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1. 发明申请

WO2008145296A9 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY, MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS WITH SAID PROJECTION OBJECTIVE, MICROLITHOGRAPHIC MANUFACTURING METHOD FOR COMPONENTS, AS WELL AS A COMPONENT MANUFACTURED WITH SAID METHOD 审中-公开
公开(公告)号：WO2008145296A9
公开(公告)日：2008-12-04
申请号：PCT/EP2008/004084
申请日：2008-05-21
申请人： CARL ZEISS SMT AG , KRAEHMER, Daniel , KAMENOV, Vladimir , TOTZECK, Michael , GOEHNERMEIER, Aksel
发明人： KRAEHMER, Daniel , KAMENOV, Vladimir , TOTZECK, Michael , GOEHNERMEIER, Aksel
IPC分类号： G03F7/20
摘要： Projection objectives of current designs for use in microlithography have a stray light component which varies over the exposure field. The variation of the stray light component over the field can be reduced and/or adapted to the variation of another projection objective by introducing additional stray light. This is accomplished advantageously by pre-adapting or altering the surface roughness of a field- proximate surface and/or by installing optical elements with specifically targeted light scattering properties in a pupil plane. In this, the invention makes use of the observation that the variation of the stray light component over the field and the different respective variations of the stray light components of different projection objectives present greater problems to the manufacturers of semiconductor components than the stray light component itself. Particularly in projection objectives for immersion lithography where a strongly scattering polycrystalline material is used, the invention provides a way to compensate for the increased variation of the stray light component of these projection objectives over the field and to thereby arrive at a stray light component that is constant over the entire field. Furthermore, particularly in the case of projection objectives for EUV lithography, which exhibit a higher stray light component than conventional projection objectives, it is possible to adapt different projection objectives to each other in regard to the stray light component and/or the variation of the stray light component over the exposure field.

2. 发明申请

WO2005031467A2 MICROLITHOGRAPHIC ILLUMINATION METHOD AS WELL AS A PROJECTION ILLUMINATION SYSTEM FOR CARRYING OUT THE METHOD 审中-公开
标题翻译：作为执行方法的投影照明系统的微观照明方法
公开(公告)号：WO2005031467A2
公开(公告)日：2005-04-07
申请号：PCT/EP2003/011977
申请日：2003-10-29
申请人： CARL ZEISS SMT AG , GRUNER, Toralf , KRAEHMER, Daniel , TOTZECK, Michael , WANGLER, Johannes , BROTSACK, Markus , DIECKMANN, Nils , GOEHNERMEIER, Aksel , SCHWAB, Markus
发明人： GRUNER, Toralf , KRAEHMER, Daniel , TOTZECK, Michael , WANGLER, Johannes , BROTSACK, Markus , DIECKMANN, Nils , GOEHNERMEIER, Aksel , SCHWAB, Markus
IPC分类号： G03F7/20
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an illumination method for illuminating a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection illumination system for performing that method output radiation directed at the substrate and having an output polarization state is produced. By means of a variable adjustment of the output polarization state with the aid of at least one polarization manipulation device the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于照射布置在投影物镜的像面的区域中的基板以及在用于执行该方法的投影照明系统中的基板的照明方法中，产生了朝向基板并具有输出偏振状态的输出辐射。借助于至少一个偏振操纵装置借助于输出偏振状态的可变调节，可以形成输出偏振状态以接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

3. 发明申请

WO2008145295A9 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY, MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS WITH SAID PROJECTION OBJECTIVE, MICROLITHOGRAPHIC MANUFACTURING METHOD FOR COMPONENTS, AS WELL AS A COMPONENT MANUFACTURED WITH SAID METHOD 审中-公开
公开(公告)号：WO2008145295A9
公开(公告)日：2008-12-04
申请号：PCT/EP2008/004081
申请日：2008-05-21
申请人： CARL ZEISS SMT AG , KRAEHMER, Daniel , KAMENOV, Vladimir , TOTZECK, Michael
发明人： KRAEHMER, Daniel , KAMENOV, Vladimir , TOTZECK, Michael
IPC分类号： G03F7/20
摘要： Projection objectives of current designs for use in microlithography have a stray light component (503) which varies over the exposure field. The variation of the stray light component over the field can be reduced by introducing additional stray light. This is accomplished advantageously by pre-adapting or altering the surface roughness of a field- proximate surface. In this, the invention makes use of the observation that the variation of the stray light component over the field presents greater problems to the manufacturers of semiconductor components than the stray light component itself. Particularly in projection objectives for immersion lithography where a strongly scattering polycrystalline material is used, the invention provides a way to compensate for the increased variation of the stray light component (502) of these projection objectives over the field and to thereby arrive at a stray light component (501) that is constant over the entire field.

