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1. 发明申请

WO2005118656A3 PHOTORESISTS COMPRISING POLYMERS DERIVED FROM FLUOROALCOHOL-SUBSTITUTED POLYCYCLIC MONOMERS 审中-公开
公开(公告)号：WO2005118656A3
公开(公告)日：2005-12-15
申请号：PCT/US2005/017325
申请日：2005-05-17
申请人： E.I. DUPONT DE NEMOURS AND COMPANY , CRAWFORD, Michael, Karl , TRAN, Hoang, Vi , SCHADT, Frank, L., III , ZUMSTEG, Frederick, Claus, Jr. , FEIRING, Andrew, Edward , FRYD, Michael
发明人： CRAWFORD, Michael, Karl , TRAN, Hoang, Vi , SCHADT, Frank, L., III , ZUMSTEG, Frederick, Claus, Jr. , FEIRING, Andrew, Edward , FRYD, Michael
IPC分类号： C08F214/18
摘要： The present invention relates to novel unsaturated polycyclic compounds containing two fluoroalcohol substitutents. This invention also relates to homopolymers and copolymers derived from such unsaturated polycyclic compounds. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The polymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.

2. 发明申请

WO2006137912A1 CURED COMPOSITIONS CONTAINING FINE MAGNETIC PARTICLES AND A PROCESS FOR PREPARING SAME AND THEIR USE 审中-公开
标题翻译：含有精细颗粒的固化组合物及其制备方法及其使用方法
公开(公告)号：WO2006137912A1
公开(公告)日：2006-12-28
申请号：PCT/US2005/036931
申请日：2005-10-14
申请人： E.I. DUPONT DE NEMOURS AND COMPANY , XU, Jingjing , MOLNAR, Charles, J. , SUBRAMONEY, Shekhar , CRAWFORD, Michael, Karl , GERGELY, John, S. , ZHANG, Lu
发明人： XU, Jingjing , MOLNAR, Charles, J. , SUBRAMONEY, Shekhar , CRAWFORD, Michael, Karl , GERGELY, John, S. , ZHANG, Lu
IPC分类号： C08K3/10 , C08J5/18 , H01F1/00
CPC分类号： C08F2/44 , C08K3/08 , C08K9/02 , C09D7/67 , C09D7/68 , C09D7/69 , C09D7/70 , C09D11/101 , H01F1/0054 , H01F1/0063
摘要： The present invention is a dispersion composition comprising (1) a curable mixture of monomers, oligomers, or a combination thereof; and (2) superparamagnetic particles dispersed in the mixture of part (1) and a method for preparing such superparamagnetic particles. The composition of the present invention can be useful as a tool for detecting and/or deterring theft, counterfeiting, or the like in commercial transactions.
摘要翻译：本发明是一种分散组合物，其包含（1）单体，低聚物或其组合的可固化混合物; 和（2）分散在部分（1）的混合物中的超顺磁性颗粒和制备这种超顺磁性颗粒的方法。本发明的组合物可用作在商业交易中检测和/或阻止盗窃，假冒等的工具。

3. 发明申请

WO0244816A3 ANTIREFLECTIVE LAYER FOR USE IN MICROLITHOGRAPHY 审中-公开
标题翻译：用于微结构的抗反射层
公开(公告)号：WO0244816A3
公开(公告)日：2003-09-12
申请号：PCT/US0143437
申请日：2001-11-21
申请人： DU PONT , BERGER LARRY L , CRAWFORD MICHAEL KARL , FRENCH ROGER HARQUAIL , WHELAND ROBERT CLAYTON , ZUMSTEG FREDERICK CLAUS JR
发明人： BERGER LARRY L , CRAWFORD MICHAEL KARL , FRENCH ROGER HARQUAIL , WHELAND ROBERT CLAYTON , ZUMSTEG FREDERICK CLAUS JR
IPC分类号： G03F7/11 , G03F7/004 , G03F7/09 , H01L21/027
CPC分类号： G03F7/091 , G03F7/0046
摘要： An element having a support, and at least an antireflective layer; wherein the antireflective layer is prepared from a composition having a polymer selected from the group consisting of (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure:-C(Rf)(Rf')OHwherein Rf and Rf' are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is 2 to 10; (d) amorphous vinyl homopolymers of perfluoro-2,2-dimethyl-1,3-dioxole or CX2=CY2, where X is -F, or -CF3 and Y is H, or amorphous vinyl copolymers of perfluoro-2,2-dimethyl-1,3-dioxole and CX2=CY2; (e) nitrile/fluoroalcohol-containing polymers prepared from substituted or unsubstituted vinyl ethers; and mixtures thereof.
摘要翻译：一种具有支撑体的元件和至少一个抗反射层; 其中所述抗反射层由具有选自以下的聚合物的组合物制备：（a）包含衍生自至少一种烯属不饱和化合物的重复单元的含氟共聚物，其特征在于至少一种烯属不饱和化合物是多环的; （b）含有保护的酸基团的支化聚合物，所述聚合物包含一个或多个沿着线性主链部分化学连接的支链段; （c）具有至少一个具有以下结构的氟代醇的含氟聚合物：具有以下结构的-C（R f）（R f'）OH其中R f和R f'为相同或不同的具有1至约10个碳原子的氟代烷基或一起为（CF 2） n其中n为2至10; （d）全氟-2,2-二甲基-1,3-二氧杂环戊烯或CX2 = CY2的无定形乙烯基均聚物，其中X为-F或-CF 3且Y为H，或全氟-2,2-二甲基-1,3-二氧杂环戊烯的无定形乙烯基共聚物，二甲基-1,3-二氧杂环戊烯和CX2 = CY2; （e）由取代或未取代的乙烯基醚制备的含腈/氟代醇的聚合物; 及其混合物。

