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1. 发明申请

WO2005092025A3 METHODS AND SYSTEMS FOR MEASURING A CHARACTERISTIC OF A SUBSTRATE OR PREPARING A SUBSTRATE FOR ANALYSIS 审中-公开
标题翻译：用于测量基板特性或制备用于分析的基板的方法和系统
公开(公告)号：WO2005092025A3
公开(公告)日：2007-05-18
申请号：PCT/US2005009324
申请日：2005-03-22
申请人： KLA TENCOR TECH CORP , NASSER-GHODSI MEHRAN , BOROWICZ MARK , BAKKER DAVE , VAEZ-IRAVANI MEHDI , AJI PRASHANT , GARCIA RUDY F , CHUANG TZU CHIN
发明人： NASSER-GHODSI MEHRAN , BOROWICZ MARK , BAKKER DAVE , VAEZ-IRAVANI MEHDI , AJI PRASHANT , GARCIA RUDY F , CHUANG TZU CHIN
IPC分类号： H01L21/00 , A61N5/00 , G01N1/32 , G03C5/00 , G03F9/00 , G21G5/00 , H01J37/30
CPC分类号： H01J37/317 , G01N1/32 , H01J37/244 , H01J37/3005 , H01J2237/2814 , H01J2237/3174 , H01J2237/31745
摘要： Methods and systems for measuring a characteristic of a substrate (90) or preparing a substrate (90) for analysis are provided. One method for measuring a characteristic of a substrate (90) includes removing a portion of a feature on the substrate (90) using an electron beam (110) to expose a cross-sectional profile of a remaining portion of the feature. The feature may be a photoresist feature. The method also includes measuring a characteristic of the cross-sectional profile. A method for preparing a substrate (90) for analysis includes removing a portion of a material on the substrate (90) proximate to a defect using chemical etching (88) in combination with an electron beam (110). The defect may be a subsurface defect or a partially subsurface defect. Another method for preparing a substrate (90) for analysis includes removing a portion of a material on a substrate (90) proximate to a defect using chemical etching (88) in combination with an electron beam (110) and a light beam.
摘要翻译：提供了用于测量基板（90）的特性或准备用于分析的基板（90）的方法和系统。用于测量衬底（90）的特性的一种方法包括使用电子束（110）去除衬底（90）上的特征的一部分以暴露特征的剩余部分的横截面轮廓。该特征可以是光致抗蚀剂特征。该方法还包括测量横截面轮廓的特性。制备用于分析的基板（90）的方法包括使用化学蚀刻（88）与电子束（110）组合地去除靠近缺陷的基板（90）上的材料的一部分。缺陷可能是地下缺陷或部分地下缺陷。制备用于分析的衬底（90）的另一种方法包括使用化学蚀刻（88）与电子束（110）和光束组合，去除邻近缺陷的衬底（90）上的材料的一部分。

2. 发明申请

WO2009137706A3 IN-SITU DIFFERENTIAL SPECTROSCOPY 审中-公开
标题翻译：现场差异光谱
公开(公告)号：WO2009137706A3
公开(公告)日：2010-02-25
申请号：PCT/US2009043185
申请日：2009-05-07
申请人： KLA TENCOR CORP , VAEZ-IRAVANI MEHDI , NASSER GHODSI MEHRAN , ZHAO GUOHENG
发明人： VAEZ-IRAVANI MEHDI , NASSER GHODSI MEHRAN , ZHAO GUOHENG
IPC分类号： G01J3/00 , G01J3/42
CPC分类号： H01J37/244 , G01N2223/079 , G01N2223/086 , G01N2223/33 , H01J37/256 , H01J2237/24495 , H01J2237/2511 , H01J2237/2807
摘要： A spectrometer having an electron beam generator for generating an electron beam that is directed at a sample. An electron beam positioner directs the electron beam onto a position of the sample, and thereby produces a secondary emitted stream from the sample, where the secondary emitted stream includes at least one of electrons and x-rays. An secondary emitted stream positioner positions the secondary emitted stream onto a detector array, which receives the secondary emitted stream and detects both the amounts and the received positions of the secondary emitted stream. A modulator modulates the electron beam that is directed onto the sample, and thereby sweeps the electron beam between a first position and a second position on the sample. An extractor is in signal communication with both the modulator and the detector array.
摘要翻译：具有用于产生针对样品的电子束的电子束发生器的光谱仪。电子束定位器将电子束引导到样品的位置，从而产生来自样品的二次发射流，其中二次发射流包括电子和X射线中的至少一个。二次发射流定位器将二次发射流定位在检测器阵列上，检测器阵列接收二次发射流并检测二次发射流的量和接收位置。调制器调制被引导到样品上的电子束，从而在样品上的第一位置和第二位置之间扫描电子束。提取器与调制器和检测器阵列进行信号通信。

