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1. 发明申请

WO1988007256A1 PROCESS FOR SOLIDIFYING INDUSTRIAL WASTE AND SOLIDIFIED WASTE 审中-公开
标题翻译：固化工业废水和固化废物的工艺
公开(公告)号：WO1988007256A1
公开(公告)日：1988-09-22
申请号：PCT/JP1988000260
申请日：1988-03-11
申请人： HITACHI, LTD. , FUNABASHI, Kiyomi , CHINO, Koichi , KURIYAMA, Osamu , BABA, Tsutomu , UCHIDA, Shunsuke , KIKUCHI, Makoto
发明人： HITACHI, LTD.
IPC分类号： G21F09/16
CPC分类号： G21F9/165 , C04B28/02 , C04B2111/00784 , C04B2111/00862 , C04B2111/34 , G21F9/304 , Y02W30/91 , C04B18/0481 , C04B22/008 , C04B2103/465
摘要： A process for solidifying industrial waste with cement, which comprises mixing industrial waste with cement that is substantially non-shrinking or swelling in volume change upon curing, and curing the cement to form a solidified waste. Hydrophilic substances may further be added to the cement for curing. This process enables formation of dense solidifed waste having small voids such as capillary voids, thus minimizing the exudation of harmful substances. In addition, since no shrinkage takes place upon curing, no tensile stress is generated in the cement surrounding fine particles of the waste, and hence reduction in solid waste strength is markedly depressed. This serves to increase the amount of waste to be packed. Previous addition of hydrophilic substances serves to keep fluidity of the cement before curing even when water is completely absorbed by water-absorptive waste, thus being extremely advantageous in conducting curing work.

2. 发明申请

WO1989011149A1 PROCESS FOR CEMENTING RADIOACTIVE WASTE AND PRODUCT OF CEMENTATION 审中-公开
标题翻译：生产放射性废物和水泥产品的工艺
公开(公告)号：WO1989011149A1
公开(公告)日：1989-11-16
申请号：PCT/JP1989000451
申请日：1989-04-28
申请人： HITACHI, LTD. , FUNABASHI, Kiyomi , KURIYAMA, Osamu , CHINO, Koichi , BABA, Tsutomu , NISHI, Takashi , KIKUCHI, Makoto
发明人： HITACHI, LTD.
IPC分类号： G21F09/16
CPC分类号： G21F9/304
摘要： A process for cementing radioactive wastes into products which are adapted for land disposal and reduced in the leakage of radioactivity and the products of cementation are disclosed. In order to minimize the leakage or radioactivity through voids within the product, the fraction of fine (up to 1 mum) voids are adjusted to 20 vol % or less. Such voids are obtained by properly selecting the water/cement ratio, setting time of a mixture of a solidifying agent with a waste, addition of an organic polymer, and the like. The CaO content of the cement is controlled to be in the range of 0.62 x alpha + 0.27 x beta to 1.87 x alpha + 2.20 x beta [wherein alpha is a silicon content (wt.%) in terms of SiO2 and beta is an aluminum content (wt.%) in terms of Al2O3] in order to prevent formation of a soluble component of Ca(OH)2 which otherwise would be leached to form voids.

3. 发明申请

WO1989000753A1 METHOD AND APPARATUS FOR SOLIDIFYING RADIOACTIVE WASTE 审中-公开
标题翻译：用于固化放射性废物的方法和装置
公开(公告)号：WO1989000753A1
公开(公告)日：1989-01-26
申请号：PCT/JP1988000596
申请日：1988-06-17
申请人： HITACHI, LTD. , KURIYAMA, Osamu , FUNABASHI, Kiyomi , BABA, Tsutomu , MATSUDA, Masami , CHINO, Koichi , KIKUCHI, Jun
发明人： HITACHI, LTD.
IPC分类号： G21F09/30
CPC分类号： G21F9/302 , G21F9/008 , G21F9/34
摘要： When a radioactive solid waste is packed into a container for producing a solidified product and then a solidifying agent is poured thereinto in the present invention, the solidifying agent is poured into the gaps defined by the radioactive solid wastes themselves or by the radioactive wastes and the container for producing the solidified member by utilizing pressure reduction in space experienced after pouring of the solidifying agent in comparison with the pressure of space at the time of pouring the solidifying agent. Thus, the solidified product of the radioactive wastes having fewer voids and suitable for disposal on or in land is formed.

