and methods for manufacturing displays, solar panels and other devices using larger size workpieces are provided. The workpiece is rolled into a cylinder, thereby reducing the physical size by a factor of 3 in one dimension. The stages on which the workpieces are rolled have a cylindrical shape, which allows a more robust and/or compact movement of the glass, reduced machine weight. The workpieces are relatively thin, more flexible, and are rolled onto a cylinder with a diameter of about 1 meter.

3. 发明申请

WO2003054632A1 METHOD AND APPARATUS FOR IMAGE FORMATION 审中-公开
标题翻译：图像形成的方法和装置
公开(公告)号：WO2003054632A1
公开(公告)日：2003-07-03
申请号：PCT/SE2002/002267
申请日：2002-12-10
申请人： MICRONIC LASER SYSTEMS AB , BJUGGREN, Måns , IVANSEN, Lars , STIBLERT, Lars
发明人： BJUGGREN, Måns , IVANSEN, Lars , STIBLERT, Lars
IPC分类号： G03F7/20
CPC分类号： G03F7/70441 , G03F1/36 , G03F1/76 , G03F7/70291 , G03F7/70433
摘要： The present invention relates to a method for adjusting a pattern to be imaged onto a workpiece. The pattern representing an image is divided ina plurality of regions. A pattern density in said plurality of region is computed. At least one feature in at least one of said plurality of regions is adjusted based on the pattern density in at least one other region. An adjusted pattern is fed to a modulator. The image is created on said workpiece by using said corrected pattern. The invention also relates to an apparatus for imaging adjusted pattern on a workpiece, a semiconducting wafer to be imaged with an adjusted pattern and a mask or a reticle to be imaged woth an adjusted pattern.
摘要翻译：本发明涉及一种用于调整要成像到工件上的图案的方法。表示图像的图案被划分成多个区域。计算所述多个区域中的图案密度。基于至少一个其他区域中的图案密度来调整所述多个区域中的至少一个区域中的至少一个特征。将调整后的图案馈送到调制器。通过使用所述校正图案在所述工件上创建图像。本发明还涉及一种用于对工件上的调整图案进行成像的成像装置，用被调整的图案成像的半导体晶片和要被调整图案成像的掩模或掩模版。

4. 发明申请

WO2008129421A1 METHOD AND APPARATUS FOR MURA DETECTION AND METROLOGY 审中-公开
标题翻译： MURA检测和方法的方法和装置
公开(公告)号：WO2008129421A1
公开(公告)日：2008-10-30
申请号：PCT/IB2008/001280
申请日：2008-04-18
申请人： MICRONIC LASER SYSTEMS AB , SANDSTROM, Torbjörn , STIBLERT, Lars
发明人： SANDSTROM, Torbjörn , STIBLERT, Lars
IPC分类号： G01N21/956 , G02F1/13 , G06F1/00
CPC分类号： G01N21/956 , G01N2021/9513 , G02F1/1309 , G03F1/84 , G06T7/0006 , G06T7/001 , G06T2207/30121 , G06T2207/30148 , G06T2207/30164
摘要： The invention devices an inspection method, e.g. optical, which maximizes the sensitivity to mura effects and suppresses artifacts from the mura inspection hardware itself and from noise. It does so by scanning the sensor, e.g. a high- resolution camera, creating a region of high internal accuracy across the mura effects. One important example is for mura related to placement errors, where a stage with better than 10 nanometer precision within a 100 mm range is created. A sampling scheme reduces the data volume and separates between instrument errors and real defects based on their different geometrical signatures. The high- resolution camera scans sparse lines at an angle to the dominating directions of expected mura defects, creating extended sensor fields with high internal precision, and quantifying edge placements in small windows in said extended fields. The mura is classified and presented as type, location and severity.
摘要翻译：本发明装置检查方法，例如光学，其最大限度地提高对mura效果的敏感性，并抑制mura检测硬件本身的伪影和噪声。它通过扫描传感器，例如一个高分辨率的摄像头，创造出一个高度内部准确度的区域在mura效果。一个重要的例子就是与定位错误相关的mura，其中创建了100mm范围内优于10纳米精度的阶段。采样方案可以减少数据量，并根据其不同的几何特征分离仪器误差和实际缺陷。高分辨率摄像机以与预期的mura缺陷的主导方向成一定角度扫描稀疏线，创建具有高内部精度的扩展传感器场，以及在所述扩展场中的小窗口中量化边缘放置。 mura被分类并呈现为类型，位置和严重性。