4. 发明申请

WO2004023172A1 OPTIMIERVERFAHREN FÜR EIN OBJEKTIV MIT FLUORID-KRISTALL-LINSEN SOWIE OBJEKTIV MIT FLUORID-KRISTALL-LINSEN 审中-公开
标题翻译：优化方法用氟晶镜头和镜头用氟晶镜头镜头
公开(公告)号：WO2004023172A1
公开(公告)日：2004-03-18
申请号：PCT/EP2003/009167
申请日：2003-08-19
申请人： CARL ZEISS SMT AG , TOTZECK, Michael , KAMENOV, Vladimir , GRUNER, Toralf
发明人： TOTZECK, Michael , KAMENOV, Vladimir , GRUNER, Toralf
IPC分类号： G02B5/30
CPC分类号： G02B1/08 , G02B1/02 , G02B5/3083 , G02B13/143 , G03F7/70241 , G03F7/705 , G03F7/70966 , Y10S359/90
摘要： Numerisches Optimierverfahren zum Bestimmen der optischen Daten eines Objektivs (1), insbesondere eines Projektionsobjektivs für eine Milcrolithographie- Projektionsbelichtungsanlage, wobei mit dem Optimierverfahren eine Optimierfunkction minimiert wird. Mit dem Optimierverfahren wird der störende Einfluss der intrinsischen Doppelbrechung von Linsen (L101-L130) aus Fluorid-Kristall-Material mit kubischer Kristallstruktur reduziert, indem in der Optimierfunktion mindestens ein Doppelbrechungs-Bildfehler berücksichtigt wird, welcher basierend auf der Durchrechnung eines Strahls (7) durch die Fluorid-Kristall-Linsen bestimmt wird und welcher, soweit er von Parametern des Strahls abhängt, nur von geometrischen Parametern des Strahls abhängt. Mit dem numerischen Optimierverfahren werden Objektive (1) hergestellt, bei welchen sowohl eine optische Verzögerung als auch eine optische Verzögerungs-Asymmetrie korrigiert ist. Die Objektive weisen dabei mehrere homogene Gruppen (HG1-HG7) auf, in welchen jeweils die optische Verzögerungs-Asymmetrie korrigiert ist.
摘要翻译：用于确定目标（1）的光学数据，尤其是投影物镜用于Milcrolithographie-投影曝光装置，其特征在于，一个Optimierfunkction被最小化与所述优化方法数值优化方法。与优化方法的氟化物晶体材料制成的透镜（L101-L130）的固有双折射的干扰影响被至少一个双折射图像误差具有立方晶体结构减少了优化功能，其基于所述跟踪的光束被认为是（7）由氟化物晶体透镜，并且其，只要它依赖于光束的参数，仅依赖于光束的几何参数来确定。与数值优化方法透镜（1）制备，其中两个光延迟和光学延迟不对称校正。在这种情况下，透镜具有更均匀的基团（HG1-HG7），在其中的每一个光学延迟不对称校正。

