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1. 发明申请

WO2008156743A1 OPTICAL INTERCONNECT 审中-公开
标题翻译：光学互联
公开(公告)号：WO2008156743A1
公开(公告)日：2008-12-24
申请号：PCT/US2008/007513
申请日：2008-06-16
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , SANTORI, Charles , FATTAL, David , WU, Wei , BICKNELL, Robert , WANG, Shih-Yuan , WILLIAMS, R. Stanly , STEWART, Duncan , QUITORIANO, Nathaniel
发明人： SANTORI, Charles , FATTAL, David , WU, Wei , BICKNELL, Robert , WANG, Shih-Yuan , WILLIAMS, R. Stanly , STEWART, Duncan , QUITORIANO, Nathaniel
IPC分类号： G02B6/32
CPC分类号： H04B10/803 , G02B6/4206 , G02B6/43
摘要： An optical interconnect (100, 200, 300, 400, 500, 645) has a plurality of optical sources (110, 360, 460, 560), a first lens (115, 225, 325, 425, 525, 625) configured to collimate optical beams (320, 350) from the plurality of optical sources (110, 360, 460. 560), a second lens (120, 230, 335, 435, 535, 640) configured to refocus the optical beams (320, 350), and a plurality of optical receivers (125, 365, 465, 565) configued to receive the refocused optical beams (320, 350) from the second lens (120, 230, 335, 435, 535, 640).
摘要翻译：光互连（100,200,300,400,500,655）具有多个光源（110,360,460,560），第一透镜（115,225,325,425,525,625）被配置为从多个光源（110,360,460,560）中校准光束（320,350）;被配置为重新聚焦光束（320,350）的第二透镜（120,230,335,435,535,640））和多个光接收器（125,365,465,565）被配置为从第二透镜（120,230,335,435,535,640）接收重新聚焦的光束（320,350）。

2. 发明申请

WO2009011878A3 OPTICAL DEVICE INCLUDING WAVEGUIDE GRATING STRUCTURE 审中-公开
公开(公告)号：WO2009011878A3
公开(公告)日：2009-01-22
申请号：PCT/US2008/008715
申请日：2008-07-16
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. , WU, Wei , FATTAL, David , SANTORI, Charles , BICKNELL, Robert, N. , WANG, Shih-Yuan , WILLIAMS, R., Stanley , QUITORIANO, Nathaniel, J.
发明人： WU, Wei , FATTAL, David , SANTORI, Charles , BICKNELL, Robert, N. , WANG, Shih-Yuan , WILLIAMS, R., Stanley , QUITORIANO, Nathaniel, J.
IPC分类号： G02B6/34
摘要： Optical devices (100) including waveguide grating structures (102) are described. In accordance with one embodiment, an optical device (100) is provided comprising a horizontal waveguide grating structure (102) having at least one waveguiding layer (104) and at least one subwavelength periodic grating layer (106). The optical device (100) further comprises upper and lower cladding layers (108, 110) immediately adjoining respective upper and lower surfaces (209, 205) of the waveguide grating structure and having refractive indices lower than a lowest-index one of the waveguiding layers, incident radiation propagating (IN) through one of the upper and lower cladding layers (108, 110) toward the waveguide grating structure. The waveguide grating structure (102) is configured for peak reflection of the incident radiation at a peak reflection frequency. A cumulative thickness of the waveguiding layers (104) is less than one tenth of a free space wavelength of the incident radiation at the peak reflection frequency divided by an average refractive index of the waveguiding layers.

