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    • 2. 发明申请
    • BASES AND SURFACTANTS AND THEIR USE IN PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY
    • 基础和表面活性剂及其在光刻胶组合物中的应用
    • WO0244814A2
    • 2002-06-06
    • PCT/US0144294
    • 2001-11-26
    • DU PONTBERGER LARRY LCRAWFORD MICHAEL CARLSCHADT FRANK L IIIZUMSTEG FREDRICK CLAUS JR
    • BERGER LARRY LCRAWFORD MICHAEL CARLSCHADT FRANK L IIIZUMSTEG FREDRICK CLAUS JR
    • G03F7/00G03F7/004G03F7/038G03F7/039G03F7/20G03F7/30H01L21/027
    • G03F7/0046G03F7/0382G03F7/0395
    • A photoresist composition having: (A) a polymer selected from the group consisting of: (a) a fluorine-containing copolymer having a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure: -C(Rf)(Rf')OH, wherein Rf and Rf' are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is 2 to 10; (d) amorphous vinyl homopolymers of perfluoro(2,2-dimethyl-1,3-dioxole) or CX2=CY2 where X = F or CF3 and Y = -H or amorphous vinyl copolymers of perfluoro(2,2-dimethyl-1,3-dioxole) and CX2=CY2; and (e) nitrile/fluoroalcohol-containing polymers prepared from substituted or unsubstituted vinyl ethers; (B) at least one photoactive component; and (C) a functional compound selected from the group consisting of a base and a surfactant. The polymer may have an absorption coefficient of less than about 5.0 ñm at a wavelength of about 157 nm. These photoresist compositions have improved imaging properties.
    • 一种光致抗蚀剂组合物,其具有:(A)选自以下的聚合物:(a)具有衍生自至少一种烯键式不饱和化合物的重复单元的含氟共聚物,其特征在于至少一种烯属不饱和化合物是多环的; (b)含有保护的酸基团的支化聚合物,所述聚合物包含一个或多个沿着线性主链部分化学连接的支链段; (c)具有至少一个具有以下结构的氟代醇的含氟聚合物:-C(R f)(R f')OH,其中R f和R f'是相同或不同的1至约10个碳原子的氟代烷基或一起为( CF 2)n,其中n为2至10; (d)全氟(2,2-二甲基-1,3-二氧杂环戊烯)或CX2 = CY2的无定形乙烯基均聚物,其中X = F或CF 3和Y = -H或全氟(2,2-二甲基-1 ,3-二氧杂环戊烯)和CX2 = CY2; 和(e)由取代或未取代的乙烯基醚制备的含腈/氟代醇的聚合物; (B)至少一种光活性组分; 和(C)选自碱和表面活性剂的官能化合物。 聚合物在约157nm的波长处可具有小于约5.0μm的吸收系数。 这些光致抗蚀剂组合物具有改善的成像性能。
    • 3. 发明申请
    • MULTILAYER ELEMENTS CONTAINING PHOTORESIST COMPOSITIONS AND THEIR USE IN MICROLITHOGRAPHY
    • 包含光电组合物的多层元件及其在微结构中的应用
    • WO0244815A2
    • 2002-06-06
    • PCT/US0144295
    • 2001-11-26
    • DU PONTBERGER LARRY LSCHADT FRANK L III
    • BERGER LARRY LSCHADT FRANK L III
    • G03F7/033G03F7/004G03F7/038G03F7/039G03F7/09G03F7/11H01L21/027
    • G03F7/0395G03F7/0046G03F7/0382G03F7/0392G03F7/094G03F7/11
    • A photoresist element comprising a substrate; an etch resistant layer; and at least one photoresist layer prepared from a photoresist composition comprising a polymer selected from the group consisting of: (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure: -C(Rf)(Rf')OH, wherein Rf and Rf' are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is 2 to 10; (d) amorphous vinyl homopolymers of perfluoro(2,2-dimethyl-1,3-dioxole) or CX2=CY2 where X = F or CF3 and Y = -H or amorphous vinyl copolymers of perfluoro(2,2-dimethyl-1,3-dioxole) and CX2=CY2; and (e) nitrile/fluoroalcohol-containing polymers prepared from substituted or unsubstituted vinyl ethers; and (B) at least one photoactive component.