5. 发明申请

WO2004023184A1 OBJECTIVE WITH BIREFRINGENT LENSES 审中-公开
标题翻译：目标与双向镜片
公开(公告)号：WO2004023184A1
公开(公告)日：2004-03-18
申请号：PCT/EP2002/014638
申请日：2002-12-20
申请人： CARL ZEISS SMT AG , TOTZECK, Michael , KAMENOV, Vladimir , KRÄHMER, Daniel , ULRICH, Wilhelm
发明人： TOTZECK, Michael , KAMENOV, Vladimir , KRÄHMER, Daniel , ULRICH, Wilhelm
IPC分类号： G02B13/14
CPC分类号： G02B1/08 , G02B1/02 , G02B5/3083 , G02B13/143 , G03F7/70241 , G03F7/705 , G03F7/70966
摘要： Objective (1, 601), in particular a projection objective for a microlithography projection apparatus, with first birefringent lenses (L108, L109, L129, L130) and with second birefringent lenses (L101-L107, L110-L128). The first lenses (L108, L109, L129, L130) are distinguished from the second lenses (L101-L107, L110-L128) by the lens material used or by the material orientation. After passing through the first lenses (L108, L109, L129, L130) and the second lenses (L101-L107, L110-L128), outer aperture ray (5, 7) and a principal ray (9) are subject to optical path differences for two mutually orthogonal states of polarization. The difference between these optical path differences is smaller than 25% of the working wavelength. In at least one first lens (L129, L130), the aperture angle of the outer aperture ray (5, 7) is at least 70% of the largest aperture angle occurring for said aperture ray in all of the first lenses (L108, L109, L129, L130) and second lenses (L101-L107, L110-L128). This arrangement has the result that the first lenses (L108, L109, L129, L130) have a combined material volume of no more than 20% of the combined total material volume of the first lenses (L108, L109, L129, L130) and second lenses (L101-L07, L110-L128).
摘要翻译：目的（1，601），特别是具有第一双折射透镜（L108，L109，L129，L130）和第二双折射透镜（L101-L107，L110-L128）的微光刻投影装置的投影物镜。第一透镜（L108，L109，L129，L130）与所使用的透镜材料或材料取向与第二透镜（L101-L107，L110-L128）不同。在穿过第一透镜（L108，L109，L129，L130）和第二透镜（L101-L107，L110-L128）之后，外部光线（5,7）和主光线（9）经受光程差对于两个相互正交的极化状态。这些光程差之差小于工作波长的25％。在至少一个第一透镜（L129，L130）中，外光圈（5,7）的孔径角为所有第一透镜（L108，L109）中的所述孔径光线发生的最大孔径角的至少70％，L129，L130）和第二透镜（L101-L107，L110-L128）。这种结构的结果是，第一透镜（L108，L109，L129，L130）的组合材料体积不超过第一透镜（L108，L109，L129，L130）和第二透镜镜头（L101-L07，L110-L128）。

6. 发明申请

WO2009152959A1 PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY COMPRISING A DEVICE FOR THE THERMAL MANIPULATION OF AN OPTICAL ELEMENT 审中-公开
标题翻译：包含用于光学元件的热处理的器件的半导体光刻机的投影曝光装置
公开(公告)号：WO2009152959A1
公开(公告)日：2009-12-23
申请号：PCT/EP2009/004006
申请日：2009-06-04
申请人： CARL ZEISS SMT AG , HAUF, Markus , BLEIDISTEL, Sascha , MIGURA, Sascha , MANN, Hans-Juergen , ENKISCH, Hartmut , ZELLNER, Johannes , SCHOTTNER, Michael , KRAEHMER, Daniel , TOTZECK, Michael , DODOC, Aurelian , HETZLER, Jochen , BEIERL, Helmut , ULRICH, Wilhelm
发明人： HAUF, Markus , BLEIDISTEL, Sascha , MIGURA, Sascha , MANN, Hans-Juergen , ENKISCH, Hartmut , ZELLNER, Johannes , SCHOTTNER, Michael , KRAEHMER, Daniel , TOTZECK, Michael , DODOC, Aurelian , HETZLER, Jochen , BEIERL, Helmut , ULRICH, Wilhelm
IPC分类号： G03F7/20
CPC分类号： G03F7/70891 , G03F7/70266
摘要： The invention relates to a projection exposure apparatus (16) for semiconductor lithography comprising a device for the thermal manipulation of an optical element (1,100), wherein the optical element (1,100) has a front side (2) for the reflection of electromagnetic radiation and a rear side (3,103), and wherein thermal actuators (4) for influencing the optical properties of the optical element (1,100) are present, which act on the optical element (1,100) from the rear side (3,103) thereof.
摘要翻译：本发明涉及一种用于半导体光刻的投影曝光装置（16），包括用于光学元件（1,100）的热操纵的装置，其中光学元件（1,100）具有用于反射电磁辐射的前侧（2）后侧（3,103），并且其中存在用于影响光学元件（1,100）的光学特性的热致动器（4），其从其后侧（3,103）作用在光学元件（1,100）上。

