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1. 发明申请

WO2011001293A2 METHOD OF FORMING AN ELECTROMECHANICAL TRANSDUCER DEVICE 审中-公开
标题翻译：形成机电传感器装置的方法
公开(公告)号：WO2011001293A2
公开(公告)日：2011-01-06
申请号：PCT/IB2010001950
申请日：2010-06-15
申请人： FREESCALE SEMICONDUCTOR INC , COMMISSARIAT ENERGIE ATOMIQUE , PERRUCHOT FRANCOIS , LIU LIANJUN , PACHECO SERGIO , DEFAY EMMANUEL , REY PATRICE
发明人： PERRUCHOT FRANCOIS , LIU LIANJUN , PACHECO SERGIO , DEFAY EMMANUEL , REY PATRICE
IPC分类号： H02N1/00
CPC分类号： B81C1/00666 , B81B2203/0118 , B81C2201/0167 , B81C2201/0169
摘要： A method of forming an electromechanical transducer device (200) comprises forming (500) on a fixed structure (210) a movable structure (203) and an actuating structure of the electromechanical transducer device, wherein the movable structure (203) is arranged in operation of the electromechanical transducer device (200) to be movable in relation to the fixed structure in response to actuation of the actuating structure. The method further comprises providing (504) a stress trimming layer (216) on at least part of the movable structure (203), after providing the stress trimming layer (216), releasing (506) the movable structure (203) from the fixed structure (210) to provide a released electromechanical transducer device (200), and after releasing the movable structure (203), changing (508) stress in the stress trimming layer of the released electromechanical transducer device such that the movable structure (203) is deflected a predetermined amount relative to the fixed structure (210) when the electromechanical transducer device (200) is in an off state.
摘要翻译：一种形成机电换能器装置（200）的方法包括在固定结构（210）上形成（500）可移动结构（203）和机电换能器装置的致动结构，其中可移动结构（203）布置在操作中所述机电换能器装置（200）响应于所述致动结构的致动而相对于所述固定结构可移动。该方法还包括在提供应力修剪层（216）之后，在可移动结构（203）的至少一部分上提供（504）应力修剪层（216），将可移动结构（203）从固定结构（210）以提供释放的机电换能器装置（200），并且在释放可移动结构（203）之后，改变（508）释放的机电换能器装置的应力修剪层中的应力，使得可移动结构（203）当机电换能器装置（200）处于关闭状态时相对于固定结构（210）偏转预定量。

2. 发明申请

WO2010061364A3 ELECTROMECHANICAL TRANSDUCER DEVICE HAVING STRESS-COMPENSATION LAYERS AND METHOD OF MANUFACTURE 审中-公开
标题翻译：具有应力补偿层的机电传感器装置及其制造方法
公开(公告)号：WO2010061364A3
公开(公告)日：2010-07-22
申请号：PCT/IB2009056020
申请日：2009-11-25
申请人： FREESCALE SEMICONDUCTOR INC , COMMISSARIAT ENERGIE ATOMIQUE , PERRUCHOT FRANCOIS , DEFAY EMMANUEL , REY PATRICE , LIU LIANJUN , PACHECO SERGIO
发明人： PERRUCHOT FRANCOIS , DEFAY EMMANUEL , REY PATRICE , LIU LIANJUN , PACHECO SERGIO
IPC分类号： B81B3/00 , H01L41/09
CPC分类号： B81B3/0072 , B81B2201/032 , H01L41/0933 , H01L41/094
摘要： A micro or nano electromechanical transducer device (200) formed on a semiconductor substrate (210) comprises a movable structure (203) which is arranged to be movable in response to actuation of an actuating structure. First (206) and second (207) compensation layers are arranged to compensate a thermal effect produced by the different first and second thermal response characteristics of the mechanical structure and the at least one layer (202) of the actuating structure such that movement of the movable structure (203) is substantially independent of variations in temperature and to adjust a stress effect produced by the different first and second stress response characteristics of the mechanical structure and the at least one layer (202) of the actuating structure such that the movable structure is deflected a predetermined amount relative to the substrate when the electromechanical transducer device (200) is in an inactive state.
摘要翻译：形成在半导体衬底（210）上的微型或纳米机电换能器装置（200）包括可移动结构（203），其被布置成可响应于致动结构的致动而是可移动的。第一（206）和第二（207）补偿层布置成补偿由机械结构和致动结构的至少一个层（202）的不同的第一和第二热响应特性产生的热效应，可移动结构（203）基本上独立于温度变化并且调节由机械结构和致动结构的至少一个层（202）的不同的第一和第二应力响应特性产生的应力效应，使得可移动结构当机电换能器装置（200）处于非活动状态时相对于基板偏转预定量。

