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    • 1. 发明申请
    • VHF ASSEMBLY
    • VHF-安排
    • WO2010049158A3
    • 2010-07-01
    • PCT/EP2009007759
    • 2009-10-29
    • LEYBOLD OPTICS GMBHGEISLER MICHAELMERZ THOMASBECKMANN RUDOLF
    • GEISLER MICHAELMERZ THOMASBECKMANN RUDOLF
    • H01J37/32
    • H01J37/32091H01J37/32009H01J37/32036H01J37/32541H01J37/32577
    • The invention relates to a VHF plasma electrode comprising a preferably prismatic, elongated electrode body (1) having an electrode surface that is or can be electrically connected to at least two connecting elements (3) for supplying electric power, at least one first connecting element (3A) being coupled to or in the vicinity of a first front face (50A) and at least one second connecting element being coupled to or in the vicinity of a second front face of the electrode body, and the electrode is preferably located in a potting compound (7) consisting of a dielectric material that does not cover the electrode surface. Preferably a shielding element (2) that does not cover the electrode surface and that surrounds the electrode together with the potting compound is provided. The electrode is characterised in that at least one of the connecting elements is designed as a VHF vacuum feedthrough element.
    • 具有优选棱柱形的,细长的电极体(1)具有电极表面电连接用于提供电力到至少两个连接元件(3)被连接到或,其中至少一个第一连接元件(3A)的VHF等离子体电极 (7),其设置的介电材料的联接处或附近的第一端面(50A)和至少在或接近电极体的第二端面相对的第二端,并且优选地在电极面的电极留下清晰的嵌入部件,优选提供了一种电极面积在离开自由端屏蔽构件(2) 与嵌入部件一起包围电极的特征在于,所述连接元件中的至少一个形成为一个VHF-真空馈通件。
    • 2. 发明申请
    • TREATMENT SYSTEM FOR FLAT SUBSTRATES
    • 救治体系平面基板
    • WO2009003552A9
    • 2010-04-01
    • PCT/EP2008003414
    • 2008-04-28
    • LEYBOLD OPTICS GMBHGEISLER MICHAELMERZ THOMASROEDER MARIO
    • GEISLER MICHAELMERZ THOMASROEDER MARIO
    • H01J37/32C23C14/56H01L21/00H01L21/677
    • H01J37/32568C23C16/4587C23C16/54H01J37/32009H01J37/32743H01J37/32788H01J2237/022H01L21/67005
    • Disclosed is a reactor for treating flat substrates, comprising a vacuum chamber (11) and a process chamber (9). A first electrode (5) and a counter electrode (7) which form two opposite walls of the process chamber are provided for generating a plasma. The counter electrode can accommodate the substrate (3). The reactor further comprises means for introducing (19, 23, 25) and evacuating gaseous material into and/or from process chamber, an inlet and outlet for the vacuum chamber, and a mechanism (41, 43) for varying the relative distance between the electrodes, a first relatively great distance being used when the process chamber is loaded and discharged and a second relatively short distance being used when the treatment is performed, and/or a device which is associated with the counter electrode, is used for accommodating substrates, and is designed such that the substrate is disposed at an angle alpha ranging from 0° to 90°, preferably at an angle of 1°, 3°, 5°, 7°, 9°, 11°, 13°, 15°, 17°, 20°, 25°, 30°, 40°, 45°, relative to the vertical direction at least while the treatment is performed, the substrate surface that is to be treated facing downward.
    • 为平面基底的处理而形成的反应器,与真空室(11),处理室(9),其中,提供用于产生等离子体与处理室的两个相对壁的第一电极(5)和一对电极(7); 装置,用于将(19,23,25)和用于去除气态物质(进和/或出处理腔室,其中所述衬底(3)是由对电极,所述真空腔室的装载和卸载开口,和装置可接收的 41,43为改变电极,其特征在于,提供一种在装载或卸载处理室并进行了处理时的第二相对较小的距离的第一相对较大的距离之间的相对距离相关联),和/或用于接收反电极装置 基板被形成为使得至少所述治疗的执行期间所述基板,与所述表面被以一角度阿尔法向下处理在范围0°和90°之间,优选地具有1°,3°的值 5设置°,7°,9°,11°,13°,15°,17°,20°,25°,30°,40°,相对于垂直方向45°。
    • 3. 发明申请
    • TREATMENT SYSTEM FOR FLAT SUBSTRATES
    • 救治体系平面基板
    • WO2009003552A2
    • 2009-01-08
    • PCT/EP2008003414
    • 2008-04-28
    • LEYBOLD OPTICS GMBHGEISLER MICHAELMERZ THOMASROEDER MARIO
    • GEISLER MICHAELMERZ THOMASROEDER MARIO
    • H01J37/32
    • H01J37/32568C23C16/4587C23C16/54H01J37/32009H01J37/32743H01J37/32788H01J2237/022H01L21/67005
    • Disclosed is a reactor for treating flat substrates, comprising a vacuum chamber (11) and a process chamber (9). A first electrode (5) and a counter electrode (7) which form two opposite walls of the process chamber are provided for generating a plasma. The counter electrode can accommodate the substrate (3). The reactor further comprises means for introducing (19, 23, 25) and evacuating gaseous material into and/or from process chamber, an inlet and outlet for the vacuum chamber, and a mechanism (41, 43) for varying the relative distance between the electrodes, a first relatively great distance being used when the process chamber is loaded and discharged and a second relatively short distance being used when the treatment is performed, and/or a device which is associated with the counter electrode, is used for accommodating substrates, and is designed such that the substrate is disposed at an angle alpha ranging from 0° to 90°, preferably at an angle alpha of 1°, 3°, 5°, 7°, 9°, 11°, 13°, 15°, 17°, 20°, 25°, 30°, 40°, 45°, relative to the vertical direction at least while the treatment is performed, the substrate surface that is to be treated facing downward.
    • 在反应器中用于治疗平坦的基板,与真空室(11),处理室(9),其特征在于,设置有第一电极(5)和用于产生等离子体的反电极(7)和形式的处理腔室的两个相对的壁。 装置,用于将(19,23,25)和用于去除气态物质的进入和/或出处理腔室,其中所述衬底(3)是可接收由计数器电极,所述真空腔室的装载和卸载开口,和装置( 41,43为改变电极,其特征在于,提供一种在装载或卸载处理室并进行了处理时的第二相对较小的距离的第一相对较大的距离之间的相对距离相关联),和/或用于接收反电极装置 基板被形成为使得至少所述治疗的执行期间所述基板,与所述表面被以一角度阿尔法向下处理在范围0°和90°之间,优选地具有1°,3°的值 5设置°,7°,9°,11°,13°,15°,17°,20°,25°,30°,40°,相对于垂直方向45°。