7. 发明申请

WO2009043790A2 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY 审中-公开
标题翻译：微压印技术的投影目标
公开(公告)号：WO2009043790A2
公开(公告)日：2009-04-09
申请号：PCT/EP2008/062835
申请日：2008-09-25
申请人： CARL ZEISS SMT AG , BEIERL, Helmut , FELDMANN, Heiko , HETZLER, Jochen , TOTZECK, Michael
发明人： BEIERL, Helmut , FELDMANN, Heiko , HETZLER, Jochen , TOTZECK, Michael
IPC分类号： G03F7/20 , G02B13/14
CPC分类号： G03F7/70341 , G02B1/02 , G02B21/33 , G03F7/70941
摘要： An assembly 11 of a projection objective for microlithography comprises a number of optical elements and an aperture 14. The optical element of the assembly 11 before the last optical element oriented towards the image is a planar convex lens 12, whose convex surface 2b is oriented towards the object, and whose planar surface 2a is oriented towards the image. As a last optical element of the assembly 11 oriented towards the image, an optical terminal element 17 is provided which comprises a planar plate 19. Between the planar surface 2b of the lens 12 and the planar plate 19 of the optical terminal element 17, thus at the object oriented surface of the planar plate, and also on the image oriented surface of the planar plate of the terminal element 17 a respective immersion liquid 13b or 13a is provided. The planar plate is thus in contact with the immersion liquids 13a and 13b on both sides. By this configuration it is assured that contaminations within the immersion liquid 13a disposed on the image oriented side do not impair the planar convex lens 12. Replacing the terminal element 17 or the planar plate 19 of the terminal element 17, however, is easily possible, as soon as their imaging properties become insufficient through contamination or other impairments.
摘要翻译：用于微光刻的投影物镜的组件11包括多个光学元件和孔14.在朝向图像定向的最后一个光学元件之前的组件11的光学元件是平面凸透镜12 ，其凸面2b朝向物体取向，并且其平面表面2a朝向图像取向。作为朝向图像定向的组件11的最后一个光学元件，提供包括平面板19的光学终端元件17.因此，在透镜12的平面表面2b和光学终端元件17的平面平板19之间在平面板的物体定向表面上以及在终端元件17的平面板的图像定向表面上提供相应的浸没液体13b或13a。因此平面板在两侧与浸液13a和13b接触。通过这种配置，可以确保设置在图像取向侧的浸液13a内的污染不会损害平面凸透镜12.然而，更换端子元件17或端子元件17的平板19是容易的，只要其成像特性因污染或其他损伤而变得不足。

8. 发明申请

WO2007019886A1 OPTISCHES SYSTEM, NÄMLICH OBJEKTIV ODER BELEUCHTUNGSEINRICHTUNG EINER MIKROLITHOGRAPHISCHEN PROJEKTIONSBELICHTUNGSANLAGE 审中-公开
标题翻译：光学系统中，透镜或照明UP的微光刻投射曝光设备
公开(公告)号：WO2007019886A1
公开(公告)日：2007-02-22
申请号：PCT/EP2005/055888
申请日：2005-11-10
申请人： CARL ZEISS AG , CARL ZEISS SMT AG , KRÄHMER, Daniel , TOTZECK, Michael , KLEEMANN, Bernd , RUOFF, Johannes
发明人： KRÄHMER, Daniel , TOTZECK, Michael , KLEEMANN, Bernd , RUOFF, Johannes
IPC分类号： G03F7/20
CPC分类号： G03F7/70566 , G03F7/70158
摘要： Die Erfindung betrifft eine Beleuchtungseinrichtung oder ein Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage, mit wenigstens einem diffraktiven optischen Element, das zur Erzielung einer Blazewirkung eine Mehrzahl von Blazestrukturen aufweist, welche jeweils mehrere für eine Blazewirkung sorgende Einzel- Substrukturen umfassen, die gemäß einer vorbestimmten Periode in Erstreckungsrichtung der jeweiligen Blazestruktur nebeneinander angeordnet sind, wobei diese Einzel- Substrukturen in Draufsicht jeweils die Form einer geschlossenen geometrischen Fläche besitzen, deren parallel zur Erstreckungsrichtung gerichtete Abmessung senkrecht zur Erstreckungsrichtung variiert, aber immer kleiner als die Wellenlänge der elektromagnetischen Strahlung ist, und deren maximale Abmessung senkrecht zur Erstreckungsrichtung größer ist als die Wellenlänge der elektromagnetischen Strahlung, wobei das Füllverhältnis der Einzel-Substrukturen in Erstreckungsrichtung zur Periode in Abhängigkeit von der Position senkrecht zur Erstreckungsrichtung so gewählt ist, dass für einen von zwei zueinander orthogonalen Polarisationszuständen der elektromagnetischen Strahlung die Blazewirkung optimiert ist.
摘要翻译：本发明涉及的照明装置或微光刻投射曝光设备的投射物镜，其具有具有多个火焰结构中的至少一个衍射光学元件来实现火焰的效果，每一个包括多个关心的闪耀效果个体子结构，其根据在延伸方向以预定的周期各自闪耀结构并列设置，在每个所述在封闭的几何表面的形式平面图单自己的子结构，定向平行于延伸方向的尺寸变化垂直于延伸方向，但总是小于所述电磁辐射的波长，且垂直于它们的最大尺寸延伸方向比所述电磁辐射的波长，在延伸方向上P上的各个子结构，其中，所述填充率大于 eriode一个功能由位置垂直于延伸方向，使得对于电磁辐射的两个相互正交的偏振状态中的一个闪耀效果被最优化选择。