5. 发明申请

WO2005073668A1 A METHOD FOR MEASURING THE POSITION OF A MARK IN A DEFLECTOR SYSTEM 审中-公开
标题翻译：一种用于测量偏差系统中标记位置的方法
公开(公告)号：WO2005073668A1
公开(公告)日：2005-08-11
申请号：PCT/SE2005/000100
申请日：2005-01-28
申请人： MICRONIC LASER SYSTEMS AB , STIBLERT, Lars , EKBERG, Peter
发明人： STIBLERT, Lars , EKBERG, Peter
IPC分类号： G01B11/00
CPC分类号： G01B11/00
摘要： The present invention relates to a method for determining the coordinates of an arbitrarily shaped pattern in a deflector system. The method basically comprises the steps of: moving the pattern in a first direction (X), calculating the position of the edge of the pattern by counting the number of micro sweeps, performed in a perpendicular direction (Y), until the edge is detected, and determining the coordinates by relating the number of counted micro sweeps to the speed of the movement of the pattern. The invention also relates to software implementing the method.
摘要翻译：本发明涉及一种用于确定偏转器系统中任意形状图案的坐标的方法。该方法基本上包括以下步骤：沿着第一方向（X）移动图案，通过对在垂直方向（Y）上执行的微扫描次数进行计数来计算图案边缘的位置，直到检测到边缘并且通过将计数的微扫描的数量与图案的移动速度相关联来确定坐标。本发明还涉及实现该方法的软件。

6. 发明申请

WO2005043077A1 A METHOD FOR CALIBRATION OF METROLOGY STAGE 审中-公开
标题翻译：一种用于校准计量阶段的方法
公开(公告)号：WO2005043077A1
公开(公告)日：2005-05-12
申请号：PCT/SE2004/001561
申请日：2004-10-27
申请人： MICRONIC LASER SYSTEM AB , STIBLERT, Lars , EKBERG, Peter
发明人： STIBLERT, Lars , EKBERG, Peter
IPC分类号： G01B21/04
CPC分类号： G01B21/045 , G03F7/70516 , G03F7/70716
摘要： The present invention relates to a method for calibrating a metrology stage in at least two dimensions using an artefact plate having marks forming a pattern, comprising the steps of: placing the artefact plate on the metrology stage in at least three positions, assuming the geometrical properties of the metrology stage and the artefact plate, and the positions of the artefact plate for each measurement, forming a model predicting the measurements of the artefact plate, measuring the marks by the metrology stage, and inverting said model to improve the assumptions on metrology stage and artefact plate.
摘要翻译：本发明涉及一种用于使用具有形成图案的标记的假象板在至少两个维度上校准计量级的方法，包括以下步骤：将假想板放置在至少三个位置的计量台上，假定几何特性的计量阶段和人造板，以及每个测量的人造板的位置，形成预测人造板测量的模型，通过计量阶段测量标记，并反转所述模型以改进计量阶段的假设和人造板。

7. 发明申请

WO2005042258A1 PATTERN GENERATING APPARATUS AND AN APPARATUS FOR MEASURING THE PHYSICAL PROPERTIES OF THE SURFACE 审中-公开
标题翻译：图案生成装置和用于测量表面物理性质的装置
公开(公告)号：WO2005042258A1
公开(公告)日：2005-05-12
申请号：PCT/SE2004/001270
申请日：2004-09-03
申请人： MICRONIC LASER SYSTEM AB , STIBLERT, Lars , EKBERG, Peter
发明人： STIBLERT, Lars , EKBERG, Peter
IPC分类号： B41J2/435
CPC分类号： G03F7/70783 , G01B11/306 , G01B21/045 , G03F7/70383
摘要： The present invention relates to a method for writing a pattern on a surface of an object intended for use in exposure equipment, including the steps of: arranging an object having a thickness (T) provided with a surface on a stage of a pattern generating apparatus, dividing the surface into a number of measurement points, where two adjacent measurement points being spaced a distance (P) apart not exceeding a predetermined maximum distance, determining the gradient of the surface at each measurement point, calculating a 2-dimensional local offset (d) in the x-y plane for each measurement point as a function of the gradient, and the thickness (T) of object, and correcting the pattern to be written on said surface by using the 2-dimensional local offset (d). The invention also relates to a pattern generating apparatus, a method and an apparatus for measuring the physical properties of a surface of an object.
摘要翻译：本发明涉及一种将图案写在用于曝光设备中的物体的表面上的方法，包括以下步骤：将具有表面的厚度（T）的物体布置在图案生成装置的台上将表面分成多个测量点，其中两个相邻的测量点间隔开不超过预定最大距离的距离（P），确定每个测量点处的表面的坡度，计算二维局部偏移（ d）在每个测量点的xy平面中，作为梯度的函数和对象的厚度（T），并且通过使用二维局部偏移量（d）来校正要写在所述表面上的图案。本发明还涉及一种用于测量物体的表面的物理性质的图案生成装置，方法和装置。

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