4. 发明申请

WO1988006914A1 APPARATUS FOR CONCENTRATING WASTE LIQUID, APPARATUS FOR PROCESSING WASTE LIQUID AND METHOD OF CONCENTRATING WASTE LIQUID 审中-公开
标题翻译：用于浓缩废液的装置，用于处理废液的装置和浓缩废液的方法
公开(公告)号：WO1988006914A1
公开(公告)日：1988-09-22
申请号：PCT/JP1988000245
申请日：1988-03-09
申请人： HITACHI, LTD. , BABA, Tsutomu , CHINO, Koichi , UCHIDA, Shunsuke , SAWA, Toshio , KIKUCHI, Makoto
发明人： HITACHI, LTD.
IPC分类号： B01D53/22
CPC分类号： B01D1/305 , B01D19/0031 , C02F1/048 , Y10S159/12 , Y10S159/27 , Y10S159/28 , Y10S203/16
摘要： This invention relates to a waste liquid concentration technique which removes water of a waste liquid therefrom at a high decontamination efficiency. The invention uses a porous film which transmits gas such as steam but not liquid such as water as a concentration film of the waste liquid. When the waste liquid is concentrated by use of this porous film, the waste liquid is brought into contact with the porous film in the form of steam flow to concentrate it. Since the waste liquid is turned to the steam flow, most of various metal ions and surfactants existing in the waste liquid are separated from the steam flow. The mist contained in the steam flow and the metal ions in the mist are removed from the steam by the porous film when the steam passes therethrough. Therefore, the waste liquid can be processed at a high decontamination efficiency and moreover, stably for an extended period. If this waste liquid concentration technique is applied to a processing apparatus for the waste liquid having high electric conductivity that is generated from a nuclear power plant, for example, various tanks, desalting devices, ion exchange resin and the like, otherwise disposed downstream of the concentrator become unnecessary and the processing system can be simplified drastically.
摘要翻译：本发明涉及一种以高去污效率从其中去除废液的水的废液浓缩技术。本发明使用透过气体例如蒸汽而不是诸如水的液体作为废液的浓缩膜的多孔膜。当通过使用该多孔膜浓缩废液时，废液以蒸汽流的形式与多孔膜接触以将其浓缩。由于废液被转向蒸汽流，存在于废液中的大多数各种金属离子和表面活性剂与蒸汽流分离。当蒸汽通过其中时，包含在蒸汽流中的雾和雾中的金属离子通过多孔膜从蒸汽中除去。因此，能够以高净化效率对废液进行处理，并且能够长时间稳定地进行处理。如果将这种废液浓缩技术应用于从核电站例如各种罐，脱盐装置，离子交换树脂等产生的具有高导电性的废液的处理装置，否则设置在集中器变得不必要，处理系统可以大大简化。

5. 发明申请

WO1999031877A1 MULTI-PROJECTION IMAGE DISPLAY DEVICE 审中-公开
标题翻译：多投影图像显示装置
公开(公告)号：WO1999031877A1
公开(公告)日：1999-06-24
申请号：PCT/JP1997004588
申请日：1997-12-12
申请人： HITACHI, LTD. , YAMASAKI, Masami , TAKEDA, Haruo
发明人： HITACHI, LTD.
IPC分类号： H04N05/74
CPC分类号： H04N9/3147 , H04N9/12
摘要： A multi-projection image display device using a plurality of image projectors to form one picture on a screen, in which images projected from the projectors are smoothly connected with one another, so that seams of the images do not appear conspicuously. The image display device has projectors (0121, 0122, 0123, 0124) and a screen (0140) laid out in such a manner that maximum image projection ranges (0151, 0152, 0153, 0154) of the respective projectors ovelap the adjacent ranges. An image signal control unit (0110) for processing an image signal supplied from an external image input (0180) has, therein, a member for cutting out a partial image area dealt with by each projector, an image converting member for performing geometric transformation and local color correction of the partial image, and an arithmetic control member for controlling the image converting member on the basis of image information inputted from a screen state monitor camera (0130). With this structure, smoothing of the seams between the images may be realized simply by image signal processing, and precise adjustment of the optical system of the projectors becomes unnecessary.
摘要翻译：一种多投影图像显示装置，其使用多个图像投影仪在屏幕上形成一个图像，其中从投影仪投影的图像彼此平滑地连接，使得图像的接缝不显着。图像显示装置具有投影仪（0121，0122，0123，0124）和以相应投影仪的最大图像投影范围（0151,022,033,0154）相邻范围的方式布置的屏幕（0140）。一种用于处理从外部图像输入（0180）提供的图像信号的图像信号控制单元（0110），其中具有用于切割由每个投影仪处理的部分图像区域的部件，用于执行几何变换的图像转换部件，部分图像的局部颜色校正，以及用于基于从屏幕状态监视摄像机（0130）输入的图像信息来控制图像转换部件的运算控制部件。利用这种结构，可以简单地通过图像信号处理来实现图像之间的接缝的平滑化，并且不需要投影仪的光学系统的精确调整。