3. 发明申请

WO2009017771A2 OPTICAL INTERCONNECT 审中-公开
标题翻译：光学互连
公开(公告)号：WO2009017771A2
公开(公告)日：2009-02-05
申请号：PCT/US2008/009226
申请日：2008-07-30
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , FATTAL, David , BICKNELL, Robert , SANTORI, Charles , WU, Wei
发明人： FATTAL, David , BICKNELL, Robert , SANTORI, Charles , WU, Wei
IPC分类号： G02B6/36 , G02B6/38
CPC分类号： H04B10/803
摘要： An optical interconnect (100, 200, 300, 400, 445) includes a first circuit board (140, 260, 350, 405) having an optical source (110, 210, 240, 305, 440) and an optical receiver (125, 220, 235, 315, 441); and a second circuit board (145, 265, 355, 410) having data source (105, 205, 250) and an optical modulator (225, 230, 310, 425, 430, 435) optically coupled with the optical source (110, 210, 240, 305, 440) and optical receiver (125, 220, 235, 315, 441), wherein the optical modulator (225, 230, 310, 425, 430, 435) is configured to encode data from the data source (105, 205, 250) into an optical signal from the optical source (110, 210, 240, 305, 440). The optical receiver (125, 220, 235, 315, 441) is configured to receive the optical signal from the optical modulator (225, 230, 310, 425, 430, 435). A method of optical communication includes generating on a first circuit board (140, 260, 350, 405) an optical signal directed at a second circuit board (145, 265, 355, 410); modulating the optical signal with data at the second circuit board (145, 265, 355, 410); reflecting the optical signal to the first circuit board (140, 260, 350, 405); and demodulating the optical signal to receive the data at the first circuit board (140, 260, 350, 405).
摘要翻译：一种光学互连（100,200,300,400,445）包括具有光源（110,210,240,305,440）的第一电路板（140,260,350,405））和光接收器（125,220,235,315,441）; 以及具有数据源（105,205,250）和光学耦合于所述光源（110,115）的光调制器（225,230,310,425,430,435）的第二电路板（145,265,355,410），其中所述光调制器（225,230,310,425,430,435）被配置为对来自所述数据源的数据进行编码（ 105,205,250）转换成来自光源（110,210,240,305,440）的光信号。光接收器（125,220,235,315,441）被配置为从光调制器（225,230,310,425,430,435）接收光信号。一种光通信的方法包括在第一电路板（140,260,350,405）上产生指向第二电路板（145,265,355,410）的光信号; 用第二电路板（145,265,355,410）处的数据调制光信号; 将光信号反射到第一电路板（140,260,350,405）; 以及解调光信号以在第一电路板（140,260,350,405）处接收数据。

4. 发明申请

WO2008121252A1 THREE-DIMENSIONAL CROSSBAR ARRAY SYSTEMS AND METHODS FOR WRITING INFORMATION TO AND READING INFORMATION STORED IN THREE-DIMENSIONAL CROSBAR ARRAY JUNCTIONS 审中-公开
标题翻译：三维十字架阵列系统和方法，用于写入信息并读取三维CROSBAR ARRAY JUNCTIONS中存储的信息
公开(公告)号：WO2008121252A1
公开(公告)日：2008-10-09
申请号：PCT/US2008/003789
申请日：2008-03-21
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , WU, Wei , WILLIAMS, Stanley, R. , ROBINETT, Warren , SNIDER, Gregory , YU, Zhaoning , WANG, Shih-yuan , STEWART, Duncan
发明人： WU, Wei , WILLIAMS, Stanley, R. , ROBINETT, Warren , SNIDER, Gregory , YU, Zhaoning , WANG, Shih-yuan , STEWART, Duncan
IPC分类号： H01L27/108 , H01L27/04
CPC分类号： H01L27/101 , B82Y10/00 , G11C13/00 , G11C13/0023 , G11C13/0033 , G11C2213/71 , G11C2213/79 , G11C2213/81 , H01L2924/0002 , Y10S977/762 , H01L2924/00
摘要： Various embodiments of the present invention are directed to three-dimensionall crossbar arrays (500, 1000). In one aspect of the present invention, a three-dimensional crossbar array (1000) includes a plurality of crossbar arrays (1102-1104), a first demultiplexer (1106), a second demultiplexer (1108), and a third demultiplexer (1110). Each crossbar array includes a first layer of nanowires (702-704), a second layer of nanowires (706-708) overlaying the first layer of nanowires, and a third layer of nanowires (710-712) overlaying the second layer of nanowires. The first demultiplexer is configured to address nanowires in the first layer of nanowires of each crossbar array, the second demultiplexer is configured to address nanowires in the second layer of nanowires of each crossbar array, and the third demultiplexer is configured to supply a signal to the nanowires in the third layer of nanowires of each crossbar array.
摘要翻译：本发明的各种实施例涉及三维全横杆阵列（500,1000）。在本发明的一个方面中，三维交叉列阵列（1000）包括多个交叉列阵列（1102-1104），第一解复用器（1106），第二解复用器（1108）和第三解复用器（1110）。每个横杆阵列包括第一层纳米线（702-704），覆盖第一纳米线层的第二纳米线层（706-708）和覆盖第二纳米线层的第三纳米线层（710-712）。第一解复用器被配置为寻址每个交叉列阵列的纳米线的第一层中的纳米线，第二解复用器被配置为寻址每个交叉列阵列的第二纳米线层中的纳米线，并且第三解复用器被配置为向纳米线在每个交叉列阵列的第三层纳米线中。