4. 发明申请

WO2005118656A2 PHOTORESISTS COMPRISING POLYMERS DERIVED FROM FLUOROALCOHOL-SUBSTITUTED POLYCYCLIC MONOMERS 审中-公开
标题翻译：包含从氟代醇取代的多环单体衍生的聚合物的光电
公开(公告)号：WO2005118656A2
公开(公告)日：2005-12-15
申请号：PCT/US2005017325
申请日：2005-05-17
申请人： DU PONT , CRAWFORD MICHAEL KARL , TRAN HOANG VI , SCHADT FRANK L III , ZUMSTEG FREDERICK CLAUS JR , FEIRING ANDREW EDWARD , FRYD MICHAEL
发明人： CRAWFORD MICHAEL KARL , TRAN HOANG VI , SCHADT FRANK L III , ZUMSTEG FREDERICK CLAUS JR , FEIRING ANDREW EDWARD , FRYD MICHAEL
IPC分类号： C07C33/44 , C07C43/178 , C07C43/196 , C08F14/18 , C08F214/18 , C08F214/26 , G03F7/004 , G03F7/039
CPC分类号： C08F214/18 , C07C33/44 , C07C43/1781 , C07C43/196 , C07C2602/42 , C07C2603/62 , C07C2603/86 , C08F214/26 , C08F220/18 , C08F220/26 , C08F232/08 , G03F7/0046 , G03F7/0395 , Y10S430/106 , Y10S430/108
摘要： The present invention relates to novel unsaturated polycyclic compounds containing two fluoroalcohol substitutents. This invention also relates to homopolymers and copolymers derived from such unsaturated polycyclic compounds. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The polymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.
摘要翻译：本发明涉及含有两个氟代醇取代基的新型不饱和多环化合物。本发明还涉及衍生自这种不饱和多环化合物的均聚物和共聚物。共聚物可用于光成像组合物，特别是用于制造半导体器件的成像的光致抗蚀剂组合物（正性和/或负性）。聚合物特别适用于具有高UV透明度（特别是短波长，例如157nm）的光致抗蚀剂组合物，其可用作抗蚀剂中的基础树脂并且潜在地在许多其它应用中。

5. 发明申请

WO0233489A3 COMPOSITIONS FOR MICROLITHOGRAPHY 审中-公开
标题翻译：显微组成
公开(公告)号：WO0233489A3
公开(公告)日：2002-11-21
申请号：PCT/US0142743
申请日：2001-10-16
申请人： DU PONT , BERGER LARRY L , CRAWFORD MICHAEL KARL , FELDMAN JERALD , JOHNSON LYNDA KAYE , SCHADT III FRANK L , ZUMSTEG JR FREDRICK CLAUS
发明人： BERGER LARRY L , CRAWFORD MICHAEL KARL , FELDMAN JERALD , JOHNSON LYNDA KAYE , SCHADT III FRANK L , ZUMSTEG JR FREDRICK CLAUS
IPC分类号： C08F232/00 , C08F232/08 , G03F7/004 , G03F7/039 , H01L21/027 , G03F7/09
CPC分类号： C08F232/08 , G03F7/0045 , G03F7/0046 , G03F7/0395
摘要： A fluorine-containing polymer prepared from at least a spacer group selected from the group consisting of ethylene, alpha-olefins, 1,1'-disubstituted olefins, vinyl alcohols, vinyl ethers, and 1,3-dienes; and a norbornyl radical containing a functional group containing the structure: -C(Rf)(Rf')Orb wherein Rf and Rf' are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is an integer ranging from 2 to about 10 and Rb is a hydrogen atom or an acid- or base-labile protecting group; r is an integer ranging from 0-4. The fluorine-containing polymer has an absorption coefficient of less than 4.0 mm- at a wavelength of 157 nm. These polymers are useful in photoresist compositions for microlithography. They exhibit high transparency at this short wavelength and also possess other key properties, including good plasma etch resistance and adhesive properties.
摘要翻译：由至少一种选自乙烯，α-烯烃，1,1'-二取代烯烃，乙烯基醇，乙烯基醚和1,3-二烯的间隔基团制备的含氟聚合物; 和含有结构为-C（Rf）（Rf'）Orb的官能团的降冰片基，其中Rf和Rf'是相同或不同的含1至约10个碳原子的氟代烷基或者合在一起为（CF2）n 其中n是2至约10的整数，Rb是氢原子或酸或碱不稳定的保护基; r是范围从0到4的整数。含氟聚合物在157nm的波长处具有小于4.0mm -1的吸收系数。这些聚合物在用于微光刻的光刻胶组合物中是有用的。它们在这种短波长下表现出高透明度，并且还具有其他关键性能，包括良好的抗等离子蚀刻性和粘合性能。

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