3. 发明申请

WO2010061363A2 ELECTROMECHANICAL TRANSDUCER DEVICE AND METHOD OF FORMING A ELECTROMECHANICAL TRANSDUCER DEVICE 审中-公开
标题翻译：机电传感器装置及形成机电传感器装置的方法
公开(公告)号：WO2010061363A2
公开(公告)日：2010-06-03
申请号：PCT/IB2009056019
申请日：2009-11-25
申请人： FREESCALE SEMICONDUCTOR INC , COMMISSARIAT ENERGIE ATOMIQUE , LIU LIANJUN , PACHECO SERGIO , PERRUCHOT FRANCOIS , DEFAY EMMANUEL , REY PATRICE
发明人： LIU LIANJUN , PACHECO SERGIO , PERRUCHOT FRANCOIS , DEFAY EMMANUEL , REY PATRICE
IPC分类号： B81B3/00 , H01L41/09
CPC分类号： B81B3/0072 , B81B2201/032 , H01L41/0933 , H01L41/094
摘要： A micro or nano electromechanical transducer device (200) formed on a semiconductor substrate comprises a movable structure (203) which is arranged to be movable in response to actuation of an actuating structure. The movable structure comprises a mechanical structure having at least one mechanical layer (204) having a first thermal response characteristic, at least one layer (202) of the actuating structure having a second thermal response characteristic different to the first thermal response characteristic, and a thermal compensation structure having at least one thermal compensation layer (206). The thermal compensation layer is different to the at least one layer (202) and is arranged to compensate a thermal effect produced by the mechanical layer and the at least one layer of the actuating structure such that the movement of the movable structure is substantially independent of variations in temperature.
摘要翻译：形成在半导体衬底上的微型或纳米机电换能器装置（200）包括可移动结构（203），可移动结构（203）被布置成响应于致动结构的致动而可移动。可移动结构包括具有至少一个具有第一热响应特性的机械层（204）的机械结构，所述致动结构的至少一层（202）具有与第一热响应特性不同的第二热响应特性，以及热补偿结构具有至少一个热补偿层（206）。热补偿层与至少一个层（202）不同，并且被布置成补偿由机械层和致动结构的至少一个层产生的热效应，使得可移动结构的运动基本上独立于温度变化。

4. 发明申请

WO2011080409A3 PROCESS FOR FABRICATING AN ELECTRONIC COMPONENT COMBINING AN ELECTROMECHANICAL SYSTEM AND AN ELECTRONIC CIRCUIT 审中-公开
标题翻译：制造电子元件组合电子系统和电子电路的方法
公开(公告)号：WO2011080409A3
公开(公告)日：2011-09-09
申请号：PCT/FR2010000828
申请日：2010-12-09
申请人： COMMISSARIAT ENERGIE ATOMIQUE , PERRUCHOT FRANCOIS , DIEM BERNARD , MOUREY BRUNO , SILLON NICOLAS
发明人： PERRUCHOT FRANCOIS , DIEM BERNARD , MOUREY BRUNO , SILLON NICOLAS
IPC分类号： B81C1/00
CPC分类号： B81C1/00238 , B81C2201/019 , B81C2203/036
摘要： The invention relates to a process for fabricating an electronic component combining, starting from two different substrates, an electromechanical system and an electronic circuit, characterized in that it comprises: a) the production of a stack comprising first and second substrates separated by an intermediate layer (4), the first substrate comprising a mechanical layer (1, 3), the second substrate comprising an electronic circuit (10) consisting of localized (6) electrical contact regions (11) that are covered by the intermediate layer (4), the intermediate layer comprising a sacrificial layer (4) and a bonding layer (7), the sacrificial layer (4) being in contact with the first substrate (1, 3) and the intermediate layer being bonded to the second substrate via the bonding layer (7); b) the production through the mechanical layer (1), on the one hand, of first trenches (20), for structuring the mechanical layer (1), and, on the other hand, of second trenches (21) passing through the mechanical layer and the intermediate layer so as to define vias (25) extending as far as the electrical contact regions (1, 1) of the electronic circuit (10), the wall (23) and the bottom of each via (25), on the one hand, and a contact region (29) for each via on the surface of the mechanical layer (1), on the other hand, comprising an electrically conductive layer (26, 29); and c) the liberation of the electromechanical structure by etching all or part of the intermediate layer (4).
摘要翻译：本发明涉及一种用于制造电子部件的方法，该电子部件从两个不同的基板开始组合机电系统和电子电路，其特征在于，其包括：a）制造包括由中间层分隔的第一和第二基板的堆叠（4），所述第一基板包括机械层（1,3），所述第二基板包括由中间层（4）覆盖的局部（6）电接触区域（11）组成的电子电路（10）所述中间层包括牺牲层（4）和接合层（7），所述牺牲层（4）与所述第一衬底（1,3）接触，并且所述中间层经由所述接合层接合到所述第二衬底（7）; b）一方面通过第一沟槽（20）的机械层（1）的生产，用于构造机械层（1），另一方面通过穿过机械层（1）的第二沟槽（21）层和中间层，以便限定延伸到电子电路（10）的电接触区域（1），壁（23）和每个通孔（25）的底部的通孔（25），一方面，另一方面，在机械层（1）的表面上的每个通孔的接触区域（29）包括导电层（26,29）; 以及c）通过蚀刻中间层（4）的全部或部分来解除机电结构。