5. 发明申请

WO2008013778A2 COMPENSATION FOR DISTORTION IN CONTACT LITHOGRAPHY 审中-公开
标题翻译：补偿接触光刻中的失真
公开(公告)号：WO2008013778A2
公开(公告)日：2008-01-31
申请号：PCT/US2007/016580
申请日：2007-07-24
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , WU, Wei , STEWART, Duncan , WANG, Shih-Yuan , WILLIAMS, R., Stanley
发明人： WU, Wei , STEWART, Duncan , WANG, Shih-Yuan , WILLIAMS, R., Stanley
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method of contact lithography includes predicting distortions likely to occur in transferring a pattern from a mold (110) to a substrate (130) during a contact lithography process: and modifying the mold (110) to compensate for the distortions. A contact lithography system includes a design subsystem (210) configured to generate data describing a lithography pattern: an analysis subsystem (220) configured to identify one or more distortions likely to occur when using a mold (110) created from the data; and a mold modification subsystem (230) configured to modify the data to compensate for the one or more distortions identified by the analysis subsystem (220).
摘要翻译：接触光刻的方法包括预测在接触光刻过程中将图案从模具（110）转印到基板（130）时可能发生的扭曲：以及修改模具（110）以补偿为扭曲。一种接触光刻系统包括被配置为产生描述光刻图案的数据的设计子系统（210）：分析子系统（220），其被配置为识别在使用从数据创建的模具（110）时可能发生的一个或多个失真; 和模具修改子系统（230），其被配置为修改数据以补偿由分析子系统（220）识别的一个或多个失真。

6. 发明申请

WO2009008923A2 METHODS OF MAKING NANO-SCALE STRUCTURES HAVING CONTROLLED SIZE, NANOWIRE STRUCTURES AND METHODS OF MAKING THE NANOWIRE STRUCTURES 审中-公开
标题翻译：制造具有控制尺寸的纳米尺度结构的方法，纳米结构和制备纳米结构的方法
公开(公告)号：WO2009008923A2
公开(公告)日：2009-01-15
申请号：PCT/US2008/004423
申请日：2008-04-02
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , KOBAYASHI, Nobuhiko , WU, Wei , STEWART, Duncan , SHARMA, Shashank , WANG, Shih-yuan , WILLIAMS, R. Stanley,
发明人： KOBAYASHI, Nobuhiko , WU, Wei , STEWART, Duncan , SHARMA, Shashank , WANG, Shih-yuan , WILLIAMS, R. Stanley,
CPC分类号： H01L31/035281 , B82Y10/00 , B82Y30/00 , H01L29/0665 , H01L29/0673 , H01L29/068 , H01L31/036 , H01L31/09 , H01L31/101 , H01L31/105 , Y02E10/50 , Y10S977/762 , Y10S977/814
摘要： Methods of making nanometer-scale semiconductor structures with controlled size are disclosed. Semiconductor structures (200, 300, 400, 500, 600. 700) that include one or ore nanowires (104, 204, 304, 404, 504, 604, 704) are also disclosed. The nanowires can include a passivation layer or have a hollow tube structure.
摘要翻译：公开了制备具有受控尺寸的纳米级半导体结构的方法。还公开了包括一个或纳米线（104,204,304,404,504,604,704）的半导体结构（200,300,400,500,600.707）。纳米线可以包括钝化层或具有中空管结构。