9. 发明申请

WO2003077011A1 OPTICAL SYSTEM WITH BIREFRINGENT OPTICAL ELEMENTS 审中-公开
标题翻译：具有双重光学元件的光学系统
公开(公告)号：WO2003077011A1
公开(公告)日：2003-09-18
申请号：PCT/EP2002/012446
申请日：2002-11-07
申请人： CARL ZEISS SMT AG , FIOLKA, Damian , DITTMAN, Olaf , TOTZECK, Michael , DIECKMANN, Nils , KÖHLER, Jess , GRUNER, Toralf , KRÄHMER, Daniel
发明人： FIOLKA, Damian , DITTMAN, Olaf , TOTZECK, Michael , DIECKMANN, Nils , KÖHLER, Jess , GRUNER, Toralf , KRÄHMER, Daniel
IPC分类号： G02B27/28
CPC分类号： G02B17/0892 , G02B17/08 , G02B27/286 , G02B27/288 , G03F7/70075 , G03F7/70191 , G03F7/70241 , G03F7/70566 , G03F7/70966
摘要： Optical system (1) : with a first optical subsystem (3) comprising at least a first birefringent optical element (7), with a second optical subsystem (5) comprising at least a second birefringent optical element (9), wherein between the first optical subsystem and the second optical subsystem an optical retarding system (13) with at least a first optical retarding element (15) is arranged, which introduces a ratardation of one-half of a wavelength between two mutually orthogonal states of polarization.
摘要翻译：光学系统（1）：具有包括至少第一双折射光学元件（7）的第一光学子系统（3），其中第二光学子系统（5）包括至少第二双折射光学元件（9），其中在第一光学子系统和第二光学子系统，布置有至少具有第一光学延迟元件（15）的光学延迟系统（13），其引入在两个相互正交的极化状态之间的波长的一半的估计。

10. 发明申请

WO2007144193A1 PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置的投影目标
公开(公告)号：WO2007144193A1
公开(公告)日：2007-12-21
申请号：PCT/EP2007/005297
申请日：2007-06-15
申请人： CARL ZEISS SMT AG , SCHUSTER, Karl-Heinz , FELDMANN, Heiko , GRUNER, Toralf , TOTZECK, Michael , CLAUSS, Wilfried , BEDER, Susanne , KRÄHMER, Daniel , DITTMANN, Olaf
发明人： SCHUSTER, Karl-Heinz , FELDMANN, Heiko , GRUNER, Toralf , TOTZECK, Michael , CLAUSS, Wilfried , BEDER, Susanne , KRÄHMER, Daniel , DITTMANN, Olaf
IPC分类号： G02B27/00 , G03F7/20 , G02B5/30
CPC分类号： G03F7/70341 , G02B5/3091 , G02B27/0025 , G03F7/70308
摘要： A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element (L3) with an index of refraction greater than 1.6. This element (L3) has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume (L3') which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.
摘要翻译：微光刻投影曝光装置的投影物镜具有折射率大于1.6的高折射率折射光学元件（L3）。该元件（L3）具有在体积上变化的体积和材料相关的光学性质。该光学特性的变化导致物镜的像差。在一个实施例中，提供至少4个光学表面，其布置在与折射光学元件的体积光学共轭的至少一个体积（L3'）中。每个光学表面包括至少一个校正装置，例如具有局部变化特性的表面变形或双折射层，其至少部分地校正由光学性质的变化引起的像差。

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