6. 发明申请

WO1999031656A1 MAGNETIC RECORDING MEDIUM AND MAGNETIC STORAGE 审中-公开
标题翻译：磁记录介质和磁存储
公开(公告)号：WO1999031656A1
公开(公告)日：1999-06-24
申请号：PCT/JP1997004586
申请日：1997-12-12
申请人： HITACHI, LTD. , DAVID, Djulianto Djayaprawira , ISHIKAWA, Akira , KOJIMA, Shuuichi , MATSUDA, Yoshibumi , YAHISA, Yotsuo , SUZUKI, Hiroyuki
发明人： HITACHI, LTD.
IPC分类号： G11B05/66
CPC分类号： G11B5/012
摘要： The ratio BrOR of the residual magnetic flux density in a circumferential direction to the residual magnetic flux density in a radial direction is 0.95 - 1.05 and the ratio HcOR of the coercive force in a circumferential direction to the coercive force in a radial direction is 1.05 - 1.2 in the substrate surface of a magnetic recording medium. Therefore, a high output resolution, a low medium noise and a high track recording density are simultaneously achieved in recording at a high line recording density. When a magnetic storage apparatus is constituted by using a high S/N magnetic recording medium like this, a magnetic disc apparatus which has a high surface recording density, is low in cost and small in size, and a large capacity and a high reliability can be provided.
摘要翻译：圆周方向的剩余磁通密度与径向残留磁通密度的比率BrOR为0.95〜1.05，圆周方向的矫顽力的比率HcOR与径向的矫顽力的比值为1.05〜 1.2在磁记录介质的基板表面中。因此，在高线路记录密度的记录中同时实现高输出分辨率，低中等噪声和高记录密度。当通过使用这样的高S / N磁记录介质构成磁存储装置时，具有高表面记录密度的磁盘装置成本低，尺寸小，容量大，可靠性高提供。

7. 发明申请

WO1999031608A1 METHOD FOR DEVELOPING SYSTEM BOARD 审中-公开
标题翻译：开发系统板的方法
公开(公告)号：WO1999031608A1
公开(公告)日：1999-06-24
申请号：PCT/JP1997004620
申请日：1997-12-16
申请人： HITACHI, LTD. , SHIMIZU, Isao , SATOU, Masayuki
发明人： HITACHI, LTD.
IPC分类号： G06F17/50
CPC分类号： G06F17/5022
摘要： A method for developing a system board using a semiconductor integrated circuit device, wherein the development of a system board is made before the development of the circuit device used for the system board is actually acquired by verifying (S31 and S32) whether or not the system board meets the target specifications of the system board by carrying out simulation using a device model in which the functions of the circuit device are modeled by using a function describing language in such a way that the target specifications of the circuit device can be met and the description of the state of the external interface of the circuit device defined conformable to the target specifications. Since the device model in which the functions of the circuit device are described meets the target specifications of the circuit device, the device model is simulated together with the description of the interface state, whether or not the circuit part related to the description of the state of the interface, namely, the interface with the circuit device is appropriate can be verified from the results of the simulation, and the design of the system board can be carried out before the completion of the development of the circuit device or the device is acquired.
摘要翻译：一种用于使用半导体集成电路器件开发系统板的方法，其中系统板的开发是在通过验证（S31和S32）是否实际获取用于系统板的电路器件的开发之前进行的（S31和S32）通过使用使用功能描述语言来对电路装置的功能进行建模的装置模型进行仿真来实现系统板的目标规格，使得可以满足电路装置的目标规格和描述符合目标规格的电路设备外部接口的状态。由于描述了电路装置的功能的装置模型符合电路装置的目标规格，因此将与接口状态的描述一起模拟装置模型，无论电路部分是否与状态描述相关的接口，即与电路设备的接口是合适的，可以从仿真结果中验证，并且系统板的设计可以在完成电路设备或设备的开发之前进行。