5. 发明申请

WO2004019385A3 COATING SUPPORT AND METHOD FOR THE SELECTIVE COATING OF CONDUCTIVE TRACKS ON ONE SUCH SUPPORT 审中-公开
标题翻译：一种支持下的导电跟踪选择性涂层的涂层支持和方法
公开(公告)号：WO2004019385A3
公开(公告)日：2004-04-08
申请号：PCT/FR0350042
申请日：2003-08-26
申请人： ALCHIMER S A , BUREAU CHRISTOPHE , PERRUCHOT FRANCOIS , KERGUERIS CHRISTOPHE
发明人： BUREAU CHRISTOPHE , PERRUCHOT FRANCOIS , KERGUERIS CHRISTOPHE
IPC分类号： G01N27/30 , C25D7/12 , C25D9/02 , G01N27/327 , G01N27/403 , G01N37/00 , H01L21/00 , B01J19/00 , H01L27/00
CPC分类号： C25D7/12 , B29C2043/5825 , C25D9/02
摘要： The invention relates to a coating support comprising numerous conductive tracks (12) which are associated with a shared addressing contact (18) and with means of selecting at least one track from said numerous tracks, which is to be electrochemically coated. According to the invention, the aforementioned selection means comprise means (20) of shifting a polarisation voltage, which are connected between the shared addressing contact and at least one track to be addressed. The invention can be used to coat conductive tracks.
摘要翻译：本发明涉及一种涂层支撑体，其包括与共享寻址接触件（18）相关联的多个导电轨道（12），并且具有从要被电化学涂覆的所述许多轨道中选择至少一个轨道的装置。根据本发明，上述选择装置包括移动偏振电压的装置（20），该偏振电压连接在共享寻址触点和要被寻址的至少一个轨道之间。本发明可用于涂覆导电轨道。

6. 发明申请

WO2004018349B1 MICROSTRUCTURE COMPRISING A SURFACE WHICH IS FUNCTIONALISED THROUGH THE LOCALISED DEPOSIT OF A THIN LAYER AND PRODUCTION METHOD THEREOF 审中-公开
标题翻译：包含通过薄层的本地化沉积物功能的表面的微结构及其生产方法
公开(公告)号：WO2004018349B1
公开(公告)日：2005-03-24
申请号：PCT/FR0350036
申请日：2003-08-25
申请人： ALCHIMER S A , TRONIC S MICROSYSTEMS , BUREAU CHRISTOPHE , KERGUERIS CHRISTOPHE , PERRUCHOT FRANCOIS
发明人： BUREAU CHRISTOPHE , KERGUERIS CHRISTOPHE , PERRUCHOT FRANCOIS
IPC分类号： A61B5/00 , B81B3/00 , G01L9/00
CPC分类号： G01L9/0042 , A61B5/00 , B29C2043/5825 , B81B3/0094 , B81B2201/0214 , B81B2201/0235 , B81B2201/0264 , B81B2201/06 , B81B2203/0127 , H01L2224/45144 , H01L2224/48091 , H01L2924/181 , Y10S977/733 , H01L2924/00012 , H01L2924/00014 , H01L2924/00
摘要： The invention relates to an electromechanical microstructure (1) consisting of a first mechanical part (102) which is made from a first conductive material and which comprises (i) an elastically-deformable area (104) having a given thickness value and an exposed surface (2) and (ii) a first organic film (4) having a given thickness, which is disposed over the entire exposed surface (2) of the aforementioned deformable area (104). The invention is characterised in that (a) the thickness of the first film (4) is such that the elastic response of the deformable area (104) comprising the first film (4) does not change by more than 5 % in relation to the response of the bare deformable area (104) or (b) in that the thickness of the first film (4) is ten times smaller than the thickness of the deformable area (104). The invention is suitable for the production of electromechanical microstructures.
摘要翻译：本发明涉及由第一导电材料制成的第一机械部件（102）组成的机电微结构（1），其包括（i）具有给定厚度值的可弹性变形区域（104）和暴露表面（2）和（ii）具有给定厚度的第一有机膜（4），其设置在上述可变形区域（104）的整个暴露表面（2）上。本发明的特征在于，（a）第一膜（4）的厚度使得包括第一膜（4）的可变形区域（104）的弹性响应相对于第一膜（4）的弹性响应不会改变超过5％可变形区域（104）或（b）的响应在于第一膜（4）的厚度比可变形区域（104）的厚度小十倍。本发明适用于生产机电微结构。