3. 发明申请

WO2006041944A2 SURFACE INSPECTION SYSTEM WITH IMPROVED CAPABILITIES 审中-公开
标题翻译：具有改进功能的表面检测系统
公开(公告)号：WO2006041944A2
公开(公告)日：2006-04-20
申请号：PCT/US2005035867
申请日：2005-10-04
申请人： KLA TENCOR TECH CORP , MILLER LAWRENCE ROBERT , VAEZ-IRAVANI MEHDI
发明人： MILLER LAWRENCE ROBERT , VAEZ-IRAVANI MEHDI
IPC分类号： G01N21/95 , G01N21/88
CPC分类号： G01N21/9501 , G01N21/8806 , G01N2021/8822
摘要： Pixel intensities indicative of scattered radiation from portions of the inspected surface surrounding a location of a potential anomaly are also stored so that such data is available for quick review of the pixel intensities within a patch on the surface containing the location of the potential anomaly. Where rotational motion is caused between the illumination beam and the inspected surface, signal-to-noise ratio may be improved by comparing the pixel intensities of pixels at corresponding positions on two different surfaces that are inspected, where corresponding pixels at the same relative locations on the two different surfaces are illuminated and scattered radiation therefrom collected and detected under the same optical conditions.
摘要翻译：还存储指示来自围绕潜在异常的位置的检查表面的部分的散射辐射的像素强度，使得这样的数据可用于快速查看包含潜在异常的位置的表面上的区块内的像素强度。在照明光束与被检查表面之间引起旋转运动的情况下，通过比较被检查的两个不同表面上的相应位置处的像素的像素强度，可以改善信噪比，其中在相同相对位置上的对应像素在两个不同的表面被照射并且在相同的光学条件下收集和检测到散射的辐射。

4. 发明申请

WO2005065246A3 ILLUMINATION APPARATUS AND METHODS 审中-公开
标题翻译：照明装置和方法
公开(公告)号：WO2005065246A3
公开(公告)日：2006-01-05
申请号：PCT/US2004043129
申请日：2004-12-17
申请人： KLA TENCOR TECH CORP , VAEZ-IRAVANI MEHDI , ZHAO GUOHENG , STOWKOWSKI STANLEY E
发明人： VAEZ-IRAVANI MEHDI , ZHAO GUOHENG , STOWKOWSKI STANLEY E
IPC分类号： G02B6/00 , G02B6/04 , G02B6/32 , G02B27/48
CPC分类号： G02B27/48 , G02B6/0001 , G02B6/04
摘要： Disclosed are apparatus and methods for illuminating a sample,
摘要翻译：公开了用于照亮样品的装置和方法，

5. 发明申请

WO2004111623B1 SYSTEMS FOR INSPECTION OF PATTERNED OR UNPATTERNED WAFERS AND OTHER SPECIMEN 审中-公开
标题翻译：用于检查图案或未加掩模的其他样本的系统
公开(公告)号：WO2004111623B1
公开(公告)日：2005-03-17
申请号：PCT/US2004017707
申请日：2004-06-04
申请人： KLA TENCOR TECH CORP , BEVIS CHRISTOPHER F , KIRK MIKE , VAEZ-IRAVANI MEHDI
发明人： BEVIS CHRISTOPHER F , KIRK MIKE , VAEZ-IRAVANI MEHDI
IPC分类号： G01N21/47 , G01N21/94 , G01N21/95
CPC分类号： G01N21/956 , G01N21/474 , G01N21/94 , G01N21/9501
摘要： Systems for inspection of patterned and unpatterned wafers are provided. One system includes an illumination system configured to illuminate the specimen. The system also includes a collector configured to collect light scattered from the specimen. In addition, the system includes a segmented detector configured to separately detect different portions of the light such that azimuthal and polar angular information about the different portions of light is preserved. The detector may also be configured to produce signals representative of the different portions of the light. The system may also include a processor configured to detect defects on the specimen from the signals. In another embodiment, the system may include a stage that is configured to rotate and translate the specimen. In one such embodiment, the system may also include an illumination system configured to scan the specimen in a wide scan path during rotation and translation of the specimen.
摘要翻译：提供了用于图案化和未图案化晶片检查的系统。一个系统包括被配置为照亮样本的照明系统。该系统还包括收集器，用于收集从样品散射的光。此外，该系统包括分段检测器，其被配置为分别检测光的不同部分，使得保持关于光的不同部分的方位角和极坐标信息。检测器还可以被配置为产生表示光的不同部分的信号。该系统还可以包括处理器，其配置成从信号中检测样本上的缺陷。在另一个实施例中，系统可以包括被配置为旋转和平移样本的台。在一个这样的实施例中，系统还可以包括被配置为在样本的旋转和平移期间以宽扫描路径扫描样本的照明系统。