    • 一种光致抗蚀剂元件,包括基底; 耐蚀刻层; 和由光致抗蚀剂组合物制备的至少一个光致抗蚀剂层,所述光致抗蚀剂组合物包含选自以下的聚合物:(a)包含衍生自至少一种烯属不饱和化合物的重复单元的含氟共聚物,其特征在于至少一种烯键式不饱和化合物 是多环的 (b)含有保护的酸基团的支化聚合物,所述聚合物包含一个或多个沿着线性主链部分化学连接的支链段; (c)具有至少一个具有以下结构的氟代醇的含氟聚合物:-C(R f)(R f')OH,其中R f和R f'是相同或不同的1至约10个碳原子的氟代烷基或一起为( CF 2)n,其中n为2至10; (d)全氟(2,2-二甲基-1,3-二氧杂环戊烯)或CX2 = CY2的无定形乙烯基均聚物,其中X = F或CF 3和Y = -H或全氟(2,2-二甲基-1 ,3-二氧杂环戊烯)和CX2 = CY2; 和(e)由取代或未取代的乙烯基醚制备的含腈/氟代醇的聚合物; 和(B)至少一种光活性组分。
    • 4. 发明申请
    • POLYMERS BLENDS AND THEIR USE IN PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY
    • 聚合物混合物及其在光刻胶组合物中的应用
    • WO0244811A3
    • 2004-09-23
    • PCT/US0143398
    • 2001-11-21
    • DU PONTBERGER LARRY LSCHADT FRANK L III
    • BERGER LARRY LSCHADT FRANK L III
    • G03F7/004G03F7/038G03F7/039H01L21/027
    • G03F7/0382G03F7/0046G03F7/0392G03F7/0395Y10S430/106Y10S430/108Y10S430/111
    • A photoresist composition having (A) at least two polymers selected from the group consisting of: (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure:-C(Rf)(Rf')OH wherein Rf and Rf' are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is 2 to 10;(d) amorphous vinyl homopolymers of perfluoro(2,2-dimethyl-1,3-dioxole) or CX2=CY2 where X = F or CF3 and Y = H or amorphous vinyl copolymers of perfluoro(2,2-dimethyl-1,3-dioxole) and CX2 = CY2; and (e) nitrile/fluoroalcohol-containing polymers prepared from substituted or unsubstituted vinyl ethers; and (B) at least one photoactive component.
    • 一种光致抗蚀剂组合物,其具有(A)至少两种选自以下的聚合物:(a)包含衍生自至少一种烯属不饱和化合物的重复单元的含氟共聚物,其特征在于至少一种烯属不饱和化合物是多环的; (b)含有保护的酸基团的支化聚合物,所述聚合物包含一个或多个沿着线性主链部分化学连接的支链段; (c)具有至少一个具有以下结构的氟代醇的含氟聚合物:其中R f和R f'为相同或不同的具有1至约10个碳原子的氟代烷基或它们一起为(CF 2) )n其中n为2至10;(d)全氟(2,2-二甲基-1,3-间二氧杂环戊烯)或CX2 = CY2的无定形乙烯基均聚物,其中X = F或CF 3和Y = H或全氟 (2,2-二甲基-1,3-二氧杂环戊烯)和CX2 = CY2; 和(e)由取代或未取代的乙烯基醚制备的含腈/氟代醇的聚合物; 和(B)至少一种光活性组分。
    • 6. 发明申请
    • ANTIREFLECTIVE LAYER FOR USE IN MICROLITHOGRAPHY
    • 用于微结构的抗反射层
    • WO0244816A3
    • 2003-09-12
    • PCT/US0143437
    • 2001-11-21
    • DU PONTBERGER LARRY LCRAWFORD MICHAEL KARLFRENCH ROGER HARQUAILWHELAND ROBERT CLAYTONZUMSTEG FREDERICK CLAUS JR
    • BERGER LARRY LCRAWFORD MICHAEL KARLFRENCH ROGER HARQUAILWHELAND ROBERT CLAYTONZUMSTEG FREDERICK CLAUS JR
    • G03F7/11G03F7/004G03F7/09H01L21/027
    • G03F7/091G03F7/0046
    • An element having a support, and at least an antireflective layer; wherein the antireflective layer is prepared from a composition having a polymer selected from the group consisting of (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure:-C(Rf)(Rf')OHwherein Rf and Rf' are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is 2 to 10; (d) amorphous vinyl homopolymers of perfluoro-2,2-dimethyl-1,3-dioxole or CX2=CY2, where X is -F, or -CF3 and Y is H, or amorphous vinyl copolymers of perfluoro-2,2-dimethyl-1,3-dioxole and CX2=CY2; (e) nitrile/fluoroalcohol-containing polymers prepared from substituted or unsubstituted vinyl ethers; and mixtures thereof.
    • 一种具有支撑体的元件和至少一个抗反射层; 其中所述抗反射层由具有选自以下的聚合物的组合物制备:(a)包含衍生自至少一种烯属不饱和化合物的重复单元的含氟共聚物,其特征在于至少一种烯属不饱和化合物是多环的; (b)含有保护的酸基团的支化聚合物,所述聚合物包含一个或多个沿着线性主链部分化学连接的支链段; (c)具有至少一个具有以下结构的氟代醇的含氟聚合物:具有以下结构的-C(R f)(R f')OH其中R f和R f'为相同或不同的具有1至约10个碳原子的氟代烷基或一起为(CF 2) n其中n为2至10; (d)全氟-2,2-二甲基-1,3-二氧杂环戊烯或CX2 = CY2的无定形乙烯基均聚物,其中X为-F或-CF 3且Y为H,或全氟-2,2-二甲基-1,3-二氧杂环戊烯的无定形乙烯基共聚物, 二甲基-1,3-二氧杂环戊烯和CX2 = CY2; (e)由取代或未取代的乙烯基醚制备的含腈/氟代醇的聚合物; 及其混合物。