7. 发明申请

WO2004018349A9 MICROSTRUCTURE COMPRISING A SURFACE WHICH IS FUNCTIONALISED THROUGH THE LOCALISED DEPOSIT OF A THIN LAYER AND PRODUCTION METHOD THEREOF 审中-公开
标题翻译：包含通过薄层的本地化沉积物功能的表面的微结构及其生产方法
公开(公告)号：WO2004018349A9
公开(公告)日：2004-06-03
申请号：PCT/FR0350036
申请日：2003-08-25
申请人： ALCHIMER S A , TRONIC S MICROSYSTEMS , BUREAU CHRISTOPHE , KERGUERIS CHRISTOPHE , PERRUCHOT FRANCOIS
发明人： BUREAU CHRISTOPHE , KERGUERIS CHRISTOPHE , PERRUCHOT FRANCOIS
IPC分类号： A61B5/00 , B81B3/00 , G01L9/00
CPC分类号： G01L9/0042 , A61B5/00 , B29C2043/5825 , B81B3/0094 , B81B2201/0214 , B81B2201/0235 , B81B2201/0264 , B81B2201/06 , B81B2203/0127 , H01L2224/45144 , H01L2224/48091 , H01L2924/181 , Y10S977/733 , H01L2924/00012 , H01L2924/00014 , H01L2924/00
摘要： The invention relates to an electromechanical microstructure (1) consisting of a first mechanical part (102) which is made from a first conductive material and which comprises (i) an elastically-deformable area (104) having a given thickness value and an exposed surface (2) and (ii) a first organic film (4) having a given thickness, which is disposed over the entire exposed surface (2) of the aforementioned deformable area (104). The invention is characterised in that (a) the thickness of the first film (4) is such that the elastic response of the deformable area (104) comprising the first film (4) does not change by more than 5 % in relation to the response of the bare deformable area (104) or (b) in that the thickness of the first film (4) is ten times smaller than the thickness of the deformable area (104). The invention is suitable for the production of electromechanical microstructures.
摘要翻译：本发明涉及由第一导电材料制成的第一机械部件（102）组成的机电微结构（1），其包括（i）具有给定厚度值的可弹性变形区域（104）和暴露表面（2）和（ii）具有给定厚度的第一有机膜（4），其设置在上述可变形区域（104）的整个暴露表面（2）上。本发明的特征在于，（a）第一膜（4）的厚度使得包括第一膜（4）的可变形区域（104）的弹性响应相对于第一膜（4）的弹性响应不会改变超过5％可变形区域（104）或（b）的响应在于第一膜（4）的厚度比可变形区域（104）的厚度小十倍。本发明适用于生产机电微结构。