6. 发明申请

WO2006041944A9 SURFACE INSPECTION SYSTEM WITH IMPROVED CAPABILITIES 审中-公开
标题翻译：具有改进能力的表面检查系统
公开(公告)号：WO2006041944A9
公开(公告)日：2006-07-20
申请号：PCT/US2005035867
申请日：2005-10-04
申请人： KLA TENCOR TECH CORP , MILLER LAWRENCE ROBERT , VAEZ-IRAVANI MEHDI
发明人： MILLER LAWRENCE ROBERT , VAEZ-IRAVANI MEHDI
IPC分类号： G01N21/95 , G01N21/88
CPC分类号： G01N21/9501 , G01N21/8806 , G01N2021/8822
摘要： Pixel intensities indicative of scattered radiation from portions of the inspected surface surrounding a location of a potential anomaly are also stored so that such data is available for quick review of the pixel intensities within a patch on the surface containing the location of the potential anomaly. Where rotational motion is caused between the illumination beam and the inspected surface, signal-to-noise ratio may be improved by comparing the pixel intensities of pixels at corresponding positions on two different surfaces that are inspected, where corresponding pixels at the same relative locations on the two different surfaces are illuminated and scattered radiation therefrom collected and detected under the same optical conditions.
摘要翻译：还存储指示围绕潜在异常位置的被检查表面的部分的散射辐射的像素强度，使得这样的数据可用于快速查看包含潜在异常位置的表面上的贴片内的像素强度。在照明光束和被检查表面之间产生旋转运动的情况下，可以通过比较被检查的两个不同表面上的相应位置处的像素的像素强度来改善信噪比，其中相同相对位置处的相应像素两个不同的表面被照射，并且在相同的光学条件下收集和检测散射的辐射。

7. 发明申请

WO2012082501A2 WAFER INSPECTION 审中-公开
标题翻译：波浪检查
公开(公告)号：WO2012082501A2
公开(公告)日：2012-06-21
申请号：PCT/US2011063849
申请日：2011-12-07
申请人： KLA TENCOR CORP , ZHAO GUOHENG , LEONG JENN-KUEN , VAEZ-IRAVANI MEHDI
发明人： ZHAO GUOHENG , LEONG JENN-KUEN , VAEZ-IRAVANI MEHDI
IPC分类号： H01L21/66
CPC分类号： G01N21/9501 , G01N21/21 , G01N21/47 , G01N21/8806 , G01N2201/06113 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Systems and methods for inspecting a wafer are provided.
摘要翻译：提供了用于检查晶片的系统和方法。

8. 发明申请

WO2010077865A2 DEFECT DETECTION AND RESPONSE 审中-公开
标题翻译：缺陷检测和响应
公开(公告)号：WO2010077865A2
公开(公告)日：2010-07-08
申请号：PCT/US2009068060
申请日：2009-12-15
申请人： KLA TENCOR CORP , ZHAO GUOHENG , ZAPALAC GEORGE H , NGAI SAMUEL S H , VAEZ-IRAVANI MEHDI , LEVY ADY , DHARMADHIKARI VINEET
发明人： ZHAO GUOHENG , ZAPALAC GEORGE H , NGAI SAMUEL S H , VAEZ-IRAVANI MEHDI , LEVY ADY , DHARMADHIKARI VINEET
IPC分类号： H01L21/66 , H01L31/042
CPC分类号： G06T7/001 , G01N25/72 , G02F1/1309 , G06T2207/10048 , G06T2207/30148
摘要： To increase inspection throughput, the field of view of an infrared camera can be moved over the sample at a constant velocity. Throughout this moving, a modulation can be provided to the sample and infrared images can be captured using the infrared camera. Moving the field of view, providing the modulation, and capturing the infrared images can be synchronized. The infrared images can be filtered to generate the time delay lock-in thermography, thereby providing defect identification. This filtering can account for the number of pixels of the infrared camera in a scanning direction. For the case of optical modulation, a dark field region can be provided for the field of view throughout the moving, thereby providing an improved signal-to-noise ratio during filtering. Localized defects can be repaired by a laser integrated into the detection system or marked by ink for later repair in the production line.
摘要翻译：为了提高检查吞吐量，红外摄像机的视野可以以恒定的速度移动到样品上。在整个移动过程中，可以向样品提供调制，并可以使用红外摄像机捕获红外图像。可以同步移动视野，提供调制和捕获红外图像。可以对红外图像进行滤波以产生延时锁定热成像，从而提供缺陷识别。该过滤可以解释红外摄像机在扫描方向上的像素数。对于光调制的情况，可以在整个移动期间为视场提供暗场区域，从而在滤波期间提供改善的信噪比。局部缺陷可以通过集成到检测系统中的激光器或由墨水标记来修复，以便在生产线中进行后续修复。

