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1. 发明申请

WO0244814A2 BASES AND SURFACTANTS AND THEIR USE IN PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY 审中-公开
标题翻译：基础和表面活性剂及其在光刻胶组合物中的应用
公开(公告)号：WO0244814A2
公开(公告)日：2002-06-06
申请号：PCT/US0144294
申请日：2001-11-26
申请人： DU PONT , BERGER LARRY L , CRAWFORD MICHAEL CARL , SCHADT FRANK L III , ZUMSTEG FREDRICK CLAUS JR
发明人： BERGER LARRY L , CRAWFORD MICHAEL CARL , SCHADT FRANK L III , ZUMSTEG FREDRICK CLAUS JR
IPC分类号： G03F7/00 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/20 , G03F7/30 , H01L21/027
CPC分类号： G03F7/0046 , G03F7/0382 , G03F7/0395
摘要： A photoresist composition having: (A) a polymer selected from the group consisting of: (a) a fluorine-containing copolymer having a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure: -C(Rf)(Rf')OH, wherein Rf and Rf' are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is 2 to 10; (d) amorphous vinyl homopolymers of perfluoro(2,2-dimethyl-1,3-dioxole) or CX2=CY2 where X = F or CF3 and Y = -H or amorphous vinyl copolymers of perfluoro(2,2-dimethyl-1,3-dioxole) and CX2=CY2; and (e) nitrile/fluoroalcohol-containing polymers prepared from substituted or unsubstituted vinyl ethers; (B) at least one photoactive component; and (C) a functional compound selected from the group consisting of a base and a surfactant. The polymer may have an absorption coefficient of less than about 5.0 ñm at a wavelength of about 157 nm. These photoresist compositions have improved imaging properties.
摘要翻译：一种光致抗蚀剂组合物，其具有：（A）选自以下的聚合物：（a）具有衍生自至少一种烯键式不饱和化合物的重复单元的含氟共聚物，其特征在于至少一种烯属不饱和化合物是多环的; （b）含有保护的酸基团的支化聚合物，所述聚合物包含一个或多个沿着线性主链部分化学连接的支链段; （c）具有至少一个具有以下结构的氟代醇的含氟聚合物：-C（R f）（R f'）OH，其中R f和R f'是相同或不同的1至约10个碳原子的氟代烷基或一起为（ CF 2）n，其中n为2至10; （d）全氟（2,2-二甲基-1,3-二氧杂环戊烯）或CX2 = CY2的无定形乙烯基均聚物，其中X = F或CF 3和Y = -H或全氟（2,2-二甲基-1 ，3-二氧杂环戊烯）和CX2 = CY2; 和（e）由取代或未取代的乙烯基醚制备的含腈/氟代醇的聚合物; （B）至少一种光活性组分; 和（C）选自碱和表面活性剂的官能化合物。聚合物在约157nm的波长处可具有小于约5.0μm的吸收系数。这些光致抗蚀剂组合物具有改善的成像性能。

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