8. 发明申请

WO0222180A2 PLASMA STERILISATION SYSTEM 审中-公开
标题翻译：等离子体灭菌系统
公开(公告)号：WO0222180A2
公开(公告)日：2002-03-21
申请号：PCT/FR0102842
申请日：2001-09-13
申请人： ABSYS , PERRUCHOT FRANCOIS , JAFFREZIC MARIE PIERRE , DESTREZ PHILIPPE , BOUSQUET SEVERINE
发明人： PERRUCHOT FRANCOIS , JAFFREZIC MARIE-PIERRE , DESTREZ PHILIPPE , BOUSQUET SEVERINE
IPC分类号： A23L3/32 , A61B1/12 , A61L2/14 , A61L2/20 , A61L2/24
CPC分类号： A61L2/202 , A61B1/121 , A61L2/14 , A61L2/24
摘要： The invention concerns a plasma sterilisation system in the presence of humidity from a non-biocidal gas containing oxygen and nitrogen of at least an object placed outside the discharge in a sealed treatment chamber substantially subjected to atmospheric pressure, said method comprising the following steps: introducing the humidified non-biocidal gas into the treatment chamber, generating a first plasma discharge A for a specific duration ensuring the efficacy of the sterilising species generated during the following phase in the entire chamber; generating a second plasma discharge B for a specific duration ensuring sterilisation of said object and rinsing the treatment chamber for a specific duration to ensure a non-polluting atmosphere when the chamber is subsequently opened. Preferably, the first plasma discharge and the introduction of humidity are simultaneous and the first and second plasma discharges can overlap such that the generation of the second plasma starts before the end of the first plasma discharge. The invention also concerns various devices for implementing said method in particular for sterilising all types of medical objects.
摘要翻译：本发明涉及一种等离子体灭菌系统，该系统在来自包含氧和氮的非杀生物气体的湿气存在下，至少放置在基本承受大气压力的密封处理室中的物体外，所述方法包括以下步骤：引入加湿的非杀生物气体进入处理室，在特定的持续时间内产生第一等离子体放电A，确保在整个室中的后续阶段期间产生的杀菌物质的功效; 在确定的持续时间内产生第二等离子体放电B，确保所述物体的消毒和漂洗处理室达特定的持续时间，以确保随后打开室时的无污染气氛。优选地，第一等离子体放电和湿气的引入是同时的，并且第一和第二等离子体放电可以重叠，使得在第一等离子体放电结束之前开始第二等离子体的生成。本发明还涉及用于实施所述方法的各种装置，特别是用于消毒所有类型的医用物品。

9. 发明申请

WO2004018349A3 MICROSTRUCTURE COMPRISING A SURFACE WHICH IS FUNCTIONALISED THROUGH THE LOCALISED DEPOSIT OF A THIN LAYER AND PRODUCTION METHOD THEREOF 审中-公开
标题翻译：包含通过薄层的局部沉积而功能化的表面的微结构体及其制造方法
公开(公告)号：WO2004018349A3
公开(公告)日：2005-01-20
申请号：PCT/FR0350036
申请日：2003-08-25
申请人： ALCHIMER S A , TRONIC S MICROSYSTEMS , BUREAU CHRISTOPHE , KERGUERIS CHRISTOPHE , PERRUCHOT FRANCOIS
发明人： BUREAU CHRISTOPHE , KERGUERIS CHRISTOPHE , PERRUCHOT FRANCOIS
IPC分类号： A61B5/00 , B81B3/00 , G01L9/00
CPC分类号： G01L9/0042 , A61B5/00 , B29C2043/5825 , B81B3/0094 , B81B2201/0214 , B81B2201/0235 , B81B2201/0264 , B81B2201/06 , B81B2203/0127 , H01L2224/45144 , H01L2224/48091 , H01L2924/181 , Y10S977/733 , H01L2924/00012 , H01L2924/00014 , H01L2924/00
摘要： The invention relates to an electromechanical microstructure (1) consisting of a first mechanical part (102) which is made from a first conductive material and which comprises (i) an elastically-deformable area (104) having a given thickness value and an exposed surface (2) and (ii) a first organic film (4) having a given thickness, which is disposed over the entire exposed surface (2) of the aforementioned deformable area (104). The invention is characterised in that (a) the thickness of the first film (4) is such that the elastic response of the deformable area (104) comprising the first film (4) does not change by more than 5 % in relation to the response of the bare deformable area (104) or (b) in that the thickness of the first film (4) is ten times smaller than the thickness of the deformable area (104). The invention is suitable for the production of electromechanical microstructures.
摘要翻译：本发明涉及一种由第一机械部件（102）组成的机电微结构（1），该第一机械部件由第一导电材料制成并且包括（i）具有给定厚度值的可弹性变形区域（104）和暴露表面（2）和（ii）具有给定厚度的第一有机膜（4），其布置在上述可变形区域（104）的整个暴露表面（2）上。本发明的特征在于：（a）第一薄膜（4）的厚度使得包括第一薄膜（4）的可变形区域（104）的弹性响应相对于第一薄膜（4）的变化不超过5％（104）或（b）的响应之处在于第一膜（4）的厚度比可变形区域（104）的厚度小十倍。本发明适用于机电微结构的制造。

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