7. 发明申请

WO2009002419A1 OPTICAL INTERCONNECT 审中-公开
标题翻译：光学互联
公开(公告)号：WO2009002419A1
公开(公告)日：2008-12-31
申请号：PCT/US2008/007554
申请日：2008-06-16
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , WANG, Shih-yuan , SIGALAS, Mihail , WU, Wei
发明人： WANG, Shih-yuan , SIGALAS, Mihail , WU, Wei
IPC分类号： G02B6/36
CPC分类号： H04B10/803
摘要： An optical interconnect (100. 300, 400, 500, 600) has a plurality of optical data sources (125, 130, 135, 525, 530, 535), a plutality of optical data receivers (155, 160, 165, 555, 560, 565), a diffractive optical element (186, 320, 440, 670) configured to diffract an optical beam (176, 335, 435, 650) from at least one alignment optical source (170, 360, 460, 625) to at leats one sensor (370, 375, 470, 475, 640, 645), and an aligning element configured to align optical beams (120, 345, 445, 570, 650) from the optical data sources (125, 130, 135, 525, 530, 535) to said optical data receivers (155, 160, 165, 555, 560, 565), according to readings from the sensor (370, 375, 470, 475, 640, 645).
摘要翻译：光学互连（100,300,400,500,600）具有多个光学数据源（125,130,135,525,530,535），光学数据接收器（155,160,165,555，被配置为将光束（176,335,435,650）从至少一个对准光源（170,360,460,625）衍射到在一个传感器（370,375,470,475,640,645）上的对准元件被配置成使光束（120,345,445,570,650）与光学数据源（125,130,135,650）对准，根据来自传感器（370,375,470,475,640,645）的读数，将所述光学数据接收器（155,160,165,555,560,556）分配给所述光学数据接收器（155,160,165,555,560,556）。

8. 发明申请

WO2008048491A2 CONTACT LITHOGRAPHY APPARATUS, SYSTEM AND METHOD 审中-公开
标题翻译：联系人地平线设备，系统和方法
公开(公告)号：WO2008048491A2
公开(公告)日：2008-04-24
申请号：PCT/US2007/021813
申请日：2007-10-12
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , WU, Wei , WANG, Shih-Yuan , LI, Zhiyong , WALMSLEY, Robert
发明人： WU, Wei , WANG, Shih-Yuan , LI, Zhiyong , WALMSLEY, Robert
IPC分类号： G03F7/00 , G03F7/20
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/7035
摘要： A contact lithography system (100, 200) includes a patterning tool (110, 228a, 510) bearing a pattern (112); a substrate chuck (214) for chucking a substrate (130, 228b) to receive the pattern (112) from the patterning tool (110, 228a, 510); where the system (100, 200) deflects a portion of either the patterning tool (110, 228a, 510) or the substrate (130, 228b) to bring the patterning tool (110, 228a, 510) and a portion of the substrate (130, 228b) into contact; and a stepper (260) for repositioning either or both of the patterning tool (110, 228a, 510) and substrate (130, 228b) to align the pattern (112) with an additional portion of the substrate (130, 228b) to also receive the pattern (112). A method of performing contact lithography comprising: deflecting a portion of either a patterning tool (110, 228a, 510) or a substrate (130, 228b) to bring the patterning tool (110, 228a, 510) and a portion of the substrate (130, 228b) into contact; and repositioning either or both of the patterning tool (110, 228a, 510) and substrate (130, 228b) to align a pattern (112) on the patterning tool (110, 228a, 510) with an additional portion of the substrate (130, 228b) to also receive the pattern (112).
摘要翻译：接触光刻系统（100,200）包括具有图案（112）的图案形成工具（110,228a，510）; 用于夹持基板（130,228b）以从所述图形化工具（110,228a，510）接收所述图案（112）的基板卡盘（214）; 其中所述系统（100,200）偏转所述图案形成工具（110,228a，510）或所述衬底（130,228b）的一部分以使所述图案形成工具（110,228a，510）和所述衬底的一部分 130，228b）接触; 以及用于重新定位所述图案形成工具（110,228a，510）和衬底（130,228b）中的一个或两个以使所述图案（112）与所述衬底（130,228b）的附加部分对准的步进器（260）接收图案（112）。一种执行接触光刻的方法，包括：使图案形成工具（110,228a，510）或衬底（130,228b）的一部分偏转以使图案形成工具（110,228a，510）和衬底的一部分 130，228b）接触; 以及重新定位图案形成工具（110,228a，510）和衬底（130,228b）中的一个或两个以使图案形成工具（110,228a，510）上的图案（112）与衬底的附加部分（130 ，228b）以也接收图案（112）。