8. 发明申请

WO1999027646A1 HIGH-FREQUENCY AMPLIFIER CIRCUIT DEVICE AND HIGH-FREQUENCY TRANSMISSION SYSTEM USING THE SAME 审中-公开
标题翻译：高频放大器电路装置及其高频传输系统
公开(公告)号：WO1999027646A1
公开(公告)日：1999-06-03
申请号：PCT/JP1997004248
申请日：1997-11-21
申请人： HITACHI, LTD. , SAKAMOTO, Kozo , KATSUEDA, Mineo , YOSHIDA, Isao , HOTTA, Masao
发明人： HITACHI, LTD.
IPC分类号： H03F03/60
CPC分类号： H01L24/05 , H01L23/66 , H01L24/06 , H01L24/48 , H01L24/49 , H01L24/73 , H01L2223/6611 , H01L2223/6644 , H01L2224/02166 , H01L2224/04042 , H01L2224/05 , H01L2224/05554 , H01L2224/32225 , H01L2224/48095 , H01L2224/48101 , H01L2224/48227 , H01L2224/4847 , H01L2224/48472 , H01L2224/49113 , H01L2224/49175 , H01L2224/73265 , H01L2924/00014 , H01L2924/01058 , H01L2924/01074 , H01L2924/14 , H01L2924/15153 , H01L2924/1517 , H01L2924/3011 , H03F3/601 , H01L2924/00 , H01L2924/00012 , H01L2224/85399 , H01L2224/05599
摘要： A high-frequency power amplifier circuit device, with the frequency of the operating band between 500 MHz and approximately 10 GHz and power level of not lower than 0.5 W, has a problem to be settled that no increase in power level can be expected in proportion to the increase in the gate width of a power transistor. In addition to the solution of the above problem, an optimal high-frequency power amplifier circuit device and a high-frequency transmission system using the device are constituted to reduce the space in the matching circuit, to improve the linearity and to prevent oscillation in a power transistor (10) and an input/output matching circuit in such a way that the grounds (2) and (4) of an input-side strip line (61) and output-side strip line (62) are separated from each other and the grounds (2) and (4) are respectively connected to an input-side ground electrode (24a) and output-side ground electrode (23a) provided on a semiconductor chip carrying the power transistor (10). Consequently, the effective source impedance component which has been the cause of the deterioration of high-frequency power amplifier circuit in mutual conductance can be reduced.
摘要翻译：具有500MHz至约10GHz之间的工作频带的频率和不低于0.5W的功率电平的高频功率放大器电路装置有一个问题需要解决，不能预期功率级别的增加可以按比例到功率晶体管的栅极宽度的增加。除了上述问题的解决之外，还构成了使用该装置的最佳高频功率放大器电路装置和高频传输系统，以减小匹配电路中的空间，从而提高线性度和防止振荡功率晶体管（10）和输入/输出匹配电路，使得输入侧带状线（61）和输出侧带状线（62）的接地（2）和（4）彼此分离并且接地（2）和（4）分别连接到设置在承载功率晶体管（10）的半导体芯片上的输入侧接地电极（24a）和输出侧接地电极（23a）。因此，可以降低高频功率放大器电路在互导中的恶化的有效源阻抗分量。

9. 发明申请

WO1999021789A1 DOOR DEVICE FOR ELEVATOR 审中-公开
标题翻译：电梯门设备
公开(公告)号：WO1999021789A1
公开(公告)日：1999-05-06
申请号：PCT/JP1997003875
申请日：1997-10-24
申请人： HITACHI, LTD. , SAKAI, Mitsuru , MATSUURA, Atsushi , ONODERA, Minoru , IIDA, Takaaki , SHIBATA, Tadashi , TAKEDA, Kazutoshi
发明人： HITACHI, LTD.
IPC分类号： B66B13/30
CPC分类号： B66B13/08 , E05D15/0626 , E05Y2900/104
摘要： A door device for elevators, in which a door is hung by a door hanger and driven in a horizontal direction, is constructed such that two adjacent different planes connect the door and the door hanger to each other in order to provide a simple construction of the door device for elevators, in which a connection between the door and the door hanger is not easily bent.
摘要翻译：门被挂在门架上并沿水平方向驱动的电梯的门装置被构造成使得两个相邻的不同的平面将门与门挂架相互连接，以便提供简单的结构电梯的门装置，其中门和门吊架之间的连接不容易弯曲。

10. 发明申请

WO1999017302A1 NUCLEAR PLANT AND ITS WATER QUALITY CONTROL METHOD 审中-公开
标题翻译：核工厂及其水质控制方法
公开(公告)号：WO1999017302A1
公开(公告)日：1999-04-08
申请号：PCT/JP1997003502
申请日：1997-10-01
申请人： HITACHI, LTD. , UETAKE, Naohito , WADA, Yoichi
发明人： HITACHI, LTD.
IPC分类号： G21D01/00
CPC分类号： G21C17/0225 , G21Y2002/103 , G21Y2004/20
摘要： Water quality control method used when hydrogen is injected into reactor water of a BWR plant. Even if low concentration hydrogen is injected, SCC of the core internals can be suppressed and, further, local corrosion can be avoided. A metal oxide which reacts as an oxidation catalyst of hydrogen is applied to the surfaces of the core internals of a boiling water reactor beforehand and then hydrogen is injected into the reactor water with which the core internals are in contact.
摘要翻译：将氢气注入BWR工厂的反应堆水中时使用的水质控制方法。即使注入低浓度的氢，也可以抑制芯内部的SCC，进一步避免局部腐蚀。将作为氢氧化催化剂反应的金属氧化物预先施加到沸水反应堆的核心内部表面，然后将氢气注入核心内部与之接触的反应器水中。

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