9. 发明申请

WO2009023154A3 SYSTEMS CONFIGURED TO INSPECT A WAFER 审中-公开
标题翻译：系统配置检查波形
公开(公告)号：WO2009023154A3
公开(公告)日：2009-04-23
申请号：PCT/US2008009571
申请日：2008-08-11
申请人： KLA TENCOR CORP , KADKLY AZMI , BIELLAK STEPHEN , VAEZ-IRAVANI MEHDI
发明人： KADKLY AZMI , BIELLAK STEPHEN , VAEZ-IRAVANI MEHDI
IPC分类号： H01L21/66
CPC分类号： G01N21/9501
摘要： Systems configured to inspect a wafer are provided. One system includes an illumination subsystem configured to illuminate an area on the wafer by directing light to the wafer at an oblique angle of incidence. The system also includes a collection subsystem configured to simultaneously collect light scattered from different spots within the illuminated area and to focus the light collected from the different spots to corresponding positions in an image plane. In addition, the system includes a detection subsystem configured to separately detect the light focused to the corresponding positions in the image plane and to separately generate output responsive to the light focused to the corresponding positions in the image plane. The output can be used to detect defects on the wafer.
摘要翻译：提供了配置用于检查晶片的系统。一个系统包括照明子系统，该照明子系统被配置为以倾斜的入射角将光引导到晶片上来照射晶片上的区域。该系统还包括收集子系统，其被配置为同时收集从照明区域内的不同点散射的光并且将从不同点收集的光聚焦到图像平面中的相应位置。另外，该系统包括检测子系统，该检测子系统被配置为分别检测聚焦到图像平面中的对应位置的光，并且响应于聚焦到图像平面中的对应位置的光单独产生输出。该输出可用于检测晶圆上的缺陷。

10. 发明申请

WO9914575B1 IMPROVED SAMPLE INSPECTION SYSTEM 审中-公开
标题翻译：改进的样品检测系统
公开(公告)号：WO9914575B1
公开(公告)日：1999-06-03
申请号：PCT/US9819564
申请日：1998-09-18
申请人： KLA TENCOR CORP , VAEZ IRAVANI MEHDI , STOKOWSKI STANLEY , ZHAO GUOHENG
发明人： VAEZ-IRAVANI MEHDI , STOKOWSKI STANLEY , ZHAO GUOHENG
IPC分类号： G01N21/956 , G01J3/44 , G01N21/00 , G01N21/21 , G01N21/47 , G01N21/88 , G01N21/94 , G01N21/95 , H01L21/66 , G01B11/24 , G01N21/86
CPC分类号： G01J3/44 , G01J3/0216 , G01J3/0229 , G01N21/21 , G01N21/47 , G01N21/474 , G01N21/8806 , G01N21/94 , G01N21/9501 , G01N2021/8825 , G01N2021/8845 , G01N2021/8848 , G01N2201/065
摘要： A curved mirrored surface (78) is used to collect radiation scattered by a sample surface (76a) and originating from a normal illumination beam (70) and an oblique illumination beam (90). The collected radiation is focused to a detector (80). Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams (70, 90) on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors (78) to restrict detection to certain azimuthal angles.
摘要翻译：使用弯曲镜像表面（78）来收集由样本表面（76a）散射并且源自正常照明光束（70）和斜向照明光束（90）的辐射。所收集的辐射被聚焦到检测器（80）。通过采用两个不同波长的辐射，通过有意地在由两个光束照射的光点之间引入偏移或者通过将正常照明光束和倾斜照明光束（70,90）切换到其上，并且通过使用两个不同波长的辐射来区分源自正常照明光束和倾斜照明光束的散射辐射交替关闭。可以通过检测倾斜照明光束的镜面反射并响应于此改变照明方向来校正由样本高度变化引起的光束位置误差。蝴蝶形空间滤波器可以与曲面镜辐射收集器（78）结合使用，以将检测限制在某些方位角。

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