9. 发明申请

WO2008013798A2 ALIGNMENT FOR CONTACT LITHOGRAPHY 审中-公开
标题翻译：对接接触光刻
公开(公告)号：WO2008013798A2
公开(公告)日：2008-01-31
申请号：PCT/US2007/016621
申请日：2007-07-24
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , WU, Wei , WANG, Shih-Yuan , WILLIAMS, R. Stanley,
发明人： WU, Wei , WANG, Shih-Yuan , WILLIAMS, R. Stanley,
CPC分类号： G03F7/7035 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7038 , G03F9/7042 , G03F9/7088 , G03F9/7096
摘要： A contact lithography system includes a patterning tool (110) having a pattern for transfer to a substrate (130); and at least one alignment device (140) coupled to the patterning tool (110). The alignment device (140) is configured to measure alignment between the patterning tool (110) and a substrate (130) for receiving the pattern of the patterning tool (110). A contact lithograpny method includes aligning a patterning tool (110) having a pattern for transfer with a substrate (130) for receiving the pattern of the patterning tool (110) using at least one alignment device (140) coupled to the patterning tool (110).
摘要翻译：接触式光刻系统包括具有用于转移到衬底（130）的图案的图案化工具（110）; 以及耦合到图案形成工具（110）的至少一个对齐装置（140）。对准装置（140）被配置为测量图案化工具（110）和用于接收图案化工具（110）的图案的基板（130）之间的对准。接触石印方法包括使用耦合到图案化工具（110）的至少一个对准装置（140）将具有用于转印的图案的图案化工具（110）与衬底（130）对准以接收图案化工具（110）的图案）。

10. 发明申请

WO2007084184A1 RAMAN SPECTROSCOPY SYSTEM AND METHOD USING A SUBWAVELENGTH RESONANT GRATING FILTER 审中-公开
标题翻译：拉曼光谱系统和使用亚波长共振滤光片的方法
公开(公告)号：WO2007084184A1
公开(公告)日：2007-07-26
申请号：PCT/US2006/028301
申请日：2006-07-21
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , WU, Wei , LI, Zhiyong , WANG, Shih-Yuan
发明人： WU, Wei , LI, Zhiyong , WANG, Shih-Yuan
IPC分类号： G01J3/44 , G02B5/18
CPC分类号： G01J3/44 , G01J3/02 , G01J3/0227 , G01J3/0256 , G01J3/18 , G01N21/65 , G01N21/658 , G02B5/1809
摘要： A Raman spectroscopy system (600) is disclosed which includes a sub-wavelength responant. grating filter (508) and a photodiode with integrated sub-wavelength resonant grating filter are disclosed. The resonant grating filter (608) comprises an array of diffraction elements (104) having a periodic spacing that is less than the wavelength of radiation to be filtered and which are formed over a waveguide layer (110). The filter (608), which can reject a specific wavelength of radiation, can be placed between a Raman sample and a Raman detector (602) in order to filter radiation that is elastically scattered from the sample while transmitting other wavelengths. The wavelength rejected by the filter can be selected by tilting the filter (608) with respect to the radiation incident upon the filter.
摘要翻译：公开了一种拉曼光谱系统（600），其包括亚波长响应物。光栅滤光器（508）和具有集成子波长谐振光栅滤光器的光电二极管。谐振光栅滤波器（608）包括衍射元件（104）的阵列，其具有小于待滤波的辐射的波长并且在波导层（110）上形成的周期性间隔。可以将能够抑制特定波长的辐射的滤光器（608）放置在拉曼样品和拉曼检测器（602）之间，以便过滤从样品弹性散射的辐射，同时传输其他波长。可以通过使过滤器（608）相对于入射到过滤器上的辐射倾斜来选择由过滤器拒绝的波长。

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